JP2020009764A - グリッド集電体並びに関連する装置及び方法 - Google Patents
グリッド集電体並びに関連する装置及び方法 Download PDFInfo
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- 238000006479 redox reaction Methods 0.000 description 1
- 238000006722 reduction reaction Methods 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 238000007761 roller coating Methods 0.000 description 1
- 238000010020 roller printing Methods 0.000 description 1
- 238000010022 rotary screen printing Methods 0.000 description 1
- 239000007784 solid electrolyte Substances 0.000 description 1
- 238000005063 solubilization Methods 0.000 description 1
- 230000007928 solubilization Effects 0.000 description 1
- 239000011877 solvent mixture Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 229920003051 synthetic elastomer Polymers 0.000 description 1
- 239000005061 synthetic rubber Substances 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- QHGNHLZPVBIIPX-UHFFFAOYSA-N tin(ii) oxide Chemical class [Sn]=O QHGNHLZPVBIIPX-UHFFFAOYSA-N 0.000 description 1
- 238000012549 training Methods 0.000 description 1
- 229920003194 trans-1,4-polybutadiene polymer Polymers 0.000 description 1
- 125000001889 triflyl group Chemical group FC(F)(F)S(*)(=O)=O 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 230000037303 wrinkles Effects 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
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Abstract
Description
−第2の材料は、少なくとも粒子からなる。
−第2の材料は、少なくともポリマー及び粒子を含む。
−第2の材料は、少なくともポリマー及び粒子からなる。
−第2の材料は、少なくともバインダー及び粒子を含む。
−第2の材料は、少なくともバインダー及び粒子からなる。
−第2の材料は、少なくともバインダーに分散した粒子を含む。
−第2の材料は、少なくともバインダーに分散した粒子からなる。
−第2の材料は、導電性金属及び合金、特に金、銀、銅、アルミニウム、ニッケル、パラジウム、白金及びチタンからなる群から選択された少なくとも1つの元素、並びに、酸化インジウム錫、フッ素化酸化錫、酸化錫及び酸化亜鉛等の金属酸化物を含む。
−グリッドは、パターンの繰り返しで構成される。
−集電体は、さらにコーティング層を含み、コーティング層は、グリッドと接触しており、積層方向に沿って基板と重なる層の積層体を形成する。
−コーティング層は、第2の組成物に従って作られ、第2の組成物は、導電性材料及びバインダー材料を含み、導電性材料は、カーボン、カーボンブラック、グラファイト、グラフェン、カーボンナノチューブ、活性炭素繊維、非活性炭素ナノファイバー、金属フレーク、金属粉末、金属繊維、及び、導電性ポリマーからなる群から選択される少なくとも1つの要素を含む。
−バインダー材料の重量含有量は、30%以上であり、好ましくは80%未満である。
−導電性材料の重量含有量は、20%以上であり、好ましくは70%未満である。
−バインダー材料は、1つ又は複数のポリマーからなる。
−コーティング層とグリッドとの全体の集合体は、15マイクロメートル以下、好ましくは3マイクロメートル以下の厚さを有する。
−グリッド及びコーティング層によって構成される積層体は、15マイクロメートル以下、好ましくは3マイクロメートル以下の厚さを有する。
−第1の材料は、少なくとも1つのアミド官能基を含むポリマー、少なくとも1つのイミド官能基を含むポリマー、少なくとも1つのイミド官能基及び1つのアミド官能基を含むポリマー、ポリ(フェニレンエーテルエーテルケトン)、及び、ポリ(エチレンナフタレート)からなる群から選択される。
−この方法は、グリッドと接触するコーティング層を堆積するための追加の段階であって、コーティング層が、導電性材料とバインダー材料とを含む組成物を堆積することによって形成される段階、
−印刷技術によって実行される少なくとも1つの堆積段階。
−導電性金属及び合金、特に金、銀、銅、アルミニウム、ニッケル、パラジウム、白金、チタン、鉄、亜鉛、マンガン、クロム、バナジウム又はステンレス鋼、及び、
−銅−、アルミニウム−、インジウム−、及び、酸化錫等の金属酸化物、フッ素化酸化錫、酸化錫、酸化亜鉛又はそれらの混合物。
2つの集電体を比較するために、出願人によって実験が行われた。
12 電解質
14 アノード
16 カソード
18 電極
20 集電体
22 基板
24 グリッド
26 コーティング層
Claims (15)
- −第1の材料(M1)で作られる基板(22)であって、前記第1の材料(M1)がポリマーを含む、基板(22)と、
−前記基板(22)に堆積されるグリッド(24)であって、前記グリッド(24)が第2の材料(M2)で作られ、前記第2の材料(M2)が金属粒子を含む、グリッド(24)と、
を備える、集電体(20)。 - 前記第2の材料(M2)が、
−導電性金属及び合金、並びに、
−金属酸化物
からなる群から選択された少なくとも1つの元素を含む、請求項1に記載の集電体。 - 前記グリッド(24)が、パターンの繰り返しである、請求項1又は2に記載の集電体。
- 前記集電体(20)が、コーティング層(26)をさらに含み、前記コーティング層(26)が、前記グリッド(24)と接触しており、積層方向に沿って前記基板(22)と重ね合わされた層のスタックを形成する、請求項1から3の何れか一項に記載の集電体。
- 前記コーティング層(26)が、第2の組成物(C2)に従って作られ、前記第2の組成物(C2)が、導電性材料(MC)及びバインダー材料(ML)を含み、前記導電性材料(MC)が、
−カーボン、
−カーボンブラック、
−グラファイト、
−グラフェン、
−カーボンナノチューブ、
−活性炭素繊維、
−非活性炭素ナノファイバー、
−金属フレーク、
−金属粉末、
−金属繊維、及び、
−導電性ポリマー
からなる群から選択される少なくとも1つを含む、請求項4に記載の集電体。 - 前記バインダー材料(ML)の重量含有量が30%以上である、請求項5に記載の集電体。
- 前記導電性材料(MC)の重量含有量が20%以上である、請求項5又は6に記載の集電体。
- 前記バインダー材料(ML)が、1つ又は複数のポリマーからなる、請求項5から7の何れか一項に記載の集電体。
- 前記コーティング層(26)と前記グリッド(24)との全体の組立体が、15マイクロメートル以下の厚さを有し、又は、前記グリッド(24)と前記コーティング層(26)とによって構成される積層体が、15マイクロメートル以下の厚さを有する、請求項5から8の何れか一項に記載の集電体。
- 前記第1の材料(M1)が、
−少なくとも1つのアミド官能基を含むポリマー、
−少なくとも1つのイミド官能基を含むポリマー、
−少なくとも1つのイミド官能基及び1つのアミド官能基を含むポリマー、
−ポリ(フェニレンエーテルエーテルケトン)、及び、
−ポリ(エチレンナフタレート)
からなる群から選択される、請求項1から9の何れか一項に記載の集電体。 - −電極、及び、
−請求項1から10の何れか一項に記載の集電体(20)
を含む、アノード又はカソードを形成する組立体。 - 請求項11に記載の組立体を含む、電気エネルギー貯蔵装置、電気化学蓄電池又はスーパーキャパシタ。
- −基板(22)を提供する段階であって、前記基板(22)が第1の材料(M1)で作られ、前記第1の材料(M1)がポリマーを含む、段階と、
−前記基板(22)に堆積されたグリッド(24)を堆積する段階であって、前記グリッド(24)が第2の材料(M2)で作られ、前記第2の材料(M2)が金属粒子を含む、段階と、
を含む、集電体(20)の製造方法。 - 前記グリッド(24)と接触してコーティング層(26)を堆積するための追加の段階を含み、前記コーティング層(26)が、導電性材料(MC)及びバインダー材料(ML)を含む組成物(C2)を堆積することによって生成される、請求項13に記載の集電体(20)の製造方法。
- 前記堆積する段階の少なくとも1つが、印刷技術によって行われる、請求項13に記載の集電体(20)の製造方法。
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JP2013532362A (ja) * | 2010-06-16 | 2013-08-15 | コミッサリア ア レネルジー アトミーク エ オ ゼネルジ ザルタナテイヴ | 組込み式シール手段を有する集電体およびそのような集電体を含む2極電池 |
KR101661174B1 (ko) * | 2015-05-22 | 2016-10-10 | 한국과학기술연구원 | 플렉시블 박막형 리튬이차전지 및 그 제조방법 |
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WO2021171999A1 (ja) * | 2020-02-26 | 2021-09-02 | 株式会社村田製作所 | 導電性基体および二次電池 |
JP7347647B2 (ja) | 2020-02-26 | 2023-09-20 | 株式会社村田製作所 | 導電性基体および二次電池 |
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KR20200005494A (ko) | 2020-01-15 |
BR102019013896A2 (pt) | 2020-02-18 |
US11133509B2 (en) | 2021-09-28 |
CN110690453A (zh) | 2020-01-14 |
FR3083649A1 (fr) | 2020-01-10 |
EP3591750A1 (fr) | 2020-01-08 |
AU2019204813A1 (en) | 2020-01-23 |
US20200014032A1 (en) | 2020-01-09 |
FR3083649B1 (fr) | 2020-06-26 |
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