JP2018537544A5 - - Google Patents

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Publication number
JP2018537544A5
JP2018537544A5 JP2018515559A JP2018515559A JP2018537544A5 JP 2018537544 A5 JP2018537544 A5 JP 2018537544A5 JP 2018515559 A JP2018515559 A JP 2018515559A JP 2018515559 A JP2018515559 A JP 2018515559A JP 2018537544 A5 JP2018537544 A5 JP 2018537544A5
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JP
Japan
Prior art keywords
hept
bicyclo
alkyl
hydroxyphenyl
hydroxy
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JP2018515559A
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English (en)
Japanese (ja)
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JP6605720B2 (ja
JP2018537544A (ja
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Priority claimed from PCT/US2016/053880 external-priority patent/WO2017058746A1/en
Publication of JP2018537544A publication Critical patent/JP2018537544A/ja
Publication of JP2018537544A5 publication Critical patent/JP2018537544A5/ja
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Publication of JP6605720B2 publication Critical patent/JP6605720B2/ja
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JP2018515559A 2015-10-01 2016-09-27 光パターニング可能なフッ素フリーフェノール官能基含有ポリマー組成物 Active JP6605720B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201562235919P 2015-10-01 2015-10-01
US62/235,919 2015-10-01
PCT/US2016/053880 WO2017058746A1 (en) 2015-10-01 2016-09-27 Fluorine free photopatternable phenol functional group containing polymer compositions

Publications (3)

Publication Number Publication Date
JP2018537544A JP2018537544A (ja) 2018-12-20
JP2018537544A5 true JP2018537544A5 (enExample) 2019-06-20
JP6605720B2 JP6605720B2 (ja) 2019-11-13

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ID=57113777

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2018515559A Active JP6605720B2 (ja) 2015-10-01 2016-09-27 光パターニング可能なフッ素フリーフェノール官能基含有ポリマー組成物

Country Status (5)

Country Link
US (2) US10054854B2 (enExample)
JP (1) JP6605720B2 (enExample)
KR (1) KR20180059805A (enExample)
TW (1) TWI672323B (enExample)
WO (1) WO2017058746A1 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6605720B2 (ja) * 2015-10-01 2019-11-13 プロメラス, エルエルシー 光パターニング可能なフッ素フリーフェノール官能基含有ポリマー組成物
TWI794520B (zh) * 2018-06-29 2023-03-01 日商住友電木股份有限公司 作為 3d 列印材料之聚環烯烴單體及由能夠產生光酸之化合物活化之催化劑
US12476107B2 (en) * 2021-08-30 2025-11-18 Taiwan Semiconductor Manufacturing Company, Ltd. Method of manufacturing a semiconductor device
JP7856019B2 (ja) * 2023-02-06 2026-05-11 信越化学工業株式会社 樹脂組成物、樹脂皮膜、ドライフィルム及び樹脂硬化物
TW202528838A (zh) * 2023-09-29 2025-07-16 美商普羅梅勒斯有限公司 含有不含pfas的多環烯烴三元共聚物之感光性組成物及由其製成的半導體裝置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ATE414118T1 (de) * 2004-07-07 2008-11-15 Promerus Llc Lichtempfindliche dielektrische harzzusammensetzungen und ihre verwendungen
US8053515B2 (en) * 2006-12-06 2011-11-08 Promerus Llc Directly photodefinable polymer compositions and methods thereof
US7727705B2 (en) * 2007-02-23 2010-06-01 Fujifilm Electronic Materials, U.S.A., Inc. High etch resistant underlayer compositions for multilayer lithographic processes
JP4948647B2 (ja) * 2008-04-07 2012-06-06 株式会社日立ハイテクノロジーズ 尿中粒子画像の領域分割方法及び装置
US8753790B2 (en) 2009-07-01 2014-06-17 Promerus, Llc Self-imageable film forming polymer, compositions thereof and devices and structures made therefrom
CN103370347B (zh) * 2010-11-24 2016-08-10 普罗米鲁斯有限责任公司 可自成像成膜聚合物、其组合物以及由其制得的器件和结构
JP6605720B2 (ja) * 2015-10-01 2019-11-13 プロメラス, エルエルシー 光パターニング可能なフッ素フリーフェノール官能基含有ポリマー組成物

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