JP2019528372A - 窒化ホウ素ナノチューブのポリマーでの気相コーティング - Google Patents
窒化ホウ素ナノチューブのポリマーでの気相コーティング Download PDFInfo
- Publication number
- JP2019528372A JP2019528372A JP2019502250A JP2019502250A JP2019528372A JP 2019528372 A JP2019528372 A JP 2019528372A JP 2019502250 A JP2019502250 A JP 2019502250A JP 2019502250 A JP2019502250 A JP 2019502250A JP 2019528372 A JP2019528372 A JP 2019528372A
- Authority
- JP
- Japan
- Prior art keywords
- bnnt
- monomer
- functionalized
- chamber
- monomers
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4485—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation without using carrier gas in contact with the source material
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K9/00—Use of pretreated ingredients
- C08K9/04—Ingredients treated with organic substances
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K9/00—Medicinal preparations characterised by special physical form
- A61K9/0087—Galenical forms not covered by A61K9/02 - A61K9/7023
- A61K9/0092—Hollow drug-filled fibres, tubes of the core-shell type, coated fibres, coated rods, microtubules or nanotubes
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/06—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
- C01B21/064—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron with boron
- C01B21/0648—After-treatment, e.g. grinding, purification
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
- C08G61/02—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes
- C08G61/025—Polyxylylenes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1003—Preparatory processes
- C08G73/1007—Preparatory processes from tetracarboxylic acids or derivatives and diamines
- C08G73/1028—Preparatory processes from tetracarboxylic acids or derivatives and diamines characterised by the process itself, e.g. steps, continuous
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/28—Nitrogen-containing compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/38—Boron-containing compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K9/00—Use of pretreated ingredients
- C08K9/08—Ingredients agglomerated by treatment with a binding agent
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
- C08L33/24—Homopolymers or copolymers of amides or imides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4417—Methods specially adapted for coating powder
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45557—Pulsed pressure or control pressure
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/46—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate
- C23C16/463—Cooling of the substrate
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/56—After-treatment
-
- D—TEXTILES; PAPER
- D01—NATURAL OR MAN-MADE THREADS OR FIBRES; SPINNING
- D01F—CHEMICAL FEATURES IN THE MANUFACTURE OF ARTIFICIAL FILAMENTS, THREADS, FIBRES, BRISTLES OR RIBBONS; APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OF CARBON FILAMENTS
- D01F9/00—Artificial filaments or the like of other substances; Manufacture thereof; Apparatus specially adapted for the manufacture of carbon filaments
- D01F9/08—Artificial filaments or the like of other substances; Manufacture thereof; Apparatus specially adapted for the manufacture of carbon filaments of inorganic material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/10—Particle morphology extending in one dimension, e.g. needle-like
- C01P2004/13—Nanotubes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G2261/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
- C08G2261/10—Definition of the polymer structure
- C08G2261/11—Homopolymers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G2261/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
- C08G2261/30—Monomer units or repeat units incorporating structural elements in the main chain
- C08G2261/31—Monomer units or repeat units incorporating structural elements in the main chain incorporating aromatic structural elements in the main chain
- C08G2261/312—Non-condensed aromatic systems, e.g. benzene
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G2261/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
- C08G2261/90—Applications
- C08G2261/96—Applications coating of particles
- C08G2261/964—Applications coating of particles coating of inorganic particles
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/38—Boron-containing compounds
- C08K2003/382—Boron-containing compounds and nitrogen
- C08K2003/385—Binary compounds of nitrogen with boron
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K2201/00—Specific properties of additives
- C08K2201/011—Nanostructured additives
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Engineering & Computer Science (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Inorganic Chemistry (AREA)
- Nanotechnology (AREA)
- General Health & Medical Sciences (AREA)
- Textile Engineering (AREA)
- Pharmacology & Pharmacy (AREA)
- Epidemiology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Animal Behavior & Ethology (AREA)
- Bioinformatics & Cheminformatics (AREA)
- Public Health (AREA)
- Veterinary Medicine (AREA)
- Carbon And Carbon Compounds (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Physical Vapour Deposition (AREA)
- Nonwoven Fabrics (AREA)
Abstract
Description
Claims (23)
- BNNT材料をチャンバ内の支持体上に位置決めし、
前記チャンバを加熱して第1モノマー及び第2モノマーを前記チャンバ内で蒸発させ、
前記支持体を冷却して前記第1モノマー及び前記第2モノマーの前記BNNT材料上での縮合を引き起こすことで官能化BNNT材料を形成することを含む、
官能化BNNTを合成する方法。 - 前記BNNT材料がBNNTパフボール、BNNT粉末、BNNTバッキーペーパー、BNNT織繊維マット又はBNNT多孔質スキャフォールドの少なくとも1種を含む、請求項1に記載の方法。
- 前記堆積チャンバが、前記第1モノマー及び前記第2モノマーの蒸発を前記チャンバ内の温度及び圧力の調節により制御できるように構成されたクヌーセンセルを含む、請求項1に記載の方法。
- 前記第1モノマー及び前記第2モノマーがポリイミドのモノマーを含む、請求項1に記載の方法。
- 前記第1モノマーが無水物を含み、前記第2モノマーがジアミンを含む、請求項4に記載の方法。
- 前記第1モノマー及び前記第2モノマーが前記BNNT材料上にポリアミック酸フィルムを形成するように選択される、請求項1に記載の方法。
- 前記第1モノマーがジアミンを含み、前記第2モノマーが無水物ガスを含み、前記第1及び第2モノマーは同時に前記チャンバに導入される又は前記チャンバに交互に導入されるのいずれか一方である、請求項1に記載の方法。
- 約1時間にわたって継続し、前記第1及び第2モノマーは交互に前記チャンバに導入され、前記第1及び第2モノマー間の切り換えサイクルは約100ヘルツ未満である、請求項1に記載の方法。
- 前記官能化BNNT材料をイミド化することでポリイミドをコーティングしたBNNTナノ複合材料を形成することをさらに含む、請求項6に記載の方法。
- 前記官能化BNNT材料がイミド化される、請求項9に記載の方法。
- 前記第1及び第2モノマーがポリ(p−キシレン)のモノマーを含む、請求項1に記載の方法。
- 前記堆積チャンバは、ジ−p−キシレンからp−キシレンモノマーを製造するための気化及び熱分解チャンバに連結される、請求項1に記載の方法。
- p−キシレンの供給速度はジ−p−キシレンの気化速度により制御される、請求項12に記載の方法。
- 前記ポリ−p−キシレンをコーティングしたBNNTは表面修飾ナノチューブとして機能する、請求項11に記載の方法。
- 前記ポリアミック酸及びポリイミドをコーティングしたBNNTは表面修飾ナノチューブとして機能する、請求項9に記載の方法。
- 前記官能化BNNT材料を所望の形状因子にすることをさらに含む、請求項1に記載の方法。
- 前記官能化BNNT材料を圧縮して不織マットを形成する、請求項16に記載の方法。
- 前記官能化BNNT材料を非溶媒に懸濁させることをさらに含む、請求項1に記載の方法。
- 前記非溶媒溶液が、金属、セラミック及びポリマーマトリックス材料の少なくとも1種を含む、請求項18に記載の方法。
- 多孔質不織マットを形成するために、前記官能化BNNT材料の真空濾過及び前記官能化BNNT材料の流延の少なくとも一方をさらに含む、請求項11に記載の方法。
- ナノ粒子を前記官能化BNNT材料内に吸収させることをさらに含む、請求項1に記載の方法。
- 前記ナノ粒子が、医薬品、金属、セラミック及び半導体材料の1種以上を含む、請求項21に記載の方法。
- 前記ナノ粒子が光子を含めた電磁放射線又は核放射線により活性化できる、請求項21に記載の方法。
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201662364490P | 2016-07-20 | 2016-07-20 | |
US62/364,490 | 2016-07-20 | ||
US201662427506P | 2016-11-29 | 2016-11-29 | |
US62/427,506 | 2016-11-29 | ||
PCT/US2017/043140 WO2018017870A1 (en) | 2016-07-20 | 2017-07-20 | Gas phase coating of boron nitride nanotubes with polymers |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2019528372A true JP2019528372A (ja) | 2019-10-10 |
JP2019528372A5 JP2019528372A5 (ja) | 2020-08-27 |
JP7007357B2 JP7007357B2 (ja) | 2022-01-24 |
Family
ID=60996054
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2019502250A Active JP7007357B2 (ja) | 2016-07-20 | 2017-07-20 | 窒化ホウ素ナノチューブのポリマーでの気相コーティング |
Country Status (6)
Country | Link |
---|---|
US (2) | US10907032B2 (ja) |
EP (1) | EP3487920A4 (ja) |
JP (1) | JP7007357B2 (ja) |
KR (1) | KR102462146B1 (ja) |
CA (1) | CA3029068A1 (ja) |
WO (1) | WO2018017870A1 (ja) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109251461B (zh) * | 2018-09-17 | 2020-10-13 | 北京环境特性研究所 | 一种功能化石墨烯/聚甲基丙烯酰亚胺复合吸波材料及制备方法 |
CN111320967A (zh) * | 2020-03-23 | 2020-06-23 | 新纳奇材料科技江苏有限公司 | 一种具有多级结构填料改性的高导热硅酮密封胶及其制备方法 |
WO2022169631A2 (en) * | 2021-01-25 | 2022-08-11 | Bnnt, Llc | Xenon-enhanced, ammonia borane filled boron nitride nanotube fusion targets |
EP4281497A4 (en) * | 2021-01-25 | 2024-07-24 | Bnnt Llc | FUSION TARGETS OF BORON NITRIDE NANOTUBE FILLED WITH AMMONIA BORANE |
CN116377426B (zh) * | 2023-02-14 | 2023-10-17 | 哈尔滨理工大学 | 一种聚酰亚胺基氮化硼涂层的制备方法及其应用 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0445259A (ja) * | 1990-06-11 | 1992-02-14 | Ulvac Japan Ltd | 成膜装置 |
JP2004231457A (ja) * | 2003-01-29 | 2004-08-19 | National Institute For Materials Science | 金属モリブデンナノ粒子が内含されている窒化ホウ素ナノチューブとその製造方法 |
US20060098389A1 (en) * | 2002-07-01 | 2006-05-11 | Tao Liu | Supercapacitor having electrode material comprising single-wall carbon nanotubes and process for making the same |
JP2012025785A (ja) * | 2008-10-20 | 2012-02-09 | Teijin Ltd | 熱伝導性に優れたプリプレグ、プリプレグの製造方法、および積層板 |
JP2013507324A (ja) * | 2009-10-13 | 2013-03-04 | ナショナル・インスティチュート・オブ・エアロスペース・アソシエイツ | 窒化ホウ素ナノチューブ(bnnt)およびbnntポリマー複合体で製作されたエネルギー変換材料 |
JP2016519621A (ja) * | 2013-03-14 | 2016-07-07 | ユニバーシティ オブ サリー | 炭素繊維強化プラスチック |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20100051879A1 (en) | 2006-11-22 | 2010-03-04 | The Regents od the Univesity of California | Functionalized Boron Nitride Nanotubes |
CA2798747A1 (en) * | 2010-05-07 | 2011-11-10 | National Institute Of Aerospace Associates | Boron nitride and boron nitride nanotube materials for radiation shielding |
CA2805458A1 (en) | 2010-07-26 | 2012-02-02 | National Institute Of Aerospace Associates | High kinetic energy penetrator shielding materials fabricated with boron nitride nanotubes |
US10365597B2 (en) * | 2016-05-26 | 2019-07-30 | Xerox Corporation | Endless belt comprising boron nitride nanotubes |
-
2017
- 2017-07-20 WO PCT/US2017/043140 patent/WO2018017870A1/en unknown
- 2017-07-20 JP JP2019502250A patent/JP7007357B2/ja active Active
- 2017-07-20 CA CA3029068A patent/CA3029068A1/en active Pending
- 2017-07-20 KR KR1020197002421A patent/KR102462146B1/ko active IP Right Grant
- 2017-07-20 EP EP17831894.5A patent/EP3487920A4/en active Pending
- 2017-07-20 US US16/319,207 patent/US10907032B2/en active Active
-
2020
- 2020-12-31 US US17/139,431 patent/US11697724B2/en active Active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0445259A (ja) * | 1990-06-11 | 1992-02-14 | Ulvac Japan Ltd | 成膜装置 |
US20060098389A1 (en) * | 2002-07-01 | 2006-05-11 | Tao Liu | Supercapacitor having electrode material comprising single-wall carbon nanotubes and process for making the same |
JP2004231457A (ja) * | 2003-01-29 | 2004-08-19 | National Institute For Materials Science | 金属モリブデンナノ粒子が内含されている窒化ホウ素ナノチューブとその製造方法 |
JP2012025785A (ja) * | 2008-10-20 | 2012-02-09 | Teijin Ltd | 熱伝導性に優れたプリプレグ、プリプレグの製造方法、および積層板 |
JP2013507324A (ja) * | 2009-10-13 | 2013-03-04 | ナショナル・インスティチュート・オブ・エアロスペース・アソシエイツ | 窒化ホウ素ナノチューブ(bnnt)およびbnntポリマー複合体で製作されたエネルギー変換材料 |
JP2016519621A (ja) * | 2013-03-14 | 2016-07-07 | ユニバーシティ オブ サリー | 炭素繊維強化プラスチック |
Also Published As
Publication number | Publication date |
---|---|
US20210230397A1 (en) | 2021-07-29 |
WO2018017870A1 (en) | 2018-01-25 |
CA3029068A1 (en) | 2018-01-25 |
US20190276635A1 (en) | 2019-09-12 |
KR102462146B1 (ko) | 2022-11-03 |
EP3487920A4 (en) | 2020-04-15 |
KR20190032388A (ko) | 2019-03-27 |
JP7007357B2 (ja) | 2022-01-24 |
US11697724B2 (en) | 2023-07-11 |
EP3487920A1 (en) | 2019-05-29 |
US10907032B2 (en) | 2021-02-02 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP7007357B2 (ja) | 窒化ホウ素ナノチューブのポリマーでの気相コーティング | |
Zeng et al. | 3D graphene fibers grown by thermal chemical vapor deposition | |
CN109874344B (zh) | 离子束用的电荷转换膜 | |
US7402340B2 (en) | High thermal conductive element, method for manufacturing same, and heat radiating system | |
US11167991B2 (en) | Method for preparing carbon nanotube/polymer composite | |
US10553326B2 (en) | Carbon nanotube compositions | |
US20120088123A1 (en) | Graphene shell and process of preparing the same | |
KR101685100B1 (ko) | 기재 위에 h-BN 후막을 형성하는 방법 및 그로부터 제조된 h-BN 후막 적층체 | |
CN1883807A (zh) | 用于制造碳纳米管的催化剂的制备方法 | |
Xia et al. | Flexible and enhanced thermal conductivity of a Al 2 O 3@ polyimide hybrid film via coaxial electrospinning | |
KR101425374B1 (ko) | 다공성 탄소 박막재료 및 이의 제조방법 | |
KR100977541B1 (ko) | 다공성 탄소나노튜브 필름 및 그 제조 방법 | |
Wang et al. | Controllable growth of two-dimensional SnSe 2 flakes with screw dislocations and fractal structures | |
JP4419337B2 (ja) | 高配向グラファイト層状シ−ト物及びその製造方法 | |
JP2006188418A (ja) | 多孔質粘土膜及びその製造方法 | |
Lee et al. | Preparation of thin porous carbon membranes from polyacrylonitrile by phase separation and heat treatment | |
KR102391874B1 (ko) | 그래핀 필름 및 이의 제조 방법 | |
Pei et al. | Processing of thin carbon nanotube-polyimide composite membranes | |
Chai et al. | Low temperature transfer of aligned carbon nanotube films using liftoff technique | |
KR102415100B1 (ko) | 건·습식 그래핀 플레이크 조성물의 제조방법 및 이에 따라 제조된 그래핀 플레이크 조성물 | |
US20220234897A1 (en) | Method of producing graphite product and composition for production of graphite product | |
Aktuna et al. | Camphor Sulfonic Acid Doped Poly (3-hexylthiophene) Nanofilms: Optical and Electrical Properties | |
Liu et al. | Honeycomb networks of boron nitride/nanodiamond with interlocking interfaces enhance the application reliability of silicone rubber thermal conductivity composites | |
Jo | Conversion of Ultrathin Polymer Film to Graphene | |
Yang et al. | Wet-Spun Graphene Sheets as Flexible Heat Spreaders for Efficient Thermal Management |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20200714 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20200714 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20210728 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20210810 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20211110 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20211207 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20220106 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 7007357 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |