JP2018516367A5 - - Google Patents
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- JP2018516367A5 JP2018516367A5 JP2017554832A JP2017554832A JP2018516367A5 JP 2018516367 A5 JP2018516367 A5 JP 2018516367A5 JP 2017554832 A JP2017554832 A JP 2017554832A JP 2017554832 A JP2017554832 A JP 2017554832A JP 2018516367 A5 JP2018516367 A5 JP 2018516367A5
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- Prior art keywords
- sampling
- drive signal
- sampling grid
- sample
- scanning
- Prior art date
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- 238000005070 sampling Methods 0.000 claims description 95
- 230000003287 optical effect Effects 0.000 claims description 22
- 238000005286 illumination Methods 0.000 claims description 18
- 238000000034 method Methods 0.000 claims description 11
- 230000001902 propagating effect Effects 0.000 claims description 6
- 238000001514 detection method Methods 0.000 claims description 4
- 230000035945 sensitivity Effects 0.000 claims description 2
- 229920002101 Chitin Polymers 0.000 claims 2
- 238000004587 chromatography analysis Methods 0.000 claims 2
- 238000003384 imaging method Methods 0.000 claims 2
- 230000007547 defect Effects 0.000 claims 1
- 238000007689 inspection Methods 0.000 claims 1
- 239000008267 milk Substances 0.000 claims 1
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- 235000013336 milk Nutrition 0.000 claims 1
- 238000004804 winding Methods 0.000 claims 1
- 238000012937 correction Methods 0.000 description 16
- 239000007787 solid Substances 0.000 description 12
- 238000010586 diagram Methods 0.000 description 8
- 238000005259 measurement Methods 0.000 description 8
- 238000002604 ultrasonography Methods 0.000 description 3
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- 238000013519 translation Methods 0.000 description 2
- 238000011144 upstream manufacturing Methods 0.000 description 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- 230000003796 beauty Effects 0.000 description 1
- 238000013480 data collection Methods 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 238000003702 image correction Methods 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 210000001747 pupil Anatomy 0.000 description 1
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- 230000001360 synchronised effect Effects 0.000 description 1
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Images
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201562150295P | 2015-04-21 | 2015-04-21 | |
| US62/150,295 | 2015-04-21 | ||
| US15/004,331 | 2016-01-22 | ||
| US15/004,331 US9864173B2 (en) | 2015-04-21 | 2016-01-22 | Systems and methods for run-time alignment of a spot scanning wafer inspection system |
| PCT/US2016/028400 WO2016172184A1 (en) | 2015-04-21 | 2016-04-20 | Systems and methods for run-time alignment of a spot scanning wafer inspection system |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2018516367A JP2018516367A (ja) | 2018-06-21 |
| JP2018516367A5 true JP2018516367A5 (enExample) | 2019-05-30 |
| JP6550470B2 JP6550470B2 (ja) | 2019-07-24 |
Family
ID=57144276
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017554832A Active JP6550470B2 (ja) | 2015-04-21 | 2016-04-20 | スポット走査型ウェハ検査システムのランタイムアライメントシステム及び方法 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US9864173B2 (enExample) |
| EP (1) | EP3286780B1 (enExample) |
| JP (1) | JP6550470B2 (enExample) |
| KR (1) | KR102317067B1 (enExample) |
| CN (1) | CN107466366B (enExample) |
| IL (1) | IL254832B (enExample) |
| TW (1) | TWI676022B (enExample) |
| WO (1) | WO2016172184A1 (enExample) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10794840B2 (en) | 2017-03-17 | 2020-10-06 | Intel Corporation | Apparatus for semiconductor package inspection |
| WO2019238553A1 (en) | 2018-06-12 | 2019-12-19 | Asml Netherlands B.V. | System and method for scanning a sample using multi-beam inspection apparatus |
| FR3084768B1 (fr) | 2018-07-31 | 2020-10-16 | Commissariat Energie Atomique | Procede d'analyse d'au moins un type de defauts parmi une pluralite de types de defauts entre au moins deux echantillons et dispositif associe |
| US10957571B2 (en) * | 2018-08-30 | 2021-03-23 | Taiwan Semiconductor Manufacturing Co., Ltd. | Apparatus and methods for determining wafer characters |
| US10923317B2 (en) * | 2018-09-19 | 2021-02-16 | KLA Corp. | Detecting defects in a logic region on a wafer |
| US11933717B2 (en) * | 2019-09-27 | 2024-03-19 | Kla Corporation | Sensitive optical metrology in scanning and static modes |
| US11127136B2 (en) * | 2019-12-05 | 2021-09-21 | Kla Corporation | System and method for defining flexible regions on a sample during inspection |
| US11187679B1 (en) * | 2020-05-20 | 2021-11-30 | The Boeing Company | Beam steering for laser ultrasonic inspection systems |
| EP3933499A1 (en) * | 2020-07-03 | 2022-01-05 | Mycronic Ab | Device and method for controlling focus of a laser beam |
| US11748872B2 (en) * | 2020-08-31 | 2023-09-05 | KLA Corp. | Setting up inspection of a specimen |
| CN112820682B (zh) * | 2021-01-08 | 2024-06-21 | 杭州长川科技股份有限公司 | 晶圆输送机构及晶圆测试设备 |
| CN117012683B (zh) * | 2023-10-07 | 2023-12-22 | 深圳黑晶光电技术有限公司 | 一种太阳能电池偏移纠正方法 |
| CN117388274B (zh) * | 2023-10-24 | 2024-05-24 | 上海感图网络科技有限公司 | 多自由度相机检测载台 |
| CN119804244B (zh) * | 2024-11-20 | 2025-11-21 | 苏州镁伽科技有限公司 | 晶圆测量方法、装置、电子设备和存储介质 |
Family Cites Families (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3851951A (en) * | 1974-01-16 | 1974-12-03 | Isomet Corp | High resolution laser beam recorder with self-focusing acousto-optic scanner |
| US4926489A (en) * | 1983-03-11 | 1990-05-15 | Kla Instruments Corporation | Reticle inspection system |
| US4805123B1 (en) * | 1986-07-14 | 1998-10-13 | Kla Instr Corp | Automatic photomask and reticle inspection method and apparatus including improved defect detector and alignment sub-systems |
| US5864394A (en) * | 1994-06-20 | 1999-01-26 | Kla-Tencor Corporation | Surface inspection system |
| US5825482A (en) * | 1995-09-29 | 1998-10-20 | Kla-Tencor Corporation | Surface inspection system with misregistration error correction and adaptive illumination |
| WO1997013370A1 (en) | 1995-10-02 | 1997-04-10 | Kla Instruments Corporation | Alignment correction prior to image sampling in inspection systems |
| US6236454B1 (en) * | 1997-12-15 | 2001-05-22 | Applied Materials, Inc. | Multiple beam scanner for an inspection system |
| ATE535834T1 (de) | 2001-05-03 | 2011-12-15 | Kla Tencor Tech Corp | Systeme und verfahren zum scannen einer probe mit einem lichtstrahl |
| US6755051B2 (en) | 2002-10-07 | 2004-06-29 | Delta Galil Industries, Ltd. | Knitted garments and methods of fabrication thereof |
| US7208328B2 (en) | 2004-03-16 | 2007-04-24 | Macronix International Co., Ltd. | Method and system for analyzing defects of an integrated circuit wafer |
| JP4812484B2 (ja) | 2006-03-24 | 2011-11-09 | 株式会社日立ハイテクノロジーズ | ボルテージコントラストを伴った欠陥をレビューする方法およびその装置 |
| JP2009071136A (ja) | 2007-09-14 | 2009-04-02 | Hitachi High-Technologies Corp | データ管理装置、検査システムおよび欠陥レビュー装置 |
| CN101840025B (zh) * | 2010-05-05 | 2011-11-09 | 北京大学 | 一种线性光子晶体器件 |
| US10354405B2 (en) | 2010-05-17 | 2019-07-16 | Kla-Tencor Corporation | Run-time correction of defect locations during defect review |
| US9279774B2 (en) * | 2011-07-12 | 2016-03-08 | Kla-Tencor Corp. | Wafer inspection |
| US9255891B2 (en) * | 2012-11-20 | 2016-02-09 | Kla-Tencor Corporation | Inspection beam shaping for improved detection sensitivity |
| US9182358B2 (en) * | 2013-03-15 | 2015-11-10 | Kla-Tencor Corporation | Multi-spot defect inspection system |
| US8995746B2 (en) * | 2013-03-15 | 2015-03-31 | KLA—Tencor Corporation | Image synchronization of scanning wafer inspection system |
| US9395340B2 (en) * | 2013-03-15 | 2016-07-19 | Kla-Tencor Corporation | Interleaved acousto-optical device scanning for suppression of optical crosstalk |
| CN104501738B (zh) * | 2014-12-31 | 2017-08-11 | 华中科技大学 | 纳米尺度下大面积散射场的快速测量方法及装置 |
-
2016
- 2016-01-22 US US15/004,331 patent/US9864173B2/en active Active
- 2016-04-20 EP EP16783746.7A patent/EP3286780B1/en active Active
- 2016-04-20 JP JP2017554832A patent/JP6550470B2/ja active Active
- 2016-04-20 CN CN201680021668.1A patent/CN107466366B/zh active Active
- 2016-04-20 KR KR1020177032833A patent/KR102317067B1/ko active Active
- 2016-04-20 WO PCT/US2016/028400 patent/WO2016172184A1/en not_active Ceased
- 2016-04-21 TW TW105112527A patent/TWI676022B/zh active
-
2017
- 2017-10-02 IL IL254832A patent/IL254832B/en active IP Right Grant
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