JP6555703B2 - リソグラフィ装置のための制御システムおよび方法 - Google Patents

リソグラフィ装置のための制御システムおよび方法 Download PDF

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Publication number
JP6555703B2
JP6555703B2 JP2018544531A JP2018544531A JP6555703B2 JP 6555703 B2 JP6555703 B2 JP 6555703B2 JP 2018544531 A JP2018544531 A JP 2018544531A JP 2018544531 A JP2018544531 A JP 2018544531A JP 6555703 B2 JP6555703 B2 JP 6555703B2
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value
module
time base
time
synchronization
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Japanese (ja)
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JP2019506006A5 (https=
JP2019506006A (ja
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ステーンストラ、ヘルレ・ティエルク
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ASML Netherlands BV
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ASML Netherlands BV
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    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F1/00—Details not covered by groups G06F3/00 - G06F13/00 and G06F21/00
    • G06F1/04—Generating or distributing clock signals or signals derived directly therefrom
    • G06F1/14—Time supervision arrangements, e.g. real time clock
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/24—Circuit arrangements not adapted to a particular application of the tube and not otherwise provided for
    • H01J37/243—Beam current control or regulation circuits
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F13/00—Interconnection of, or transfer of information or other signals between, memories, input/output devices or central processing units
    • G06F13/38—Information transfer, e.g. on bus
    • G06F13/40—Bus structure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/045—Beam blanking or chopping, i.e. arrangements for momentarily interrupting exposure to the discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. program control
    • H01J37/3023—Program control
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • H01J37/3177—Multi-beam, e.g. fly's eye, comb probe
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04J—MULTIPLEX COMMUNICATION
    • H04J3/00—Time-division multiplex systems
    • H04J3/02—Details
    • H04J3/06—Synchronising arrangements
    • H04J3/0635—Clock or time synchronisation in a network
    • H04J3/0638—Clock or time synchronisation among nodes; Internode synchronisation
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04L—TRANSMISSION OF DIGITAL INFORMATION, e.g. TELEGRAPHIC COMMUNICATION
    • H04L7/00—Arrangements for synchronising receiver with transmitter
    • H04L7/0008—Synchronisation information channels, e.g. clock distribution lines
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2059—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a scanning corpuscular radiation beam, e.g. an electron beam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/304—Controlling tubes
    • H01J2237/30472—Controlling the beam
    • H01J2237/30483—Scanning
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography
    • H01J2237/31761—Patterning strategy
    • H01J2237/31762—Computer and memory organisation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography
    • H01J2237/31761—Patterning strategy
    • H01J2237/31766—Continuous moving of wafer
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Theoretical Computer Science (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Signal Processing (AREA)
  • General Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Toxicology (AREA)
  • Health & Medical Sciences (AREA)
  • Electron Beam Exposure (AREA)
  • Electron Sources, Ion Sources (AREA)
JP2018544531A 2015-12-28 2016-12-23 リソグラフィ装置のための制御システムおよび方法 Active JP6555703B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US14/979,583 US10096450B2 (en) 2015-12-28 2015-12-28 Control system and method for lithography apparatus
US14/979,583 2015-12-28
PCT/EP2016/082618 WO2017114794A1 (en) 2015-12-28 2016-12-23 Control system and method for lithography apparatus

Publications (3)

Publication Number Publication Date
JP2019506006A JP2019506006A (ja) 2019-02-28
JP2019506006A5 JP2019506006A5 (https=) 2019-06-20
JP6555703B2 true JP6555703B2 (ja) 2019-08-07

Family

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JP2018544531A Active JP6555703B2 (ja) 2015-12-28 2016-12-23 リソグラフィ装置のための制御システムおよび方法

Country Status (6)

Country Link
US (1) US10096450B2 (https=)
EP (1) EP3398271B1 (https=)
JP (1) JP6555703B2 (https=)
KR (1) KR102022434B1 (https=)
CN (1) CN108702229B (https=)
WO (1) WO2017114794A1 (https=)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10483080B1 (en) * 2018-07-17 2019-11-19 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Charged particle beam device, multi-beam blanker for a charged particle beam device, and method for operating a charged particle beam device
US10593509B2 (en) 2018-07-17 2020-03-17 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Charged particle beam device, multi-beam blanker for a charged particle beam device, and method for operating a charged particle beam device
CN108919612B (zh) * 2018-07-27 2021-08-31 中国电子科技集团公司第十三研究所 电子束曝光方法、电子束光刻方法及金属线条制备方法
DE102018133703B4 (de) * 2018-12-29 2020-08-06 Carl Zeiss Multisem Gmbh Vorrichtung zur Erzeugung einer Vielzahl von Teilchenstrahlen und Vielstrahl-Teilchenstrahlsysteme
CN113032015B (zh) * 2019-12-24 2022-02-18 中国科学院沈阳自动化研究所 一种用于精密运动控制的通信方法
DE102020107738B3 (de) 2020-03-20 2021-01-14 Carl Zeiss Multisem Gmbh Teilchenstrahl-System mit einer Multipol-Linsen-Sequenz zur unabhängigen Fokussierung einer Vielzahl von Einzel-Teilchenstrahlen, seine Verwendung und zugehöriges Verfahren

Family Cites Families (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4215380A1 (de) 1992-05-11 1993-11-18 Siemens Ag Verfahren zum Synchronisieren von lokalen Zeitgebern eines Automatisierungssystems
US5661700A (en) * 1994-07-18 1997-08-26 Allen-Bradley Company, Inc. Synchronizable local clock for industrial controller system
DE19626287A1 (de) 1996-07-01 1997-02-13 Abb Management Ag Verfahren zum Betrieb eines Antriebssystems und Vorrichtung zur Durchführung des Verfahrens
US6535528B1 (en) 1999-03-15 2003-03-18 Nortel Networks Limited DS256 synchronous digital interface
DE10145218A1 (de) * 2001-09-13 2003-04-03 Bosch Gmbh Robert Verfahren und Vorrichtung zur Zeitbestimmung in einem Bussystem und Bussystem
ATE538412T1 (de) 2002-10-25 2012-01-15 Mapper Lithography Ip Bv Lithographisches system
AU2003276779A1 (en) * 2002-10-30 2004-05-25 Mapper Lithography Ip B.V. Electron beam exposure system
KR101068607B1 (ko) 2003-03-10 2011-09-30 마퍼 리쏘그라피 아이피 비.브이. 복수 개의 빔렛 발생 장치
ATE524822T1 (de) 2003-05-28 2011-09-15 Mapper Lithography Ip Bv Belichtungsverfahren für strahlen aus geladenen teilchen
ATE381728T1 (de) 2003-07-30 2008-01-15 Mapper Lithography Ip Bv Modulator-schaltkreise
DE602005013354D1 (de) 2004-01-13 2009-04-30 Nxp Bv Synchronisation von zeitbasiseinheiten
US7709815B2 (en) 2005-09-16 2010-05-04 Mapper Lithography Ip B.V. Lithography system and projection method
WO2008138047A1 (en) * 2007-05-11 2008-11-20 Audinate Pty Limited Systems, methods and computer-readable media for configuring receiver latency
US8130014B2 (en) 2006-10-31 2012-03-06 Freescale Semiconductor, Inc. Network and method for setting a time-base of a node in the network
EP2132613A4 (en) 2007-03-01 2016-05-04 Qulsar Sweden Ab ELECTRONIC TIMER SYSTEM, TIME CONTROL AND GENERATION OF TIMING SIGNALS
US8445869B2 (en) 2008-04-15 2013-05-21 Mapper Lithography Ip B.V. Projection lens arrangement
JP5408674B2 (ja) 2008-02-26 2014-02-05 マッパー・リソグラフィー・アイピー・ビー．ブイ． 投影レンズ構成体
KR101570974B1 (ko) 2008-02-26 2015-11-23 마퍼 리쏘그라피 아이피 비.브이. 투사 렌즈 배열체
WO2009141428A1 (en) 2008-05-23 2009-11-26 Mapper Lithography Ip B.V. Imaging system
WO2009147202A1 (en) 2008-06-04 2009-12-10 Mapper Lithography Ip B.V. Writing strategy
CN102265237A (zh) 2008-08-21 2011-11-30 克罗诺洛吉克有限公司 同步和计时方法及设备
WO2010039365A1 (en) * 2008-09-30 2010-04-08 Rambus Inc. Signal calibration methods and apparatuses
TWI479530B (zh) 2008-10-01 2015-04-01 Mapper Lithography Ip Bv 靜電透鏡結構、靜電透鏡陣列、帶電粒子的子束微影系統以及製造絕緣結構的方法
CN102422380A (zh) 2009-02-22 2012-04-18 迈普尔平版印刷Ip有限公司 带电粒子微影设备及真空腔室中产生真空的方法
US8640070B2 (en) 2010-11-08 2014-01-28 International Business Machines Corporation Method and infrastructure for cycle-reproducible simulation on large scale digital circuits on a coordinated set of field-programmable gate arrays (FPGAs)
US8884255B2 (en) 2010-11-13 2014-11-11 Mapper Lithography Ip B.V. Data path for lithography apparatus
US9526080B2 (en) * 2011-03-22 2016-12-20 Given Imaging Ltd. Systems and methods for synchronizing between an in-vivo device and a localization system
EP2575159B1 (en) * 2011-09-30 2016-04-20 Carl Zeiss Microscopy GmbH Particle beam system and method for operating the same
DE102014225867A1 (de) * 2014-12-15 2016-06-16 Dr. Johannes Heidenhain Gmbh Vorrichtung und Verfahren zur Überprüfung eines Arbeitstaktsignals einer Positionsmesseinrichtung

Also Published As

Publication number Publication date
WO2017114794A1 (en) 2017-07-06
KR102022434B1 (ko) 2019-09-18
EP3398271B1 (en) 2024-01-31
CN108702229B (zh) 2019-10-11
EP3398271A1 (en) 2018-11-07
US20170186582A1 (en) 2017-06-29
CN108702229A (zh) 2018-10-23
KR20180093081A (ko) 2018-08-20
US10096450B2 (en) 2018-10-09
JP2019506006A (ja) 2019-02-28

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