JP2019531405A - セラミック材料の溶射 - Google Patents
セラミック材料の溶射 Download PDFInfo
- Publication number
- JP2019531405A JP2019531405A JP2019508869A JP2019508869A JP2019531405A JP 2019531405 A JP2019531405 A JP 2019531405A JP 2019508869 A JP2019508869 A JP 2019508869A JP 2019508869 A JP2019508869 A JP 2019508869A JP 2019531405 A JP2019531405 A JP 2019531405A
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- metal
- particles
- coated
- ceramic
- metal alloy
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1635—Composition of the substrate
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
- B22F1/14—Treatment of metallic powder
- B22F1/148—Agglomerating
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
- B22F1/17—Metallic particles coated with metal
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
- B22F1/18—Non-metallic particles coated with metal
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- C—CHEMISTRY; METALLURGY
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- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/515—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics
- C04B35/56—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on carbides or oxycarbides
- C04B35/563—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on carbides or oxycarbides based on boron carbide
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- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
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- C04B35/56—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on carbides or oxycarbides
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- C04B35/62605—Treating the starting powders individually or as mixtures
- C04B35/62645—Thermal treatment of powders or mixtures thereof other than sintering
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- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
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- C04B35/62605—Treating the starting powders individually or as mixtures
- C04B35/62695—Granulation or pelletising
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- C04B35/628—Coating the powders or the macroscopic reinforcing agents
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- C—CHEMISTRY; METALLURGY
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- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
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Abstract
Description
ケイ素およびホウ素の炭化物系材料および窒化物系材料は、優れた機械的、熱的および化学的性質を併せ持つため、多くの産業において幅広く用いられてきた。これらの炭化物および窒化物は、非常に良好な摩擦学的性質および耐食性を示すため、耐摩耗・耐研磨性が要求される塗装用途、例えば、腐食性環境において一般に使用される。これらは、ダイヤモンドなどの高価な材料と比べても、このような特性において遜色がない。
一態様によれば、本発明は、
(i)炭化ケイ素、窒化ケイ素、炭化ホウ素または窒化ホウ素の粒子を金属合金層または金属層で被覆する工程、
(ii)工程(i)の粒子を凝集させる工程、および
(iii)凝集金属被覆粒子または凝集金属合金被覆粒子を基板上に溶射して、基板上に皮膜を付与する工程を
含むプロセスを提供する。
(i)50〜95重量%の炭化ケイ素、窒化ケイ素、炭化ホウ素または窒化ホウ素の内側コアと、
(ii)5〜50重量%の金属または金属合金の外層と
を含む複数の金属被覆粒子または金属合金被覆粒子を提供する。
(i)炭化ケイ素、窒化ケイ素、炭化ホウ素または窒化ホウ素の粒子を処理して、上記粒子の表面に核生成サイトを付与する工程、
(ii)工程(i)の粒子上に金属または金属合金の層を付与して、金属被覆粒子または金属合金被覆粒子を形成する工程、
(iii)金属被覆粒子または金属合金被覆粒子を噴霧乾燥して、金属被覆粒子または金属合金被覆粒子を含む凝集粒子状物を生成する工程、および、必要に応じて
(iv)凝集粒子状物を熱処理する工程
を含むプロセスを提供する。
(i)炭化ケイ素、窒化ケイ素、炭化ホウ素または窒化ホウ素の粒子を処理して、上記粒子の表面に核生成サイトを付与する工程、
(ii)電気めっき、例えば、無電解めっきにより、工程(i)の粒子上に金属または金属合金の層を付与して、金属被覆粒子または金属合金被覆粒子を形成する工程、
(iii)金属被覆粒子または金属合金被覆粒子を噴霧乾燥して、金属被覆粒子または金属合金被覆粒子を含む凝集粒子状物を生成する工程、および、必要に応じて、
(iv)凝集粒子状物を熱処理する工程
を含むプロセスを提供する。
(i)少なくとも1つの金属酸化物層で被覆された炭化ケイ素、窒化ケイ素、炭化ホウ素または窒化ホウ素の粒子を得る工程、
(ii)金属酸化物被覆粒子を還元して、金属層または金属合金層で被覆された炭化ケイ素、窒化ケイ素、炭化ホウ素または窒化ホウ素の粒子を形成する工程
を含むプロセスを提供する。
(i)少なくとも1つの金属酸化物層で被覆された炭化ケイ素、窒化ケイ素、炭化ホウ素または窒化ホウ素の粒子を得る工程、
(ii)上記粒子を加熱によって凝集させる工程、および
(iii)凝集金属酸化物被覆粒子を還元して、金属層または金属合金層で被覆された炭化ケイ素、窒化ケイ素、炭化ホウ素または窒化ホウ素の粒子を形成する工程
を含むプロセスを提供する。
(i)セラミック粒子を、燃料と、酸化対イオンを有する少なくとも1つの金属塩との水溶液中に懸濁させて、混合物を形成する工程、
(ii)混合物をその点火温度未満の温度に加熱して、水の少なくとも一部を除去する工程、および
(iii)混合物の少なくとも一部をその点火温度に加熱して、金属被覆セラミック粒子または金属合金被覆セラミック粒子を形成する工程、
(iv)金属被覆セラミック粒子を噴霧乾燥して、セラミック粒子の凝集粒子状物を生成する工程、および
(v)凝集粒子状物を熱処理する工程
を含むプロセスを提供する。
(i)炭化ケイ素、窒化ケイ素、炭化ホウ素または窒化ホウ素の粒子の表面上に1つまたは複数の金属塩を沈殿させ、続いて、沈殿した塩を酸化して、セラミック粒子上に金属酸化物層を形成する工程、
(ii)金属酸化物被覆セラミック粒子を噴霧乾燥して、セラミック粒子の凝集粒子状物を生成する工程、および
(iii)金属酸化物層を金属層または金属合金層に還元する工程
を含むプロセスを提供する。
本明細書において、「溶射」という用語は、燃焼溶射プロセス(例えば、高速酸素燃料)、デトネーション溶射プロセス(例えば、高周波数パルスデトネーション)または電気/プラズマ溶射プロセス(例えば、大気圧プラズマ噴霧)のいずれかを用いた噴霧を包含するものとして使用される。これらの技術は、新規ではなく、当該分野の技術者に良く知られている。
本発明は、コアであるセラミックが昇華または分解することなく溶射によって基板上に塗工が可能となるよう金属層または金属合金層で被覆された炭化ケイ素(SiC)、炭化ホウ素(B4C)、窒化ケイ素(Si3N4)および窒化ホウ素(BN)のセラミック粒子に関する。本明細書において、本発明について、セラミック粒子という用語を用いて一般的に説明するが、これは炭化ケイ素、窒化ケイ素、窒化ホウ素または炭化ホウ素、好ましくは、炭化ケイ素(SiC)、炭化ホウ素(B4C)または窒化ケイ素(Si3N4)のセラミック粒子を意味するものであると解釈される。セラミックにおけるSiの使用、とりわけSiCの使用が最も好ましい選択である。セラミックコアは、好ましくは、当該材料で構成される。
一態様において、本発明は、金属または金属合金の層を含むセラミックコアをそれぞれが有する金属被覆セラミック粒子または金属合金被覆セラミック粒子を提供する。セラミックコアは、好ましくは上記粒子の50〜95重量%、好ましくは粒子の60〜95重量%、例えば粒子の65〜90重量%または70〜85重量%を形成する。金属皮膜または金属合金皮膜は、粒子の5〜50重量%、好ましくは、粒子の5〜40重量%、例えば、粒子の10〜35重量%または15〜30重量%を形成する。
本発明は、本発明のセラミック粒子を調製するためのいくつかのプロセスであって、金属または金属合金の層をセラミック粒子上に付与することを含む方法を提供する。
第1の実施形態において、金属皮膜または金属合金皮膜が無電解めっきによってセラミック粒子上に付与される。このプロセスは直接行うことができるが、金属皮膜または金属合金皮膜を粒子に確実に接着させるために、セラミック粒子を事前に調整することが好ましい。なお、以下に説明する工程(ii)〜(iv)は、前調整工程(i)が行われることを前提に番号付けされていることが理解されるであろう。この工程を省略する場合、以下に(ii)〜(iv)として説明する手順は、プロセスの工程(i)〜(iii)となる。
(i)炭化ケイ素、窒化ケイ素、炭化ホウ素または窒化ホウ素から選択されるセラミック材料の粒子を処理して、セラミック材料の表面に核生成サイトを付与する工程、
(ii)セラミック材料上に金属または金属合金の層を付与して、金属被覆セラミック粒子または金属合金被覆セラミック粒子を形成する工程、
(iii)金属被覆粒子または金属合金被覆粒子を噴霧乾燥して、金属被覆粒子または金属合金被覆粒子を含む凝集粒子状物を生成する工程、および、必要に応じて、
(iv)凝集粒子状物を熱処理する工程
を含む方法によって調製することができる。
市販のセラミック粒子は、典型的には、酸化物の薄層をその表面に含む。セラミックの表面に酸化物層が存在する場合、金属層または金属合金層をセラミック粒子に適切に接着させることは困難である。本発明者らは、セラミックの表面に、任意には酸化物のエッチングの後に、核生成サイトを付与することにより、金属皮膜または金属合金皮膜を粒子に適切に接着させることが可能であることを確認した。
工程(ii)において、工程(i)で形成された、表面に核生成サイトを有するセラミック粒子を無電解めっきに供して、セラミック粒子の表面に金属層または金属合金層を形成する。無電解めっき技術は当該技術分野において周知であり、めっき技術の選択については特に限定されない。典型的には、めっき液は、所望の金属イオンの溶液を含む。めっきは、存在する金属イオンを還元することによって行われる。
b.0.11M硫酸ニッケル(NiSO4・6H2O)、0.38M次亜リン酸ナトリウム(NaH2PO2)、0.24Mクエン酸ナトリウム(Na3C6H5O7・2H2O)およびホウ酸(H3BO3)、
c.0.13M塩化ニッケル、(NiCl2・6H2O)、0.10M次亜リン酸ナトリウム(NaH2PO2・H2O)および0.50Mグリコール酸ナトリウム(CH2OHCOONa)。
工程(iii)において、工程(ii)中に形成される金属被覆セラミック粒子または金属合金被覆セラミック粒子を従来技術を用いて(例えば、噴霧乾燥)凝集させる。この段階で形成される被覆粒子は、凝集し易く、凝集粒子状物を形成することができる。このような凝集物は、5ミクロン以上、例えば、10ミクロン以上、例えば、10〜100μmの範囲の粒径を有し得る。凝集は、球状化、破砕、混合または噴霧乾燥などの当該技術分野において公知の方法によって行うことができる。工程(ii)中に形成される粒子は、工程(iii)において噴霧乾燥によって凝集させることが最も好ましい。
(i)50〜95重量%の炭化ケイ素、窒化ケイ素または炭化ホウ素の内側コアと、
(ii)好ましくはNi、Co、Cr、FeおよびAlを含む5〜50重量%の金属または金属合金の外層とを含む複数の金属被覆粒子または金属合金被覆粒子の凝集物を提供し、
上記凝集物は、5ミクロン以上、特に、10ミクロン以上の粒径を有する。
工程(iii)の後、凝集粒子を熱処理に供することが好ましい。500℃までの温度、例えば、350〜500℃の温度を用いてもよい。炉内の雰囲気は、副反応が最小限となるように制御することができる。例えば、熱処理は、アルゴンまたは窒素雰囲気下で行ってもよい。凝集および熱処理の際、少なくとも1.5、好ましくは、2g/cm3を超えるタップ密度を得ることを目標とすることが好ましい。
第2の方法において、セラミック粒子上の金属皮膜または金属合金皮膜は、溶液燃焼法によって形成される。溶液燃焼プロセスにおいては、酸化可能な対イオン(典型的には、金属の硝酸塩、硫酸塩、塩化物、炭酸塩または酢酸塩、例えば、硝酸塩)を含む金属イオンの溶液に燃料が提供される。この燃料は、典型的には、水溶性の有機アミン、有機酸またはアミノ酸である。加熱時、反応が自己持続して金属粉末が生成される。この種の反応は当該技術分野において周知である。
(i)グリシンなどの燃料と酸化対イオンを有する少なくとも1つの金属塩との水溶液中にセラミック粒子を懸濁させて、混合物を形成する工程、
(ii)前記混合物をその点火温度未満の温度に加熱して、少なくとも一部の水、例えば、全ての水を除去する工程、
(iii)前記混合物をその点火温度に加熱して、金属被覆セラミック粒子または金属合金被覆セラミック粒子を形成する工程、
(iv)金属被覆セラミック粒子または金属合金被覆セラミック粒子を噴霧乾燥して、凝集粒子状物を生成する工程、および
(v)前記凝集粒子状物を熱処理する工程
によって調製される。
別の実施形態において、本発明の金属被覆セラミック粒子または金属合金被覆セラミック粒子は、粒子上で金属酸化物層を還元することによって調製することができる。酸化物層を得る手段については限定されない。金属酸化物層は、ゾルゲル法によって導入してもよく、沈殿によって導入してもよい。一実施形態において、金属酸化物層は、国際公開第2014/068082号の開示に従って導入される。
(i)炭化ケイ素、窒化ケイ素、炭化ホウ素または窒化ホウ素の金属酸化物被覆粒子を得る工程、および
(ii)金属酸化物皮膜を金属層または金属合金層に還元する工程を提供する。
(i)炭化ケイ素、窒化ケイ素、炭化ホウ素または窒化ホウ素の金属酸化物被覆粒子を得る工程、
(ii)工程(i)の被覆粒子を凝集させる工程、および
(iii)金属酸化物皮膜を金属層または金属合金層に還元する工程を提供する。
(i)炭化ケイ素、窒化ケイ素、炭化ホウ素または窒化ホウ素の粒子の表面に1つまたは複数の金属塩を沈殿させ、続いて、沈殿した塩を酸化して、1つ以上の金属酸化物を含む層を当該粒子上に形成する工程、
(ii)必要に応じて、被覆粒子を噴霧乾燥して凝集粒子状物を生成する工程、および
(iii)金属酸化物層を金属層または金属合金層に還元する工程を提供する。
金属酸化物の還元は、粒子を炉内で黒鉛またはH2ガスの存在下で金属または金属合金の融点未満の温度にて加熱するだけで好ましく行われるが、粒子を水素ガスに晒すことによって行うことが好ましい。
金属被覆セラミック粒子または金属合金被覆セラミック粒子を基板上に溶射することができる。燃焼(例えば、火炎噴霧もしくはHVOF)、デトネーション(デトネーションガンもしくは高周波数デトネーションガン)または電気/プラズマ噴霧(大気圧プラズマ噴霧、低圧プラズマ噴霧もしくは真空プラズマ噴霧)に基づく溶射技術などの様々な溶射技術を用いることができる。好ましい噴霧技術は、高周波数デトネーションガン、HVOF技術または大気圧プラズマ噴霧を含む。これらの技術は周知であり、ここで完全に概説する必要はない。
1.無電解Ni法
前処理:
a.表面を洗浄および活性化し、それにより、SiCを、最終的に接着し成長を開始することになるニッケル金属に接触させる。
b.無電解ニッケルめっきの際にニッケル金属が接着し成長を開始することが可能なSiC表面を活性化させる。
− 20%NaOH溶液を用いて80℃にて30分間処理
SiC粒子をこれらの溶液に分散させるが、超音波または磁気バーを用いた攪拌が利用される。30分後、溶液をろ過し、処理後のSiC粒子を回収する。
増感は、SiC粒子を水性SnCl2(10g/L)+HCl(30ml/L)を用いて40℃にて15〜30分間処理することによって行われる。
a.式
攪拌:300rpm
温度:80℃
pH:10
時間:60〜120分。
a.前処理なしで行ったSiC粒子(平均サイズ0.8μm)の無電解ニッケルめっきの結果を図1に示す。ニッケル金属が観察される。
燃焼プロセス(図3および図4)によって生成された粉末を、以下のパラメータに従い、大気圧プラズマスプレーガンを用いて炭素鋼基板上にプラズマ噴霧した。
強度:600A
基板からのトーチの距離:70mm
ThermicoCPF−2による粉体の供給には、20SLPMの窒素キャリアガスおよび回転10rpmの供給ディスクを用いる。
Claims (29)
- (i)50〜95重量%の炭化ケイ素、窒化ケイ素、炭化ホウ素または窒化ホウ素の内側コアと、
(ii)5〜50重量%の金属または金属合金の外層と
を含む金属被覆粒子または金属合金被覆粒子
を含む組成物。 - 前記金属または金属合金は、第一列遷移金属、またはBもしくはSiを必要に応じて含む第一列遷移金属合金である、請求項1に記載の組成物。
- 前記粒子の前記外側皮膜(ii)は、Ni、NiCo、NiCr、NiSi、FeSi、CoSi、NiTiCr、NiTiCrBSi、NiB、Co、CoCr、FeおよびFeCrからなる群から選択される、請求項1または2に記載の組成物。
- 前記粒子は凝集している、先行する請求項のいずれかに記載の組成物。
- 前記金属被覆粒子または金属合金被覆粒子は凝集しており、かつ10〜100μmの範囲の平均粒径を有する、請求項4に記載の組成物。
- 前記粒子上の前記金属層の平均厚さは、500nmまでの範囲である、請求項1〜5のいずれかに記載の組成物。
- 前記内側コアは炭化ケイ素、窒化ケイ素または炭化ホウ素である、先行する請求項のいずれかに記載の組成物。
- (i)炭化ケイ素、窒化ケイ素、炭化ホウ素または窒化ホウ素の粒子を金属合金層または金属層で被覆する工程、
(ii)工程(i)の粒子を凝集させて、例えば、請求項4に記載の粒子を得る工程、
(iii)前記凝集金属被覆粒子または凝集金属合金被覆粒子を基板上に溶射して、前記基板上に皮膜を付与する工程
を含むプロセス。 - 前記凝集は噴霧乾燥によって行われる、請求項5に記載のプロセス。
- 請求項1〜7に記載されるような金属被覆粒子または金属合金被覆粒子を製造するためのプロセスであって、
(i)炭化ケイ素、窒化ケイ素、炭化ホウ素または窒化ホウ素の粒子を処理して、前記粒子の表面に核生成サイトを付与する工程、
(ii) 工程(i)の粒子上に金属または金属合金の層を付与して、金属被覆粒子または金属合金被覆粒子を形成する工程、
(iii)例えば、前記金属被覆粒子または金属合金被覆粒子を噴霧乾燥することにより、前記金属被覆粒子または金属合金被覆粒子を含む凝集粒子状物を生成する工程、および、必要に応じて
(iv)前記凝集粒子状物を熱処理する工程
を含むプロセス。 - 工程(i)は、前記セラミック粒子を強酸を用いて処理することにより、前記セラミック粒子から酸化物層を除去する段階を含む、請求項10に記載のプロセス。
- 前記酸は、HF、またはベンゾトリアゾールとHFと硝酸との混合物である、請求項11に記載のプロセス。
- 工程(i)は、前記セラミック粒子を、Sn(II)溶液およびPd(II)溶液、好ましくはSnCl2溶液、続いてPdCl2溶液で順次処理する段階を含む、請求項10に記載のプロセス。
- 工程(i)は、前記セラミック粒子を帯電高分子電解質を用いて処理する第1の段階(i)(a)、および工程(i)(a)から得られる粒子をPd(II)源、好ましくはPdCl2またはNa2PdCl4の溶液を用いて処理する第2の段階(i)(b)を含む、請求項13に記載のプロセス。
- 工程(ii)は、工程(i)で形成される粒子上に金属または金属合金を無電解めっきすることによって行われる、請求項10〜14のいずれかに記載のプロセス。
- 前記セラミック上に形成される前記金属または金属合金の層は、NiまたはNi合金である、請求項8〜15に記載のプロセス。
- 工程(iii)の後に形成される凝集粒子状物は、10〜200μm、例えば、10〜100ミクロンの平均凝集粒径を有する、請求項8〜16のいずれかに記載のプロセス。
- 請求項1〜7に記載されるような金属被覆粒子または金属合金被覆粒子を製造するためのプロセスであって、
(i)炭化ケイ素、窒化ケイ素、炭化ホウ素または窒化ホウ素のセラミック粒子を、燃料と、酸化対イオンを有する少なくとも1つの金属塩との水溶液中に懸濁させて、混合物を形成する工程、
(ii)前記混合物をその点火温度未満の温度に加熱して、前記水の少なくとも一部を除去する工程、
(iii)前記混合物の少なくとも一部をその点火温度に加熱して、金属被覆セラミック粒子または金属合金被覆セラミック粒子を形成する工程、
(iv)例えば、前記金属被覆セラミック粒子または金属合金被覆セラミック粒子を噴霧乾燥することにより、前記金属被覆セラミック粒子または金属合金被覆セラミック粒子の凝集粒子状物を生成する工程、および
(v)前記凝集粒子状物を熱処理する工程
を含むプロセス。 - 工程(i)の塩は硝酸塩、硫酸塩、塩化物塩または酢酸塩である、請求項18に記載のプロセス。
- 工程(i)の金属はNiである、請求項18または19に記載のプロセス。
- 工程(i)で作成される懸濁液中に硝酸アンモニウムが存在する、請求項18〜20のいずれかに記載のプロセス。
- 工程(iii)は、前記混合物の少なくとも一部を1000〜2000℃の範囲の温度に加熱することを含む、請求項18〜21のいずれかに記載のプロセス。
- (i)炭化ケイ素、窒化ケイ素、炭化ホウ素または窒化ホウ素のセラミック粒子の表面に1つまたは複数の金属塩を沈殿させ、続いて、前記沈殿した塩を酸化させて、前記セラミック粒子上に金属酸化物皮膜を形成する工程、
(ii)必要に応じて、例えば、前記金属酸化物被覆セラミック粒子を噴霧乾燥することにより、前記金属酸化物被覆セラミック粒子の凝集粒子状物を生成する工程、および
(iii)前記金属酸化物皮膜を金属皮膜または金属合金皮膜に還元する工程
を含むプロセス。 - 工程(i)は、前記セラミック粒子上に、ニッケル(II)塩を沈殿させることにより、Ni合金の場合には、ニッケル(II)塩と他の合金化元素の塩とを共沈させることにより行われる、請求項23に記載のプロセス。
- 前記粒子はSiCを含む、請求項8〜24のいずれか一項に記載のプロセス。
- 基板に炭化ケイ素、炭化ホウ素、窒化ケイ素または窒化ホウ素の皮膜を付与するプロセスであって、請求項1〜7のいずれかに記載の粒子を前記基板上に溶射する工程を含むプロセス。
- 前記基板は金属、セラミックマトリックス複合物(CMC)または炭素マトリックスである、請求項26に記載のプロセス。
- 請求項26〜27に記載のプロセスにおける溶射によって塗工された皮膜をその上に有する物品。
- 基板上に溶射するための、炭化ケイ素、窒化ケイ素、炭化ホウ素または窒化ホウ素の金属被覆粒子の使用。
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BR112019002978A2 (pt) | 2019-05-14 |
MY191269A (en) | 2022-06-13 |
CN109844177A (zh) | 2019-06-04 |
AU2017314133A1 (en) | 2019-04-04 |
GB201614008D0 (en) | 2016-09-28 |
CN109844177B (zh) | 2022-05-17 |
JP7057776B2 (ja) | 2022-04-20 |
MX2019001870A (es) | 2019-07-10 |
WO2018033577A1 (en) | 2018-02-22 |
CA3033928A1 (en) | 2018-02-22 |
BR112019002978B1 (pt) | 2023-10-03 |
EA201990271A1 (ru) | 2019-07-31 |
AU2017314133B2 (en) | 2020-01-30 |
KR102564289B1 (ko) | 2023-08-07 |
EP3500693A1 (en) | 2019-06-26 |
US11697880B2 (en) | 2023-07-11 |
US20190211434A1 (en) | 2019-07-11 |
KR20190051980A (ko) | 2019-05-15 |
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