JPS6411970A - Device for forming and evaluating multi-layered thin film - Google Patents
Device for forming and evaluating multi-layered thin filmInfo
- Publication number
- JPS6411970A JPS6411970A JP16810887A JP16810887A JPS6411970A JP S6411970 A JPS6411970 A JP S6411970A JP 16810887 A JP16810887 A JP 16810887A JP 16810887 A JP16810887 A JP 16810887A JP S6411970 A JPS6411970 A JP S6411970A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- substrate
- electrodes
- vacuum vessel
- thin films
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
PURPOSE:To freely form plural multi-layered thin films on a substrate by arranging the fixed substrate capable of being heated and cooled and plural rotatable magnetron sputtering electrodes having a target and a magnet in a vacuum vessel, and providing a polarization analyzer using a monochromatic laser. CONSTITUTION:A fixed substrate holder provided with a heater 3 and a water cooler 4 is fixed in the vacuum vessel 1, and the magnetron sputtering electrodes 9A and 9B rotating horizontally with rotating shafts 10A and 10B as the axes are arranged in opposition to the holder. The electrodes 9A and 9B have the targets 7 and 7 of the. different materials and magnets 8 and 8 on the rear surfaces, and are moved by the rotation of the rotating shaft 10A and 10B. As a result, the electrodes 9A and 9B move alternately to a position opposed to the substrate 4, and the thin films by the respective targets are formed one upon another. In this case, the substrate 4 is heated or cooled to facilitate the control of the interface between the laminated thin films, and the crystallinity of the thin film is improved. In addition, a monochromatic laser beam is projected on the thin film on the substrate by utilizing the windows 11A and 11B of the vacuum vessel 1, the characteristics, etc., of the thin film are thereby polarization-analyzed, observed, and evaluated, and the formation of the composite thin film can be controlled.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16810887A JPS6411970A (en) | 1987-07-06 | 1987-07-06 | Device for forming and evaluating multi-layered thin film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16810887A JPS6411970A (en) | 1987-07-06 | 1987-07-06 | Device for forming and evaluating multi-layered thin film |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6411970A true JPS6411970A (en) | 1989-01-17 |
Family
ID=15861998
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16810887A Pending JPS6411970A (en) | 1987-07-06 | 1987-07-06 | Device for forming and evaluating multi-layered thin film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6411970A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009203495A (en) * | 2008-02-26 | 2009-09-10 | Nippon Hoso Kyokai <Nhk> | Carousel system magnetron cathode and sputter device |
JP2014034701A (en) * | 2012-08-08 | 2014-02-24 | Dexerials Corp | Thin film deposition device and thin film deposition method |
JP2018016892A (en) * | 2017-10-31 | 2018-02-01 | デクセリアルズ株式会社 | Thin film forming apparatus, thin film forming method, and optical film manufacturing method |
US11630055B2 (en) | 2017-04-03 | 2023-04-18 | Mitsubishi Heavy Industries, Ltd. | Method for evaluating structure used for nuclide transmutation reaction, evaluation device, structure manufacturing device provided with same, and nuclide transmutation system |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4978640A (en) * | 1972-12-06 | 1974-07-29 | ||
JPS61576A (en) * | 1984-06-12 | 1986-01-06 | Mitsubishi Metal Corp | Sputtering device for forming multi-layered films |
-
1987
- 1987-07-06 JP JP16810887A patent/JPS6411970A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4978640A (en) * | 1972-12-06 | 1974-07-29 | ||
JPS61576A (en) * | 1984-06-12 | 1986-01-06 | Mitsubishi Metal Corp | Sputtering device for forming multi-layered films |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009203495A (en) * | 2008-02-26 | 2009-09-10 | Nippon Hoso Kyokai <Nhk> | Carousel system magnetron cathode and sputter device |
JP2014034701A (en) * | 2012-08-08 | 2014-02-24 | Dexerials Corp | Thin film deposition device and thin film deposition method |
US11630055B2 (en) | 2017-04-03 | 2023-04-18 | Mitsubishi Heavy Industries, Ltd. | Method for evaluating structure used for nuclide transmutation reaction, evaluation device, structure manufacturing device provided with same, and nuclide transmutation system |
JP2018016892A (en) * | 2017-10-31 | 2018-02-01 | デクセリアルズ株式会社 | Thin film forming apparatus, thin film forming method, and optical film manufacturing method |
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