JP2019506006A5 - - Google Patents
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- JP2019506006A5 JP2019506006A5 JP2018544531A JP2018544531A JP2019506006A5 JP 2019506006 A5 JP2019506006 A5 JP 2019506006A5 JP 2018544531 A JP2018544531 A JP 2018544531A JP 2018544531 A JP2018544531 A JP 2018544531A JP 2019506006 A5 JP2019506006 A5 JP 2019506006A5
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- JP
- Japan
- Prior art keywords
- value
- time base
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- synchronization
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- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000000034 method Methods 0.000 claims 14
- 239000002245 particle Substances 0.000 claims 9
- 238000001459 lithography Methods 0.000 claims 3
- 230000000977 initiatory effect Effects 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US14/979,583 US10096450B2 (en) | 2015-12-28 | 2015-12-28 | Control system and method for lithography apparatus |
| US14/979,583 | 2015-12-28 | ||
| PCT/EP2016/082618 WO2017114794A1 (en) | 2015-12-28 | 2016-12-23 | Control system and method for lithography apparatus |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2019506006A JP2019506006A (ja) | 2019-02-28 |
| JP2019506006A5 true JP2019506006A5 (https=) | 2019-06-20 |
| JP6555703B2 JP6555703B2 (ja) | 2019-08-07 |
Family
ID=57708590
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018544531A Active JP6555703B2 (ja) | 2015-12-28 | 2016-12-23 | リソグラフィ装置のための制御システムおよび方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US10096450B2 (https=) |
| EP (1) | EP3398271B1 (https=) |
| JP (1) | JP6555703B2 (https=) |
| KR (1) | KR102022434B1 (https=) |
| CN (1) | CN108702229B (https=) |
| WO (1) | WO2017114794A1 (https=) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10483080B1 (en) * | 2018-07-17 | 2019-11-19 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Charged particle beam device, multi-beam blanker for a charged particle beam device, and method for operating a charged particle beam device |
| US10593509B2 (en) | 2018-07-17 | 2020-03-17 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Charged particle beam device, multi-beam blanker for a charged particle beam device, and method for operating a charged particle beam device |
| CN108919612B (zh) * | 2018-07-27 | 2021-08-31 | 中国电子科技集团公司第十三研究所 | 电子束曝光方法、电子束光刻方法及金属线条制备方法 |
| DE102018133703B4 (de) * | 2018-12-29 | 2020-08-06 | Carl Zeiss Multisem Gmbh | Vorrichtung zur Erzeugung einer Vielzahl von Teilchenstrahlen und Vielstrahl-Teilchenstrahlsysteme |
| CN113032015B (zh) * | 2019-12-24 | 2022-02-18 | 中国科学院沈阳自动化研究所 | 一种用于精密运动控制的通信方法 |
| DE102020107738B3 (de) | 2020-03-20 | 2021-01-14 | Carl Zeiss Multisem Gmbh | Teilchenstrahl-System mit einer Multipol-Linsen-Sequenz zur unabhängigen Fokussierung einer Vielzahl von Einzel-Teilchenstrahlen, seine Verwendung und zugehöriges Verfahren |
Family Cites Families (29)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4215380A1 (de) | 1992-05-11 | 1993-11-18 | Siemens Ag | Verfahren zum Synchronisieren von lokalen Zeitgebern eines Automatisierungssystems |
| US5661700A (en) * | 1994-07-18 | 1997-08-26 | Allen-Bradley Company, Inc. | Synchronizable local clock for industrial controller system |
| DE19626287A1 (de) | 1996-07-01 | 1997-02-13 | Abb Management Ag | Verfahren zum Betrieb eines Antriebssystems und Vorrichtung zur Durchführung des Verfahrens |
| US6535528B1 (en) | 1999-03-15 | 2003-03-18 | Nortel Networks Limited | DS256 synchronous digital interface |
| DE10145218A1 (de) * | 2001-09-13 | 2003-04-03 | Bosch Gmbh Robert | Verfahren und Vorrichtung zur Zeitbestimmung in einem Bussystem und Bussystem |
| ATE538412T1 (de) | 2002-10-25 | 2012-01-15 | Mapper Lithography Ip Bv | Lithographisches system |
| AU2003276779A1 (en) * | 2002-10-30 | 2004-05-25 | Mapper Lithography Ip B.V. | Electron beam exposure system |
| KR101068607B1 (ko) | 2003-03-10 | 2011-09-30 | 마퍼 리쏘그라피 아이피 비.브이. | 복수 개의 빔렛 발생 장치 |
| ATE524822T1 (de) | 2003-05-28 | 2011-09-15 | Mapper Lithography Ip Bv | Belichtungsverfahren für strahlen aus geladenen teilchen |
| ATE381728T1 (de) | 2003-07-30 | 2008-01-15 | Mapper Lithography Ip Bv | Modulator-schaltkreise |
| DE602005013354D1 (de) | 2004-01-13 | 2009-04-30 | Nxp Bv | Synchronisation von zeitbasiseinheiten |
| US7709815B2 (en) | 2005-09-16 | 2010-05-04 | Mapper Lithography Ip B.V. | Lithography system and projection method |
| WO2008138047A1 (en) * | 2007-05-11 | 2008-11-20 | Audinate Pty Limited | Systems, methods and computer-readable media for configuring receiver latency |
| US8130014B2 (en) | 2006-10-31 | 2012-03-06 | Freescale Semiconductor, Inc. | Network and method for setting a time-base of a node in the network |
| EP2132613A4 (en) | 2007-03-01 | 2016-05-04 | Qulsar Sweden Ab | ELECTRONIC TIMER SYSTEM, TIME CONTROL AND GENERATION OF TIMING SIGNALS |
| US8445869B2 (en) | 2008-04-15 | 2013-05-21 | Mapper Lithography Ip B.V. | Projection lens arrangement |
| JP5408674B2 (ja) | 2008-02-26 | 2014-02-05 | マッパー・リソグラフィー・アイピー・ビー.ブイ. | 投影レンズ構成体 |
| KR101570974B1 (ko) | 2008-02-26 | 2015-11-23 | 마퍼 리쏘그라피 아이피 비.브이. | 투사 렌즈 배열체 |
| WO2009141428A1 (en) | 2008-05-23 | 2009-11-26 | Mapper Lithography Ip B.V. | Imaging system |
| WO2009147202A1 (en) | 2008-06-04 | 2009-12-10 | Mapper Lithography Ip B.V. | Writing strategy |
| CN102265237A (zh) | 2008-08-21 | 2011-11-30 | 克罗诺洛吉克有限公司 | 同步和计时方法及设备 |
| WO2010039365A1 (en) * | 2008-09-30 | 2010-04-08 | Rambus Inc. | Signal calibration methods and apparatuses |
| TWI479530B (zh) | 2008-10-01 | 2015-04-01 | Mapper Lithography Ip Bv | 靜電透鏡結構、靜電透鏡陣列、帶電粒子的子束微影系統以及製造絕緣結構的方法 |
| CN102422380A (zh) | 2009-02-22 | 2012-04-18 | 迈普尔平版印刷Ip有限公司 | 带电粒子微影设备及真空腔室中产生真空的方法 |
| US8640070B2 (en) | 2010-11-08 | 2014-01-28 | International Business Machines Corporation | Method and infrastructure for cycle-reproducible simulation on large scale digital circuits on a coordinated set of field-programmable gate arrays (FPGAs) |
| US8884255B2 (en) | 2010-11-13 | 2014-11-11 | Mapper Lithography Ip B.V. | Data path for lithography apparatus |
| US9526080B2 (en) * | 2011-03-22 | 2016-12-20 | Given Imaging Ltd. | Systems and methods for synchronizing between an in-vivo device and a localization system |
| EP2575159B1 (en) * | 2011-09-30 | 2016-04-20 | Carl Zeiss Microscopy GmbH | Particle beam system and method for operating the same |
| DE102014225867A1 (de) * | 2014-12-15 | 2016-06-16 | Dr. Johannes Heidenhain Gmbh | Vorrichtung und Verfahren zur Überprüfung eines Arbeitstaktsignals einer Positionsmesseinrichtung |
-
2015
- 2015-12-28 US US14/979,583 patent/US10096450B2/en active Active
-
2016
- 2016-12-23 EP EP16820289.3A patent/EP3398271B1/en active Active
- 2016-12-23 KR KR1020187021720A patent/KR102022434B1/ko active Active
- 2016-12-23 JP JP2018544531A patent/JP6555703B2/ja active Active
- 2016-12-23 CN CN201680082269.6A patent/CN108702229B/zh active Active
- 2016-12-23 WO PCT/EP2016/082618 patent/WO2017114794A1/en not_active Ceased
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