JP2018054609A - ガスセンサ及びその製造方法 - Google Patents
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Abstract
【解決手段】ガスセンサであって、基板154と、該基板上に配置された第1の表面157及び第2の表面159を有する第1のポリマー層155Aであって、該第1の表面が、該基板に接触し、該第2の表面が、該第1の表面に対向し、かつ該第1の表面より大きい表面積を有し、該第1のポリマー層が、脱保護された水素供与体を有する反復単位を含む、第1のポリマー層と、該第1のポリマー層上に配置された第2のポリマー層155Bであって、該第2のポリマー層が、水素受容体を含む反復単位に由来する、第2のポリマー層と、を備える。
【選択図】図2(A)
Description
Claims (11)
- ガスセンサであって、
基板と、
前記基板上に配置された第1の表面及び第2の表面を有する第1のポリマー層であって、前記第1の表面が、前記基板に接触し、前記第2の表面が、前記第1の表面に対向し、かつ前記第1の表面より大きい表面積を有し、前記第1のポリマー層が、脱保護された水素供与体を有する反復単位を含む、第1のポリマー層と、
前記第1のポリマー層上に配置された第2のポリマー層であって、前記第2のポリマー層が、水素受容体を含む反復単位に由来する、第2のポリマー層と、を備える、ガスセンサ。 - 前記水素受容体を含む前記反復単位が、窒素含有基を含み、前記水素受容体が、第1のポリマーの水素供与体との水素結合、ファンデルワールス相互作用、π−π相互作用、静電相互作用、またはそれらの組み合わせを受けるように動作する、請求項1に記載のガスセンサ。
- 前記水素受容体を含む前記反復単位が、感知受容体をさらに含み、前記感知受容体が、ガスとの水素結合、ファンデルワールス相互作用、π−π相互作用、静電相互作用、またはそれらの組み合わせを受けるように動作する、請求項1に記載のガスセンサ。
- 前記窒素含有基が、アミン、アミド、及びピリジン基から選択される、請求項2に記載のガスセンサ。
- 前記脱保護された水素供与体が、保護された酸基及び/または保護されたアルコール基を有する反復単位を脱保護することによって得られる、請求項1に記載のガスセンサ。
- 前記第2の表面が、テクスチャ加工される、請求項1に記載のガスセンサ。
- 前記テクスチャ加工された第2の表面が、前記第1の表面の表面積よりも少なくとも2倍大きい表面積を有する、請求項1に記載のガスセンサ。
- 前記第2のポリマー層が、テクスチャ加工された自由表面を有する、請求項1に記載のガスセンサ。
- ガスセンサの製造方法であって、
第1の表面及び第2の表面を有する第1のポリマー層を基板上に配置することであって、前記第1の表面が、前記基板に接触し、前記第2の表面が、前記第1の表面に対向し、かつ前記第1の表面より大きい表面積を有し、前記第1のポリマー層が、脱保護された水素供与体を有する反復単位を含む、配置することと、
第2のポリマー層を前記第1のポリマー層上に配置することであって、前記第2のポリマー層が、水素受容体を含む反復単位に由来する、配置することと、を含む、方法。 - ガスの検出方法であって、
ガスセンサをガス状分子と接触させることであって、前記ガスセンサが、
基板、
前記基板上に配置された第1の表面及び第2の表面を有する第1のポリマー層であって、前記第1の表面が、前記基板に接触し、前記第2の表面が、前記第1の表面に対向し、かつ前記第1の表面より大きい表面積を有し、前記第1のポリマー層が、脱保護された水素供与体を有する反復単位を含む、第1のポリマー層、ならびに
前記第1のポリマー層上に配置された第2のポリマー層であって、前記第2のポリマー層が、水素受容体を含む反復単位に由来する、第2のポリマー層を備える、接触させることと、
前記ガス分子と前記第2のポリマー層との間に水素結合、ファンデルワールス相互作用、π−π相互作用、または静電相互作用のうちの少なくとも1つを形成することと、
前記水素結合、前記ファンデルワールス相互作用、前記π−π相互作用、及び前記静電相互作用の前記形成の前及び後の前記センサの差に基づいて、前記ガス分子の同一性を決定することと、を含む、方法。 - 前記差が、重量差または導電率の差である、請求項10に記載の方法。
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US201662400008P | 2016-09-26 | 2016-09-26 | |
US62/400,008 | 2016-09-26 |
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US10539542B2 (en) * | 2017-07-26 | 2020-01-21 | Honeywell International Inc. | Pressure transient normalization within a gas detector |
CN108872314B (zh) * | 2018-07-03 | 2021-01-26 | 中国工程物理研究院化工材料研究所 | 一种压电型氢气传感器及其制备方法和应用 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6283641A (ja) * | 1985-10-08 | 1987-04-17 | Sharp Corp | 電界効果型半導体センサ |
JPH06128721A (ja) * | 1992-10-19 | 1994-05-10 | Mitsubishi Electric Corp | 窒素酸化物ガスセンサ用感応薄膜の形成方法 |
JPH10249985A (ja) * | 1997-03-11 | 1998-09-22 | Tokuyama Corp | 有機/金属酸化物複合薄膜の製造方法 |
JP2001013055A (ja) * | 1999-04-27 | 2001-01-19 | Mitsubishi Electric Corp | ガス検出装置およびその感応膜材料とその成膜方法 |
US20040095043A1 (en) * | 2001-01-30 | 2004-05-20 | Tomofumi Jitsukawa | Oscillator and mass detector |
WO2007114192A1 (ja) * | 2006-03-29 | 2007-10-11 | Kitakyushu Foundation For The Advancement Of Industry, Science And Technology | ガス検知素子及びその製造方法 |
JP2010066170A (ja) * | 2008-09-11 | 2010-03-25 | Hitachi Chem Co Ltd | 塩基性ガスセンサ |
Family Cites Families (5)
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JPS60180957A (ja) * | 1984-02-29 | 1985-09-14 | 日石三菱株式会社 | セラミツクス製品の製造方法 |
EP0805971B1 (de) * | 1994-11-07 | 1998-09-23 | Ticona GmbH | Polymer-sensor |
JP4905752B2 (ja) | 2001-07-24 | 2012-03-28 | エスティー・ラボ株式会社 | 揮発性有機塩素化合物センサ |
TWI410625B (zh) * | 2008-12-31 | 2013-10-01 | Ind Tech Res Inst | 氣體感測材料及包含其之氣體感測器 |
KR102176758B1 (ko) * | 2014-02-10 | 2020-11-10 | 에스케이하이닉스 주식회사 | 블록 코폴리머를 이용한 패턴 형성을 위한 구조 및 패턴 형성 방법 |
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- 2017-09-18 TW TW106131982A patent/TWI669496B/zh active
- 2017-09-19 CN CN201710847795.3A patent/CN107870182A/zh active Pending
- 2017-09-21 KR KR1020170121597A patent/KR101971505B1/ko active IP Right Grant
- 2017-09-25 JP JP2017183206A patent/JP6427645B2/ja active Active
- 2017-09-26 US US15/715,564 patent/US20180088073A1/en not_active Abandoned
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6283641A (ja) * | 1985-10-08 | 1987-04-17 | Sharp Corp | 電界効果型半導体センサ |
JPH06128721A (ja) * | 1992-10-19 | 1994-05-10 | Mitsubishi Electric Corp | 窒素酸化物ガスセンサ用感応薄膜の形成方法 |
JPH10249985A (ja) * | 1997-03-11 | 1998-09-22 | Tokuyama Corp | 有機/金属酸化物複合薄膜の製造方法 |
JP2001013055A (ja) * | 1999-04-27 | 2001-01-19 | Mitsubishi Electric Corp | ガス検出装置およびその感応膜材料とその成膜方法 |
US20040095043A1 (en) * | 2001-01-30 | 2004-05-20 | Tomofumi Jitsukawa | Oscillator and mass detector |
WO2007114192A1 (ja) * | 2006-03-29 | 2007-10-11 | Kitakyushu Foundation For The Advancement Of Industry, Science And Technology | ガス検知素子及びその製造方法 |
JP2010066170A (ja) * | 2008-09-11 | 2010-03-25 | Hitachi Chem Co Ltd | 塩基性ガスセンサ |
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Publication number | Publication date |
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KR101971505B1 (ko) | 2019-04-23 |
TWI669496B (zh) | 2019-08-21 |
CN107870182A (zh) | 2018-04-03 |
KR20180034252A (ko) | 2018-04-04 |
TW201814268A (zh) | 2018-04-16 |
JP6427645B2 (ja) | 2018-11-21 |
US20180088073A1 (en) | 2018-03-29 |
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