JP2019070180A5 - - Google Patents

Download PDF

Info

Publication number
JP2019070180A5
JP2019070180A5 JP2017196465A JP2017196465A JP2019070180A5 JP 2019070180 A5 JP2019070180 A5 JP 2019070180A5 JP 2017196465 A JP2017196465 A JP 2017196465A JP 2017196465 A JP2017196465 A JP 2017196465A JP 2019070180 A5 JP2019070180 A5 JP 2019070180A5
Authority
JP
Japan
Prior art keywords
forming method
film forming
group
periodic table
raw material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2017196465A
Other languages
English (en)
Japanese (ja)
Other versions
JP7391296B2 (ja
JP2019070180A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2017196465A priority Critical patent/JP7391296B2/ja
Priority claimed from JP2017196465A external-priority patent/JP7391296B2/ja
Priority to CN201811147185.3A priority patent/CN109628910B/zh
Priority to US16/151,461 priority patent/US10927458B2/en
Publication of JP2019070180A publication Critical patent/JP2019070180A/ja
Publication of JP2019070180A5 publication Critical patent/JP2019070180A5/ja
Application granted granted Critical
Publication of JP7391296B2 publication Critical patent/JP7391296B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2017196465A 2017-10-07 2017-10-07 成膜方法 Active JP7391296B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2017196465A JP7391296B2 (ja) 2017-10-07 2017-10-07 成膜方法
CN201811147185.3A CN109628910B (zh) 2017-10-07 2018-09-29 形成膜的方法
US16/151,461 US10927458B2 (en) 2017-10-07 2018-10-04 Method of forming film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2017196465A JP7391296B2 (ja) 2017-10-07 2017-10-07 成膜方法

Publications (3)

Publication Number Publication Date
JP2019070180A JP2019070180A (ja) 2019-05-09
JP2019070180A5 true JP2019070180A5 (enExample) 2020-12-03
JP7391296B2 JP7391296B2 (ja) 2023-12-05

Family

ID=66441046

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2017196465A Active JP7391296B2 (ja) 2017-10-07 2017-10-07 成膜方法

Country Status (1)

Country Link
JP (1) JP7391296B2 (enExample)

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0057054A1 (en) * 1981-01-16 1982-08-04 P.A. Consulting Services Limited Thin films of compounds and alloy compounds of Group III and Group V elements
US4975299A (en) * 1989-11-02 1990-12-04 Eastman Kodak Company Vapor deposition process for depositing an organo-metallic compound layer on a substrate
CN103189991B (zh) 2010-10-01 2016-02-17 应用材料公司 用在薄膜晶体管应用中的砷化镓基材料
WO2013192220A1 (en) 2012-06-18 2013-12-27 University Of Florida Research Foundation, Inc. Tungsten nitrido precursors for the cvd of tungsten nitride, carbonitride, and oxide films
JP2014043640A (ja) * 2012-07-31 2014-03-13 Tosoh Corp ケイ素含有薄膜の製造方法及びケイ素含有薄膜
TWI722077B (zh) 2015-12-18 2021-03-21 中國大陸商江蘇南大光電材料股份有限公司 製造有機胺基矽烷之方法；自該有機胺基矽烷製造矽烷胺之方法
JP7240580B2 (ja) 2015-12-24 2023-03-16 株式会社Flosfia 成膜方法

Similar Documents

Publication Publication Date Title
Yin et al. Cold spray additive manufacturing and repair: Fundamentals and applications
Seah et al. Mechanisms of graphene growth by chemical vapour deposition on transition metals
JP2018140352A5 (enExample)
JP2016216332A5 (enExample)
MY196942A (en) Denitration catalyst and method for producing the same
JP2019524612A5 (ja) 窒化ホウ素ナノ材料の製造方法
JP2016072210A5 (enExample)
AR103491A1 (es) Método de formación de materiales magnéticos duros de nitruro de hierro utilizando deposición química de vapor o epitaxia en fase líquida
JP2019070179A5 (enExample)
JP2017022294A5 (enExample)
TW201612185A (en) Chemically stable alkyl aluminum solution and hydrolysate composition solution, composition for aluminum oxide film coating formation, method for producing same, method for producing passivation film, passivation film, and solar cell element using same
RU2016135995A (ru) Атомно-слоевое осаждение германия или оксида германия
JP2020506557A5 (enExample)
MY196081A (en) A Hydrogen-Containing Rare Earth Fluoride Compound, the Preparation Method and its Application
Wu et al. Preparation and properties of erbium oxide films deposited by radio frequency magnetron sputtering
WO2014144862A3 (en) Synthesis of silicon containing materials using liquid hydrosilane compositions through direct injection
JP2015522509A5 (enExample)
JP2019099393A5 (enExample)
JP2017010967A5 (enExample)
MY193167A (en) Method for producing metal powder
JP2016157879A5 (enExample)
RU2020102868A (ru) Катализатор и способ его применения
WO2015128823A3 (en) A process for preparing a catalyst
WO2015019316A3 (en) Method for forming a coating on a solid substrate, and article thus obtained
CN202427623U (zh) 一种水性涂料生产线的烘烤装置