JP2019509609A5 - - Google Patents
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- Publication number
- JP2019509609A5 JP2019509609A5 JP2018549925A JP2018549925A JP2019509609A5 JP 2019509609 A5 JP2019509609 A5 JP 2019509609A5 JP 2018549925 A JP2018549925 A JP 2018549925A JP 2018549925 A JP2018549925 A JP 2018549925A JP 2019509609 A5 JP2019509609 A5 JP 2019509609A5
- Authority
- JP
- Japan
- Prior art keywords
- electro
- microscope system
- electron microscope
- scanning electron
- sample stage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000010894 electron beam technology Methods 0.000 claims 17
- 239000000758 substrate Substances 0.000 claims 13
- 238000000034 method Methods 0.000 claims 11
- 230000003287 optical effect Effects 0.000 claims 9
- 238000005259 measurement Methods 0.000 claims 2
- 230000001360 synchronised effect Effects 0.000 claims 1
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201662312651P | 2016-03-24 | 2016-03-24 | |
| US62/312,651 | 2016-03-24 | ||
| US15/269,031 | 2016-09-19 | ||
| US15/269,031 US9892885B2 (en) | 2016-03-24 | 2016-09-19 | System and method for drift compensation on an electron beam based characterization tool |
| PCT/US2017/023239 WO2017165308A1 (en) | 2016-03-24 | 2017-03-20 | System and method for drift compensation on an electron beam based characterization tool |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2019509609A JP2019509609A (ja) | 2019-04-04 |
| JP2019509609A5 true JP2019509609A5 (enExample) | 2020-04-30 |
| JP6938529B2 JP6938529B2 (ja) | 2021-09-22 |
Family
ID=59897358
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018549925A Active JP6938529B2 (ja) | 2016-03-24 | 2017-03-20 | 電子ビーム式特性解明ツールを対象としたドリフト補償システム及び方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US9892885B2 (enExample) |
| EP (1) | EP3433873A4 (enExample) |
| JP (1) | JP6938529B2 (enExample) |
| KR (1) | KR102184032B1 (enExample) |
| CN (1) | CN108780729B (enExample) |
| TW (1) | TWI720154B (enExample) |
| WO (1) | WO2017165308A1 (enExample) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10338013B1 (en) * | 2018-01-25 | 2019-07-02 | Kla-Tencor Corporation | Position feedback for multi-beam particle detector |
| WO2019217873A1 (en) * | 2018-05-10 | 2019-11-14 | Protochips, Inc. | Sample support with fiducial indicia |
| US11373838B2 (en) * | 2018-10-17 | 2022-06-28 | Kla Corporation | Multi-beam electron characterization tool with telecentric illumination |
| US11135835B2 (en) * | 2018-12-20 | 2021-10-05 | Kateeva, Inc. | Ejection control using substrate alignment features and print region alignment features |
| DE102019200696B4 (de) * | 2019-01-21 | 2022-02-10 | Carl Zeiss Smt Gmbh | Vorrichtung, Verfahren und Computerprogram zum Bestimmen einer Position eines Elements auf einer fotolithographischen Maske |
| KR102287441B1 (ko) * | 2019-07-03 | 2021-08-09 | 주식회사 탑 엔지니어링 | 스테이지 정렬 장치, 이를 포함하는 도포 장치, 및 이를 이용한 스테이지 정렬 방법 |
| US11902665B2 (en) | 2019-08-16 | 2024-02-13 | Protochips, Inc. | Automated application of drift correction to sample studied under electron microscope |
| JP7264539B2 (ja) * | 2019-08-16 | 2023-04-25 | プロトチップス，インコーポレイテッド | 電子顕微鏡下で研究される試料へのドリフト補正の自動化されたアプリケーション |
| CN113707522B (zh) * | 2021-08-26 | 2022-07-08 | 北京中科科仪股份有限公司 | 固定装置、扫描电镜和电子束曝光机 |
| CN115616017B (zh) * | 2022-09-30 | 2023-11-10 | 南方科技大学 | 一种电子光学测试平台装置 |
| CN119470504A (zh) * | 2025-01-14 | 2025-02-18 | 华东师范大学 | 一种实时校正透射电子显微镜图像漂移的方法以及控制模块 |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60201626A (ja) * | 1984-03-27 | 1985-10-12 | Canon Inc | 位置合わせ装置 |
| US5424548A (en) * | 1993-09-21 | 1995-06-13 | International Business Machines Corp. | Pattern specific calibration for E-beam lithography |
| JP3666267B2 (ja) * | 1998-09-18 | 2005-06-29 | 株式会社日立製作所 | 荷電粒子ビーム走査式自動検査装置 |
| JP3951590B2 (ja) | 2000-10-27 | 2007-08-01 | 株式会社日立製作所 | 荷電粒子線装置 |
| US7462848B2 (en) * | 2003-10-07 | 2008-12-09 | Multibeam Systems, Inc. | Optics for generation of high current density patterned charged particle beams |
| US7332729B1 (en) * | 2004-06-18 | 2008-02-19 | Novelx, Inc. | System and method for multiple electron, ion, and photon beam alignment |
| JP4477434B2 (ja) * | 2004-06-29 | 2010-06-09 | キヤノン株式会社 | 荷電粒子線露光装置およびデバイス製造方法 |
| JP4638800B2 (ja) | 2005-10-27 | 2011-02-23 | 株式会社日立ハイテクノロジーズ | 走査電子顕微鏡装置における機差管理システムおよびその方法 |
| JP4741408B2 (ja) * | 2006-04-27 | 2011-08-03 | 株式会社荏原製作所 | 試料パターン検査装置におけるｘｙ座標補正装置及び方法 |
| US7825386B2 (en) | 2006-10-25 | 2010-11-02 | Hermes-Microvision, Inc. | System and method for a charged particle beam |
| JP5843610B2 (ja) * | 2011-12-28 | 2016-01-13 | キヤノン株式会社 | 描画装置及び物品の製造方法 |
| JP2013183017A (ja) * | 2012-03-01 | 2013-09-12 | Canon Inc | 描画装置、基準素子、及び物品製造方法 |
| EP2823361B1 (en) * | 2012-03-08 | 2022-03-02 | ASML Netherlands B.V. | Lithography system and method for processing a target, such as a wafer |
| JP2014168031A (ja) * | 2013-01-30 | 2014-09-11 | Canon Inc | リソグラフィ装置、リソグラフィ方法及び物品製造方法 |
| DE112014005893B4 (de) * | 2013-12-21 | 2023-02-16 | Kla-Tencor Corporation | Ein Verfahren zum Messen von Positionen von Strukturen auf einer Maske und dadurch Bestimmen von Fehlern bei der Herstellung von Masken |
| US9552958B2 (en) | 2014-02-25 | 2017-01-24 | Weatherford Technology Holdings, Llc | Alignment marking for rock sample analysis |
| JP6689602B2 (ja) * | 2014-12-22 | 2020-04-28 | カール ツァイス マイクロスコーピー エルエルシー | 荷電粒子ビームシステム及び方法 |
-
2016
- 2016-09-19 US US15/269,031 patent/US9892885B2/en active Active
-
2017
- 2017-03-17 TW TW106108839A patent/TWI720154B/zh active
- 2017-03-20 WO PCT/US2017/023239 patent/WO2017165308A1/en not_active Ceased
- 2017-03-20 KR KR1020187030817A patent/KR102184032B1/ko active Active
- 2017-03-20 JP JP2018549925A patent/JP6938529B2/ja active Active
- 2017-03-20 CN CN201780015907.7A patent/CN108780729B/zh active Active
- 2017-03-20 EP EP17770919.3A patent/EP3433873A4/en active Pending
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