JP2019007069A5 - - Google Patents

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Publication number
JP2019007069A5
JP2019007069A5 JP2017126165A JP2017126165A JP2019007069A5 JP 2019007069 A5 JP2019007069 A5 JP 2019007069A5 JP 2017126165 A JP2017126165 A JP 2017126165A JP 2017126165 A JP2017126165 A JP 2017126165A JP 2019007069 A5 JP2019007069 A5 JP 2019007069A5
Authority
JP
Japan
Prior art keywords
opening
openings
vapor deposition
deposition mask
mask according
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2017126165A
Other languages
English (en)
Japanese (ja)
Other versions
JP6998139B2 (ja
JP2019007069A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2017126165A priority Critical patent/JP6998139B2/ja
Priority claimed from JP2017126165A external-priority patent/JP6998139B2/ja
Priority to PCT/JP2018/013198 priority patent/WO2019003534A1/ja
Priority to CN201880039459.9A priority patent/CN110741105A/zh
Publication of JP2019007069A publication Critical patent/JP2019007069A/ja
Priority to US16/693,454 priority patent/US11111572B2/en
Publication of JP2019007069A5 publication Critical patent/JP2019007069A5/ja
Application granted granted Critical
Publication of JP6998139B2 publication Critical patent/JP6998139B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2017126165A 2017-06-28 2017-06-28 蒸着マスク Active JP6998139B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2017126165A JP6998139B2 (ja) 2017-06-28 2017-06-28 蒸着マスク
PCT/JP2018/013198 WO2019003534A1 (ja) 2017-06-28 2018-03-29 蒸着マスク
CN201880039459.9A CN110741105A (zh) 2017-06-28 2018-03-29 蒸镀掩模
US16/693,454 US11111572B2 (en) 2017-06-28 2019-11-25 Vapor deposition mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2017126165A JP6998139B2 (ja) 2017-06-28 2017-06-28 蒸着マスク

Publications (3)

Publication Number Publication Date
JP2019007069A JP2019007069A (ja) 2019-01-17
JP2019007069A5 true JP2019007069A5 (https=) 2020-08-20
JP6998139B2 JP6998139B2 (ja) 2022-01-18

Family

ID=64741357

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2017126165A Active JP6998139B2 (ja) 2017-06-28 2017-06-28 蒸着マスク

Country Status (4)

Country Link
US (1) US11111572B2 (https=)
JP (1) JP6998139B2 (https=)
CN (1) CN110741105A (https=)
WO (1) WO2019003534A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12037673B2 (en) * 2018-09-27 2024-07-16 Nippon Steel Chemical & Material Co., Ltd. Metal mask material, method for manufacturing same, and metal mask
CN114446190B (zh) * 2022-02-08 2023-07-25 武汉华星光电半导体显示技术有限公司 支撑板及显示装置

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002060927A (ja) * 2000-08-10 2002-02-28 Toray Ind Inc 薄膜パターン成膜用マスク
JP2003017254A (ja) * 2001-06-29 2003-01-17 Sanyo Electric Co Ltd エレクトロルミネッセンス表示装置の製造方法
JP3596502B2 (ja) * 2001-09-25 2004-12-02 セイコーエプソン株式会社 マスク及びその製造方法、エレクトロルミネッセンス装置及びその製造方法並びに電子機器
JP2005042133A (ja) * 2003-07-22 2005-02-17 Seiko Epson Corp 蒸着マスク及びその製造方法、表示装置及びその製造方法、表示装置を備えた電子機器
JP4608874B2 (ja) * 2003-12-02 2011-01-12 ソニー株式会社 蒸着マスクおよびその製造方法
JP2006152396A (ja) * 2004-11-30 2006-06-15 Sony Corp メタルマスク、電鋳用マスク原版及びマスター原版の製造方法
JP4624824B2 (ja) * 2005-03-04 2011-02-02 京セラ株式会社 メタルマスクの製造方法およびメタルマスク
JP2008293798A (ja) 2007-05-24 2008-12-04 Toyota Industries Corp 有機ｅｌ素子の製造方法
JP5297046B2 (ja) * 2008-01-16 2013-09-25 キヤノントッキ株式会社 成膜装置
JP2009221535A (ja) * 2008-03-17 2009-10-01 Univ Of Tsukuba 微細構造素子製造装置及び微細構造素子生産方法
JP2010106358A (ja) * 2008-09-30 2010-05-13 Canon Inc 成膜用マスク及びそれを用いた成膜方法
JP5642153B2 (ja) * 2009-04-03 2014-12-17 オスラム オプト セミコンダクターズ ゲゼルシャフト ミット ベシュレンクテル ハフツングＯｓｒａｍ Ｏｐｔｏ Ｓｅｍｉｃｏｎｄｕｃｔｏｒｓ ＧｍｂＨ 材料堆積装置において基板を保持する装置
KR101135544B1 (ko) * 2009-09-22 2012-04-17 삼성모바일디스플레이주식회사 마스크 조립체, 이의 제조 방법 및 이를 이용한 평판표시장치용 증착 장치
US8786054B2 (en) * 2009-11-16 2014-07-22 Taiwan Semiconductor Manufacturing Company, Ltd. Structure for integrated circuit alignment
KR101597887B1 (ko) * 2010-12-20 2016-02-25 샤프 가부시키가이샤 증착 방법 및 증착 장치
JP5323041B2 (ja) * 2010-12-22 2013-10-23 日東電工株式会社 有機ｅｌ素子の製造方法及び製造装置
KR20160015214A (ko) * 2013-04-22 2016-02-12 어플라이드 머티어리얼스, 인코포레이티드 능동적으로-정렬되는 미세 금속 마스크
JP6404615B2 (ja) * 2014-06-26 2018-10-10 シャープ株式会社 有機エレクトロルミネッセンス素子製造用マスク、有機エレクトロルミネッセンス素子の製造装置、及び、有機エレクトロルミネッセンス素子の製造方法
CN204125520U (zh) * 2014-08-14 2015-01-28 昆山萬豐電子有限公司 一种用于磁控溅射工艺的立式掩膜夹具
JP6527408B2 (ja) * 2015-07-02 2019-06-05 株式会社ブイ・テクノロジー 成膜マスクの製造方法及びその製造装置
KR102509663B1 (ko) * 2015-07-17 2023-03-14 도판 인사츠 가부시키가이샤 메탈 마스크용 기재의 제조 방법, 증착용 메탈 마스크의 제조 방법, 메탈 마스크용 기재, 및, 증착용 메탈 마스크

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