JP2017110293A - カーボン膜の成膜方法および成膜装置 - Google Patents

カーボン膜の成膜方法および成膜装置 Download PDF

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Publication number
JP2017110293A
JP2017110293A JP2016219861A JP2016219861A JP2017110293A JP 2017110293 A JP2017110293 A JP 2017110293A JP 2016219861 A JP2016219861 A JP 2016219861A JP 2016219861 A JP2016219861 A JP 2016219861A JP 2017110293 A JP2017110293 A JP 2017110293A
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Japan
Prior art keywords
carbon film
film forming
gas
etching
carbon
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Pending
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JP2016219861A
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Japanese (ja)
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JP2017110293A5 (enExample
Inventor
昌幸 北村
Masayuki Kitamura
昌幸 北村
清水　亮
Akira Shimizu
亮 清水
要介 渡邉
Yosuke Watanabe
要介 渡邉
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Tokyo Electron Ltd
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Tokyo Electron Ltd
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Priority to US15/377,141 priority Critical patent/US20170170065A1/en
Publication of JP2017110293A publication Critical patent/JP2017110293A/ja
Publication of JP2017110293A5 publication Critical patent/JP2017110293A5/ja
Pending legal-status Critical Current

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  • Chemical Vapour Deposition (AREA)
  • Drying Of Semiconductors (AREA)
  • Formation Of Insulating Films (AREA)
JP2016219861A 2015-12-15 2016-11-10 カーボン膜の成膜方法および成膜装置 Pending JP2017110293A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US15/377,141 US20170170065A1 (en) 2015-12-15 2016-12-13 Carbon film forming method, carbon film forming apparatus, and storage medium

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2015244234 2015-12-15
JP2015244234 2015-12-15

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JP2017110293A true JP2017110293A (ja) 2017-06-22
JP2017110293A5 JP2017110293A5 (enExample) 2019-07-11

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JP2016219861A Pending JP2017110293A (ja) 2015-12-15 2016-11-10 カーボン膜の成膜方法および成膜装置

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2021504936A (ja) * 2017-11-27 2021-02-15 インターナショナル・ビジネス・マシーンズ・コーポレーションＩｎｔｅｒｎａｔｉｏｎａｌ Ｂｕｓｉｎｅｓｓ Ｍａｃｈｉｎｅｓ Ｃｏｒｐｏｒａｔｉｏｎ 超電導部分ｔｓｖを用いたトランスモン・キュービット用の後面結合
CN114855150A (zh) * 2021-02-04 2022-08-05 东京毅力科创株式会社 碳膜的成膜方法和成膜装置
WO2022185916A1 (ja) * 2021-03-02 2022-09-09 東京エレクトロン株式会社 成膜方法、処理装置及び処理システム

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014033186A (ja) * 2012-07-09 2014-02-20 Tokyo Electron Ltd カーボン膜の成膜方法および成膜装置
US20140094035A1 (en) * 2012-05-18 2014-04-03 Novellus Systems, Inc. Carbon deposition-etch-ash gap fill process

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20140094035A1 (en) * 2012-05-18 2014-04-03 Novellus Systems, Inc. Carbon deposition-etch-ash gap fill process
JP2014033186A (ja) * 2012-07-09 2014-02-20 Tokyo Electron Ltd カーボン膜の成膜方法および成膜装置

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2021504936A (ja) * 2017-11-27 2021-02-15 インターナショナル・ビジネス・マシーンズ・コーポレーションＩｎｔｅｒｎａｔｉｏｎａｌ Ｂｕｓｉｎｅｓｓ Ｍａｃｈｉｎｅｓ Ｃｏｒｐｏｒａｔｉｏｎ 超電導部分ｔｓｖを用いたトランスモン・キュービット用の後面結合
JP7212439B2 (ja) 2017-11-27 2023-01-25 インターナショナル・ビジネス・マシーンズ・コーポレーション 超電導部分ｔｓｖを用いたトランスモン・キュービット用の後面結合
CN114855150A (zh) * 2021-02-04 2022-08-05 东京毅力科创株式会社 碳膜的成膜方法和成膜装置
WO2022185916A1 (ja) * 2021-03-02 2022-09-09 東京エレクトロン株式会社 成膜方法、処理装置及び処理システム
JP2022133762A (ja) * 2021-03-02 2022-09-14 東京エレクトロン株式会社 成膜方法、処理装置及び処理システム
JP7662285B2 (ja) 2021-03-02 2025-04-15 東京エレクトロン株式会社 成膜方法、処理装置及び処理システム

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