JP2018510058A - パラジウム上に金を施したガス分離膜の作製方法 - Google Patents
パラジウム上に金を施したガス分離膜の作製方法 Download PDFInfo
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- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 title claims abstract description 161
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 title claims abstract description 111
- 239000010931 gold Substances 0.000 title claims abstract description 111
- 229910052737 gold Inorganic materials 0.000 title claims abstract description 111
- 229910052763 palladium Inorganic materials 0.000 title claims abstract description 81
- 239000012528 membrane Substances 0.000 title claims abstract description 40
- 238000000926 separation method Methods 0.000 title claims abstract description 23
- 238000004519 manufacturing process Methods 0.000 title description 10
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims abstract description 110
- 239000000758 substrate Substances 0.000 claims abstract description 77
- 238000000034 method Methods 0.000 claims abstract description 43
- 239000007789 gas Substances 0.000 claims abstract description 23
- 239000002253 acid Substances 0.000 claims abstract description 18
- 230000003746 surface roughness Effects 0.000 claims abstract description 17
- 238000007747 plating Methods 0.000 claims description 100
- 238000002156 mixing Methods 0.000 claims description 5
- 150000003839 salts Chemical class 0.000 claims description 4
- 230000001154 acute effect Effects 0.000 claims description 2
- 239000000243 solution Substances 0.000 abstract description 72
- 229910001020 Au alloy Inorganic materials 0.000 abstract description 4
- 239000003353 gold alloy Substances 0.000 abstract description 4
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 abstract description 3
- 229910002091 carbon monoxide Inorganic materials 0.000 abstract description 3
- 239000012266 salt solution Substances 0.000 abstract description 3
- 239000010410 layer Substances 0.000 description 62
- 229910045601 alloy Inorganic materials 0.000 description 13
- 239000000956 alloy Substances 0.000 description 13
- 229910052739 hydrogen Inorganic materials 0.000 description 12
- 239000001257 hydrogen Substances 0.000 description 12
- 238000000137 annealing Methods 0.000 description 10
- 238000000151 deposition Methods 0.000 description 9
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 8
- 239000011148 porous material Substances 0.000 description 8
- 230000008569 process Effects 0.000 description 8
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- 239000007769 metal material Substances 0.000 description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- 230000008021 deposition Effects 0.000 description 6
- 238000009792 diffusion process Methods 0.000 description 6
- 238000009826 distribution Methods 0.000 description 6
- 239000007864 aqueous solution Substances 0.000 description 5
- 230000004888 barrier function Effects 0.000 description 5
- 238000002360 preparation method Methods 0.000 description 5
- BBKFSSMUWOMYPI-UHFFFAOYSA-N gold palladium Chemical compound [Pd].[Au] BBKFSSMUWOMYPI-UHFFFAOYSA-N 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 3
- 229910001252 Pd alloy Inorganic materials 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 239000012530 fluid Substances 0.000 description 3
- 230000004907 flux Effects 0.000 description 3
- 229910000856 hastalloy Inorganic materials 0.000 description 3
- 150000002431 hydrogen Chemical class 0.000 description 3
- 229910001026 inconel Inorganic materials 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 239000010935 stainless steel Substances 0.000 description 3
- 229910001220 stainless steel Inorganic materials 0.000 description 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 239000011733 molybdenum Substances 0.000 description 2
- 230000000737 periodic effect Effects 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 239000000725 suspension Substances 0.000 description 2
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 229910002065 alloy metal Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 238000010954 commercial manufacturing process Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 230000002572 peristaltic effect Effects 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 231100000572 poisoning Toxicity 0.000 description 1
- 230000000607 poisoning effect Effects 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- 150000003464 sulfur compounds Chemical class 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
- B01D71/02—Inorganic material
- B01D71/022—Metals
- B01D71/0223—Group 8, 9 or 10 metals
- B01D71/02231—Palladium
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/22—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by diffusion
- B01D53/228—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by diffusion characterised by specific membranes
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- B01D—SEPARATION
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- B01D67/0039—Inorganic membrane manufacture
- B01D67/0044—Inorganic membrane manufacture by chemical reaction
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- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
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- B01D67/0039—Inorganic membrane manufacture
- B01D67/0069—Inorganic membrane manufacture by deposition from the liquid phase, e.g. electrochemical deposition
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- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
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- B01D69/02—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor characterised by their properties
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
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- B01D69/04—Tubular membranes
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- B01D71/02—Inorganic material
- B01D71/022—Metals
- B01D71/0223—Group 8, 9 or 10 metals
- B01D71/02232—Nickel
-
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- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
- B01D71/02—Inorganic material
- B01D71/022—Metals
- B01D71/0227—Metals comprising an intermediate layer for avoiding intermetallic diffusion
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B3/00—Hydrogen; Gaseous mixtures containing hydrogen; Separation of hydrogen from mixtures containing it; Purification of hydrogen
- C01B3/50—Separation of hydrogen or hydrogen containing gases from gaseous mixtures, e.g. purification
- C01B3/501—Separation of hydrogen or hydrogen containing gases from gaseous mixtures, e.g. purification by diffusion
- C01B3/503—Separation of hydrogen or hydrogen containing gases from gaseous mixtures, e.g. purification by diffusion characterised by the membrane
- C01B3/505—Membranes containing palladium
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- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
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- C23C18/1635—Composition of the substrate
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- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
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Abstract
Description
この実施例は、パラジウム上に金を施した水素分離膜システムの調製を記載する。
管状多孔質支持体の初期調製
この実施例2のパラジウム上に金を施した膜の調製におけるパラジウムめっき工程は、実施例1に記載したものと同じであった。
この実施例2のパラジウム上に金を施した膜の調製におけるアニーリング工程は、実施例1に記載したものと同じであった。
研磨された表面の所望の研磨及び表面特性を提供するように設定された条件下で3MのTrizactA3ベルトを用いてAcme manufacturingのロボット式研磨機で膜を研磨した。Trizactベルト及び他の関連の摩耗媒体及びそれらの使用方法は、「A Method of Making a Supported Gas Separation Membrane.」と題する2014年4月10日に出願された米国特許出願第61/977790号に詳細に記載されている。この開示はその公開物に関して参照により本明細書に組み込まれる。
セットの繰り返し
パラジウムめっきした膜を摩耗し、1300mlの0.08%クロロ金酸を含有する金めっき浴内に入れた。浴温を20℃で維持した。膜アセンブリを約50rpmの速度でオーバーヘッド撹拌モーターで回旋した。1mlの30%過酸化水素(H2O2)をピペットを介して金めっき浴の中心に送達した。2時間後、0.25mlの30%過酸化水素を同様の手法で添加した。
Claims (9)
- パラジウム上に金を施したガス分離膜システムの調製方法であって、
外径、長さ、及び前記長さの中間点によって画成される管状多孔質基材の表面上にパラジウム層を提供することであって、前記パラジウム層は2.5ミクロン未満の平均表面粗さ(Sa)を有する、提供することと、
前記パラジウム層を有する前記管状多孔質基材を、ある体積のクロロ金酸またはその塩の溶液内に浸漬することと、
所望の均一性及び所望の厚さの金層を前記パラジウム層上に堆積させるように、前記管状多孔質基材をある設定速度である期間にわたって回転させながら、ある体積の過酸化水素を前記溶液に周期的に導入することと、を含む、方法。 - 前記体積の過酸化水素は、前記管状多孔質基材に近接する点で前記体積の過酸化水素を導入するための導管手段を介して前記溶液に導入される、請求項1に記載の方法。
- 前記管状多孔質基材は、その長さが水平面と非平行であるように前記体積の前記溶液内に配向される、請求項1に記載の方法。
- 前記体積の過酸化水素の前記導入点は、前記管状多孔質基材の前記長さの前記中間点付近の範囲内にある、請求項1に記載の方法。
- 前記導入点の前記近接性は、前記溶液内での前記管状多孔質基材の回転動作が前記体積の過酸化水素と前記体積の前記溶液との混合を補助するようなものである、請求項1に記載の方法。
- 前記導入点の前記近接性は、前記管状多孔質基材の前記外径から3インチまでである、請求項1に記載の方法。
- 前記設定速度は30rpm〜150rpmの範囲内である、請求項1に記載の方法。
- 前記体積の前記溶液に導入される前記体積の過酸化水素は、0.01重量%〜0.1重量%の範囲内の金めっき溶液中の過酸化水素の濃度を提供するようなものである、請求項1に記載の方法。
- 前記管状多孔質基材は、その長さが45°〜135°の範囲内の角度で水平面に対して鋭角及び鈍角であるかまたは直角であるように前記体積の前記溶液と配向される、請求項1に記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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US201562134635P | 2015-03-18 | 2015-03-18 | |
US62/134,635 | 2015-03-18 | ||
PCT/US2016/022550 WO2016149306A1 (en) | 2015-03-18 | 2016-03-16 | Method of making a gold on palladium gas separation membrane |
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JP2018510058A true JP2018510058A (ja) | 2018-04-12 |
JP6704926B2 JP6704926B2 (ja) | 2020-06-03 |
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US (1) | US20180104657A1 (ja) |
EP (1) | EP3271048A4 (ja) |
JP (1) | JP6704926B2 (ja) |
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Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6152987A (en) * | 1997-12-15 | 2000-11-28 | Worcester Polytechnic Institute | Hydrogen gas-extraction module and method of fabrication |
JP2005125313A (ja) * | 2003-09-30 | 2005-05-19 | Kobe Steel Ltd | ゼオライト膜支持基材およびゼオライト膜複合体 |
JP2008200558A (ja) * | 2007-02-16 | 2008-09-04 | National Institute Of Advanced Industrial & Technology | 化学気相析出法を用いた水素透過膜製造装置 |
JP2015502243A (ja) * | 2011-10-26 | 2015-01-22 | シエル・インターナシヨナル・リサーチ・マートスハツペイ・ベー・ヴエー | パラジウム金合金ガス分離膜システムを調製する方法 |
JP2015504362A (ja) * | 2011-11-16 | 2015-02-12 | シエル・インターナシヨナル・リサーチ・マートスハツペイ・ベー・ヴエー | 漏れ安定性ガス分離膜システムを作製または再調整する方法 |
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CA2519774A1 (en) * | 2003-03-21 | 2004-10-07 | Worcester Polytechnic Institute | Method for fabricating composite gas separation modules |
US7744675B2 (en) * | 2006-11-08 | 2010-06-29 | Shell Oil Company | Gas separation membrane comprising a substrate with a layer of coated inorganic oxide particles and an overlayer of a gas-selective material, and its manufacture and use |
EP2717999B1 (en) * | 2011-06-07 | 2022-06-01 | Core Energy Recovery Solutions Inc. | A heat and moisture exchanger |
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2016
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- 2016-03-16 EP EP16765612.3A patent/EP3271048A4/en not_active Withdrawn
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Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6152987A (en) * | 1997-12-15 | 2000-11-28 | Worcester Polytechnic Institute | Hydrogen gas-extraction module and method of fabrication |
JP2005125313A (ja) * | 2003-09-30 | 2005-05-19 | Kobe Steel Ltd | ゼオライト膜支持基材およびゼオライト膜複合体 |
JP2008200558A (ja) * | 2007-02-16 | 2008-09-04 | National Institute Of Advanced Industrial & Technology | 化学気相析出法を用いた水素透過膜製造装置 |
JP2015502243A (ja) * | 2011-10-26 | 2015-01-22 | シエル・インターナシヨナル・リサーチ・マートスハツペイ・ベー・ヴエー | パラジウム金合金ガス分離膜システムを調製する方法 |
JP2015504362A (ja) * | 2011-11-16 | 2015-02-12 | シエル・インターナシヨナル・リサーチ・マートスハツペイ・ベー・ヴエー | 漏れ安定性ガス分離膜システムを作製または再調整する方法 |
Non-Patent Citations (1)
Title |
---|
JOURNAL OF MEMBRANE SCIENCE, vol. 330, JPN6019049100, 2009, pages 233 - 245, ISSN: 0004176941 * |
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WO2016149306A1 (en) | 2016-09-22 |
CN107427763B (zh) | 2021-06-18 |
CN107427763A (zh) | 2017-12-01 |
EP3271048A1 (en) | 2018-01-24 |
EP3271048A4 (en) | 2018-12-05 |
US20180104657A1 (en) | 2018-04-19 |
JP6704926B2 (ja) | 2020-06-03 |
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