JP2017207755A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2017207755A5 JP2017207755A5 JP2017100801A JP2017100801A JP2017207755A5 JP 2017207755 A5 JP2017207755 A5 JP 2017207755A5 JP 2017100801 A JP2017100801 A JP 2017100801A JP 2017100801 A JP2017100801 A JP 2017100801A JP 2017207755 A5 JP2017207755 A5 JP 2017207755A5
- Authority
- JP
- Japan
- Prior art keywords
- irradiation
- spm
- detector
- collector
- chip
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005259 measurement Methods 0.000 claims description 33
- 239000000523 sample Substances 0.000 claims description 22
- 238000011084 recovery Methods 0.000 claims description 16
- 239000002245 particle Substances 0.000 claims description 14
- 230000005855 radiation Effects 0.000 claims description 12
- 238000001228 spectrum Methods 0.000 claims description 12
- 238000005286 illumination Methods 0.000 claims description 10
- 238000004891 communication Methods 0.000 claims description 4
- 230000003287 optical effect Effects 0.000 claims description 4
- 239000000758 substrate Substances 0.000 claims description 4
- 239000000356 contaminant Substances 0.000 claims description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000010276 construction Methods 0.000 description 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US15/160,263 | 2016-05-20 | ||
| US15/160,263 US10384238B2 (en) | 2007-09-17 | 2016-05-20 | Debris removal in high aspect structures |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2017207755A JP2017207755A (ja) | 2017-11-24 |
| JP2017207755A5 true JP2017207755A5 (OSRAM) | 2020-08-13 |
| JP7042039B2 JP7042039B2 (ja) | 2022-03-25 |
Family
ID=58772394
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017100801A Active JP7042039B2 (ja) | 2016-05-20 | 2017-05-22 | 高アスペクト構造からのデブリ除去 |
Country Status (4)
| Country | Link |
|---|---|
| EP (1) | EP3251760B1 (OSRAM) |
| JP (1) | JP7042039B2 (OSRAM) |
| KR (1) | KR102433627B1 (OSRAM) |
| TW (3) | TWI892579B (OSRAM) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP3964841A1 (de) | 2020-09-02 | 2022-03-09 | Siltronic AG | Messapparatur und verfahren zum untersuchen eines bereichs einer oberfläche eines substrats mit hilfe einer kraft-messsonde |
| DE102021201669B4 (de) * | 2021-02-22 | 2023-08-17 | Carl Zeiss Smt Gmbh | Verfahren und vorrichtung zum bearbeiten einer probe |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05164512A (ja) * | 1991-12-13 | 1993-06-29 | Toshiba Corp | 表面測定装置 |
| TW285721B (OSRAM) * | 1994-12-27 | 1996-09-11 | Siemens Ag | |
| JP2005084582A (ja) * | 2003-09-11 | 2005-03-31 | Sii Nanotechnology Inc | フォトマスクのパーティクル除去方法 |
| ATE478984T1 (de) | 2004-09-03 | 2010-09-15 | Honeywell Int Inc | Polyethylengarne |
| JP2006339472A (ja) * | 2005-06-03 | 2006-12-14 | Matsushita Electric Ind Co Ltd | プローブカード触針のクリーニング装置およびクリーニング方法 |
| JP4820740B2 (ja) | 2006-12-08 | 2011-11-24 | エスアイアイ・ナノテクノロジー株式会社 | 加工用ダイヤモンド探針の加工方法 |
| JP2008209544A (ja) * | 2007-02-26 | 2008-09-11 | Sii Nanotechnology Inc | フォトマスク上の異物の組成分析方法 |
| JP2009006378A (ja) * | 2007-06-29 | 2009-01-15 | Sii Nanotechnology Inc | 微細加工方法及び微細加工装置 |
| US8287653B2 (en) | 2007-09-17 | 2012-10-16 | Rave, Llc | Debris removal in high aspect structures |
| JP5031509B2 (ja) | 2007-10-23 | 2012-09-19 | キヤノン株式会社 | 近接場光散乱用プローブおよびその製造方法 |
| JP2009265176A (ja) * | 2008-04-22 | 2009-11-12 | Toshiba Corp | 異物除去方法、異物除去装置および半導体装置の作製方法 |
| JP2011133296A (ja) * | 2009-12-24 | 2011-07-07 | Yamaha Corp | クリーニング装置、及び、プローブ針のクリーニング方法 |
| CN102798735B (zh) | 2012-08-14 | 2015-03-04 | 厦门大学 | 针尖增强暗场显微镜、电化学测试装置和调平系统 |
| JP6215677B2 (ja) | 2013-12-05 | 2017-10-18 | 株式会社日立ハイテクマニファクチャ＆サービス | 顕微ラマン分光装置および顕微ラマン分光システム |
-
2017
- 2017-05-02 TW TW113113483A patent/TWI892579B/zh active
- 2017-05-02 TW TW106114454A patent/TWI787181B/zh active
- 2017-05-02 TW TW111147463A patent/TWI841110B/zh active
- 2017-05-18 KR KR1020170061709A patent/KR102433627B1/ko active Active
- 2017-05-22 JP JP2017100801A patent/JP7042039B2/ja active Active
- 2017-05-22 EP EP17172132.7A patent/EP3251760B1/en active Active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP6018645B2 (ja) | 測定装置 | |
| TW201809656A (zh) | 判定重疊誤差之方法、用以製造多層半導體裝置之方法、原子力顯微鏡裝置、微影系統及半導體裝置 | |
| US7928409B2 (en) | Real-time, active picometer-scale alignment, stabilization, and registration in one or more dimensions | |
| JP2017207755A5 (OSRAM) | ||
| JP6949573B2 (ja) | 近接場走査プローブ顕微鏡、走査プローブ顕微鏡用プローブおよび試料観察方法 | |
| JPWO2015033681A1 (ja) | 走査プローブ顕微鏡およびこれを用いた試料の観察方法 | |
| KR102280558B1 (ko) | 라만-원자간력 현미경 | |
| US9063168B2 (en) | Scanning probe microscope and measurement method using same | |
| CN103529643A (zh) | 一种纳米图形化系统及其光响应特性检测装置 | |
| KR100859819B1 (ko) | 극초단 펄스 레이저 가공 장치 | |
| CN110118725B (zh) | 光电流扫描系统 | |
| CN117434303A (zh) | 基于微悬臂-微球探针的超分辨拉曼/荧光/光电流二维扫描成像联合表征系统 | |
| CN104181110A (zh) | 一种基于显微镜的激光双调制反射光谱检测系统 | |
| US10852641B2 (en) | Thermal nanolithography method and system | |
| CN202710465U (zh) | 一种纳米图形化系统及其光响应特性检测装置 | |
| JP6669759B2 (ja) | ラマン散乱光測定装置 | |
| CN106546324A (zh) | 测量任意偏振态小光束内部三维光强分布的方法 | |
| JP4929106B2 (ja) | 近接場ファイバープローブ、及び近接場光学顕微鏡 | |
| JP3866225B2 (ja) | 表面微小領域原子発光分析装置 | |
| CN112611890B (zh) | Stm针尖增强光信号空间成像装置及其成像方法 | |
| US20100154084A1 (en) | Method and apparatus for performing apertureless near-field scanning optical microscopy | |
| JP2014006314A (ja) | 異物除去装置及び異物除去方法 | |
| Dal Savio et al. | A compact sensor head for simultaneous scanning force and near-field optical microscopy | |
| CN103033131B (zh) | 半导体微台面列阵的测量装置和方法 | |
| KR102256800B1 (ko) | 라만-원자간력 현미경을 위한 구동 구조체 및 상기 구동 구조체를 제어하는 방법 |