JP2018140352A5 - - Google Patents
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- Publication number
- JP2018140352A5 JP2018140352A5 JP2017036358A JP2017036358A JP2018140352A5 JP 2018140352 A5 JP2018140352 A5 JP 2018140352A5 JP 2017036358 A JP2017036358 A JP 2017036358A JP 2017036358 A JP2017036358 A JP 2017036358A JP 2018140352 A5 JP2018140352 A5 JP 2018140352A5
- Authority
- JP
- Japan
- Prior art keywords
- raw material
- processing
- material liquid
- mist
- film forming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 239000002994 raw material Substances 0.000 claims 7
- 239000007788 liquid Substances 0.000 claims 5
- 238000003672 processing method Methods 0.000 claims 5
- 238000000034 method Methods 0.000 claims 4
- 239000003595 mist Substances 0.000 claims 4
- 239000003795 chemical substances by application Substances 0.000 claims 2
- 238000005530 etching Methods 0.000 claims 2
- 239000002245 particle Substances 0.000 claims 2
- 239000012159 carrier gas Substances 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2017036358A JP7126107B2 (ja) | 2017-02-28 | 2017-02-28 | 成膜方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2017036358A JP7126107B2 (ja) | 2017-02-28 | 2017-02-28 | 成膜方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2018140352A JP2018140352A (ja) | 2018-09-13 |
| JP2018140352A5 true JP2018140352A5 (enExample) | 2020-04-09 |
| JP7126107B2 JP7126107B2 (ja) | 2022-08-26 |
Family
ID=63527345
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017036358A Active JP7126107B2 (ja) | 2017-02-28 | 2017-02-28 | 成膜方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP7126107B2 (enExample) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7391297B2 (ja) | 2019-06-28 | 2023-12-05 | 株式会社Flosfia | エッチング処理方法およびエッチング処理装置 |
| JP7366340B2 (ja) * | 2019-06-28 | 2023-10-23 | 株式会社Flosfia | エッチング処理方法 |
| JP7366341B2 (ja) * | 2019-06-28 | 2023-10-23 | 株式会社Flosfia | エッチング処理方法 |
| TWI849160B (zh) * | 2019-06-28 | 2024-07-21 | 日商Ｆｌｏｓｆｉａ股份有限公司 | 蝕刻處理方法和半導體裝置的製造方法 |
| KR20240049513A (ko) | 2021-08-30 | 2024-04-16 | 니치유 가부시키가이샤 | 방열 회로 기판, 방열 부재, 및 방열 회로 기판의 제조 방법 |
| WO2023176770A1 (ja) | 2022-03-18 | 2023-09-21 | 日油株式会社 | 放熱基板、放熱回路基板、放熱部材、及び放熱基板の製造方法 |
| KR20250137562A (ko) | 2023-01-24 | 2025-09-18 | 니치유 가부시키가이샤 | 화학 기상 성장법용 성막 보조제, 화학 기상 성장법용 도공액, 금속 산화물막, 및 금속 산화물막의 성막 방법 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6143063A (en) | 1996-03-04 | 2000-11-07 | Symetrix Corporation | Misted precursor deposition apparatus and method with improved mist and mist flow |
| JP2008289967A (ja) | 2007-05-23 | 2008-12-04 | Samco Inc | 薄膜形成方法及び薄膜形成装置 |
| KR20130113591A (ko) * | 2012-04-06 | 2013-10-16 | 주식회사 경우 | 히터가 구비된 박막 제조 장치 |
| JP3208344U (ja) | 2015-11-16 | 2017-01-05 | アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ | 低蒸気圧のエアゾールに支援されるｃｖｄ |
-
2017
- 2017-02-28 JP JP2017036358A patent/JP7126107B2/ja active Active
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