JP2019505829A - 光学面を研磨する方法及び光学素子 - Google Patents
光学面を研磨する方法及び光学素子 Download PDFInfo
- Publication number
- JP2019505829A JP2019505829A JP2018528789A JP2018528789A JP2019505829A JP 2019505829 A JP2019505829 A JP 2019505829A JP 2018528789 A JP2018528789 A JP 2018528789A JP 2018528789 A JP2018528789 A JP 2018528789A JP 2019505829 A JP2019505829 A JP 2019505829A
- Authority
- JP
- Japan
- Prior art keywords
- polishing
- optical surface
- area
- optical
- shape
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B13/00—Machines or devices designed for grinding or polishing optical surfaces on lenses or surfaces of similar shape on other work; Accessories therefor
- B24B13/02—Machines or devices designed for grinding or polishing optical surfaces on lenses or surfaces of similar shape on other work; Accessories therefor by means of tools with abrading surfaces corresponding in shape with the lenses to be made
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/0891—Ultraviolet [UV] mirrors
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/10—Mirrors with curved faces
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70316—Details of optical elements, e.g. of Bragg reflectors, extreme ultraviolet [EUV] multilayer or bilayer mirrors or diffractive optical elements
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B31/00—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor
- B24B31/10—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor involving other means for tumbling of work
- B24B31/112—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor involving other means for tumbling of work using magnetically consolidated grinding powder, moved relatively to the workpiece under the influence of pressure
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/0816—Multilayer mirrors, i.e. having two or more reflecting layers
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K2201/00—Arrangements for handling radiation or particles
- G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
- G21K2201/061—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements characterised by a multilayer structure
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K2201/00—Arrangements for handling radiation or particles
- G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
- G21K2201/064—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements having a curved surface
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K2201/00—Arrangements for handling radiation or particles
- G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
- G21K2201/067—Construction details
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
- Optical Elements Other Than Lenses (AREA)
- Optical Filters (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102015223983.7 | 2015-12-02 | ||
| DE102015223983.7A DE102015223983A1 (de) | 2015-12-02 | 2015-12-02 | Verfahren zum Polieren einer optischen Oberfläche und optisches Element |
| PCT/EP2016/077866 WO2017093020A1 (de) | 2015-12-02 | 2016-11-16 | Verfahren zum polieren einer optischen oberfläche und optisches element |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021068492A Division JP7053925B2 (ja) | 2015-12-02 | 2021-04-14 | 光学面を研磨する方法及び光学素子 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2019505829A true JP2019505829A (ja) | 2019-02-28 |
| JP2019505829A5 JP2019505829A5 (enExample) | 2019-12-26 |
Family
ID=57348658
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018528789A Pending JP2019505829A (ja) | 2015-12-02 | 2016-11-16 | 光学面を研磨する方法及び光学素子 |
| JP2021068492A Active JP7053925B2 (ja) | 2015-12-02 | 2021-04-14 | 光学面を研磨する方法及び光学素子 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021068492A Active JP7053925B2 (ja) | 2015-12-02 | 2021-04-14 | 光学面を研磨する方法及び光学素子 |
Country Status (4)
| Country | Link |
|---|---|
| JP (2) | JP2019505829A (enExample) |
| CN (1) | CN108369299B (enExample) |
| DE (1) | DE102015223983A1 (enExample) |
| WO (1) | WO2017093020A1 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2020166135A (ja) * | 2019-03-29 | 2020-10-08 | 株式会社ロジストラボ | 光学素子の製造方法 |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107322411B (zh) * | 2017-06-09 | 2023-04-11 | 中国科学院西安光学精密机械研究所 | 一种大口径非球面光学元件抛光装置 |
| DE102017216128A1 (de) * | 2017-09-13 | 2019-03-14 | Carl Zeiss Smt Gmbh | Verfahren zum Bearbeiten eines Werkstücks bei der Herstellung eines optischen Elements |
| DE102018202570A1 (de) * | 2018-02-20 | 2019-08-22 | Carl Zeiss Smt Gmbh | Verfahren zum Polieren eines Werkstücks bei der Herstellung eines optischen Elements |
| CN113661149B (zh) * | 2019-03-01 | 2023-06-27 | 齐戈股份有限公司 | 用于光学表面的成形控制的方法 |
| CN115319625A (zh) * | 2022-08-11 | 2022-11-11 | 浙江百康光学股份有限公司 | 工件抛光工艺 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5958415A (ja) * | 1982-09-29 | 1984-04-04 | Seiko Epson Corp | 累進多焦点レンズ |
| JP2002052451A (ja) * | 2000-08-11 | 2002-02-19 | Canon Inc | 研磨方法及び光学素子及び光学素子の成形用金型 |
| JP2002346899A (ja) * | 2001-03-23 | 2002-12-04 | Ricoh Co Ltd | 曲面加工法及び加工装置 |
| JP2002370147A (ja) * | 2001-06-12 | 2002-12-24 | Canon Inc | 研磨工具 |
| US7118449B1 (en) * | 2004-09-20 | 2006-10-10 | Carl Zeiss Smt Ag | Method of manufacturing an optical element |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63221954A (ja) * | 1987-03-11 | 1988-09-14 | Matsushita Electric Ind Co Ltd | 曲面研磨方法 |
| JPH09239653A (ja) * | 1996-03-06 | 1997-09-16 | Nikon Corp | 研磨装置 |
| JP2001246539A (ja) * | 2000-03-03 | 2001-09-11 | Inst Of Physical & Chemical Res | 非軸対称非球面ミラーの研削加工方法 |
| JP2001322063A (ja) * | 2000-05-18 | 2001-11-20 | Canon Inc | 光学素子の加工方法 |
| JP3882764B2 (ja) * | 2003-02-19 | 2007-02-21 | セイコーエプソン株式会社 | 累進屈折力レンズ |
| DE10338893B4 (de) * | 2003-08-23 | 2007-07-05 | Essilor International (Compagnie Generale D'optique) | Verfahren zur Herstellung von Brillengläsern und anderen optischen Formkörpern aus Kunststoff |
| DE102007013563A1 (de) * | 2007-03-21 | 2008-09-25 | Carl Zeiss Smt Ag | Verfahren und Vorrichtung zur Herstellung eines Elements mit mindestens einer Freiformfläche mit hoher Formgenauigkeit und geringer Oberflächenrauhigkeit |
| JP5029485B2 (ja) * | 2008-05-12 | 2012-09-19 | 株式会社島津製作所 | 非球面反射光学素子 |
| EP2184132B1 (en) * | 2008-11-07 | 2013-05-08 | Essilor International (Compagnie Générale D'Optique) | A method of and an apparatus for manufacturing an optical lens |
| KR101039144B1 (ko) * | 2008-12-10 | 2011-06-07 | 한국표준과학연구원 | 입력된 데이터에 근거하여 대구경 광학렌즈로 연마하는 장치 |
| JP5399167B2 (ja) * | 2009-08-19 | 2014-01-29 | オリンパス株式会社 | 研磨方法 |
-
2015
- 2015-12-02 DE DE102015223983.7A patent/DE102015223983A1/de not_active Ceased
-
2016
- 2016-11-16 WO PCT/EP2016/077866 patent/WO2017093020A1/de not_active Ceased
- 2016-11-16 JP JP2018528789A patent/JP2019505829A/ja active Pending
- 2016-11-16 CN CN201680070686.9A patent/CN108369299B/zh active Active
-
2021
- 2021-04-14 JP JP2021068492A patent/JP7053925B2/ja active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5958415A (ja) * | 1982-09-29 | 1984-04-04 | Seiko Epson Corp | 累進多焦点レンズ |
| JP2002052451A (ja) * | 2000-08-11 | 2002-02-19 | Canon Inc | 研磨方法及び光学素子及び光学素子の成形用金型 |
| JP2002346899A (ja) * | 2001-03-23 | 2002-12-04 | Ricoh Co Ltd | 曲面加工法及び加工装置 |
| JP2002370147A (ja) * | 2001-06-12 | 2002-12-24 | Canon Inc | 研磨工具 |
| US7118449B1 (en) * | 2004-09-20 | 2006-10-10 | Carl Zeiss Smt Ag | Method of manufacturing an optical element |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2020166135A (ja) * | 2019-03-29 | 2020-10-08 | 株式会社ロジストラボ | 光学素子の製造方法 |
| WO2020202696A1 (ja) * | 2019-03-29 | 2020-10-08 | 株式会社ロジストラボ | 光学素子の製造方法 |
| JP7162844B2 (ja) | 2019-03-29 | 2022-10-31 | 株式会社ロジストラボ | 光学素子の製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| CN108369299B (zh) | 2020-11-10 |
| WO2017093020A1 (de) | 2017-06-08 |
| JP2021119393A (ja) | 2021-08-12 |
| DE102015223983A1 (de) | 2017-06-08 |
| CN108369299A (zh) | 2018-08-03 |
| JP7053925B2 (ja) | 2022-04-12 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20191113 |
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| A621 | Written request for application examination |
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| A977 | Report on retrieval |
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