CN108702229B - 用于光刻设备的控制系统和方法 - Google Patents

用于光刻设备的控制系统和方法 Download PDF

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Publication number
CN108702229B
CN108702229B CN201680082269.6A CN201680082269A CN108702229B CN 108702229 B CN108702229 B CN 108702229B CN 201680082269 A CN201680082269 A CN 201680082269A CN 108702229 B CN108702229 B CN 108702229B
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China
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value
module
synchronization
time
base
Prior art date
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CN201680082269.6A
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English (en)
Chinese (zh)
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CN108702229A (zh
Inventor
H.T.斯蒂恩斯特拉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
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ASML Holding NV
Mapper Lithopraphy IP BV
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Classifications

    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F1/00—Details not covered by groups G06F3/00 - G06F13/00 and G06F21/00
    • G06F1/04—Generating or distributing clock signals or signals derived directly therefrom
    • G06F1/14—Time supervision arrangements, e.g. real time clock
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2059—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a scanning corpuscular radiation beam, e.g. an electron beam
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F13/00—Interconnection of, or transfer of information or other signals between, memories, input/output devices or central processing units
    • G06F13/38—Information transfer, e.g. on bus
    • G06F13/40—Bus structure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/045—Beam blanking or chopping, i.e. arrangements for momentarily interrupting exposure to the discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/24—Circuit arrangements not adapted to a particular application of the tube and not otherwise provided for
    • H01J37/243—Beam current control or regulation circuits
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. program control
    • H01J37/3023—Program control
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • H01J37/3177—Multi-beam, e.g. fly's eye, comb probe
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04J—MULTIPLEX COMMUNICATION
    • H04J3/00—Time-division multiplex systems
    • H04J3/02—Details
    • H04J3/06—Synchronising arrangements
    • H04J3/0635—Clock or time synchronisation in a network
    • H04J3/0638—Clock or time synchronisation among nodes; Internode synchronisation
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04L—TRANSMISSION OF DIGITAL INFORMATION, e.g. TELEGRAPHIC COMMUNICATION
    • H04L7/00—Arrangements for synchronising receiver with transmitter
    • H04L7/0008—Synchronisation information channels, e.g. clock distribution lines
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/304—Controlling tubes
    • H01J2237/30472—Controlling the beam
    • H01J2237/30483—Scanning
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography
    • H01J2237/31761—Patterning strategy
    • H01J2237/31762—Computer and memory organisation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography
    • H01J2237/31761—Patterning strategy
    • H01J2237/31766—Continuous moving of wafer
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Theoretical Computer Science (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Signal Processing (AREA)
  • General Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Toxicology (AREA)
  • Health & Medical Sciences (AREA)
  • Electron Beam Exposure (AREA)
  • Electron Sources, Ion Sources (AREA)
CN201680082269.6A 2015-12-28 2016-12-23 用于光刻设备的控制系统和方法 Active CN108702229B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US14/979,583 US10096450B2 (en) 2015-12-28 2015-12-28 Control system and method for lithography apparatus
US14/979,583 2015-12-28
PCT/EP2016/082618 WO2017114794A1 (en) 2015-12-28 2016-12-23 Control system and method for lithography apparatus

Publications (2)

Publication Number Publication Date
CN108702229A CN108702229A (zh) 2018-10-23
CN108702229B true CN108702229B (zh) 2019-10-11

Family

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CN201680082269.6A Active CN108702229B (zh) 2015-12-28 2016-12-23 用于光刻设备的控制系统和方法

Country Status (6)

Country Link
US (1) US10096450B2 (https=)
EP (1) EP3398271B1 (https=)
JP (1) JP6555703B2 (https=)
KR (1) KR102022434B1 (https=)
CN (1) CN108702229B (https=)
WO (1) WO2017114794A1 (https=)

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US10483080B1 (en) * 2018-07-17 2019-11-19 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Charged particle beam device, multi-beam blanker for a charged particle beam device, and method for operating a charged particle beam device
US10593509B2 (en) 2018-07-17 2020-03-17 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Charged particle beam device, multi-beam blanker for a charged particle beam device, and method for operating a charged particle beam device
CN108919612B (zh) * 2018-07-27 2021-08-31 中国电子科技集团公司第十三研究所 电子束曝光方法、电子束光刻方法及金属线条制备方法
DE102018133703B4 (de) * 2018-12-29 2020-08-06 Carl Zeiss Multisem Gmbh Vorrichtung zur Erzeugung einer Vielzahl von Teilchenstrahlen und Vielstrahl-Teilchenstrahlsysteme
CN113032015B (zh) * 2019-12-24 2022-02-18 中国科学院沈阳自动化研究所 一种用于精密运动控制的通信方法
DE102020107738B3 (de) 2020-03-20 2021-01-14 Carl Zeiss Multisem Gmbh Teilchenstrahl-System mit einer Multipol-Linsen-Sequenz zur unabhängigen Fokussierung einer Vielzahl von Einzel-Teilchenstrahlen, seine Verwendung und zugehöriges Verfahren

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US5661700A (en) * 1994-07-18 1997-08-26 Allen-Bradley Company, Inc. Synchronizable local clock for industrial controller system
CN102165695A (zh) * 2008-09-30 2011-08-24 拉姆伯斯公司 信号校准方法及装置
CN103402575A (zh) * 2011-03-22 2013-11-20 基文影像公司 用于在体内装置和定位系统之间同步的系统和方法
CN105702016A (zh) * 2014-12-15 2016-06-22 约翰内斯·海德汉博士有限公司 用于校验位置测量装置的工作时钟信号的装置和方法

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DE19626287A1 (de) 1996-07-01 1997-02-13 Abb Management Ag Verfahren zum Betrieb eines Antriebssystems und Vorrichtung zur Durchführung des Verfahrens
US6535528B1 (en) 1999-03-15 2003-03-18 Nortel Networks Limited DS256 synchronous digital interface
DE10145218A1 (de) * 2001-09-13 2003-04-03 Bosch Gmbh Robert Verfahren und Vorrichtung zur Zeitbestimmung in einem Bussystem und Bussystem
ATE538412T1 (de) 2002-10-25 2012-01-15 Mapper Lithography Ip Bv Lithographisches system
AU2003276779A1 (en) * 2002-10-30 2004-05-25 Mapper Lithography Ip B.V. Electron beam exposure system
KR101068607B1 (ko) 2003-03-10 2011-09-30 마퍼 리쏘그라피 아이피 비.브이. 복수 개의 빔렛 발생 장치
ATE524822T1 (de) 2003-05-28 2011-09-15 Mapper Lithography Ip Bv Belichtungsverfahren für strahlen aus geladenen teilchen
ATE381728T1 (de) 2003-07-30 2008-01-15 Mapper Lithography Ip Bv Modulator-schaltkreise
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US5661700A (en) * 1994-07-18 1997-08-26 Allen-Bradley Company, Inc. Synchronizable local clock for industrial controller system
CN102165695A (zh) * 2008-09-30 2011-08-24 拉姆伯斯公司 信号校准方法及装置
CN103402575A (zh) * 2011-03-22 2013-11-20 基文影像公司 用于在体内装置和定位系统之间同步的系统和方法
CN105702016A (zh) * 2014-12-15 2016-06-22 约翰内斯·海德汉博士有限公司 用于校验位置测量装置的工作时钟信号的装置和方法

Also Published As

Publication number Publication date
WO2017114794A1 (en) 2017-07-06
JP6555703B2 (ja) 2019-08-07
KR102022434B1 (ko) 2019-09-18
EP3398271B1 (en) 2024-01-31
EP3398271A1 (en) 2018-11-07
US20170186582A1 (en) 2017-06-29
CN108702229A (zh) 2018-10-23
KR20180093081A (ko) 2018-08-20
US10096450B2 (en) 2018-10-09
JP2019506006A (ja) 2019-02-28

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