JP2018516431A - Ｏｌｅｄのための層状構造体及びそのような構造体の製造方法 - Google Patents

Ｏｌｅｄのための層状構造体及びそのような構造体の製造方法 Download PDF

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JP2018516431A
JP2018516431A JP2017553325A JP2017553325A JP2018516431A JP 2018516431 A JP2018516431 A JP 2018516431A JP 2017553325 A JP2017553325 A JP 2017553325A JP 2017553325 A JP2017553325 A JP 2017553325A JP 2018516431 A JP2018516431 A JP 2018516431A
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layer
iel
ald
layered structure
oxide
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Japanese (ja)
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JP2018516431A5 (enExample
Inventor
ヨン ソン リ
ヨン ソン リ
ル モアル シモン
ル モアル シモン
チンウ ハン
チンウ ハン
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Saint Gobain Glass France SAS
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Saint Gobain Glass France SAS
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Publication of JP2018516431A5 publication Critical patent/JP2018516431A5/ja
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/805—Electrodes
    • H10K50/81—Anodes
    • H10K50/814—Anodes combined with auxiliary electrodes, e.g. ITO layer combined with metal lines
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
    • H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
    • H01L21/02263—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase
    • H01L21/02271—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase deposition by decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition
    • H01L21/0228—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase deposition by decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition deposition by cyclic CVD, e.g. ALD, ALE, pulsed CVD
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02612—Formation types
    • H01L21/02617—Deposition types
    • H01L21/02631—Physical deposition at reduced pressure, e.g. MBE, sputtering, evaporation
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/84—Passivation; Containers; Encapsulations
    • H10K50/844—Encapsulations
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/85—Arrangements for extracting light from the devices
    • H10K50/854—Arrangements for extracting light from the devices comprising scattering means
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/621—Providing a shape to conductive layers, e.g. patterning or selective deposition
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K77/00—Constructional details of devices covered by this subclass and not covered by groups H10K10/80, H10K30/80, H10K50/80 or H10K59/80
    • H10K77/10—Substrates, e.g. flexible substrates
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K2102/00—Constructional details relating to the organic devices covered by this subclass
    • H10K2102/10—Transparent electrodes, e.g. using graphene
    • H10K2102/101—Transparent electrodes, e.g. using graphene comprising transparent conductive oxides [TCO]
    • H10K2102/103—Transparent electrodes, e.g. using graphene comprising transparent conductive oxides [TCO] comprising indium oxides, e.g. ITO
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/805—Electrodes
    • H10K50/81—Anodes
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/549—Organic PV cells

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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electroluminescent Light Sources (AREA)
  • Laminated Bodies (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • Surface Treatment Of Glass (AREA)
JP2017553325A 2015-04-16 2016-03-23 Ｏｌｅｄのための層状構造体及びそのような構造体の製造方法 Pending JP2018516431A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP15163911.9A EP3082172A1 (en) 2015-04-16 2015-04-16 Layered structure for an oled and a method for producing such a structure
EP15163911.9 2015-04-16
PCT/EP2016/056448 WO2016165921A1 (en) 2015-04-16 2016-03-23 Layered structure for an oled and a method for producing such a structure

Publications (2)

Publication Number Publication Date
JP2018516431A true JP2018516431A (ja) 2018-06-21
JP2018516431A5 JP2018516431A5 (enExample) 2019-04-04

Family

ID=52946413

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2017553325A Pending JP2018516431A (ja) 2015-04-16 2016-03-23 Ｏｌｅｄのための層状構造体及びそのような構造体の製造方法

Country Status (8)

Country Link
US (1) US10367142B2 (enExample)
EP (1) EP3082172A1 (enExample)
JP (1) JP2018516431A (enExample)
KR (1) KR20170137087A (enExample)
CN (1) CN107431144B (enExample)
RU (1) RU2017134935A (enExample)
TW (1) TW201705581A (enExample)
WO (1) WO2016165921A1 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ES2637715T3 (es) * 2014-12-01 2017-10-16 Saint-Gobain Glass France Sustrato OLED difusor transparente y método para producir dicho sustrato
CN110429161B (zh) * 2018-08-07 2021-04-20 广东聚华印刷显示技术有限公司 光学增透结构及底发射型电致发光器件和制备方法
CN109148694A (zh) * 2018-08-27 2019-01-04 领旺（上海）光伏科技有限公司 用于柔性钙钛矿太阳能电池的ito电极表面修饰方法
CN111384271B (zh) * 2018-12-29 2021-05-28 Tcl科技集团股份有限公司 量子点发光二极管及其制备方法
CN110747449B (zh) * 2019-11-19 2021-01-05 哈尔滨工业大学 一种用于电子屏幕的自洁疏水膜层的制备方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006253106A (ja) * 2004-07-20 2006-09-21 Denso Corp カラー有機ｅｌディスプレイおよびその製造方法
WO2012133716A1 (ja) * 2011-03-29 2012-10-04 Ｎｅｃライティング株式会社 有機ｅｌ発光装置、有機ｅｌ発光装置の製造方法及び有機ｅｌ照明装置
WO2013187735A1 (en) * 2012-06-14 2013-12-19 Saint-Gobain Glass France Layered structure for oled device, method for manufacturing the same, and oled device having the same
WO2014092041A1 (ja) * 2012-12-13 2014-06-19 コニカミノルタ株式会社 有機エレクトロルミネッセンスデバイスの製造方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE655526A (fr) 1964-11-10 1965-05-10 Acec Poêle à accumulation
US7335980B2 (en) * 2004-11-04 2008-02-26 International Business Machines Corporation Hardmask for reliability of silicon based dielectrics
CN101766052B (zh) 2007-07-27 2012-07-18 旭硝子株式会社 透光性基板、其制造方法、有机led元件及其制造方法
FR2955575B1 (fr) * 2010-01-22 2012-02-24 Saint Gobain Substrat verrier revetu d'une couche haut indice sous un revetement electrode et dispositif electroluminescent organique comportant un tel substrat.
FR2958795B1 (fr) * 2010-04-12 2012-06-15 Commissariat Energie Atomique Dispositif optoelectronique organique et son procede d'encapsulation.
WO2012093467A1 (ja) * 2011-01-06 2012-07-12 シャープ株式会社 有機ｅｌ表示装置およびその製造方法
KR101825053B1 (ko) * 2011-01-11 2018-02-05 삼성디스플레이 주식회사 유기발광표시장치의 제조방법
FR2993707B1 (fr) 2012-07-17 2015-03-13 Saint Gobain Electrode supportee transparente pour oled
ES2548048T3 (es) 2012-09-28 2015-10-13 Saint-Gobain Glass France Método de para producir un sustrato OLED difusor transparente
FR3020179B1 (fr) 2014-04-22 2017-10-06 Saint Gobain Electrode supportee transparente pour oled

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006253106A (ja) * 2004-07-20 2006-09-21 Denso Corp カラー有機ｅｌディスプレイおよびその製造方法
WO2012133716A1 (ja) * 2011-03-29 2012-10-04 Ｎｅｃライティング株式会社 有機ｅｌ発光装置、有機ｅｌ発光装置の製造方法及び有機ｅｌ照明装置
WO2013187735A1 (en) * 2012-06-14 2013-12-19 Saint-Gobain Glass France Layered structure for oled device, method for manufacturing the same, and oled device having the same
WO2014092041A1 (ja) * 2012-12-13 2014-06-19 コニカミノルタ株式会社 有機エレクトロルミネッセンスデバイスの製造方法

Also Published As

Publication number Publication date
RU2017134935A (ru) 2019-04-05
WO2016165921A1 (en) 2016-10-20
CN107431144A (zh) 2017-12-01
RU2017134935A3 (enExample) 2019-07-26
KR20170137087A (ko) 2017-12-12
TW201705581A (zh) 2017-02-01
CN107431144B (zh) 2019-10-01
US10367142B2 (en) 2019-07-30
US20180114910A1 (en) 2018-04-26
EP3082172A1 (en) 2016-10-19

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