JP2020047900A - 搬送ユニット及び搬送方法 - Google Patents
搬送ユニット及び搬送方法 Download PDFInfo
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- JP2020047900A JP2020047900A JP2018177718A JP2018177718A JP2020047900A JP 2020047900 A JP2020047900 A JP 2020047900A JP 2018177718 A JP2018177718 A JP 2018177718A JP 2018177718 A JP2018177718 A JP 2018177718A JP 2020047900 A JP2020047900 A JP 2020047900A
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- 230000032258 transport Effects 0.000 claims abstract description 115
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- 238000012545 processing Methods 0.000 description 16
- 238000010586 diagram Methods 0.000 description 14
- 238000012546 transfer Methods 0.000 description 11
- 230000004308 accommodation Effects 0.000 description 6
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- 229910001220 stainless steel Inorganic materials 0.000 description 1
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- 238000006467 substitution reaction Methods 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67778—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving loading and unloading of wafers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67778—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving loading and unloading of wafers
- H01L21/67781—Batch transfer of wafers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
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- Condensed Matter Physics & Semiconductors (AREA)
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- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
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Abstract
Description
本発明の実施形態1に係る搬送ユニット及び搬送方法を図面に基づいて説明する。図1は、実施形態1に係る搬送方法の搬送対象の被加工物の一例を示す斜視図である。図2は、図1中のII−II線に沿う断面図である。図3は、実施形態1に係る搬送ユニットを備える分割装置の構成例を示す図である。図4は、図3に示す分割装置の保持テーブルを示す斜視図である。図5は、実施形態1に係る搬送ユニットを下方からみた斜視図である。図6は、実施形態1に係る搬送ユニットの構成を一部断面で示す図である。図7は、実施形態1に係る搬送ユニットを下方からみた平面図である。
本発明の実施形態2に係る搬送ユニット及び搬送方法を図面に基づいて説明する。図15は、実施形態2に係る搬送ユニットを下方からみた平面図である。図15は、実施形態1と同一部分に同一符号を付して説明を省略する。
本発明の実施形態1及び実施形態2の変形例に係る搬送ユニット及び搬送方法を図面に基づいて説明する。図16は、実施形態2に係る搬送ユニットの要部の断面図である。図16は、実施形態1及び実施形態2と同一部分に同一符号を付して説明を省略する。
70 搬送ユニット
71 吸引保持パッド
75 吸引孔
78 エア吸引源
79 エア供給源
80 チップ接触シート
81,81−2 穴
204 CSP(チップ)
741 下面
ST2 チップ保持ステップ
ST3 搬送ステップ
ST4 チップ収容ステップ
Claims (4)
- 複数のチップを搬送する搬送ユニットであって、
該搬送ユニットは、
該複数のチップと対応する位置に形成された複数の吸引孔を有しチップを吸引保持する吸引保持パッドと、
該吸引孔と連通するエア供給源及びエア吸引源と、
該吸引保持パッドの下面に配設され該吸引孔と対応する位置に複数の穴を備えたチップ接触シートと、を備え、
該チップ接触シートは、該吸引保持パッドに外縁が固定されていることを特徴とする、
搬送ユニット。 - 該穴は、該吸引孔より小さいことを特徴とする請求項1に記載の搬送ユニット。
- 該穴は、該吸引孔と一部が重なるように形成されていることを特徴とする請求項1に記載の搬送ユニット。
- 請求項1から請求項3のいずれか一項に記載の搬送ユニットを利用した搬送方法であって、
該チップ接触シートの該複数の穴を該複数のチップに接触させるとともに該エア供給源との連通を遮断した状態でエア吸引源でエアを吸引することでチップを保持するチップ保持ステップと、
チップを保持した状態で収容トレイの上部まで該複数のチップを搬送する搬送ステップと、
該エア吸引源との連通を遮断した状態で該エア供給源からエアを供給し該吸引保持パッドと該チップ接触シートとの間にエアを供給しながら該複数のチップを収容トレイに落下させるチップ収容ステップと、
を備えることを特徴とする搬送方法。
Priority Applications (2)
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JP2018177718A JP7138002B2 (ja) | 2018-09-21 | 2018-09-21 | 搬送ユニット及び搬送方法 |
CN201910851619.6A CN110943025A (zh) | 2018-09-21 | 2019-09-10 | 搬送单元和搬送方法 |
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JP2018177718A JP7138002B2 (ja) | 2018-09-21 | 2018-09-21 | 搬送ユニット及び搬送方法 |
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JP2020047900A true JP2020047900A (ja) | 2020-03-26 |
JP7138002B2 JP7138002B2 (ja) | 2022-09-15 |
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CN (1) | CN110943025A (ja) |
Families Citing this family (1)
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JP7456399B2 (ja) * | 2021-02-12 | 2024-03-27 | 株式会社村田製作所 | シート搬送装置 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5803797A (en) * | 1996-11-26 | 1998-09-08 | Micron Technology, Inc. | Method and apparatus to hold intergrated circuit chips onto a chuck and to simultaneously remove multiple intergrated circuit chips from a cutting chuck |
JPH11285966A (ja) * | 1998-04-02 | 1999-10-19 | Speedfam-Ipec Co Ltd | キャリア及びcmp装置 |
JP2008091401A (ja) * | 2006-09-29 | 2008-04-17 | Seiko Epson Corp | 基板搬送方法 |
JP2015012264A (ja) * | 2013-07-02 | 2015-01-19 | 株式会社ディスコ | 切削装置 |
JP2015088558A (ja) * | 2013-10-29 | 2015-05-07 | Towa株式会社 | 電子部品の製造装置及び製造方法 |
JP2016021541A (ja) * | 2014-07-16 | 2016-02-04 | Towa株式会社 | 個片化物品の移送方法、製造方法及び製造装置 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2017084893A (ja) * | 2015-10-26 | 2017-05-18 | 株式会社ディスコ | 分割装置 |
JP6901908B2 (ja) * | 2017-06-02 | 2021-07-14 | 株式会社ディスコ | チップ収容方法、搬送装置及び分割装置 |
-
2018
- 2018-09-21 JP JP2018177718A patent/JP7138002B2/ja active Active
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2019
- 2019-09-10 CN CN201910851619.6A patent/CN110943025A/zh active Pending
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5803797A (en) * | 1996-11-26 | 1998-09-08 | Micron Technology, Inc. | Method and apparatus to hold intergrated circuit chips onto a chuck and to simultaneously remove multiple intergrated circuit chips from a cutting chuck |
JPH11285966A (ja) * | 1998-04-02 | 1999-10-19 | Speedfam-Ipec Co Ltd | キャリア及びcmp装置 |
JP2008091401A (ja) * | 2006-09-29 | 2008-04-17 | Seiko Epson Corp | 基板搬送方法 |
JP2015012264A (ja) * | 2013-07-02 | 2015-01-19 | 株式会社ディスコ | 切削装置 |
JP2015088558A (ja) * | 2013-10-29 | 2015-05-07 | Towa株式会社 | 電子部品の製造装置及び製造方法 |
JP2016021541A (ja) * | 2014-07-16 | 2016-02-04 | Towa株式会社 | 個片化物品の移送方法、製造方法及び製造装置 |
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JP7138002B2 (ja) | 2022-09-15 |
CN110943025A (zh) | 2020-03-31 |
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