JP6938529B2 - 電子ビーム式特性解明ツールを対象としたドリフト補償システム及び方法 - Google Patents

電子ビーム式特性解明ツールを対象としたドリフト補償システム及び方法 Download PDF

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JP6938529B2
JP6938529B2 JP2018549925A JP2018549925A JP6938529B2 JP 6938529 B2 JP6938529 B2 JP 6938529B2 JP 2018549925 A JP2018549925 A JP 2018549925A JP 2018549925 A JP2018549925 A JP 2018549925A JP 6938529 B2 JP6938529 B2 JP 6938529B2
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alignment
electron
electron microscope
scanning electron
microscope system
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Japanese (ja)
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JP2019509609A (ja
JP2019509609A5 (enExample
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フランク ラスケ
フランク ラスケ
クリストファー シアーズ
クリストファー シアーズ
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KLA Corp
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KLA Corp
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/10—Lenses
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/1501—Beam alignment means or procedures

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Electron Sources, Ion Sources (AREA)
JP2018549925A 2016-03-24 2017-03-20 電子ビーム式特性解明ツールを対象としたドリフト補償システム及び方法 Active JP6938529B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201662312651P 2016-03-24 2016-03-24
US62/312,651 2016-03-24
US15/269,031 2016-09-19
US15/269,031 US9892885B2 (en) 2016-03-24 2016-09-19 System and method for drift compensation on an electron beam based characterization tool
PCT/US2017/023239 WO2017165308A1 (en) 2016-03-24 2017-03-20 System and method for drift compensation on an electron beam based characterization tool

Publications (3)

Publication Number Publication Date
JP2019509609A JP2019509609A (ja) 2019-04-04
JP2019509609A5 JP2019509609A5 (enExample) 2020-04-30
JP6938529B2 true JP6938529B2 (ja) 2021-09-22

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JP2018549925A Active JP6938529B2 (ja) 2016-03-24 2017-03-20 電子ビーム式特性解明ツールを対象としたドリフト補償システム及び方法

Country Status (7)

Country Link
US (1) US9892885B2 (enExample)
EP (1) EP3433873A4 (enExample)
JP (1) JP6938529B2 (enExample)
KR (1) KR102184032B1 (enExample)
CN (1) CN108780729B (enExample)
TW (1) TWI720154B (enExample)
WO (1) WO2017165308A1 (enExample)

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US10338013B1 (en) * 2018-01-25 2019-07-02 Kla-Tencor Corporation Position feedback for multi-beam particle detector
WO2019217873A1 (en) * 2018-05-10 2019-11-14 Protochips, Inc. Sample support with fiducial indicia
US11373838B2 (en) * 2018-10-17 2022-06-28 Kla Corporation Multi-beam electron characterization tool with telecentric illumination
US11135835B2 (en) * 2018-12-20 2021-10-05 Kateeva, Inc. Ejection control using substrate alignment features and print region alignment features
DE102019200696B4 (de) * 2019-01-21 2022-02-10 Carl Zeiss Smt Gmbh Vorrichtung, Verfahren und Computerprogram zum Bestimmen einer Position eines Elements auf einer fotolithographischen Maske
KR102287441B1 (ko) * 2019-07-03 2021-08-09 주식회사 탑 엔지니어링 스테이지 정렬 장치, 이를 포함하는 도포 장치, 및 이를 이용한 스테이지 정렬 방법
US11902665B2 (en) 2019-08-16 2024-02-13 Protochips, Inc. Automated application of drift correction to sample studied under electron microscope
JP7264539B2 (ja) * 2019-08-16 2023-04-25 プロトチップス，インコーポレイテッド 電子顕微鏡下で研究される試料へのドリフト補正の自動化されたアプリケーション
CN113707522B (zh) * 2021-08-26 2022-07-08 北京中科科仪股份有限公司 固定装置、扫描电镜和电子束曝光机
CN115616017B (zh) * 2022-09-30 2023-11-10 南方科技大学 一种电子光学测试平台装置
CN119470504A (zh) * 2025-01-14 2025-02-18 华东师范大学 一种实时校正透射电子显微镜图像漂移的方法以及控制模块

Family Cites Families (17)

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Publication number Priority date Publication date Assignee Title
JPS60201626A (ja) * 1984-03-27 1985-10-12 Canon Inc 位置合わせ装置
US5424548A (en) * 1993-09-21 1995-06-13 International Business Machines Corp. Pattern specific calibration for E-beam lithography
JP3666267B2 (ja) * 1998-09-18 2005-06-29 株式会社日立製作所 荷電粒子ビーム走査式自動検査装置
JP3951590B2 (ja) 2000-10-27 2007-08-01 株式会社日立製作所 荷電粒子線装置
US7462848B2 (en) * 2003-10-07 2008-12-09 Multibeam Systems, Inc. Optics for generation of high current density patterned charged particle beams
US7332729B1 (en) * 2004-06-18 2008-02-19 Novelx, Inc. System and method for multiple electron, ion, and photon beam alignment
JP4477434B2 (ja) * 2004-06-29 2010-06-09 キヤノン株式会社 荷電粒子線露光装置およびデバイス製造方法
JP4638800B2 (ja) 2005-10-27 2011-02-23 株式会社日立ハイテクノロジーズ 走査電子顕微鏡装置における機差管理システムおよびその方法
JP4741408B2 (ja) * 2006-04-27 2011-08-03 株式会社荏原製作所 試料パターン検査装置におけるｘｙ座標補正装置及び方法
US7825386B2 (en) 2006-10-25 2010-11-02 Hermes-Microvision, Inc. System and method for a charged particle beam
JP5843610B2 (ja) * 2011-12-28 2016-01-13 キヤノン株式会社 描画装置及び物品の製造方法
JP2013183017A (ja) * 2012-03-01 2013-09-12 Canon Inc 描画装置、基準素子、及び物品製造方法
EP2823361B1 (en) * 2012-03-08 2022-03-02 ASML Netherlands B.V. Lithography system and method for processing a target, such as a wafer
JP2014168031A (ja) * 2013-01-30 2014-09-11 Canon Inc リソグラフィ装置、リソグラフィ方法及び物品製造方法
DE112014005893B4 (de) * 2013-12-21 2023-02-16 Kla-Tencor Corporation Ein Verfahren zum Messen von Positionen von Strukturen auf einer Maske und dadurch Bestimmen von Fehlern bei der Herstellung von Masken
US9552958B2 (en) 2014-02-25 2017-01-24 Weatherford Technology Holdings, Llc Alignment marking for rock sample analysis
JP6689602B2 (ja) * 2014-12-22 2020-04-28 カール ツァイス マイクロスコーピー エルエルシー 荷電粒子ビームシステム及び方法

Also Published As

Publication number Publication date
US9892885B2 (en) 2018-02-13
US20170278666A1 (en) 2017-09-28
KR20180119699A (ko) 2018-11-02
JP2019509609A (ja) 2019-04-04
KR102184032B1 (ko) 2020-11-27
CN108780729A (zh) 2018-11-09
CN108780729B (zh) 2020-08-21
EP3433873A1 (en) 2019-01-30
TW201801124A (zh) 2018-01-01
EP3433873A4 (en) 2019-11-20
TWI720154B (zh) 2021-03-01
WO2017165308A1 (en) 2017-09-28

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