JP2019067978A - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
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- JP2019067978A JP2019067978A JP2017193529A JP2017193529A JP2019067978A JP 2019067978 A JP2019067978 A JP 2019067978A JP 2017193529 A JP2017193529 A JP 2017193529A JP 2017193529 A JP2017193529 A JP 2017193529A JP 2019067978 A JP2019067978 A JP 2019067978A
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- insulating film
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 79
- 239000010410 layer Substances 0.000 claims abstract description 79
- 230000001681 protective effect Effects 0.000 claims abstract description 56
- 239000002184 metal Substances 0.000 claims abstract description 51
- 229910052751 metal Inorganic materials 0.000 claims abstract description 51
- 239000000758 substrate Substances 0.000 claims abstract description 38
- 239000011229 interlayer Substances 0.000 claims abstract description 22
- 230000002093 peripheral effect Effects 0.000 claims abstract description 22
- 230000000149 penetrating effect Effects 0.000 claims 1
- 238000009413 insulation Methods 0.000 abstract 8
- 229910000789 Aluminium-silicon alloy Inorganic materials 0.000 description 23
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 15
- 210000000746 body region Anatomy 0.000 description 11
- 230000004888 barrier function Effects 0.000 description 9
- 230000008646 thermal stress Effects 0.000 description 7
- 238000002955 isolation Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 230000035882 stress Effects 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000012447 hatching Effects 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
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- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
- H01L23/528—Geometry or layout of the interconnection structure
- H01L23/5283—Cross-sectional geometry
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- H01L24/02—Bonding areas ; Manufacturing methods related thereto
- H01L24/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L24/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
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- H01L23/5226—Via connections in a multilevel interconnection structure
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- H01L23/532—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body characterised by the materials
- H01L23/53204—Conductive materials
- H01L23/53209—Conductive materials based on metals, e.g. alloys, metal silicides
- H01L23/53214—Conductive materials based on metals, e.g. alloys, metal silicides the principal metal being aluminium
- H01L23/53223—Additional layers associated with aluminium layers, e.g. adhesion, barrier, cladding layers
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- H01L23/532—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body characterised by the materials
- H01L23/53204—Conductive materials
- H01L23/53209—Conductive materials based on metals, e.g. alloys, metal silicides
- H01L23/53257—Conductive materials based on metals, e.g. alloys, metal silicides the principal metal being a refractory metal
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- H01L23/532—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body characterised by the materials
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- H01L29/42316—Gate electrodes for field effect devices for field-effect transistors
- H01L29/4232—Gate electrodes for field effect devices for field-effect transistors with insulated gate
- H01L29/42372—Gate electrodes for field effect devices for field-effect transistors with insulated gate characterised by the conducting layer, e.g. the length, the sectional shape or the lay-out
- H01L29/4238—Gate electrodes for field effect devices for field-effect transistors with insulated gate characterised by the conducting layer, e.g. the length, the sectional shape or the lay-out characterised by the surface lay-out
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- H01L29/739—Transistor-type devices, i.e. able to continuously respond to applied control signals controlled by field-effect, e.g. bipolar static induction transistors [BSIT]
- H01L29/7393—Insulated gate bipolar mode transistors, i.e. IGBT; IGT; COMFET
- H01L29/7395—Vertical transistors, e.g. vertical IGBT
- H01L29/7396—Vertical transistors, e.g. vertical IGBT with a non planar surface, e.g. with a non planar gate or with a trench or recess or pillar in the surface of the emitter, base or collector region for improving current density or short circuiting the emitter and base regions
- H01L29/7397—Vertical transistors, e.g. vertical IGBT with a non planar surface, e.g. with a non planar gate or with a trench or recess or pillar in the surface of the emitter, base or collector region for improving current density or short circuiting the emitter and base regions and a gate structure lying on a slanted or vertical surface or formed in a groove, e.g. trench gate IGBT
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- H01L29/7802—Vertical DMOS transistors, i.e. VDMOS transistors
- H01L29/7813—Vertical DMOS transistors, i.e. VDMOS transistors with trench gate electrode, e.g. UMOS transistors
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- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Geometry (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Electrodes Of Semiconductors (AREA)
Abstract
Description
12 :半導体基板
14 :エミッタ電極
15 :信号電極
16 :保護絶縁膜
20 :アクティブ領域
22 :中間領域
24 :外周領域
30 :ゲート電極
30a:トレンチ
32a:コンタクトプラグ
32b:コンタクトプラグ
40 :ゲート絶縁膜
42 :ドリフト領域
44 :下部ボディ領域
46 :分離領域
48 :上部ボディ領域
50 :層間絶縁膜
52 :AlSi層
54 :Ni層
56 :W層
58 :バリアメタル
Claims (2)
- 半導体装置であって、
半導体基板と、
前記半導体基板上に設けられた層間絶縁膜と、
金属によって構成されており、前記層間絶縁膜を貫通し、前記半導体基板に接しているコンタクトプラグと、
前記層間絶縁膜の表面と前記コンタクトプラグの表面を覆う第1金属層と、
前記第1金属層の表面の一部を覆う保護絶縁膜と、
前記第1金属層の表面を覆い、前記保護絶縁膜の端部に接し、前記第1金属層とは異なる金属により構成されている第2金属層、
を備えており、
前記半導体装置が、前記半導体基板の厚み方向に沿って見たときに、前記保護絶縁膜が設けられている外周領域と、前記コンタクトプラグの第1部分が複数配置されているアクティブ領域と、前記外周領域と前記アクティブ領域の間に位置するとともに前記コンタクトプラグの第2部分が少なくとも1つ配置されている中間領域を備えており、
前記第1部分が、前記保護絶縁膜の前記端部に向かって伸びる部分であり、
前記第2部分が、前記保護絶縁膜の前記端部に沿って伸びる部分である、
半導体装置。 - 前記中間領域に、複数の前記第2部分が配置されている請求項1の半導体装置。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017193529A JP7043773B2 (ja) | 2017-10-03 | 2017-10-03 | 半導体装置 |
CN201811160907.9A CN109599379B (zh) | 2017-10-03 | 2018-09-30 | 半导体装置 |
US16/149,800 US10522465B2 (en) | 2017-10-03 | 2018-10-02 | Semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017193529A JP7043773B2 (ja) | 2017-10-03 | 2017-10-03 | 半導体装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2019067978A true JP2019067978A (ja) | 2019-04-25 |
JP7043773B2 JP7043773B2 (ja) | 2022-03-30 |
Family
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Application Number | Title | Priority Date | Filing Date |
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JP2017193529A Active JP7043773B2 (ja) | 2017-10-03 | 2017-10-03 | 半導体装置 |
Country Status (3)
Country | Link |
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US (1) | US10522465B2 (ja) |
JP (1) | JP7043773B2 (ja) |
CN (1) | CN109599379B (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2021005798A1 (ja) * | 2019-07-11 | 2021-01-14 | 堺ディスプレイプロダクト株式会社 | フレキシブル発光デバイスの製造方法及び支持基板 |
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- 2017-10-03 JP JP2017193529A patent/JP7043773B2/ja active Active
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- 2018-09-30 CN CN201811160907.9A patent/CN109599379B/zh active Active
- 2018-10-02 US US16/149,800 patent/US10522465B2/en active Active
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JP2009021528A (ja) * | 2007-07-13 | 2009-01-29 | Toshiba Corp | 半導体装置 |
JP2010541191A (ja) * | 2007-07-26 | 2010-12-24 | エヌエックスピー ビー ヴィ | 半導体部品中における積層体の補強構造 |
JP2017034041A (ja) * | 2015-07-30 | 2017-02-09 | トヨタ自動車株式会社 | 半導体装置とその製造方法 |
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WO2021005798A1 (ja) * | 2019-07-11 | 2021-01-14 | 堺ディスプレイプロダクト株式会社 | フレキシブル発光デバイスの製造方法及び支持基板 |
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