JP2020008841A5 - - Google Patents
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- JP2020008841A5 JP2020008841A5 JP2019097148A JP2019097148A JP2020008841A5 JP 2020008841 A5 JP2020008841 A5 JP 2020008841A5 JP 2019097148 A JP2019097148 A JP 2019097148A JP 2019097148 A JP2019097148 A JP 2019097148A JP 2020008841 A5 JP2020008841 A5 JP 2020008841A5
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- JP
- Japan
- Prior art keywords
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- information
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- information processing
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- 239000000758 substrate Substances 0.000 claims description 47
- 238000007689 inspection Methods 0.000 claims description 42
- 238000001459 lithography Methods 0.000 claims description 39
- 230000010365 information processing Effects 0.000 claims description 33
- 238000010801 machine learning Methods 0.000 claims description 7
- 238000000034 method Methods 0.000 claims 9
- 239000000463 material Substances 0.000 claims 7
- 238000004519 manufacturing process Methods 0.000 claims 4
- 238000004364 calculation method Methods 0.000 claims 3
- 238000009826 distribution Methods 0.000 claims 3
- 238000005259 measurement Methods 0.000 claims 3
- 238000003825 pressing Methods 0.000 claims 3
- 238000010008 shearing Methods 0.000 claims 1
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020190073913A KR102543393B1 (ko) | 2018-06-29 | 2019-06-21 | 정보 처리 장치, 저장 매체, 리소그래피 장치, 리소그래피 시스템 및 물품 제조 방법 |
| US16/451,727 US11061335B2 (en) | 2018-06-29 | 2019-06-25 | Information processing apparatus, storage medium, lithography apparatus, lithography system, and article manufacturing method |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2018125523 | 2018-06-29 | ||
| JP2018125523 | 2018-06-29 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2020008841A JP2020008841A (ja) | 2020-01-16 |
| JP2020008841A5 true JP2020008841A5 (OSRAM) | 2022-05-24 |
| JP7305430B2 JP7305430B2 (ja) | 2023-07-10 |
Family
ID=69151680
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2019097148A Active JP7305430B2 (ja) | 2018-06-29 | 2019-05-23 | 情報処理装置、プログラム、リソグラフィ装置、リソグラフィシステム、および物品の製造方法 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP7305430B2 (OSRAM) |
| KR (1) | KR102543393B1 (OSRAM) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102770779B1 (ko) | 2020-01-08 | 2025-02-19 | 주식회사 엘지에너지솔루션 | 접속 플레이트를 구비한 배터리 팩 |
| JP2021190596A (ja) * | 2020-06-01 | 2021-12-13 | キヤノン株式会社 | 制御方法、プログラム、インプリント方法、および物品製造方法 |
| JP7466403B2 (ja) * | 2020-08-03 | 2024-04-12 | キヤノン株式会社 | 制御装置、リソグラフィー装置、制御方法および物品製造方法 |
| US11908711B2 (en) * | 2020-09-30 | 2024-02-20 | Canon Kabushiki Kaisha | Planarization process, planarization system and method of manufacturing an article |
| JP7657631B2 (ja) * | 2021-03-29 | 2025-04-07 | キヤノン株式会社 | 評価装置、プログラム、評価方法、成形システム、および物品製造方法 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8945444B2 (en) | 2007-12-04 | 2015-02-03 | Canon Nanotechnologies, Inc. | High throughput imprint based on contact line motion tracking control |
| JP5669377B2 (ja) | 2009-11-09 | 2015-02-12 | キヤノン株式会社 | インプリント装置及び物品の製造方法 |
| SG11201610106SA (en) | 2014-06-10 | 2016-12-29 | Asml Netherlands Bv | Computational wafer inspection |
| WO2016086138A1 (en) * | 2014-11-25 | 2016-06-02 | Stream Mosaic, Inc. | Improved process control techniques for semiconductor manufacturing processes |
| WO2016096308A1 (en) * | 2014-12-18 | 2016-06-23 | Asml Netherlands B.V. | Feature search by machine learning |
| US11067902B2 (en) | 2017-08-07 | 2021-07-20 | Asml Netherlands B.V. | Computational metrology |
-
2019
- 2019-05-23 JP JP2019097148A patent/JP7305430B2/ja active Active
- 2019-06-21 KR KR1020190073913A patent/KR102543393B1/ko active Active
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