JP2017507358A - 特にマイクロリソグラフィ投影露光装置の光学系のサブアセンブリ - Google Patents

特にマイクロリソグラフィ投影露光装置の光学系のサブアセンブリ Download PDF

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JP2017507358A
JP2017507358A JP2016553420A JP2016553420A JP2017507358A JP 2017507358 A JP2017507358 A JP 2017507358A JP 2016553420 A JP2016553420 A JP 2016553420A JP 2016553420 A JP2016553420 A JP 2016553420A JP 2017507358 A JP2017507358 A JP 2017507358A
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Prior art keywords
subassembly
refrigerant
subassembly according
temperature control
mirror
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Pending
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JP2016553420A
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English (en)
Japanese (ja)
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JP2017507358A5 (enExample
Inventor
シュベトナー ティルマン
シュベトナー ティルマン
フィゲレード ステーシー
フィゲレード ステーシー
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カール・ツァイス・エスエムティー・ゲーエムベーハー
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Publication of JP2017507358A publication Critical patent/JP2017507358A/ja
Publication of JP2017507358A5 publication Critical patent/JP2017507358A5/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F28—HEAT EXCHANGE IN GENERAL
    • F28D—HEAT-EXCHANGE APPARATUS, NOT PROVIDED FOR IN ANOTHER SUBCLASS, IN WHICH THE HEAT-EXCHANGE MEDIA DO NOT COME INTO DIRECT CONTACT
    • F28D15/00—Heat-exchange apparatus with the intermediate heat-transfer medium in closed tubes passing into or through the conduit walls ; Heat-exchange apparatus employing intermediate heat-transfer medium or bodies
    • F28D15/02—Heat-exchange apparatus with the intermediate heat-transfer medium in closed tubes passing into or through the conduit walls ; Heat-exchange apparatus employing intermediate heat-transfer medium or bodies in which the medium condenses and evaporates, e.g. heat pipes
    • F28D15/0241—Heat-exchange apparatus with the intermediate heat-transfer medium in closed tubes passing into or through the conduit walls ; Heat-exchange apparatus employing intermediate heat-transfer medium or bodies in which the medium condenses and evaporates, e.g. heat pipes the tubes being flexible
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F28—HEAT EXCHANGE IN GENERAL
    • F28D—HEAT-EXCHANGE APPARATUS, NOT PROVIDED FOR IN ANOTHER SUBCLASS, IN WHICH THE HEAT-EXCHANGE MEDIA DO NOT COME INTO DIRECT CONTACT
    • F28D15/00—Heat-exchange apparatus with the intermediate heat-transfer medium in closed tubes passing into or through the conduit walls ; Heat-exchange apparatus employing intermediate heat-transfer medium or bodies
    • F28D15/02—Heat-exchange apparatus with the intermediate heat-transfer medium in closed tubes passing into or through the conduit walls ; Heat-exchange apparatus employing intermediate heat-transfer medium or bodies in which the medium condenses and evaporates, e.g. heat pipes
    • F28D15/0266—Heat-exchange apparatus with the intermediate heat-transfer medium in closed tubes passing into or through the conduit walls ; Heat-exchange apparatus employing intermediate heat-transfer medium or bodies in which the medium condenses and evaporates, e.g. heat pipes with separate evaporating and condensing chambers connected by at least one conduit; Loop-type heat pipes; with multiple or common evaporating or condensing chambers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/181—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation
    • G02B7/1815—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation with cooling or heating systems

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • General Engineering & Computer Science (AREA)
  • Thermal Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Sustainable Development (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Environmental & Geological Engineering (AREA)
  • Toxicology (AREA)
  • Atmospheric Sciences (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2016553420A 2014-02-21 2015-02-11 特にマイクロリソグラフィ投影露光装置の光学系のサブアセンブリ Pending JP2017507358A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102014203144.3A DE102014203144A1 (de) 2014-02-21 2014-02-21 Baugruppe eines optischen Systems, insbesondere in einer mikrolithographischen Projektionsbelichtungsanlage
DE102014203144.3 2014-02-21
PCT/EP2015/052825 WO2015124471A1 (en) 2014-02-21 2015-02-11 Subassembly of an optical system, in particular in a microlithographic projection exposure apparatus

Publications (2)

Publication Number Publication Date
JP2017507358A true JP2017507358A (ja) 2017-03-16
JP2017507358A5 JP2017507358A5 (enExample) 2018-03-22

Family

ID=52598721

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016553420A Pending JP2017507358A (ja) 2014-02-21 2015-02-11 特にマイクロリソグラフィ投影露光装置の光学系のサブアセンブリ

Country Status (7)

Country Link
US (1) US20160334719A1 (enExample)
JP (1) JP2017507358A (enExample)
KR (1) KR20160124102A (enExample)
CN (1) CN106062633A (enExample)
DE (1) DE102014203144A1 (enExample)
TW (1) TWI663479B (enExample)
WO (1) WO2015124471A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2022534002A (ja) * 2019-05-22 2022-07-27 アンプリテュード 光線を制御するための光学部品マウント及び関連システム

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Publication number Priority date Publication date Assignee Title
DE102017202653A1 (de) 2017-02-20 2018-08-23 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage für die Halbleiterlithographie mit verbessertem Wärmeübergang
KR102374206B1 (ko) 2017-12-05 2022-03-14 삼성전자주식회사 반도체 장치 제조 방법
KR102678312B1 (ko) 2018-10-18 2024-06-25 삼성전자주식회사 Euv 노광 장치와 노광 방법, 및 그 노광 방법을 포함한 반도체 소자 제조 방법
CN116324621A (zh) * 2020-08-07 2023-06-23 卡尔蔡司Smt有限责任公司 光学系统与操作光学系统的方法
DE102023207048A1 (de) 2022-09-20 2024-03-21 Carl Zeiss Smt Gmbh Baugruppe eines optischen Systems sowie Verfahren zum Temperieren eines Spiegels, insbesondere in einer mikrolithographischen Projektionsbelichtungsanlage
DE102022212277A1 (de) 2022-11-18 2024-05-23 Carl Zeiss Smt Gmbh Baugruppe eines optischen Systems
DE102022212279A1 (de) 2022-11-18 2024-05-23 Carl Zeiss Smt Gmbh Baugruppe eines optischen Systems
DE102022213142A1 (de) 2022-12-06 2024-06-06 Carl Zeiss Smt Gmbh Spiegelanordnung mit gekühlten Spiegelelementen und Lithographiesystem
DE102023202039A1 (de) 2023-03-07 2024-03-28 Carl Zeiss Smt Gmbh Verfahren zum Kühlen einer Komponente und Lithographiesystem
DE102023208751A1 (de) * 2023-09-11 2024-07-18 Carl Zeiss Smt Gmbh Optische Anordnung mit einer zu temperierenden Komponente

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JPS60237985A (ja) * 1984-05-11 1985-11-26 Takashi Taniguchi 醗酵熱利用装置
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JP2004039851A (ja) * 2002-07-03 2004-02-05 Nikon Corp ミラー冷却装置及び露光装置
JP2004039905A (ja) * 2002-07-04 2004-02-05 Nikon Corp 露光装置、ミラーの冷却方法、反射マスクの冷却方法及び露光方法
JP2004153064A (ja) * 2002-10-31 2004-05-27 Nikon Corp 露光装置
JP2004312006A (ja) * 2003-04-08 2004-11-04 Samsung Electronics Co Ltd べークシステム
JP2004309688A (ja) * 2003-04-04 2004-11-04 Nikon Corp 光学素子保持冷却装置及び露光装置
JP2007250678A (ja) * 2006-03-14 2007-09-27 Tokyo Electron Ltd 熱処理装置、熱処理方法及び記憶媒体
JP2010054122A (ja) * 2008-08-28 2010-03-11 Mitsubishi Electric Corp 可変コンダクタンスヒートパイプ

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US20030192669A1 (en) 2002-04-10 2003-10-16 Memfuel International Corporation Micro-loop heat pipe
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DE102008009600A1 (de) 2008-02-15 2009-08-20 Carl Zeiss Smt Ag Facettenspiegel zum Einsatz in einer Projektionsbelichtungsanlage für die Mikro-Lithographie
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EP2515170B1 (en) * 2011-04-20 2020-02-19 ASML Netherlands BV Thermal conditioning system for thermal conditioning a part of a lithographic apparatus and a thermal conditioning method
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DE102012200733A1 (de) 2012-01-19 2013-01-24 Carl Zeiss Smt Gmbh Spiegelanordnung, insbesondere zum Einsatz in einem optischen System, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage
WO2013113634A2 (en) * 2012-01-30 2013-08-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60237985A (ja) * 1984-05-11 1985-11-26 Takashi Taniguchi 醗酵熱利用装置
JP2004029314A (ja) * 2002-06-25 2004-01-29 Nikon Corp 光学素子冷却装置、光学素子冷却方法及び露光装置
JP2004039851A (ja) * 2002-07-03 2004-02-05 Nikon Corp ミラー冷却装置及び露光装置
JP2004039905A (ja) * 2002-07-04 2004-02-05 Nikon Corp 露光装置、ミラーの冷却方法、反射マスクの冷却方法及び露光方法
JP2004153064A (ja) * 2002-10-31 2004-05-27 Nikon Corp 露光装置
JP2004309688A (ja) * 2003-04-04 2004-11-04 Nikon Corp 光学素子保持冷却装置及び露光装置
JP2004312006A (ja) * 2003-04-08 2004-11-04 Samsung Electronics Co Ltd べークシステム
JP2007250678A (ja) * 2006-03-14 2007-09-27 Tokyo Electron Ltd 熱処理装置、熱処理方法及び記憶媒体
JP2010054122A (ja) * 2008-08-28 2010-03-11 Mitsubishi Electric Corp 可変コンダクタンスヒートパイプ

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2022534002A (ja) * 2019-05-22 2022-07-27 アンプリテュード 光線を制御するための光学部品マウント及び関連システム
JP7543316B2 (ja) 2019-05-22 2024-09-02 アンプリテュード 光線を制御するための光学部品マウント及び関連システム

Also Published As

Publication number Publication date
CN106062633A (zh) 2016-10-26
TW201533545A (zh) 2015-09-01
WO2015124471A1 (en) 2015-08-27
TWI663479B (zh) 2019-06-21
DE102014203144A1 (de) 2015-08-27
KR20160124102A (ko) 2016-10-26
US20160334719A1 (en) 2016-11-17

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