JP2018016892A5 - Thin film forming apparatus and optical film manufacturing method - Google Patents
Thin film forming apparatus and optical film manufacturing method Download PDFInfo
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- JP2018016892A5 JP2018016892A5 JP2017211234A JP2017211234A JP2018016892A5 JP 2018016892 A5 JP2018016892 A5 JP 2018016892A5 JP 2017211234 A JP2017211234 A JP 2017211234A JP 2017211234 A JP2017211234 A JP 2017211234A JP 2018016892 A5 JP2018016892 A5 JP 2018016892A5
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- thin film
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- film forming
- base film
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- 239000010408 film Substances 0.000 title claims description 28
- 239000010409 thin film Substances 0.000 title claims description 22
- 230000003287 optical Effects 0.000 title claims description 13
- 238000004519 manufacturing process Methods 0.000 title claims description 5
- 238000004544 sputter deposition Methods 0.000 claims description 2
- 239000007789 gas Substances 0.000 claims 21
- 238000005259 measurement Methods 0.000 claims 6
- 210000002381 Plasma Anatomy 0.000 claims 3
- 239000012159 carrier gas Substances 0.000 claims 3
- 238000000295 emission spectrum Methods 0.000 claims 2
- 239000010410 layer Substances 0.000 claims 2
- 239000002356 single layer Substances 0.000 claims 2
- 238000004804 winding Methods 0.000 claims 2
- 230000015572 biosynthetic process Effects 0.000 claims 1
- 238000005755 formation reaction Methods 0.000 claims 1
- 230000031700 light absorption Effects 0.000 claims 1
- 238000001228 spectrum Methods 0.000 claims 1
- 230000003796 beauty Effects 0.000 description 2
Description
本発明は、スパッタリングにより薄膜を形成する薄膜形成装置、及び光学膜の製造方法に関する。 The present invention relates to a thin film forming apparatus for forming a thin film by sputtering, a method of manufacturing a 及 beauty optical film.
本発明は、このような従来の実情に鑑みて提案されたものであり、幅方向に均一な厚みの薄膜を形成することができる薄膜形成装置、及び光学膜の製造方法を提供する。 The present invention has such a proposed in view of the conventional situation, the thin film forming apparatus capable of forming a thin film of uniform thickness in the width direction, to provide a method of manufacturing 及 beauty optical film.
Claims (11)
成膜部が前記基材フィルムの長手方向に複数配列された成膜室ユニットと、
前記成膜室ユニットにて薄膜が形成された基材フィルムを巻き取る巻取部と、
少なくとも何れか１つの前記成膜室ユニットの後に設けられ、前記基材フィルムが長手方向に連続的に供給され、該基材フィルム上に形成された前記薄膜の幅方向の光学特性のうち反射特性を測定する測定部と、
前記基材フィルムの幅方向に複数のガスノズルが設けられ、ターゲット近傍に反応性ガスを供給する供給部と、
前記測定部における幅方向の前記反射特性に基づいて、前記複数のガスノズルから噴出する前記反応性ガスの流量を制御する制御部と、を備え、
前記測定部には、前記基材フィルム上の前記薄膜に対して光を照射する投光部と、前記基材フィルム上の前記薄膜からの反射光を受光する受光部を有する光学ヘッドと、前記基材フィルムを透過する前記投光部からの光を吸収する光吸収面を有する測定ロールが設けられる薄膜形成装置。 An unwinding section for unwinding the base film in the longitudinal direction;
A film forming chamber unit in which a plurality of film forming portions are arranged in the longitudinal direction of the base film;
A winding unit for winding the base film on which a thin film is formed in the film forming chamber unit;
Reflective characteristics among optical characteristics in the width direction of the thin film provided after at least one of the film forming chamber units, the base film being continuously supplied in the longitudinal direction, and formed on the base film A measurement unit for measuring
A plurality of gas nozzles are provided in the width direction of the base film, and a supply unit that supplies a reactive gas in the vicinity of the target;
A control unit for controlling the flow rate of the reactive gas ejected from the plurality of gas nozzles based on the reflection characteristics in the width direction in the measurement unit;
The measuring unit includes a light projecting unit that irradiates light to the thin film on the base film, an optical head having a light receiving unit that receives reflected light from the thin film on the base film, and A thin film forming apparatus provided with a measurement roll having a light absorption surface that absorbs light from the light projecting portion that passes through the base film.
前記制御部は、前記測定部における幅方向の光学特性及び前記プラズマ測定部における前記発光スペクトルに基づいて、前記複数のガスノズルから噴出する前記反応性ガスの流量及び前記ターゲットに印加する電圧を制御する請求項１又は２に記載の薄膜形成装置。 The film forming unit includes a sputtering electrode that applies a voltage to the target, and a plasma measuring unit that measures an emission spectrum of plasma in the width direction of the base film during film formation,
The control unit controls the flow rate of the reactive gas ejected from the plurality of gas nozzles and the voltage applied to the target based on the optical characteristics in the width direction of the measurement unit and the emission spectrum of the plasma measurement unit. The thin film forming apparatus according to claim 1 or 2.
前記受光部は、前記斜め方向から照射された光の反射光を受光する請求項１乃至４の何れか１項に記載の薄膜形成装置。 The light projecting unit irradiates light from an oblique direction to the thin film on the base film,
The thin film forming apparatus according to claim 1, wherein the light receiving unit receives reflected light of light irradiated from the oblique direction.
前記制御部は、前記連結部にマスフローコントローラを介してガスを導入し、前記複数のガスノズルから噴出するガスの流量を制御する請求項８に記載の薄膜形成装置。 The gas pipe for the reactive gas includes a connecting part for introducing gas, and a pipe branched in a tournament shape so that the opening of the pipe is equidistant from the connecting part,
The thin film forming apparatus according to claim 8, wherein the control unit introduces a gas into the connecting unit via a mass flow controller and controls a flow rate of the gas ejected from the plurality of gas nozzles.
基材フィルムを長手方向に第１の速度で連続的に供給し、各層について単層の薄膜を形成し、前記基材フィルムの幅方向の光学厚み分布を所定範囲に調整する調整工程と、
前記基材フィルムを長手方向に第１の速度よりも速い第２の速度で連続的に供給し、多層の薄膜を形成する光学膜形成工程と、を有する光学膜の製造方法。 In the manufacturing method of an optical film which manufactures a multilayer optical film using the thin film forming device according to any one of claims 1 to 9,
An adjustment step of continuously supplying the base film at a first speed in the longitudinal direction, forming a single-layer thin film for each layer, and adjusting the optical thickness distribution in the width direction of the base film to a predetermined range;
An optical film forming step of continuously supplying the base film in the longitudinal direction at a second speed higher than the first speed to form a multilayer thin film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2017211234A JP6776212B2 (en) | 2017-10-31 | 2017-10-31 | Manufacturing method of optical film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2017211234A JP6776212B2 (en) | 2017-10-31 | 2017-10-31 | Manufacturing method of optical film |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012176148A Division JP2014034701A (en) | 2012-08-08 | 2012-08-08 | Thin film deposition device and thin film deposition method |
Related Child Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018191585A Division JP6542970B2 (en) | 2018-10-10 | 2018-10-10 | Method of manufacturing antireflective film |
| JP2020115333A Division JP7146853B2 (en) | 2020-07-03 | 2020-07-03 | Method for manufacturing optical film |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2018016892A JP2018016892A (en) | 2018-02-01 |
| JP2018016892A5 true JP2018016892A5 (en) | 2018-08-02 |
| JP6776212B2 JP6776212B2 (en) | 2020-10-28 |
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| JP2017211234A Active JP6776212B2 (en) | 2017-10-31 | 2017-10-31 | Manufacturing method of optical film |
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| JPS6411970A (en) * | 1987-07-06 | 1989-01-17 | Nippon Telegraph & Telephone | Device for forming and evaluating multi-layered thin film |
| JP3531234B2 (en) * | 1994-09-22 | 2004-05-24 | Ｊｓｒ株式会社 | Transparent conductive polarizing film |
| JPH08136730A (en) * | 1994-11-04 | 1996-05-31 | Sumitomo Chem Co Ltd | Production of antireflection polarizing film |
| JPH09263934A (en) * | 1996-03-29 | 1997-10-07 | Toppan Printing Co Ltd | Film formation method and device thereof |
| JP2000064041A (en) * | 1998-08-19 | 2000-02-29 | Sony Corp | Black roll for optical measurement and thin film forming apparatus including the same and thin film formation using the same |
| JP4196136B2 (en) * | 1998-09-03 | 2008-12-17 | ソニー株式会社 | Deposition equipment |
| JP2000146534A (en) * | 1998-11-06 | 2000-05-26 | Sony Corp | Film forming device |
| JP2000214330A (en) * | 1999-01-27 | 2000-08-04 | Toyobo Co Ltd | Transparent conductive polarizing film, touch panel and liquid crystal display device |
| KR100356989B1 (en) * | 1999-04-13 | 2002-10-18 | 주식회사 엘지씨아이 | Polarizer unified transparent conductive film, touch panel unified polarizer and flat panel display unified touch panel |
| JP2001215111A (en) * | 2000-02-03 | 2001-08-10 | Toppan Printing Co Ltd | Method and apparatus for measuring film thickness |
| JP2001311827A (en) * | 2000-05-02 | 2001-11-09 | Sumitomo Chem Co Ltd | Polarizing plate and its manufacturing method |
| JP2002097571A (en) * | 2000-07-17 | 2002-04-02 | Sony Corp | Method and apparatus for manufacturing functional film |
| JP4103368B2 (en) * | 2001-10-23 | 2008-06-18 | 東レ株式会社 | Method and apparatus for producing film with metal oxide film |
| JP4117447B2 (en) * | 2002-02-18 | 2008-07-16 | 日本ゼオン株式会社 | Composite film |
| JP2006091859A (en) * | 2004-08-27 | 2006-04-06 | Fuji Photo Film Co Ltd | Anti-reflection film, and polarizing plate and image display device using the same |
| JP4876619B2 (en) * | 2006-02-21 | 2012-02-15 | ソニー株式会社 | Reactive sputtering apparatus and film forming method |
| JP5428175B2 (en) * | 2008-03-27 | 2014-02-26 | 凸版印刷株式会社 | Vacuum film forming apparatus and vacuum film forming method |
| JP5490462B2 (en) * | 2009-08-17 | 2014-05-14 | 横河電機株式会社 | Film thickness measuring device |
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| JP2011248294A (en) * | 2010-05-31 | 2011-12-08 | Sumitomo Chemical Co Ltd | Manufacturing method of polarizing laminated film and manufacturing method of polarizing plate |
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