JP2019521374A5 - - Google Patents

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Publication number
JP2019521374A5
JP2019521374A5 JP2018564190A JP2018564190A JP2019521374A5 JP 2019521374 A5 JP2019521374 A5 JP 2019521374A5 JP 2018564190 A JP2018564190 A JP 2018564190A JP 2018564190 A JP2018564190 A JP 2018564190A JP 2019521374 A5 JP2019521374 A5 JP 2019521374A5
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Japan
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group
formula
methyl
ethyl
hept
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JP2018564190A
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Japanese (ja)
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JP2019521374A (ja
JP6765452B2 (ja
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Priority claimed from PCT/US2017/037138 external-priority patent/WO2017218459A1/en
Publication of JP2019521374A publication Critical patent/JP2019521374A/ja
Publication of JP2019521374A5 publication Critical patent/JP2019521374A5/ja
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JP2018564190A 2016-06-14 2017-06-13 ネガ型感光性組成物 Active JP6765452B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201662349948P 2016-06-14 2016-06-14
US62/349,948 2016-06-14
PCT/US2017/037138 WO2017218459A1 (en) 2016-06-14 2017-06-13 Negative tone photosensitive compositions

Publications (3)

Publication Number Publication Date
JP2019521374A JP2019521374A (ja) 2019-07-25
JP2019521374A5 true JP2019521374A5 (enExample) 2020-07-02
JP6765452B2 JP6765452B2 (ja) 2020-10-07

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ID=59093637

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2018564190A Active JP6765452B2 (ja) 2016-06-14 2017-06-13 ネガ型感光性組成物

Country Status (6)

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US (1) US10712661B2 (enExample)
JP (1) JP6765452B2 (enExample)
KR (1) KR102251652B1 (enExample)
CN (1) CN109313388B (enExample)
TW (1) TWI705079B (enExample)
WO (1) WO2017218459A1 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111416039A (zh) * 2019-01-07 2020-07-14 纽多维有限公司 制剂和层
JP7434853B2 (ja) * 2019-12-03 2024-02-21 住友ベークライト株式会社 架橋剤、感光性樹脂組成物、硬化膜、および電子装置
TWI850509B (zh) * 2019-12-30 2024-08-01 日商住友電木股份有限公司 催化多環烯烴組成物的uv活性衍生物
TWI850512B (zh) * 2019-12-30 2024-08-01 日商住友電木股份有限公司 作為光學材料之uv活性鈀催化多環烯烴聚合物組成物
TWI834019B (zh) * 2020-01-09 2024-03-01 日商住友電木股份有限公司 作為3d列印材料之穩定本體聚合型多環烯烴組成物及其製備方法
US20220413386A1 (en) * 2021-06-09 2022-12-29 Jeremy Golden Improved Transparency in Negative Epoxy Photoresist
KR20250107860A (ko) * 2022-11-14 2025-07-14 가부시끼가이샤 레조낙 중합성 조성물

Family Cites Families (18)

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US4898916A (en) 1987-03-05 1990-02-06 Hoechst Celanese Corporation Process for the preparation of poly(vinylphenol) from poly(acetoxystyrene) by acid catalyzed transesterification
US4877843A (en) 1987-09-11 1989-10-31 Hoechst Celanese Corporation Selective hydrolysis of copolymers of para-acetoxy styrene and allyl esters of ethylenically unsaturated acids
US4857601A (en) 1987-09-11 1989-08-15 Hoechst Celanese Corp. Selective hydrolysis of copolymers of para-acetoxy styrene and dialkyl muconates or alkyl sorbates
US5910394A (en) * 1997-06-18 1999-06-08 Shipley Company, L.L.C. I-line photoresist compositions
US7022790B2 (en) * 2002-07-03 2006-04-04 Sumitomo Bakelite Company, Ltd. Photosensitive compositions based on polycyclic polymers
US7160669B2 (en) * 2002-10-16 2007-01-09 Sumitomo Chemical Company, Limited Chemical amplification type resist composition
JP4084710B2 (ja) * 2003-06-12 2008-04-30 松下電器産業株式会社 パターン形成方法
TW200707106A (en) * 2005-05-17 2007-02-16 Kyowa Hakko Chemical Co Ltd Photoresist composition
GB2457497B (en) * 2008-02-15 2012-08-08 Pilot Drilling Control Ltd Flow stop valve
US9005871B2 (en) * 2008-10-20 2015-04-14 Basf Se Sulfonium derivatives and the use therof as latent acids
US8808959B2 (en) * 2008-11-13 2014-08-19 Tokyo Ohka Kogyo Co., Ltd. Resist composition, method of forming resist pattern, novel compound, and acid generator
US8753790B2 (en) * 2009-07-01 2014-06-17 Promerus, Llc Self-imageable film forming polymer, compositions thereof and devices and structures made therefrom
US8580477B2 (en) * 2009-09-21 2013-11-12 Promerus Llc Aqueous base-developable negative-tone films based on functionalized norbornene polymers
JP5728762B2 (ja) 2010-11-24 2015-06-03 住友ベークライト株式会社 自己画像形成性フィルム形成ポリマー、その組成物、並びにそれから製造されるデバイス及び構造物
CN103649220B (zh) 2011-07-14 2015-09-09 住友电木株式会社 在成像式曝光于光化辐射下之后形成构图层的聚合物及其组合物
CN104221176B (zh) * 2012-01-16 2017-03-01 住友电木株式会社 用于微电子和光电子器件及其组件的热氧化稳定的、侧链聚醚官能化的聚降冰片烯
KR101659940B1 (ko) 2013-04-26 2016-09-27 스미토모 베이클리트 컴퍼니 리미티드 감광성 조성물 및 이의 적용
WO2015038412A2 (en) * 2013-09-16 2015-03-19 Promerus, Llc Amine treated maleic anhydride polymers with pendent silyl group, compositions and applications thereof

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