JPS6411970A - Device for forming and evaluating multi-layered thin film - Google Patents

Device for forming and evaluating multi-layered thin film

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Publication number
JPS6411970A
JPS6411970A JP16810887A JP16810887A JPS6411970A JP S6411970 A JPS6411970 A JP S6411970A JP 16810887 A JP16810887 A JP 16810887A JP 16810887 A JP16810887 A JP 16810887A JP S6411970 A JPS6411970 A JP S6411970A
Authority
JP
Japan
Prior art keywords
thin film
substrate
electrodes
vacuum vessel
thin films
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16810887A
Other languages
Japanese (ja)
Inventor
Yujiro Kato
Hidefumi Asano
Keiichi Tanabe
Shugo Kubo
Osamu Michigami
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP16810887A priority Critical patent/JPS6411970A/en
Publication of JPS6411970A publication Critical patent/JPS6411970A/en
Pending legal-status Critical Current

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  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To freely form plural multi-layered thin films on a substrate by arranging the fixed substrate capable of being heated and cooled and plural rotatable magnetron sputtering electrodes having a target and a magnet in a vacuum vessel, and providing a polarization analyzer using a monochromatic laser. CONSTITUTION:A fixed substrate holder provided with a heater 3 and a water cooler 4 is fixed in the vacuum vessel 1, and the magnetron sputtering electrodes 9A and 9B rotating horizontally with rotating shafts 10A and 10B as the axes are arranged in opposition to the holder. The electrodes 9A and 9B have the targets 7 and 7 of the. different materials and magnets 8 and 8 on the rear surfaces, and are moved by the rotation of the rotating shaft 10A and 10B. As a result, the electrodes 9A and 9B move alternately to a position opposed to the substrate 4, and the thin films by the respective targets are formed one upon another. In this case, the substrate 4 is heated or cooled to facilitate the control of the interface between the laminated thin films, and the crystallinity of the thin film is improved. In addition, a monochromatic laser beam is projected on the thin film on the substrate by utilizing the windows 11A and 11B of the vacuum vessel 1, the characteristics, etc., of the thin film are thereby polarization-analyzed, observed, and evaluated, and the formation of the composite thin film can be controlled.
JP16810887A 1987-07-06 1987-07-06 Device for forming and evaluating multi-layered thin film Pending JPS6411970A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16810887A JPS6411970A (en) 1987-07-06 1987-07-06 Device for forming and evaluating multi-layered thin film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16810887A JPS6411970A (en) 1987-07-06 1987-07-06 Device for forming and evaluating multi-layered thin film

Publications (1)

Publication Number Publication Date
JPS6411970A true JPS6411970A (en) 1989-01-17

Family

ID=15861998

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16810887A Pending JPS6411970A (en) 1987-07-06 1987-07-06 Device for forming and evaluating multi-layered thin film

Country Status (1)

Country Link
JP (1) JPS6411970A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009203495A (en) * 2008-02-26 2009-09-10 Nippon Hoso Kyokai <Nhk> Carousel system magnetron cathode and sputter device
JP2014034701A (en) * 2012-08-08 2014-02-24 Dexerials Corp Thin film deposition device and thin film deposition method
JP2018016892A (en) * 2017-10-31 2018-02-01 デクセリアルズ株式会社 Thin film forming apparatus, thin film forming method, and optical film manufacturing method
US11630055B2 (en) 2017-04-03 2023-04-18 Mitsubishi Heavy Industries, Ltd. Method for evaluating structure used for nuclide transmutation reaction, evaluation device, structure manufacturing device provided with same, and nuclide transmutation system

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4978640A (en) * 1972-12-06 1974-07-29
JPS61576A (en) * 1984-06-12 1986-01-06 Mitsubishi Metal Corp Sputtering device for forming multi-layered films

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4978640A (en) * 1972-12-06 1974-07-29
JPS61576A (en) * 1984-06-12 1986-01-06 Mitsubishi Metal Corp Sputtering device for forming multi-layered films

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009203495A (en) * 2008-02-26 2009-09-10 Nippon Hoso Kyokai <Nhk> Carousel system magnetron cathode and sputter device
JP2014034701A (en) * 2012-08-08 2014-02-24 Dexerials Corp Thin film deposition device and thin film deposition method
US11630055B2 (en) 2017-04-03 2023-04-18 Mitsubishi Heavy Industries, Ltd. Method for evaluating structure used for nuclide transmutation reaction, evaluation device, structure manufacturing device provided with same, and nuclide transmutation system
JP2018016892A (en) * 2017-10-31 2018-02-01 デクセリアルズ株式会社 Thin film forming apparatus, thin film forming method, and optical film manufacturing method

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