JP2020507793A5 - - Google Patents

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Publication number
JP2020507793A5
JP2020507793A5 JP2019528690A JP2019528690A JP2020507793A5 JP 2020507793 A5 JP2020507793 A5 JP 2020507793A5 JP 2019528690 A JP2019528690 A JP 2019528690A JP 2019528690 A JP2019528690 A JP 2019528690A JP 2020507793 A5 JP2020507793 A5 JP 2020507793A5
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JP
Japan
Prior art keywords
layer
waveguide
optical structure
substrate
adhesive layer
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JP2019528690A
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English (en)
Japanese (ja)
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JP2020507793A (ja
JP6967593B2 (ja
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Priority claimed from PCT/US2017/051796 external-priority patent/WO2018102005A1/en
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Publication of JP2020507793A5 publication Critical patent/JP2020507793A5/ja
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JP2019528690A 2016-11-30 2017-09-15 多重導波管明視野ディスプレイ Active JP6967593B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201662428193P 2016-11-30 2016-11-30
US62/428,193 2016-11-30
PCT/US2017/051796 WO2018102005A1 (en) 2016-11-30 2017-09-15 Multi-waveguide light field display

Publications (3)

Publication Number Publication Date
JP2020507793A JP2020507793A (ja) 2020-03-12
JP2020507793A5 true JP2020507793A5 (enExample) 2020-10-22
JP6967593B2 JP6967593B2 (ja) 2021-11-17

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ID=62189986

Family Applications (1)

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JP2019528690A Active JP6967593B2 (ja) 2016-11-30 2017-09-15 多重導波管明視野ディスプレイ

Country Status (9)

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US (3) US10444422B2 (enExample)
EP (1) EP3548941B1 (enExample)
JP (1) JP6967593B2 (enExample)
KR (1) KR102247455B1 (enExample)
CN (2) CN110023801B (enExample)
AU (1) AU2017367795B2 (enExample)
CA (1) CA3044808C (enExample)
IL (3) IL304058B2 (enExample)
WO (1) WO2018102005A1 (enExample)

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CN110023801B (zh) * 2016-11-30 2021-10-26 分子印记公司 多波导光场显示
US11536882B2 (en) * 2017-07-18 2022-12-27 Baden-Württemberg Stiftung Ggmbh Method of fabricating an imaging system and corresponding imaging system
US10705268B2 (en) * 2018-06-29 2020-07-07 Applied Materials, Inc. Gap fill of imprinted structure with spin coated high refractive index material for optical components
US11635622B1 (en) * 2018-12-07 2023-04-25 Meta Platforms Technologies, Llc Nanovided spacer materials and corresponding systems and methods
WO2020243828A1 (en) 2019-06-05 2020-12-10 Airy3D Inc. Light field imaging device and method for 3d sensing
CN115443426B (zh) * 2020-04-07 2025-01-21 斯纳普公司 光学装置
US20230266594A1 (en) * 2020-09-08 2023-08-24 Sony Group Corporation Devices, systems, and methods for diffraction gratings
CN112331071A (zh) * 2020-10-23 2021-02-05 云谷(固安)科技有限公司 一种光场调制组件、显示组件和显示装置
CN117063104A (zh) 2020-11-17 2023-11-14 应用材料公司 具有结构及折射率渐变的光学器件及其制造方法
US11926113B2 (en) 2022-08-03 2024-03-12 Himax Technologies Limited Optical element and method for manufacturing optical element
CN115032734B (zh) * 2022-08-11 2023-01-24 歌尔光学科技有限公司 光波导结构、制作方法及电子设备

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JP2003520986A (ja) * 2000-01-21 2003-07-08 フレックス プロダクツ インコーポレイテッド 光学変調セキュリティーデバイス
US6307995B1 (en) 2000-04-05 2001-10-23 James T. Veligdan Planar optical waveguides for optical panel having gradient refractive index core
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JP3885671B2 (ja) * 2002-06-20 2007-02-21 住友電気工業株式会社 平面導波路型回折格子素子の製造方法
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CN110023801B (zh) * 2016-11-30 2021-10-26 分子印记公司 多波导光场显示

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