JP2018180367A - 光照射装置 - Google Patents
光照射装置 Download PDFInfo
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- JP2018180367A JP2018180367A JP2017081272A JP2017081272A JP2018180367A JP 2018180367 A JP2018180367 A JP 2018180367A JP 2017081272 A JP2017081272 A JP 2017081272A JP 2017081272 A JP2017081272 A JP 2017081272A JP 2018180367 A JP2018180367 A JP 2018180367A
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- 230000003287 optical effect Effects 0.000 claims abstract description 60
- 230000005540 biological transmission Effects 0.000 claims abstract description 42
- 239000000758 substrate Substances 0.000 claims abstract description 11
- 238000009826 distribution Methods 0.000 claims description 15
- 230000001678 irradiating effect Effects 0.000 claims description 6
- 230000032258 transport Effects 0.000 description 12
- 238000010586 diagram Methods 0.000 description 8
- 230000005484 gravity Effects 0.000 description 6
- 238000001514 detection method Methods 0.000 description 5
- 230000002093 peripheral effect Effects 0.000 description 5
- 230000010287 polarization Effects 0.000 description 5
- 238000013459 approach Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 238000003860 storage Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 3
- 230000007246 mechanism Effects 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 230000007423 decrease Effects 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 230000004075 alteration Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 230000008707 rearrangement Effects 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
- G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
- G02F1/133788—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by light irradiation, e.g. linearly polarised light photo-polymerisation
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
- F21V13/00—Producing particular characteristics or distribution of the light emitted by means of a combination of elements specified in two or more of main groups F21V1/00 - F21V11/00
- F21V13/02—Combinations of only two kinds of elements
- F21V13/04—Combinations of only two kinds of elements the elements being reflectors and refractors
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
- F21V5/00—Refractors for light sources
- F21V5/04—Refractors for light sources of lens shape
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
- F21V9/00—Elements for modifying spectral properties, polarisation or intensity of the light emitted, e.g. filters
- F21V9/14—Elements for modifying spectral properties, polarisation or intensity of the light emitted, e.g. filters for producing polarised light
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
- G02F1/133711—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by organic films, e.g. polymeric films
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/7035—Proximity or contact printers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70566—Polarisation control
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Mathematical Physics (AREA)
- General Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Liquid Crystal (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
Description
まず、偏光光照射装置における光学系の特性について説明する。図15は、フライアイレンズ112へ平行光が入射する場合における理想的な光の経路を説明する図である。説明のため、フライアイレンズ112は、3個のレンズ112a、112b、112cから構成されるものとする。フライアイレンズ112とコンデンサレンズ116は、f値が同一となるように、すなわち、フライアイレンズ112の後側焦点位置とコンデンサレンズ116の前側焦点位置とが一致するように配置される。
図1は第1の実施の形態に係る偏光光照射装置1の概略を示す斜視図である。以下、ワークWの搬送方向(すなわち、走査方向)Fをx方向とし、搬送方向Fに直交する方向をy方向とし、鉛直方向をz方向とする。
シフト量=(FE1の光量×FE1の照射位置オフセット+FE2の光量×FE2の照射位置オフセット+FE3の光量×FE3の照射位置オフセット+FE4の光量×FE4の照射位置オフセット)/(FE1の光量+FE2の光量+FE3の光量+FE4の光量) ・・・(1)
第1の実施の形態は、光透過領域32aと光軸Axとの距離は、その光透過領域32aを通過した光が形成する露光パターンと光軸Axとの距離のA倍であったが、光透過領域32aの配置はこれに限られない。
10 :搬送部
11 :ステージ
11a :上面
12 :駆動部
12a :水平駆動部
12b :回転駆動部
13 :位置検出部
20、21、22 :光照射部
30 :マスクユニット
32、32A、32’ :マスク
32a :光透過領域
32b :遮光領域
35 :マスク保持部
101 :制御部
101a :光源制御部
101b :駆動制御部
101c :位置決定部
102 :記憶部
103 :入力部
104 :出力部
111 :フォトマスク
111a :開口部
112 :フライアイレンズ
112a、112b、112c :レンズ
113、113a、113b、113c:光
114、114a、114b、114c:光
115、115a、115b、115c:光
116 :コンデンサレンズ
211 :光源
211a :ランプ
211b :反射鏡
212、213 :ミラー
214 :フライアイレンズ
214a :光入射側レンズアレイ
214b :光出射側レンズアレイ
214c :単位レンズ
215 :コンデンサレンズ
216 :PBS
Claims (3)
- 基板の第1方向に沿って帯状に露光パターンを形成する光照射装置であって、
光を出射する光源と、
前記第1方向に沿った帯状の光透過領域が光軸と交差しない位置に形成されたマスクと、
前記光源から出射された光を平行光にして前記マスクに照射するコリメート手段と、
前記光源と前記コリメート手段との間に配設され、前記マスクに照射される光の強度分布を均一にするフライアイレンズと、
を備え、
前記第1方向と略直交する第2方向において、前記光透過領域と前記光軸との距離は、前記光透過領域を通過した光により前記基板に形成される露光パターンと前記光軸との距離のA(Aは1以上の数)倍である
ことを特徴とする光照射装置。 - 前記基板を載置するステージと、
前記マスクを、前記ステージの上面と略直交する方向に沿って移動させるマスク移動部と、
を備えたことを特徴とする請求項1に記載の光照射装置。 - 前記光源は、光を出射するランプと、前記ランプの背面側に設けられた反射鏡と、を有し、
前記ランプを前記光軸に沿って移動させるランプ移動部を備えたことを特徴とする請求項1又は2に記載の光照射装置。
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017081272A JP6755472B2 (ja) | 2017-04-17 | 2017-04-17 | 光照射装置 |
TW107112274A TW201839523A (zh) | 2017-04-17 | 2018-04-10 | 光照射裝置 |
KR1020197026314A KR20190139204A (ko) | 2017-04-17 | 2018-04-10 | 광조사 장치 |
CN201880019554.2A CN110462503B (zh) | 2017-04-17 | 2018-04-10 | 光照射装置 |
PCT/JP2018/015062 WO2018193913A1 (ja) | 2017-04-17 | 2018-04-10 | 光照射装置 |
US16/572,213 US20200012158A1 (en) | 2017-04-17 | 2019-09-16 | Light irradiation device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017081272A JP6755472B2 (ja) | 2017-04-17 | 2017-04-17 | 光照射装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2018180367A true JP2018180367A (ja) | 2018-11-15 |
JP6755472B2 JP6755472B2 (ja) | 2020-09-16 |
Family
ID=63855787
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2017081272A Expired - Fee Related JP6755472B2 (ja) | 2017-04-17 | 2017-04-17 | 光照射装置 |
Country Status (6)
Country | Link |
---|---|
US (1) | US20200012158A1 (ja) |
JP (1) | JP6755472B2 (ja) |
KR (1) | KR20190139204A (ja) |
CN (1) | CN110462503B (ja) |
TW (1) | TW201839523A (ja) |
WO (1) | WO2018193913A1 (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE112018005374T5 (de) * | 2017-09-22 | 2020-06-25 | Fujifilm Corporation | Bildbelichtungsvorrichtung |
KR20240030197A (ko) | 2022-08-30 | 2024-03-07 | 유니램 주식회사 | 광 조사 장치 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012123207A (ja) * | 2010-12-08 | 2012-06-28 | Hitachi High-Technologies Corp | 露光装置及び露光方法 |
JP2014021239A (ja) * | 2012-07-17 | 2014-02-03 | V Technology Co Ltd | 露光装置 |
US20140227929A1 (en) * | 2011-08-29 | 2014-08-14 | Sharp Kabushiki Kaisha | Method for manufacturing liquid crystal display device |
JP2016071009A (ja) * | 2014-09-29 | 2016-05-09 | 株式会社村田製作所 | 直描型露光装置 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59160134A (ja) * | 1983-03-04 | 1984-09-10 | Canon Inc | 照明光学系 |
JP4345331B2 (ja) * | 2003-03-17 | 2009-10-14 | セイコーエプソン株式会社 | 遮光手段を用いた露光装置及び露光方法 |
JP2006278960A (ja) * | 2005-03-30 | 2006-10-12 | Canon Inc | 露光装置 |
JP5688730B2 (ja) * | 2010-09-17 | 2015-03-25 | 株式会社ブイ・テクノロジー | 露光装置 |
CN102269925B (zh) * | 2011-09-09 | 2012-10-03 | 北京理工大学 | 一种基于Abbe矢量成像模型的相移掩膜优化方法 |
-
2017
- 2017-04-17 JP JP2017081272A patent/JP6755472B2/ja not_active Expired - Fee Related
-
2018
- 2018-04-10 KR KR1020197026314A patent/KR20190139204A/ko unknown
- 2018-04-10 CN CN201880019554.2A patent/CN110462503B/zh not_active Expired - Fee Related
- 2018-04-10 WO PCT/JP2018/015062 patent/WO2018193913A1/ja active Application Filing
- 2018-04-10 TW TW107112274A patent/TW201839523A/zh unknown
-
2019
- 2019-09-16 US US16/572,213 patent/US20200012158A1/en not_active Abandoned
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012123207A (ja) * | 2010-12-08 | 2012-06-28 | Hitachi High-Technologies Corp | 露光装置及び露光方法 |
US20140227929A1 (en) * | 2011-08-29 | 2014-08-14 | Sharp Kabushiki Kaisha | Method for manufacturing liquid crystal display device |
JP2014021239A (ja) * | 2012-07-17 | 2014-02-03 | V Technology Co Ltd | 露光装置 |
JP2016071009A (ja) * | 2014-09-29 | 2016-05-09 | 株式会社村田製作所 | 直描型露光装置 |
Also Published As
Publication number | Publication date |
---|---|
TW201839523A (zh) | 2018-11-01 |
CN110462503B (zh) | 2022-09-30 |
JP6755472B2 (ja) | 2020-09-16 |
WO2018193913A1 (ja) | 2018-10-25 |
CN110462503A (zh) | 2019-11-15 |
US20200012158A1 (en) | 2020-01-09 |
KR20190139204A (ko) | 2019-12-17 |
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