JP2018538699A - 半導体基板の片面エッチングを行うための装置及び方法 - Google Patents
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- 238000005530 etching Methods 0.000 title claims abstract description 263
- 239000004065 semiconductor Substances 0.000 title claims abstract description 164
- 238000000034 method Methods 0.000 title claims abstract description 73
- 239000000758 substrate Substances 0.000 title claims description 9
- 239000008151 electrolyte solution Substances 0.000 claims abstract description 28
- 230000008569 process Effects 0.000 claims abstract description 28
- 239000003792 electrolyte Substances 0.000 claims abstract description 27
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 13
- 229910052710 silicon Inorganic materials 0.000 claims description 13
- 239000010703 silicon Substances 0.000 claims description 13
- 230000007423 decrease Effects 0.000 claims description 8
- 230000008021 deposition Effects 0.000 claims description 4
- 239000000463 material Substances 0.000 claims description 4
- 238000001514 detection method Methods 0.000 claims description 3
- 230000004044 response Effects 0.000 claims description 3
- 230000000737 periodic effect Effects 0.000 claims description 2
- 238000005259 measurement Methods 0.000 claims 1
- 239000010410 layer Substances 0.000 description 164
- 230000007704 transition Effects 0.000 description 14
- 239000007788 liquid Substances 0.000 description 13
- 230000008859 change Effects 0.000 description 10
- 230000000694 effects Effects 0.000 description 9
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 8
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 5
- 235000012431 wafers Nutrition 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000011835 investigation Methods 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 229910021426 porous silicon Inorganic materials 0.000 description 3
- 239000011241 protective layer Substances 0.000 description 3
- 239000002344 surface layer Substances 0.000 description 3
- 239000004094 surface-active agent Substances 0.000 description 3
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- ZVLDJSZFKQJMKD-UHFFFAOYSA-N [Li].[Si] Chemical compound [Li].[Si] ZVLDJSZFKQJMKD-UHFFFAOYSA-N 0.000 description 2
- 229910052796 boron Inorganic materials 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 238000005868 electrolysis reaction Methods 0.000 description 2
- 230000000630 rising effect Effects 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- GPXJNWSHGFTCBW-UHFFFAOYSA-N Indium phosphide Chemical compound [In]#P GPXJNWSHGFTCBW-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 230000001174 ascending effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 235000011118 potassium hydroxide Nutrition 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 230000001502 supplementing effect Effects 0.000 description 1
- 230000002123 temporal effect Effects 0.000 description 1
- 230000001960 triggered effect Effects 0.000 description 1
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Abstract
Description
Claims (17)
- 半導体層の片面エッチングを行うための装置であって、
電解液(3)を収容するための少なくとも一つのエッチング槽(1)、
前記装置の使用時に前記エッチング槽(1)内に所在する前記電解液(3)の電気的接触のために配置された第一の電極、
前記半導体層の間接又は直接の電気的接触のために配置された少なくとも一つの第二の電極、
エッチング電流を発生させるために前記第一及び前記第二の電極と導電接続された少なくとも一つの電源(9)、及び、
基本的に前記半導体層のエッチングさるべきエッチング面のみが前記装置の使用時に前記エッチング槽(1)内に所在する前記電解液によって湿潤され得るようにして前記半導体層を前記エッチング槽(1)に対して相対搬送するための少なくとも一つの搬送装置を備える装置において、
前記電源(9)は可変電源(9)として形成され、
該装置は前記可変電源(9)を制御するための制御ユニット(10)を有し、
該装置は、前記エッチング電流を、エッチングプロセス中、前記制御ユニット(10)によって自動的に可変化するように形成されていることを特徴とする装置。 - 前記制御ユニット(10)は、前記エッチング電流を、時間的推移のプリセット、特に、前記エッチングプロセスの開始時に上昇する及び/又は前記エッチングプロセスの終了時に下降するエッチング電流のプリセット、及び/又は、時間的に変調された、特に正弦変調されたエッチング電流のプリセットによって、制御し得るように形成されていることを特徴とする、請求項1に記載の装置。
- 前記制御ユニット(10)は、前記エッチング電流を制御信号、特に検出信号に応じて、制御し得るように形成されていることを特徴とする、請求項1又は2に記載の装置。
- 前記装置は、前記エッチング槽(1)に対する前記半導体層の少なくとも一つのポジショニングを検出するためのポジションセンサ(11)を有し、
該ポジションセンサ(11)は前記制御ユニット(10)と連携するように形成されていることを特徴とする、請求項1から3のいずれか一項に記載の装置。 - 前記ポジションセンサ(11)は、前記半導体層が前記装置の使用時に前記エッチングチャンバ内に所在する前記電解液(3)によって湿潤される前に、前記半導体層のポジションを検出するように配置かつ形成されていることを特徴とする、請求項4に記載の装置。
- 該装置は、前記エッチングプロセス中、前記半導体層の前記エッチング電流の密度が一定に保たれるように形成されていることを特徴とする、請求項1から5のいずれか一項に記載の装置。
- 前記装置は、前記半導体層の幾何学特性又は材料特性を検出するためのセンサを有し、該センサは前記制御ユニット(10)と連携して、前記センサデータに応じて前記エッチング電流を制御するように形成され、特に、該センサは導電率センサとして形成されていることを特徴とする、請求項1から6のいずれか一項に記載の装置。
- 電解液(3)と前記半導体層との間のエッチング電流によって、前記半導体層の片面エッチングを行うための方法であって、
前記半導体層は基本的に片面が前記電解液(3)によって湿潤されるように構成した方法において、
前記エッチングプロセス中、前記エッチング電流は自動的に変化させられることを特徴とする方法。 - 前記エッチングプロセス中、前記エッチング電流の周期的な変調、特に正弦変調が行われることを特徴とする、請求項8に記載の方法。
- 前記半導体層は、該半導体層が基本的に片面のみ前記電解液(3)によって湿潤されるようにして、前記電解液(3)を含んだエッチングチャンバ上を搬送させられ、
その際、前記半導体層の搬入の際に前記エッチング電流は上昇し及び/又は前記半導体層の搬出の際に前記エッチング電流は下降することを特徴とする、請求項8又は9に記載の方法。 - 前記搬入の際に前記エッチング電流は連続的に上昇し、特に、前記電解液(3)によって覆われた面積に比例して上昇し及び/又は前記搬出の際に前記エッチング電流は連続的に下降し、特に、前記電解液(3)によって覆われた面積に比例して下降することを特徴とする、請求項10に記載の方法。
- 前記エッチング電流は、前記電解液(3)に対する前記半導体層の前記ポジションに応じて変化させられることを特徴とする、請求項8から11のいずれか一項に記載の方法。
- 前記エッチング電流は周期的に変調され、かつ、前記半導体層の搬入の際に時間平均で前記エッチング電流は上昇し及び/又は前記半導体層の搬出の際に時間平均で前記エッチング電流は下降することを特徴とする、請求項9及び請求項10から12のいずれか一項に記載の方法。
- 前記エッチング電流は、前記エッチングプロセス中、前記半導体層の前記エッチング電流の密度が一定であるように制御されることを特徴とする、請求項8から13のいずれか一項に記載の方法。
- 前記エッチング電流は、少なくとも一つのセンサの前記測定パラメータに応じて変化させられることを特徴とする、請求項8から14のいずれか一項に記載の方法。
- 多孔質半導体層を製造するための、請求項1から7のいずれか一項に記載の装置の使用。
- 半導体層、特にシリコン層のエピタキシャル析出用のキャリア基板を製造するための、請求項1から7のいずれか一項に記載の装置の使用。
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JP2020188171A (ja) * | 2019-05-15 | 2020-11-19 | トヨタ自動車株式会社 | エッチング装置 |
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