JP6708422B2 - 超小型加速器および超小型質量分析装置およびイオン注入装置 - Google Patents

超小型加速器および超小型質量分析装置およびイオン注入装置 Download PDF

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JP6708422B2
JP6708422B2 JP2016017577A JP2016017577A JP6708422B2 JP 6708422 B2 JP6708422 B2 JP 6708422B2 JP 2016017577 A JP2016017577 A JP 2016017577A JP 2016017577 A JP2016017577 A JP 2016017577A JP 6708422 B2 JP6708422 B2 JP 6708422B2
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coil
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JP2017139074A (ja
JP2017139074A5 (enExample
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俊 保坂
俊 保坂
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Priority to PCT/JP2017/003678 priority patent/WO2017135332A1/ja
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H13/00—Magnetic resonance accelerators; Cyclotrons
    • H05H13/04—Synchrotrons
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H9/00—Linear accelerators

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Particle Accelerators (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
  • Electron Tubes For Measurement (AREA)
JP2016017577A 2016-02-02 2016-02-02 超小型加速器および超小型質量分析装置およびイオン注入装置 Active JP6708422B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2016017577A JP6708422B2 (ja) 2016-02-02 2016-02-02 超小型加速器および超小型質量分析装置およびイオン注入装置
PCT/JP2017/003678 WO2017135332A1 (ja) 2016-02-02 2017-02-02 超小型加速器および超小型質量分析装置および超小型イオン注入装置

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Application Number Priority Date Filing Date Title
JP2016017577A JP6708422B2 (ja) 2016-02-02 2016-02-02 超小型加速器および超小型質量分析装置およびイオン注入装置

Related Child Applications (1)

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JP2020070095A Division JP7018090B2 (ja) 2020-04-08 2020-04-08 超小型加速器および超小型質量分析装置およびイオン注入装置

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JP2017139074A JP2017139074A (ja) 2017-08-10
JP2017139074A5 JP2017139074A5 (enExample) 2019-08-22
JP6708422B2 true JP6708422B2 (ja) 2020-06-10

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JP (1) JP6708422B2 (enExample)
WO (1) WO2017135332A1 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7445240B2 (ja) * 2018-06-14 2024-03-07 株式会社アスコン サービス提供システム及びユーザ側設備
JP7225010B2 (ja) 2019-04-10 2023-02-20 株式会社東芝 イオン生成装置、方法及びプログラム
JP2024021159A (ja) * 2022-08-03 2024-02-16 三菱重工機械システム株式会社 加速空洞
CN116170933B (zh) * 2023-01-09 2023-09-05 中国科学院近代物理研究所 用于应用型等时性回旋加速器的磁场装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0479141A (ja) * 1990-07-20 1992-03-12 Sharp Corp イオン注入装置
JP2803563B2 (ja) * 1994-03-30 1998-09-24 日本電気株式会社 微小真空紫外分光装置
JP4754684B2 (ja) * 2000-12-05 2011-08-24 株式会社アルバック イオン注入装置
JP2005294090A (ja) * 2004-04-01 2005-10-20 Nissin Ion Equipment Co Ltd イオン注入装置
JP2015527692A (ja) * 2012-06-12 2015-09-17 アクセリス テクノロジーズ， インコーポレイテッド ワークピースキャリア
EP2921285B1 (en) * 2014-03-21 2018-05-02 British Telecommunications public limited company Printed apparatus comprising a 3D printed thermionic device and method and apparatus for its manufacture
JP6624482B2 (ja) * 2014-07-29 2019-12-25 俊 保坂 超小型加速器および超小型質量分析装置

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JP2017139074A (ja) 2017-08-10
WO2017135332A1 (ja) 2017-08-10

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