JP2017139074A5 - - Google Patents
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- Publication number
- JP2017139074A5 JP2017139074A5 JP2016017577A JP2016017577A JP2017139074A5 JP 2017139074 A5 JP2017139074 A5 JP 2017139074A5 JP 2016017577 A JP2016017577 A JP 2016017577A JP 2016017577 A JP2016017577 A JP 2016017577A JP 2017139074 A5 JP2017139074 A5 JP 2017139074A5
- Authority
- JP
- Japan
- Prior art keywords
- space
- substrate
- ion implantation
- implantation apparatus
- ion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
- 239000000758 substrate Substances 0.000 claims 123
- 150000002500 ions Chemical class 0.000 claims 76
- 238000005468 ion implantation Methods 0.000 claims 60
- 230000001133 acceleration Effects 0.000 claims 34
- 230000035515 penetration Effects 0.000 claims 30
- 230000005684 electric field Effects 0.000 claims 20
- 230000000149 penetrating effect Effects 0.000 claims 19
- 238000005530 etching Methods 0.000 claims 12
- 238000007747 plating Methods 0.000 claims 12
- 239000004020 conductor Substances 0.000 claims 8
- 239000000243 solution Substances 0.000 claims 7
- 238000005498 polishing Methods 0.000 claims 6
- 238000000926 separation method Methods 0.000 claims 6
- 230000014759 maintenance of location Effects 0.000 claims 5
- 238000004519 manufacturing process Methods 0.000 claims 5
- 239000007788 liquid Substances 0.000 claims 4
- 239000000463 material Substances 0.000 claims 3
- 238000003825 pressing Methods 0.000 claims 3
- 230000015572 biosynthetic process Effects 0.000 claims 2
- 238000000034 method Methods 0.000 claims 2
- 238000005520 cutting process Methods 0.000 claims 1
- 238000000151 deposition Methods 0.000 claims 1
- 230000008021 deposition Effects 0.000 claims 1
- 238000001312 dry etching Methods 0.000 claims 1
- 238000002347 injection Methods 0.000 claims 1
- 239000007924 injection Substances 0.000 claims 1
- 230000001678 irradiating effect Effects 0.000 claims 1
- 239000012528 membrane Substances 0.000 claims 1
- 239000012768 molten material Substances 0.000 claims 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 claims 1
- 239000000843 powder Substances 0.000 claims 1
- 238000005245 sintering Methods 0.000 claims 1
- 238000004544 sputter deposition Methods 0.000 claims 1
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016017577A JP6708422B2 (ja) | 2016-02-02 | 2016-02-02 | 超小型加速器および超小型質量分析装置およびイオン注入装置 |
| PCT/JP2017/003678 WO2017135332A1 (ja) | 2016-02-02 | 2017-02-02 | 超小型加速器および超小型質量分析装置および超小型イオン注入装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016017577A JP6708422B2 (ja) | 2016-02-02 | 2016-02-02 | 超小型加速器および超小型質量分析装置およびイオン注入装置 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2020070095A Division JP7018090B2 (ja) | 2020-04-08 | 2020-04-08 | 超小型加速器および超小型質量分析装置およびイオン注入装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2017139074A JP2017139074A (ja) | 2017-08-10 |
| JP2017139074A5 true JP2017139074A5 (enExample) | 2019-08-22 |
| JP6708422B2 JP6708422B2 (ja) | 2020-06-10 |
Family
ID=59499625
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016017577A Active JP6708422B2 (ja) | 2016-02-02 | 2016-02-02 | 超小型加速器および超小型質量分析装置およびイオン注入装置 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP6708422B2 (enExample) |
| WO (1) | WO2017135332A1 (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7445240B2 (ja) * | 2018-06-14 | 2024-03-07 | 株式会社アスコン | サービス提供システム及びユーザ側設備 |
| JP7225010B2 (ja) | 2019-04-10 | 2023-02-20 | 株式会社東芝 | イオン生成装置、方法及びプログラム |
| JP2024021159A (ja) * | 2022-08-03 | 2024-02-16 | 三菱重工機械システム株式会社 | 加速空洞 |
| CN116170933B (zh) * | 2023-01-09 | 2023-09-05 | 中国科学院近代物理研究所 | 用于应用型等时性回旋加速器的磁场装置 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0479141A (ja) * | 1990-07-20 | 1992-03-12 | Sharp Corp | イオン注入装置 |
| JP2803563B2 (ja) * | 1994-03-30 | 1998-09-24 | 日本電気株式会社 | 微小真空紫外分光装置 |
| JP4754684B2 (ja) * | 2000-12-05 | 2011-08-24 | 株式会社アルバック | イオン注入装置 |
| JP2005294090A (ja) * | 2004-04-01 | 2005-10-20 | Nissin Ion Equipment Co Ltd | イオン注入装置 |
| JP2015527692A (ja) * | 2012-06-12 | 2015-09-17 | アクセリス テクノロジーズ， インコーポレイテッド | ワークピースキャリア |
| EP2921285B1 (en) * | 2014-03-21 | 2018-05-02 | British Telecommunications public limited company | Printed apparatus comprising a 3D printed thermionic device and method and apparatus for its manufacture |
| JP6624482B2 (ja) * | 2014-07-29 | 2019-12-25 | 俊 保坂 | 超小型加速器および超小型質量分析装置 |
-
2016
- 2016-02-02 JP JP2016017577A patent/JP6708422B2/ja active Active
-
2017
- 2017-02-02 WO PCT/JP2017/003678 patent/WO2017135332A1/ja not_active Ceased
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