JP2017519326A5 - - Google Patents

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Publication number
JP2017519326A5
JP2017519326A5 JP2016559307A JP2016559307A JP2017519326A5 JP 2017519326 A5 JP2017519326 A5 JP 2017519326A5 JP 2016559307 A JP2016559307 A JP 2016559307A JP 2016559307 A JP2016559307 A JP 2016559307A JP 2017519326 A5 JP2017519326 A5 JP 2017519326A5
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JP
Japan
Prior art keywords
layer
terminal layer
conductive material
terminal
conductive
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JP2016559307A
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English (en)
Japanese (ja)
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JP6486383B2 (ja
JP2017519326A (ja
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Priority claimed from KR1020140042135A external-priority patent/KR101586902B1/ko
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Publication of JP2017519326A5 publication Critical patent/JP2017519326A5/ja
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Publication of JP6486383B2 publication Critical patent/JP6486383B2/ja
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JP2016559307A 2014-04-09 2014-10-31 ナノ構造のパターンを備えた光透過性導電体及びその製造方法 Active JP6486383B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
KR1020140042135A KR101586902B1 (ko) 2014-04-09 2014-04-09 나노구조의 패턴을 구비한 광투과성 도전체 및 그 제조방법
KR10-2014-0042135 2014-04-09
PCT/KR2014/010333 WO2015156467A1 (ko) 2014-04-09 2014-10-31 나노구조의 패턴을 구비한 광투과성 도전체 및 그 제조방법

Publications (3)

Publication Number Publication Date
JP2017519326A JP2017519326A (ja) 2017-07-13
JP2017519326A5 true JP2017519326A5 (enExample) 2017-09-28
JP6486383B2 JP6486383B2 (ja) 2019-03-20

Family

ID=54288024

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016559307A Active JP6486383B2 (ja) 2014-04-09 2014-10-31 ナノ構造のパターンを備えた光透過性導電体及びその製造方法

Country Status (5)

Country Link
US (1) US10165680B2 (enExample)
JP (1) JP6486383B2 (enExample)
KR (1) KR101586902B1 (enExample)
CN (1) CN106133847B (enExample)
WO (1) WO2015156467A1 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101606338B1 (ko) * 2014-04-22 2016-03-24 인트리 주식회사 나노구조의 패턴을 구비한 광투과성 도전체를 제조하기 위한 포토마스크 및 그 제조방법
KR102285456B1 (ko) * 2015-02-10 2021-08-03 동우 화인켐 주식회사 도전패턴
US9801284B2 (en) * 2015-11-18 2017-10-24 Dow Global Technologies Llc Method of manufacturing a patterned conductor
TWI718414B (zh) * 2018-09-21 2021-02-11 元太科技工業股份有限公司 導電結構、線路結構及顯示器

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4617479B2 (ja) * 2004-09-17 2011-01-26 独立行政法人産業技術総合研究所 透明導電性カーボンナノチューブフィルムを用いたタッチパネル
KR101333012B1 (ko) 2005-08-12 2013-12-02 캄브리오스 테크놀로지즈 코포레이션 나노와이어 기반의 투명 도전체
US20090056854A1 (en) * 2006-04-04 2009-03-05 Top-Nanosis, Inc. Method for manufacturing conductive composite material
US8018563B2 (en) * 2007-04-20 2011-09-13 Cambrios Technologies Corporation Composite transparent conductors and methods of forming the same
JP5221088B2 (ja) 2007-09-12 2013-06-26 株式会社クラレ 透明導電膜およびその製造方法
JP5360528B2 (ja) * 2008-05-07 2013-12-04 国立大学法人北陸先端科学技術大学院大学 ギャップで分断された薄膜の製造方法、およびこれを用いたデバイスの製造方法
JP2011065944A (ja) 2009-09-18 2011-03-31 Fujifilm Corp 導電膜形成用感光材料、導電性材料、表示素子及び太陽電池
US8604332B2 (en) 2010-03-04 2013-12-10 Guardian Industries Corp. Electronic devices including transparent conductive coatings including carbon nanotubes and nanowire composites, and methods of making the same
EP2598942A4 (en) * 2010-07-30 2014-07-23 Univ Leland Stanford Junior CONDUCTIVE FILMS
JP5647864B2 (ja) * 2010-11-05 2015-01-07 富士フイルム株式会社 タッチパネル
JP5603801B2 (ja) * 2011-02-23 2014-10-08 富士フイルム株式会社 導電シートの製造方法、導電シート及びタッチパネル
JP5542752B2 (ja) * 2011-07-06 2014-07-09 信越ポリマー株式会社 絶縁部形成方法及び導電パターン形成基板の製造方法
JP5808966B2 (ja) * 2011-07-11 2015-11-10 富士フイルム株式会社 導電性積層体、タッチパネル及び表示装置
JP5646424B2 (ja) * 2011-09-27 2014-12-24 株式会社東芝 透明電極積層体
KR101328483B1 (ko) 2012-05-10 2013-11-13 전자부품연구원 금속 메쉬 구조를 갖는 투명 전극 박막 및 그 제조방법
WO2014050440A1 (ja) * 2012-09-27 2014-04-03 東レ株式会社 透明導電積層体
KR101386362B1 (ko) * 2012-09-27 2014-04-16 한국과학기술원 은 나노와이어 네트워크―그래핀 적층형 투명전극 소재, 그 제조 방법 및 이를 포함하는 투명전극
CN104838449B (zh) * 2012-12-07 2018-06-15 3M创新有限公司 导电制品

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