JP2017506684A5 - - Google Patents

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Publication number
JP2017506684A5
JP2017506684A5 JP2016551282A JP2016551282A JP2017506684A5 JP 2017506684 A5 JP2017506684 A5 JP 2017506684A5 JP 2016551282 A JP2016551282 A JP 2016551282A JP 2016551282 A JP2016551282 A JP 2016551282A JP 2017506684 A5 JP2017506684 A5 JP 2017506684A5
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JP
Japan
Prior art keywords
substrate
blend
copolymer
copolymers
block copolymer
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JP2016551282A
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English (en)
Japanese (ja)
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JP6411529B2 (ja
JP2017506684A (ja
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Priority claimed from FR1451062A external-priority patent/FR3017395B1/fr
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Publication of JP2017506684A publication Critical patent/JP2017506684A/ja
Publication of JP2017506684A5 publication Critical patent/JP2017506684A5/ja
Application granted granted Critical
Publication of JP6411529B2 publication Critical patent/JP6411529B2/ja
Expired - Fee Related legal-status Critical Current
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JP2016551282A 2014-02-11 2015-02-06 基材の表面エネルギーの制御のための方法 Expired - Fee Related JP6411529B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR1451062A FR3017395B1 (fr) 2014-02-11 2014-02-11 Procede de controle de l'energie de surface d'un substrat
FR1451062 2014-02-11
PCT/FR2015/050285 WO2015121568A1 (fr) 2014-02-11 2015-02-06 Procede de controle de l'energie de surface d'un substrat

Publications (3)

Publication Number Publication Date
JP2017506684A JP2017506684A (ja) 2017-03-09
JP2017506684A5 true JP2017506684A5 (https=) 2018-04-26
JP6411529B2 JP6411529B2 (ja) 2018-10-24

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ID=50829107

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016551282A Expired - Fee Related JP6411529B2 (ja) 2014-02-11 2015-02-06 基材の表面エネルギーの制御のための方法

Country Status (10)

Country Link
US (1) US20160369031A1 (https=)
EP (1) EP3105295B1 (https=)
JP (1) JP6411529B2 (https=)
KR (1) KR101876108B1 (https=)
CN (1) CN105980495B (https=)
ES (1) ES2731577T3 (https=)
FR (1) FR3017395B1 (https=)
SG (1) SG11201606659YA (https=)
TW (1) TWI596058B (https=)
WO (1) WO2015121568A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN120863178B (zh) * 2025-09-26 2025-12-05 绍兴金阳纺织有限公司 一种航空机舱用阻燃型多层复合面料及其制备方法

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2679237B1 (fr) 1991-07-19 1994-07-22 Atochem Systeme d'amorcage pour la polymerisation anionique de monomeres (meth) acryliques.
FR2735480B1 (fr) 1995-06-15 1997-07-18 Atochem Elf Sa Procede de polymerisation anionique en continu d'au moins un monomere (meth)acrylique pour l'obtention de polymeres a haut taux de solide
CA2245413C (en) * 1997-09-16 2001-09-18 Thomas & Betts International, Inc. Conductive elastomer for grafting to an elastic substrate
US6673161B2 (en) 2001-07-03 2004-01-06 Brooks Automation, Inc. Substrate handling end effector
US7446149B2 (en) * 2001-09-27 2008-11-04 Basf Corporation Fast drying clearcoat refinish composition
WO2006129800A1 (ja) * 2005-06-03 2006-12-07 Daikin Industries, Ltd. パターン形成用表面処理剤
JP4698347B2 (ja) * 2005-09-08 2011-06-08 富士フイルム株式会社 転写材料、それを用いたカラーフィルタの製造方法及びカラーフィルタ、ならびに液晶表示装置
JP5136999B2 (ja) * 2005-11-18 2013-02-06 国立大学法人京都大学 パターン基板の製造方法、パターン転写体、磁気記録用パターン媒体、及び高分子薄膜
DE112007000148T5 (de) * 2006-01-12 2008-11-20 3M Innovative Properties Co., St. Paul Licht kollimierender Film
US8647814B2 (en) * 2006-05-24 2014-02-11 Northwestern University Method of making nanopatterns and nanostructures and nanopatterned functional oxide materials
JP4673266B2 (ja) * 2006-08-03 2011-04-20 日本電信電話株式会社 パターン形成方法及びモールド
US8372295B2 (en) * 2007-04-20 2013-02-12 Micron Technology, Inc. Extensions of self-assembled structures to increased dimensions via a “bootstrap” self-templating method
US7763319B2 (en) * 2008-01-11 2010-07-27 International Business Machines Corporation Method of controlling orientation of domains in block copolymer films
US8426313B2 (en) * 2008-03-21 2013-04-23 Micron Technology, Inc. Thermal anneal of block copolymer films with top interface constrained to wet both blocks with equal preference
JP4654280B2 (ja) * 2008-08-28 2011-03-16 株式会社日立製作所 微細構造体の製造方法
US8362179B2 (en) * 2008-11-19 2013-01-29 Wisconsin Alumni Research Foundation Photopatternable imaging layers for controlling block copolymer microdomain orientation
EP2534195B1 (en) * 2010-02-12 2019-07-31 Jindal Films Europe Virton SPRL Coated polymeric film
TWI556958B (zh) * 2010-09-14 2016-11-11 東京應化工業股份有限公司 基質劑及含嵌段共聚物之層的圖型形成方法
US8697810B2 (en) * 2012-02-10 2014-04-15 Rohm And Haas Electronic Materials Llc Block copolymer and methods relating thereto
US8710150B2 (en) * 2012-02-10 2014-04-29 Rohm And Haas Electronic Materials Llc Blended block copolymer composition
US8513356B1 (en) * 2012-02-10 2013-08-20 Dow Global Technologies Llc Diblock copolymer blend composition
US9127113B2 (en) * 2012-05-16 2015-09-08 Rohm And Haas Electronic Materials Llc Polystyrene-polyacrylate block copolymers, methods of manufacture thereof and articles comprising the same
US10280328B2 (en) * 2012-12-18 2019-05-07 Nissan Chemical Industries, Ltd. Bottom layer film-forming composition of self-organizing film containing styrene structure
JP5640099B2 (ja) * 2013-01-07 2014-12-10 株式会社日立製作所 微細構造を有する高分子薄膜およびパターン基板の製造方法

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