JP2018523133A5 - - Google Patents

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JP2018523133A5
JP2018523133A5 JP2018510315A JP2018510315A JP2018523133A5 JP 2018523133 A5 JP2018523133 A5 JP 2018523133A5 JP 2018510315 A JP2018510315 A JP 2018510315A JP 2018510315 A JP2018510315 A JP 2018510315A JP 2018523133 A5 JP2018523133 A5 JP 2018523133A5
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JP
Japan
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optical elements
offset beams
diffractive optical
optical element
acousto
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JP2018510315A
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Japanese (ja)
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JP6678233B2 (ja
JP2018523133A (ja
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Priority claimed from US14/982,747 external-priority patent/US9891175B2/en
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JP2018510315A 2015-05-08 2016-05-04 スポットの２ｄアレイによる斜め入射走査のシステムおよび方法 Active JP6678233B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201562159173P 2015-05-08 2015-05-08
US62/159,173 2015-05-08
US14/982,747 US9891175B2 (en) 2015-05-08 2015-12-29 System and method for oblique incidence scanning with 2D array of spots
US14/982,747 2015-12-29
PCT/US2016/030838 WO2016182820A1 (en) 2015-05-08 2016-05-04 Systems and methods for oblique incidence scanning with 2d array of spots

Publications (3)

Publication Number Publication Date
JP2018523133A JP2018523133A (ja) 2018-08-16
JP2018523133A5 true JP2018523133A5 (enExample) 2019-05-30
JP6678233B2 JP6678233B2 (ja) 2020-04-08

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JP2018510315A Active JP6678233B2 (ja) 2015-05-08 2016-05-04 スポットの２ｄアレイによる斜め入射走査のシステムおよび方法

Country Status (8)

Country Link
US (1) US9891175B2 (enExample)
EP (1) EP3295477B1 (enExample)
JP (1) JP6678233B2 (enExample)
KR (1) KR102374253B1 (enExample)
CN (1) CN107580677B (enExample)
IL (1) IL255084B (enExample)
TW (1) TWI683102B (enExample)
WO (1) WO2016182820A1 (enExample)

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KR20210024556A (ko) * 2018-06-21 2021-03-05 바라자 피티와이 엘티디 광학 빔 지향기
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CN111624757B (zh) * 2020-06-15 2025-09-05 苏州智立洁医疗器械有限公司 一种三镜头扫描显微装置
JP7554064B2 (ja) * 2020-06-30 2024-09-19 株式会社ヴィーネックス 異物・欠陥検査装置、異物・欠陥検査における画像生成装置、及び異物・欠陥検査方法
JP7608089B2 (ja) * 2020-08-11 2025-01-06 株式会社ヴィーネックス 異物・欠陥検査装置、異物・欠陥検査における画像生成装置、及び異物・欠陥検査方法
TWI779357B (zh) * 2020-09-23 2022-10-01 南亞科技股份有限公司 偵測物品表面缺陷的方法及其系統
US11748871B2 (en) 2020-09-28 2023-09-05 KLA Corp. Alignment of a specimen for inspection and other processes
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CN113552725A (zh) * 2021-07-20 2021-10-26 中国工程物理研究院激光聚变研究中心 一种激光束同轴同波面控制系统及方法
WO2024048800A1 (ko) * 2022-08-29 2024-03-07 (주)구일엔지니어링 웨이퍼 검사 시스템
US20240310292A1 (en) * 2023-03-14 2024-09-19 Kla Corporation Oblique uniform illumination for imaging systems
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US20250219284A1 (en) * 2023-12-27 2025-07-03 Serguei Matitsine Multi-Beam Mimo Antenna Systems And Methods

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