JP2019041005A5 - - Google Patents

Download PDF

Info

Publication number
JP2019041005A5
JP2019041005A5 JP2017162178A JP2017162178A JP2019041005A5 JP 2019041005 A5 JP2019041005 A5 JP 2019041005A5 JP 2017162178 A JP2017162178 A JP 2017162178A JP 2017162178 A JP2017162178 A JP 2017162178A JP 2019041005 A5 JP2019041005 A5 JP 2019041005A5
Authority
JP
Japan
Prior art keywords
holding surface
contact
lithographic apparatus
polishing
holding
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2017162178A
Other languages
English (en)
Japanese (ja)
Other versions
JP2019041005A (ja
JP6942562B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2017162178A priority Critical patent/JP6942562B2/ja
Priority claimed from JP2017162178A external-priority patent/JP6942562B2/ja
Priority to US16/107,864 priority patent/US10444646B2/en
Priority to KR1020180097810A priority patent/KR102383372B1/ko
Publication of JP2019041005A publication Critical patent/JP2019041005A/ja
Publication of JP2019041005A5 publication Critical patent/JP2019041005A5/ja
Application granted granted Critical
Publication of JP6942562B2 publication Critical patent/JP6942562B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2017162178A 2017-08-25 2017-08-25 リソグラフィ装置、および物品の製造方法 Active JP6942562B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2017162178A JP6942562B2 (ja) 2017-08-25 2017-08-25 リソグラフィ装置、および物品の製造方法
US16/107,864 US10444646B2 (en) 2017-08-25 2018-08-21 Lithography apparatus and method of manufacturing article
KR1020180097810A KR102383372B1 (ko) 2017-08-25 2018-08-22 리소그래피 장치 및 물품의 제조 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2017162178A JP6942562B2 (ja) 2017-08-25 2017-08-25 リソグラフィ装置、および物品の製造方法

Publications (3)

Publication Number Publication Date
JP2019041005A JP2019041005A (ja) 2019-03-14
JP2019041005A5 true JP2019041005A5 (https=) 2020-08-27
JP6942562B2 JP6942562B2 (ja) 2021-09-29

Family

ID=65435156

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2017162178A Active JP6942562B2 (ja) 2017-08-25 2017-08-25 リソグラフィ装置、および物品の製造方法

Country Status (3)

Country Link
US (1) US10444646B2 (https=)
JP (1) JP6942562B2 (https=)
KR (1) KR102383372B1 (https=)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7320360B2 (ja) 2019-03-06 2023-08-03 日東電工株式会社 粘着シート
EP3919978A1 (en) * 2020-06-05 2021-12-08 Taiwan Semiconductor Manufacturing Co., Ltd. Apparatus and a method of forming a particle shield
JP2022122141A (ja) * 2021-02-09 2022-08-22 株式会社ディスコ 保持面の洗浄方法
JP7650590B2 (ja) * 2021-03-29 2025-03-25 株式会社ディスコ 研磨装置
JP7756535B2 (ja) * 2021-10-06 2025-10-20 キヤノン株式会社 位置決め装置、リソグラフィ装置、および物品製造方法

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5559582A (en) * 1992-08-28 1996-09-24 Nikon Corporation Exposure apparatus
JP3613288B2 (ja) 1994-10-18 2005-01-26 株式会社ニコン 露光装置用のクリーニング装置
US5825470A (en) * 1995-03-14 1998-10-20 Nikon Corporation Exposure apparatus
JP3450584B2 (ja) 1996-04-09 2003-09-29 キヤノン株式会社 半導体露光装置
JP3441956B2 (ja) * 1998-02-16 2003-09-02 キヤノン株式会社 露光装置、クリーニング用砥石およびデバイス製造方法
JP2000077368A (ja) * 1998-08-31 2000-03-14 Okamoto Machine Tool Works Ltd チャック機構よりウエハを取り外す方法
US6249932B1 (en) * 1999-01-29 2001-06-26 Taiwan Semiconductor Manufacturing Company, Ltd. Apparatus and method for removing fine particles
US6176770B1 (en) * 2000-01-31 2001-01-23 United Microelectronics Corp. Grindstone having a vacuum system in a pin chuck stepper
EP1329770A1 (en) * 2002-01-18 2003-07-23 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
DE60323927D1 (de) * 2002-12-13 2008-11-20 Asml Netherlands Bv Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
US7986395B2 (en) * 2005-10-24 2011-07-26 Taiwan Semiconductor Manufacturing Company, Ltd. Immersion lithography apparatus and methods
US20100183987A1 (en) * 2006-12-08 2010-07-22 Canon Kabushiki Kaisha Exposure apparatus
KR101423611B1 (ko) * 2008-01-16 2014-07-30 삼성전자주식회사 기판 처리 장치, 노광 장치 및 클리닝 툴의 세정 방법
JP2010093245A (ja) * 2008-10-07 2010-04-22 Nikon Corp 露光装置、メンテナンス方法、露光方法、及びデバイス製造方法
JP2010153407A (ja) * 2008-12-23 2010-07-08 Nikon Corp 清掃方法及び装置、並びに露光方法及び装置
NL2004153A (en) * 2009-02-24 2010-08-25 Asml Netherlands Bv Lithographic apparatus, a method for removing material of one or more protrusions on a support surface, and an article support system.
JP5769451B2 (ja) * 2011-03-07 2015-08-26 キヤノン株式会社 インプリント装置および物品の製造方法
JP2012243805A (ja) * 2011-05-16 2012-12-10 Toshiba Corp パターン形成方法
JP2016031952A (ja) * 2014-07-25 2016-03-07 キヤノン株式会社 インプリント装置及び物品の製造方法

Similar Documents

Publication Publication Date Title
JP2019041005A5 (https=)
JP2011114309A5 (https=)
KR101301507B1 (ko) 반도체 제조장치용 히터 제조방법 및 그에 따라 제조된 히터
JP2011507712A5 (https=)
JP2019502056A5 (https=)
JP2017500217A5 (https=)
JP2016538139A5 (https=)
CN109599327A (zh) 为使沉积留存增加而用于表面纹理化的几何形状和图案
SE0802294L (sv) Förfarande för tillverkning av en kiselkarbid-halvledarkrets
RU2017102177A (ru) Тисненый лист из термопластичной смолы, гравированный валок, способ изготовления гравированного валка, межлистовой слой ламинированного стекла и ламинированное стекло
JP2017092396A5 (ja) 基板を処理する装置、及び物品の製造方法
JP2016201485A5 (https=)
JP2015231036A5 (https=)
CN106978690B (zh) 一种棉兜成型机
JP2016042501A5 (https=)
JP2004221244A5 (https=)
JP2015193246A5 (https=)
JP2016004837A5 (ja) インプリント装置、インプリント方法、物品の製造方法及び供給装置
JP2018078258A5 (ja) 装置、方法、及び物品製造方法
CN204183389U (zh) 适用于半导体晶圆研磨抛光用的固定环结构
JP2010283108A5 (https=)
JP2010534610A5 (https=)
CN204400002U (zh) 螺杆驱动式电路板旋转载具
JP2017092462A5 (ja) 液体供給装置、インプリント装置および物品製造方法
JP2012187757A5 (https=)