CN107580677B - 用于二维点阵列倾斜入射扫描的系统和方法 - Google Patents

用于二维点阵列倾斜入射扫描的系统和方法 Download PDF

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CN107580677B
CN107580677B CN201680025753.5A CN201680025753A CN107580677B CN 107580677 B CN107580677 B CN 107580677B CN 201680025753 A CN201680025753 A CN 201680025753A CN 107580677 B CN107580677 B CN 107580677B
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offset
beams
optical elements
scan
scanning
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CN107580677A (zh
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J·沙利文
Y·丘林
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KLA Corp
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KLA Tencor Corp
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/0004—Microscopes specially adapted for specific applications
    • G02B21/002—Scanning microscopes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/0004—Microscopes specially adapted for specific applications
    • G02B21/002—Scanning microscopes
    • G02B21/0024—Confocal scanning microscopes (CSOMs) or confocal "macroscopes"; Accessories which are not restricted to use with CSOMs, e.g. sample holders
    • G02B21/0052—Optical details of the image generation
    • G02B21/006—Optical details of the image generation focusing arrangements; selection of the plane to be imaged
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/06—Means for illuminating specimens
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems
    • G02B26/101—Scanning systems with both horizontal and vertical deflecting means, e.g. raster or XY scanners
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0905—Dividing and/or superposing multiple light beams
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0938—Using specific optical elements
    • G02B27/0944—Diffractive optical elements, e.g. gratings, holograms
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10—Beam splitting or combining systems
    • G02B27/1086—Beam splitting or combining systems operating by diffraction only
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10—Beam splitting or combining systems
    • G02B27/12—Beam splitting or combining systems operating by refraction only
    • G02B27/123—The splitting element being a lens or a system of lenses, including arrays and surfaces with refractive power
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
    • G02B27/4233—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive element [DOE] contributing to a non-imaging application
    • G02B27/425—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive element [DOE] contributing to a non-imaging application in illumination systems
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/29—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the position or the direction of light beams, i.e. deflection
    • G02F1/33—Acousto-optical deflection devices
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G01N2021/8848—Polarisation of light
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N21/95607—Inspecting patterns on the surface of objects using a comparative method
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/06—Illumination; Optics
    • G01N2201/063—Illuminating optical parts
    • G01N2201/0635—Structured illumination, e.g. with grating
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/10—Scanning
    • G01N2201/104—Mechano-optical scan, i.e. object and beam moving
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/10—Scanning
    • G01N2201/105—Purely optical scan
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/10—Scanning
    • G01N2201/106—Acousto-optical scan

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Nonlinear Science (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
CN201680025753.5A 2015-05-08 2016-05-04 用于二维点阵列倾斜入射扫描的系统和方法 Active CN107580677B (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201562159173P 2015-05-08 2015-05-08
US62/159,173 2015-05-08
US14/982,747 2015-12-29
US14/982,747 US9891175B2 (en) 2015-05-08 2015-12-29 System and method for oblique incidence scanning with 2D array of spots
PCT/US2016/030838 WO2016182820A1 (en) 2015-05-08 2016-05-04 Systems and methods for oblique incidence scanning with 2d array of spots

Publications (2)

Publication Number Publication Date
CN107580677A CN107580677A (zh) 2018-01-12
CN107580677B true CN107580677B (zh) 2020-12-04

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US (1) US9891175B2 (enExample)
EP (1) EP3295477B1 (enExample)
JP (1) JP6678233B2 (enExample)
KR (1) KR102374253B1 (enExample)
CN (1) CN107580677B (enExample)
IL (1) IL255084B (enExample)
TW (1) TWI683102B (enExample)
WO (1) WO2016182820A1 (enExample)

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US12416580B2 (en) 2018-05-07 2025-09-16 Unm Rainforest Innovations Method and system for in-line optical scatterometry
US20190355110A1 (en) * 2018-05-15 2019-11-21 Camtek Ltd. Cross talk reduction
CA3100714A1 (en) * 2018-06-07 2019-12-12 Baraja Pty Ltd An optical beam director
KR20210024556A (ko) * 2018-06-21 2021-03-05 바라자 피티와이 엘티디 광학 빔 지향기
US11118903B2 (en) * 2018-10-17 2021-09-14 Kla Corporation Efficient illumination shaping for scatterometry overlay
JP7595599B2 (ja) 2019-02-14 2024-12-06 ケーエルエー コーポレイション トポグラフィ半導体デバイスウェハの製造における位置ずれの測定方法
US12399120B2 (en) * 2019-11-01 2025-08-26 Unm Rainforest Innovations In-line angular optical multi-point scatterometry for nanomanufacturing systems
US11397153B2 (en) * 2019-12-03 2022-07-26 Kla Corporation Apparatus and method for gray field imaging
CN111624757B (zh) * 2020-06-15 2025-09-05 苏州智立洁医疗器械有限公司 一种三镜头扫描显微装置
JP7554064B2 (ja) * 2020-06-30 2024-09-19 株式会社ヴィーネックス 異物・欠陥検査装置、異物・欠陥検査における画像生成装置、及び異物・欠陥検査方法
JP7608089B2 (ja) * 2020-08-11 2025-01-06 株式会社ヴィーネックス 異物・欠陥検査装置、異物・欠陥検査における画像生成装置、及び異物・欠陥検査方法
TWI779357B (zh) * 2020-09-23 2022-10-01 南亞科技股份有限公司 偵測物品表面缺陷的方法及其系統
US11748871B2 (en) 2020-09-28 2023-09-05 KLA Corp. Alignment of a specimen for inspection and other processes
US11526086B2 (en) * 2021-03-08 2022-12-13 Kla Corporation Multi-field scanning overlay metrology
CN113552725A (zh) * 2021-07-20 2021-10-26 中国工程物理研究院激光聚变研究中心 一种激光束同轴同波面控制系统及方法
CN119317872A (zh) * 2022-07-25 2025-01-14 Asml荷兰有限公司 使用多个辐射斑点的量测系统
WO2024048800A1 (ko) * 2022-08-29 2024-03-07 (주)구일엔지니어링 웨이퍼 검사 시스템
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Also Published As

Publication number Publication date
US9891175B2 (en) 2018-02-13
WO2016182820A1 (en) 2016-11-17
KR20180004239A (ko) 2018-01-10
CN107580677A (zh) 2018-01-12
JP2018523133A (ja) 2018-08-16
EP3295477A1 (en) 2018-03-21
TWI683102B (zh) 2020-01-21
EP3295477B1 (en) 2021-12-15
TW201643413A (zh) 2016-12-16
JP6678233B2 (ja) 2020-04-08
IL255084B (en) 2021-06-30
IL255084A0 (en) 2017-12-31
EP3295477A4 (en) 2019-01-30
KR102374253B1 (ko) 2022-03-16
US20160327493A1 (en) 2016-11-10

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