JP2019070180A5 - - Google Patents

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Publication number
JP2019070180A5
JP2019070180A5 JP2017196465A JP2017196465A JP2019070180A5 JP 2019070180 A5 JP2019070180 A5 JP 2019070180A5 JP 2017196465 A JP2017196465 A JP 2017196465A JP 2017196465 A JP2017196465 A JP 2017196465A JP 2019070180 A5 JP2019070180 A5 JP 2019070180A5
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JP
Japan
Prior art keywords
forming method
film forming
group
periodic table
raw material
Prior art date
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Application number
JP2017196465A
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English (en)
Japanese (ja)
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JP7391296B2 (ja
JP2019070180A (ja
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Priority to JP2017196465A priority Critical patent/JP7391296B2/ja
Priority claimed from JP2017196465A external-priority patent/JP7391296B2/ja
Priority to CN201811147185.3A priority patent/CN109628910B/zh
Priority to US16/151,461 priority patent/US10927458B2/en
Publication of JP2019070180A publication Critical patent/JP2019070180A/ja
Publication of JP2019070180A5 publication Critical patent/JP2019070180A5/ja
Application granted granted Critical
Publication of JP7391296B2 publication Critical patent/JP7391296B2/ja
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JP2017196465A 2017-10-07 2017-10-07 成膜方法 Active JP7391296B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2017196465A JP7391296B2 (ja) 2017-10-07 2017-10-07 成膜方法
CN201811147185.3A CN109628910B (zh) 2017-10-07 2018-09-29 形成膜的方法
US16/151,461 US10927458B2 (en) 2017-10-07 2018-10-04 Method of forming film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2017196465A JP7391296B2 (ja) 2017-10-07 2017-10-07 成膜方法

Publications (3)

Publication Number Publication Date
JP2019070180A JP2019070180A (ja) 2019-05-09
JP2019070180A5 true JP2019070180A5 (enExample) 2020-12-03
JP7391296B2 JP7391296B2 (ja) 2023-12-05

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ID=66441046

Family Applications (1)

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JP2017196465A Active JP7391296B2 (ja) 2017-10-07 2017-10-07 成膜方法

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JP (1) JP7391296B2 (enExample)

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4427714A (en) * 1981-01-16 1984-01-24 Pa Management Consultants Limited Thin films of compounds and alloy compounds of Group III and Group V elements
US4975299A (en) * 1989-11-02 1990-12-04 Eastman Kodak Company Vapor deposition process for depositing an organo-metallic compound layer on a substrate
JP6080167B2 (ja) * 2010-10-01 2017-02-15 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ 薄膜トランジスタ用途に用いられる砒化ガリウムに基づく材料
WO2013192220A1 (en) * 2012-06-18 2013-12-27 University Of Florida Research Foundation, Inc. Tungsten nitrido precursors for the cvd of tungsten nitride, carbonitride, and oxide films
JP2014043640A (ja) * 2012-07-31 2014-03-13 Tosoh Corp ケイ素含有薄膜の製造方法及びケイ素含有薄膜
EP3390411B1 (en) * 2015-12-18 2020-09-30 DDP Specialty Electronic Materials US 9, LLC Method for making an organoaminosilane; a method for making a silylamine from the organoaminosilane
JP7240580B2 (ja) * 2015-12-24 2023-03-16 株式会社Flosfia 成膜方法

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