JP2017160105A5 - - Google Patents

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Publication number
JP2017160105A5
JP2017160105A5 JP2016082691A JP2016082691A JP2017160105A5 JP 2017160105 A5 JP2017160105 A5 JP 2017160105A5 JP 2016082691 A JP2016082691 A JP 2016082691A JP 2016082691 A JP2016082691 A JP 2016082691A JP 2017160105 A5 JP2017160105 A5 JP 2017160105A5
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JP
Japan
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particle size
manufactured
raw material
material powder
average particle
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JP2016082691A
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English (en)
Japanese (ja)
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JP6677058B2 (ja
JP2017160105A (ja
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Priority to KR1020187024734A priority Critical patent/KR20180116293A/ko
Priority to PCT/JP2016/086172 priority patent/WO2017149882A1/ja
Priority to CN201680083127.1A priority patent/CN108698937B/zh
Priority to TW105141143A priority patent/TWI748971B/zh
Publication of JP2017160105A publication Critical patent/JP2017160105A/ja
Publication of JP2017160105A5 publication Critical patent/JP2017160105A5/ja
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Publication of JP6677058B2 publication Critical patent/JP6677058B2/ja
Expired - Fee Related legal-status Critical Current
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JP2016082691A 2016-03-04 2016-04-18 Sn−Zn−O系酸化物焼結体とその製造方法 Expired - Fee Related JP6677058B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
KR1020187024734A KR20180116293A (ko) 2016-03-04 2016-12-06 Sn-Zn-O 계 산화물 소결체와 그 제조 방법
PCT/JP2016/086172 WO2017149882A1 (ja) 2016-03-04 2016-12-06 Sn-Zn-O系酸化物焼結体とその製造方法
CN201680083127.1A CN108698937B (zh) 2016-03-04 2016-12-06 Sn-Zn-O系氧化物烧结体及其制造方法
TW105141143A TWI748971B (zh) 2016-03-04 2016-12-13 Sn-Zn-O系氧化物燒結體及其製造方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016042332 2016-03-04
JP2016042332 2016-03-04

Publications (3)

Publication Number Publication Date
JP2017160105A JP2017160105A (ja) 2017-09-14
JP2017160105A5 true JP2017160105A5 (OSRAM) 2018-10-04
JP6677058B2 JP6677058B2 (ja) 2020-04-08

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ID=59853860

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016082691A Expired - Fee Related JP6677058B2 (ja) 2016-03-04 2016-04-18 Sn−Zn−O系酸化物焼結体とその製造方法

Country Status (3)

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JP (1) JP6677058B2 (OSRAM)
KR (1) KR20180116293A (OSRAM)
CN (1) CN108698937B (OSRAM)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2019163494A (ja) * 2018-03-19 2019-09-26 住友金属鉱山株式会社 透明酸化物膜、透明酸化物膜の製造方法、酸化物焼結体及び透明樹脂基板
JP2021021122A (ja) * 2019-07-30 2021-02-18 住友金属鉱山株式会社 蒸着用タブレットと酸化物透明導電膜および酸化錫系焼結体の製造方法
CN115745573A (zh) * 2022-10-31 2023-03-07 芜湖映日科技股份有限公司 一种细晶izo靶材制备方法
CN118724584B (zh) * 2024-08-06 2025-04-25 深圳众诚达应用材料股份有限公司 一种低电阻的氧化锡基靶材及其制备方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05155651A (ja) * 1990-12-14 1993-06-22 Hitachi Metals Ltd 酸化インジウム系焼結体および酸化物焼結体の製造方法
KR101335794B1 (ko) * 2005-01-12 2013-12-02 이데미쓰 고산 가부시키가이샤 TFT 기판 및 그의 제조 방법, 및 Al배선을 구비한투명 도전막 적층 기판 및 그의 제조 방법, 및 Al배선을구비한 투명 도전막 적층 회로 기판 및 그의 제조 방법, 및산화물 투명 도전막 재료
JP4552950B2 (ja) * 2006-03-15 2010-09-29 住友金属鉱山株式会社 ターゲット用酸化物焼結体、その製造方法、それを用いた透明導電膜の製造方法、及び得られる透明導電膜
JP4730204B2 (ja) * 2006-05-24 2011-07-20 住友金属鉱山株式会社 酸化物焼結体ターゲット、及びそれを用いた酸化物透明導電膜の製造方法
JP2008192604A (ja) * 2007-01-12 2008-08-21 Sumitomo Chemical Co Ltd 透明導電膜用材料
JP4745319B2 (ja) * 2007-11-15 2011-08-10 Jx日鉱日石金属株式会社 光情報記録媒体
KR20130080063A (ko) * 2008-06-06 2013-07-11 이데미쓰 고산 가부시키가이샤 산화물 박막용 스퍼터링 타겟 및 그의 제조 방법
KR101671543B1 (ko) * 2008-11-20 2016-11-01 이데미쓰 고산 가부시키가이샤 ZnO-SnO₂-In₂O₃계 산화물 소결체 및 비정질 투명 도전막
EP2447233A1 (en) * 2010-10-27 2012-05-02 Corning Incorporated Tin oxide-based thermoelectric materials
JP2012180248A (ja) * 2011-03-02 2012-09-20 Kobelco Kaken:Kk 酸化物焼結体およびスパッタリングターゲット
JP5686067B2 (ja) * 2011-08-05 2015-03-18 住友金属鉱山株式会社 Zn−Sn−O系酸化物焼結体とその製造方法
JP6278229B2 (ja) * 2012-08-10 2018-02-14 三菱マテリアル株式会社 透明酸化物膜形成用スパッタリングターゲット及びその製造方法
CN105121694B (zh) * 2013-04-12 2018-07-06 日立金属株式会社 氧化物半导体靶材、氧化物半导体膜及其制造方法、以及薄膜晶体管
CN104529426B (zh) * 2014-12-19 2016-08-24 江门安磁电子有限公司 用于120~160℃的高Bs低损耗锰锌铁氧体材料及其制造方法
TWM512182U (zh) * 2015-01-21 2015-11-11 Univ Tajen 醫療照護系統及其醫療教學裝置

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