JP2018118381A - ガスバリア性フィルム - Google Patents
ガスバリア性フィルム Download PDFInfo
- Publication number
- JP2018118381A JP2018118381A JP2015111591A JP2015111591A JP2018118381A JP 2018118381 A JP2018118381 A JP 2018118381A JP 2015111591 A JP2015111591 A JP 2015111591A JP 2015111591 A JP2015111591 A JP 2015111591A JP 2018118381 A JP2018118381 A JP 2018118381A
- Authority
- JP
- Japan
- Prior art keywords
- silicon
- layer
- film
- gas barrier
- polysilazane
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B9/00—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/10—Glass or silica
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/42—Silicides
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Laminated Bodies (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015111591A JP2018118381A (ja) | 2015-06-01 | 2015-06-01 | ガスバリア性フィルム |
PCT/JP2016/063905 WO2016194559A1 (fr) | 2015-06-01 | 2016-05-10 | Film étanche aux gaz |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015111591A JP2018118381A (ja) | 2015-06-01 | 2015-06-01 | ガスバリア性フィルム |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2018118381A true JP2018118381A (ja) | 2018-08-02 |
Family
ID=57441025
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2015111591A Pending JP2018118381A (ja) | 2015-06-01 | 2015-06-01 | ガスバリア性フィルム |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP2018118381A (fr) |
WO (1) | WO2016194559A1 (fr) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2022196636A1 (fr) * | 2021-03-19 | 2022-09-22 | リンテック株式会社 | Film formant barrière aux gaz et procédé de fabrication pour un film formant barrière aux gaz |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6788081B1 (ja) * | 2019-09-06 | 2020-11-18 | 神港精機株式会社 | 反応性イオンプレーティング装置および方法 |
WO2024047806A1 (fr) * | 2022-08-31 | 2024-03-07 | 株式会社レニアス | Procédé de production d'un produit multicouche transparent |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008100368A (ja) * | 2006-10-17 | 2008-05-01 | Asahi Kasei Chemicals Corp | 酸化亜鉛系透明導電積層体およびおその製造方法 |
JP2010284845A (ja) * | 2009-06-10 | 2010-12-24 | Lintec Corp | ガスバリア性フィルムおよびその製造方法 |
JP2011238567A (ja) * | 2010-05-13 | 2011-11-24 | Lintec Corp | 透明導電性フィルムおよびその製造方法並びに透明導電性フィルムを用いた電子デバイス |
JP2013000977A (ja) * | 2011-06-16 | 2013-01-07 | Dainippon Printing Co Ltd | ガスバリア性フィルム及びその製造方法 |
-
2015
- 2015-06-01 JP JP2015111591A patent/JP2018118381A/ja active Pending
-
2016
- 2016-05-10 WO PCT/JP2016/063905 patent/WO2016194559A1/fr active Application Filing
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2022196636A1 (fr) * | 2021-03-19 | 2022-09-22 | リンテック株式会社 | Film formant barrière aux gaz et procédé de fabrication pour un film formant barrière aux gaz |
Also Published As
Publication number | Publication date |
---|---|
WO2016194559A1 (fr) | 2016-12-08 |
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