JP2017516075A - 照明パターン形成を用いた圧縮センシング - Google Patents
照明パターン形成を用いた圧縮センシング Download PDFInfo
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- 238000005286 illumination Methods 0.000 title claims abstract description 81
- 230000007261 regionalization Effects 0.000 title claims description 3
- 210000001747 pupil Anatomy 0.000 claims abstract description 50
- 238000005259 measurement Methods 0.000 claims abstract description 35
- 230000003595 spectral effect Effects 0.000 claims abstract description 33
- 230000010287 polarization Effects 0.000 claims abstract description 29
- 238000000034 method Methods 0.000 claims abstract description 19
- 238000000059 patterning Methods 0.000 claims abstract description 18
- 230000005855 radiation Effects 0.000 claims abstract description 12
- 238000001228 spectrum Methods 0.000 claims description 26
- 230000003287 optical effect Effects 0.000 claims description 15
- 206010034960 Photophobia Diseases 0.000 abstract 1
- 208000013469 light sensitivity Diseases 0.000 abstract 1
- 238000010586 diagram Methods 0.000 description 11
- 238000010168 coupling process Methods 0.000 description 8
- 238000005859 coupling reaction Methods 0.000 description 8
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- 239000000835 fiber Substances 0.000 description 2
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- 238000004458 analytical method Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
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- 230000007935 neutral effect Effects 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
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- G01N21/88—Investigating the presence of flaws or contamination
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- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
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- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/02—Details
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
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- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
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- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/28—Investigating the spectrum
- G01J3/2823—Imaging spectrometer
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- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/47—Scattering, i.e. diffuse reflection
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
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- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
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- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/9501—Semiconductor wafers
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- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
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- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
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- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
- G01N21/95623—Inspecting patterns on the surface of objects using a spatial filtering method
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
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- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8806—Specially adapted optical and illumination features
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Abstract
Description
本出願は、その全体を本願に引用して援用する、2014年3月20日に出願した米国仮特許出願第61/955,793号の利益を主張するものである。
Claims (10)
- そのスペクトル範囲およびその偏光のうちの少なくとも1つに対して計測目標の照明をパターン形成するステップと、
前記パターン形成された照明によって計測目標を照明するステップと、
収集パターンを選択された瞳面の画素へ適用することによって瞳面において前記瞳面の画素をそれぞれ少なくとも1つの単一の検出器へ向けることにより前記目標から散乱された放射を測定するステップと
を含む方法。 - 請求項1に記載の方法であって、前記パターン形成するステップは、前記照明の瞳面において実行される方法。
- 請求項1に記載の方法であって、前記収集パターンは、前記照明パターンに関連するように構成されている方法。
- 請求項1に記載の方法であって、前記目標の照明は、前記スペクトル範囲とその前記偏光の両方に対してパターン形成されている方法。
- 請求項1に記載の方法であって、前記目標の照明は、スペクトルプログラマによって前記スペクトル範囲に関してパターン形成される方法。
- そのスペクトル範囲およびその偏光のうちの少なくとも1つに対して目標の照明をパターン形成するように構成されている照明源と、
圧縮センシング装置であって、収集パターンを選択された瞳面の画素へ適用することによって瞳面において前記瞳面の画素を前記装置のそれぞれ少なくとも1つの単一の検出器へ向けることにより前記パターン形成された照明によって照明された目標から散乱された放射を測定するように構成されている圧縮センシング装置と
を備える計測光学系。 - 請求項6に記載の計測光学系であって、前記パターン形成は、前記照明源の瞳面において実行される計測光学系。
- 請求項6に記載の計測光学系であって、前記収集パターンは、前記照明パターンに関連するように構成されている計測光学系。
- 請求項6に記載の計測光学系であって、前記目標の照明は、前記スペクトル範囲とその前記偏光の両方に対してパターン形成されている計測光学系。
- 請求項6に記載の計測光学系であって、前記スペクトル範囲に対して前記目標の照明をパターン形成するように構成されているスペクトルプログラマをさらに備える計測光学系。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201461955793P | 2014-03-20 | 2014-03-20 | |
US61/955,793 | 2014-03-20 | ||
PCT/US2015/021843 WO2015143378A1 (en) | 2014-03-20 | 2015-03-20 | Compressive sensing with illumination patterning |
Publications (3)
Publication Number | Publication Date |
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JP2017516075A true JP2017516075A (ja) | 2017-06-15 |
JP2017516075A5 JP2017516075A5 (ja) | 2018-04-26 |
JP6775421B2 JP6775421B2 (ja) | 2020-10-28 |
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JP2016557933A Active JP6775421B2 (ja) | 2014-03-20 | 2015-03-20 | 照明パターン形成を用いた計測光学系及び方法 |
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US (1) | US9719940B2 (ja) |
JP (1) | JP6775421B2 (ja) |
KR (1) | KR102135999B1 (ja) |
CN (1) | CN106104202B (ja) |
WO (1) | WO2015143378A1 (ja) |
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US9793178B2 (en) * | 2014-08-28 | 2017-10-17 | University Of Rochester | Focused beam scatterometry apparatus and method |
JP6619883B2 (ja) | 2015-12-09 | 2019-12-11 | エーエスエムエル ホールディング エヌ.ブイ. | メトロロジ装置における照明方法およびメトロロジ装置 |
CN108700816A (zh) | 2015-12-17 | 2018-10-23 | Asml荷兰有限公司 | 散射测量中的偏振调谐 |
CN108700834B (zh) | 2016-03-07 | 2021-03-09 | Asml荷兰有限公司 | 照射系统和量测系统 |
EP3477392A1 (en) * | 2017-10-31 | 2019-05-01 | ASML Netherlands B.V. | Metrology apparatus, method of measuring a structure, device manufacturing method |
IL273836B2 (en) | 2017-10-31 | 2023-09-01 | Asml Netherlands Bv | A measuring device, a method for measuring a structure, a method for making a device |
JP7186230B2 (ja) | 2017-12-28 | 2022-12-08 | エーエスエムエル ネザーランズ ビー.ブイ. | 装置の構成要素から汚染粒子を除去する装置および方法 |
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JP2009200466A (ja) * | 2007-11-13 | 2009-09-03 | Asml Netherlands Bv | 検査方法及び装置、リソグラフィ装置、リソグラフィ処理セル、並びに、デバイス製造方法 |
WO2013002988A2 (en) * | 2011-06-27 | 2013-01-03 | Kla-Tencor Corporation | Illumination control |
US20130070138A1 (en) * | 2010-02-22 | 2013-03-21 | Richard G Baraniuk | Number Of Pixels In Detector Arrays Using Compressive Sensing |
US8723130B2 (en) * | 2011-04-25 | 2014-05-13 | Center For Space Science And Applied Research, Chinese Academy Of Sciences | Single photon-counting imaging system and method thereof |
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JP2003161888A (ja) * | 2001-11-26 | 2003-06-06 | Inst Of Physical & Chemical Res | 特定の波長で照明できる顕微鏡 |
US7580559B2 (en) * | 2004-01-29 | 2009-08-25 | Asml Holding N.V. | System and method for calibrating a spatial light modulator |
US7446877B2 (en) * | 2004-08-27 | 2008-11-04 | Bwt Property Inc. | All-fiber spectroscopic optical sensor |
WO2006116134A2 (en) * | 2005-04-21 | 2006-11-02 | William Marsh Rice University | Method and apparatus for compressive imaging device |
US7916284B2 (en) * | 2006-07-18 | 2011-03-29 | Asml Netherlands B.V. | Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method |
US7580131B2 (en) * | 2007-04-17 | 2009-08-25 | Asml Netherlands B.V. | Angularly resolved scatterometer and inspection method |
ITFI20070260A1 (it) * | 2007-11-21 | 2009-05-22 | Light 4 Tech Firenze S R L | Dispositivo per illuminare un oggetto con una sorgente di luce multispettrale e rivelare lo spettro della luce emessa. |
JP2011191199A (ja) * | 2010-03-15 | 2011-09-29 | Japan Science & Technology Agency | 顕微鏡システム |
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WO2013061858A1 (ja) * | 2011-10-24 | 2013-05-02 | 株式会社ニコン | 照明光学系、露光装置、およびデバイス製造方法 |
WO2013181156A1 (en) * | 2012-05-29 | 2013-12-05 | Kla-Tencor Corporation | Small spot size spectroscopic ellipsometer |
US9341769B2 (en) * | 2012-12-17 | 2016-05-17 | Kla-Tencor Corporation | Spectral control system |
-
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- 2015-03-20 JP JP2016557933A patent/JP6775421B2/ja active Active
- 2015-03-20 KR KR1020167028947A patent/KR102135999B1/ko active IP Right Grant
- 2015-03-20 CN CN201580013650.2A patent/CN106104202B/zh active Active
- 2015-03-20 WO PCT/US2015/021843 patent/WO2015143378A1/en active Application Filing
- 2015-10-05 US US14/875,084 patent/US9719940B2/en active Active
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JP2009200466A (ja) * | 2007-11-13 | 2009-09-03 | Asml Netherlands Bv | 検査方法及び装置、リソグラフィ装置、リソグラフィ処理セル、並びに、デバイス製造方法 |
US20130070138A1 (en) * | 2010-02-22 | 2013-03-21 | Richard G Baraniuk | Number Of Pixels In Detector Arrays Using Compressive Sensing |
US8723130B2 (en) * | 2011-04-25 | 2014-05-13 | Center For Space Science And Applied Research, Chinese Academy Of Sciences | Single photon-counting imaging system and method thereof |
WO2013002988A2 (en) * | 2011-06-27 | 2013-01-03 | Kla-Tencor Corporation | Illumination control |
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US20160025646A1 (en) | 2016-01-28 |
US9719940B2 (en) | 2017-08-01 |
KR102135999B1 (ko) | 2020-07-21 |
KR20160135769A (ko) | 2016-11-28 |
JP6775421B2 (ja) | 2020-10-28 |
CN106104202A (zh) | 2016-11-09 |
WO2015143378A1 (en) | 2015-09-24 |
CN106104202B (zh) | 2019-08-02 |
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