SG11201606659YA - Method for controlling the surface energy of a substrate - Google Patents
Method for controlling the surface energy of a substrateInfo
- Publication number
- SG11201606659YA SG11201606659YA SG11201606659YA SG11201606659YA SG11201606659YA SG 11201606659Y A SG11201606659Y A SG 11201606659YA SG 11201606659Y A SG11201606659Y A SG 11201606659YA SG 11201606659Y A SG11201606659Y A SG 11201606659YA SG 11201606659Y A SG11201606659Y A SG 11201606659YA
- Authority
- SG
- Singapore
- Prior art keywords
- substrate
- controlling
- surface energy
- energy
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F297/00—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer
- C08F297/02—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type
- C08F297/026—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type polymerising acrylic acid, methacrylic acid or derivatives thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
- B81C1/00206—Processes for functionalising a surface, e.g. provide the surface with specific mechanical, chemical or biological properties
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/12—Chemical modification
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D153/00—Coating compositions based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C2201/00—Manufacture or treatment of microstructural devices or systems
- B81C2201/01—Manufacture or treatment of microstructural devices or systems in or on a substrate
- B81C2201/0101—Shaping material; Structuring the bulk substrate or layers on the substrate; Film patterning
- B81C2201/0147—Film patterning
- B81C2201/0149—Forming nanoscale microstructures using auto-arranging or self-assembling material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Nanotechnology (AREA)
- Wood Science & Technology (AREA)
- Molecular Biology (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Health & Medical Sciences (AREA)
- Polymers & Plastics (AREA)
- Medicinal Chemistry (AREA)
- Composite Materials (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Paints Or Removers (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Graft Or Block Polymers (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR1451062A FR3017395B1 (en) | 2014-02-11 | 2014-02-11 | METHOD FOR CONTROLLING THE SURFACE ENERGY OF A SUBSTRATE |
| PCT/FR2015/050285 WO2015121568A1 (en) | 2014-02-11 | 2015-02-06 | Method for controlling the surface energy of a substrate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG11201606659YA true SG11201606659YA (en) | 2016-09-29 |
Family
ID=50829107
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG11201606659YA SG11201606659YA (en) | 2014-02-11 | 2015-02-06 | Method for controlling the surface energy of a substrate |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US20160369031A1 (en) |
| EP (1) | EP3105295B1 (en) |
| JP (1) | JP6411529B2 (en) |
| KR (1) | KR101876108B1 (en) |
| CN (1) | CN105980495B (en) |
| ES (1) | ES2731577T3 (en) |
| FR (1) | FR3017395B1 (en) |
| SG (1) | SG11201606659YA (en) |
| TW (1) | TWI596058B (en) |
| WO (1) | WO2015121568A1 (en) |
Family Cites Families (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2679237B1 (en) | 1991-07-19 | 1994-07-22 | Atochem | PRIMING SYSTEM FOR THE ANIONIC POLYMERIZATION OF (METH) ACRYLIC MONOMERS. |
| FR2735480B1 (en) | 1995-06-15 | 1997-07-18 | Atochem Elf Sa | CONTINUOUS ANIONIC POLYMERIZATION PROCESS OF AT LEAST ONE (METH) ACRYLIC MONOMER FOR THE OBTAINING OF POLYMERS WITH A HIGH SOLID RATE |
| CA2245413C (en) * | 1997-09-16 | 2001-09-18 | Thomas & Betts International, Inc. | Conductive elastomer for grafting to an elastic substrate |
| US6673161B2 (en) | 2001-07-03 | 2004-01-06 | Brooks Automation, Inc. | Substrate handling end effector |
| US7446149B2 (en) * | 2001-09-27 | 2008-11-04 | Basf Corporation | Fast drying clearcoat refinish composition |
| WO2006129800A1 (en) * | 2005-06-03 | 2006-12-07 | Daikin Industries, Ltd. | Surface treating agent for pattern formation |
| JP4698347B2 (en) * | 2005-09-08 | 2011-06-08 | 富士フイルム株式会社 | Transfer material, color filter manufacturing method and color filter using the same, and liquid crystal display device |
| JP5136999B2 (en) * | 2005-11-18 | 2013-02-06 | 国立大学法人京都大学 | Pattern substrate manufacturing method, pattern transfer body, pattern medium for magnetic recording, and polymer thin film |
| DE112007000148T5 (en) * | 2006-01-12 | 2008-11-20 | 3M Innovative Properties Co., St. Paul | Light collimating film |
| US8647814B2 (en) * | 2006-05-24 | 2014-02-11 | Northwestern University | Method of making nanopatterns and nanostructures and nanopatterned functional oxide materials |
| JP4673266B2 (en) * | 2006-08-03 | 2011-04-20 | 日本電信電話株式会社 | Pattern forming method and mold |
| US8372295B2 (en) * | 2007-04-20 | 2013-02-12 | Micron Technology, Inc. | Extensions of self-assembled structures to increased dimensions via a “bootstrap” self-templating method |
| US7763319B2 (en) * | 2008-01-11 | 2010-07-27 | International Business Machines Corporation | Method of controlling orientation of domains in block copolymer films |
| US8426313B2 (en) * | 2008-03-21 | 2013-04-23 | Micron Technology, Inc. | Thermal anneal of block copolymer films with top interface constrained to wet both blocks with equal preference |
| JP4654280B2 (en) * | 2008-08-28 | 2011-03-16 | 株式会社日立製作所 | Manufacturing method of fine structure |
| US8362179B2 (en) * | 2008-11-19 | 2013-01-29 | Wisconsin Alumni Research Foundation | Photopatternable imaging layers for controlling block copolymer microdomain orientation |
| EP2534195B1 (en) * | 2010-02-12 | 2019-07-31 | Jindal Films Europe Virton SPRL | Coated polymeric film |
| TWI556958B (en) * | 2010-09-14 | 2016-11-11 | 東京應化工業股份有限公司 | Base material and method of forming pattern including block copolymer |
| US8710150B2 (en) * | 2012-02-10 | 2014-04-29 | Rohm And Haas Electronic Materials Llc | Blended block copolymer composition |
| US8697810B2 (en) * | 2012-02-10 | 2014-04-15 | Rohm And Haas Electronic Materials Llc | Block copolymer and methods relating thereto |
| US8513356B1 (en) * | 2012-02-10 | 2013-08-20 | Dow Global Technologies Llc | Diblock copolymer blend composition |
| US9127113B2 (en) * | 2012-05-16 | 2015-09-08 | Rohm And Haas Electronic Materials Llc | Polystyrene-polyacrylate block copolymers, methods of manufacture thereof and articles comprising the same |
| KR102126789B1 (en) * | 2012-12-18 | 2020-06-25 | 닛산 가가쿠 가부시키가이샤 | Bottom layer film-forming composition of self-organizing film containing styrene structure |
| JP5640099B2 (en) * | 2013-01-07 | 2014-12-10 | 株式会社日立製作所 | Production method of polymer thin film having fine structure and patterned substrate |
-
2014
- 2014-02-11 FR FR1451062A patent/FR3017395B1/en not_active Expired - Fee Related
-
2015
- 2015-02-06 ES ES15707705T patent/ES2731577T3/en active Active
- 2015-02-06 KR KR1020167024523A patent/KR101876108B1/en active IP Right Grant
- 2015-02-06 TW TW104104048A patent/TWI596058B/en active
- 2015-02-06 CN CN201580008266.3A patent/CN105980495B/en active Active
- 2015-02-06 SG SG11201606659YA patent/SG11201606659YA/en unknown
- 2015-02-06 US US15/117,972 patent/US20160369031A1/en not_active Abandoned
- 2015-02-06 JP JP2016551282A patent/JP6411529B2/en active Active
- 2015-02-06 WO PCT/FR2015/050285 patent/WO2015121568A1/en active Application Filing
- 2015-02-06 EP EP15707705.8A patent/EP3105295B1/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| TW201600452A (en) | 2016-01-01 |
| JP6411529B2 (en) | 2018-10-24 |
| FR3017395B1 (en) | 2017-11-03 |
| EP3105295B1 (en) | 2019-03-27 |
| JP2017506684A (en) | 2017-03-09 |
| KR101876108B1 (en) | 2018-07-06 |
| US20160369031A1 (en) | 2016-12-22 |
| FR3017395A1 (en) | 2015-08-14 |
| ES2731577T3 (en) | 2019-11-18 |
| CN105980495B (en) | 2018-12-25 |
| TWI596058B (en) | 2017-08-21 |
| KR20160119174A (en) | 2016-10-12 |
| CN105980495A (en) | 2016-09-28 |
| WO2015121568A1 (en) | 2015-08-20 |
| EP3105295A1 (en) | 2016-12-21 |
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