JP2017066147A5 - - Google Patents
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- JP2017066147A5 JP2017066147A5 JP2016217206A JP2016217206A JP2017066147A5 JP 2017066147 A5 JP2017066147 A5 JP 2017066147A5 JP 2016217206 A JP2016217206 A JP 2016217206A JP 2016217206 A JP2016217206 A JP 2016217206A JP 2017066147 A5 JP2017066147 A5 JP 2017066147A5
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- 238000000034 method Methods 0.000 claims 11
- 150000001875 compounds Chemical class 0.000 claims 10
- 125000000217 alkyl group Chemical group 0.000 claims 6
- 125000003277 amino group Chemical group 0.000 claims 6
- 125000004122 cyclic group Chemical group 0.000 claims 6
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims 4
- 239000003054 catalyst Substances 0.000 claims 4
- 150000004820 halides Chemical class 0.000 claims 4
- 150000002466 imines Chemical class 0.000 claims 4
- 125000003342 alkenyl group Chemical group 0.000 claims 3
- DSWDPPJBJCXDCZ-UHFFFAOYSA-N ctk0h9754 Chemical class N[SiH2][SiH3] DSWDPPJBJCXDCZ-UHFFFAOYSA-N 0.000 claims 3
- 125000006165 cyclic alkyl group Chemical group 0.000 claims 3
- 125000000623 heterocyclic group Chemical group 0.000 claims 3
- 229910052739 hydrogen Inorganic materials 0.000 claims 3
- 239000001257 hydrogen Substances 0.000 claims 3
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 claims 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 2
- 150000002431 hydrogen Chemical class 0.000 claims 2
- 238000004519 manufacturing process Methods 0.000 claims 2
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical class [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 claims 2
- 229910052710 silicon Inorganic materials 0.000 claims 2
- 239000010703 silicon Substances 0.000 claims 2
- NHBMXLXMVPLQAX-UHFFFAOYSA-N 1,3-disiletane Chemical compound C1[SiH2]C[SiH2]1 NHBMXLXMVPLQAX-UHFFFAOYSA-N 0.000 claims 1
- SBWCARQXLPGQNH-UHFFFAOYSA-N 1-methylsilolane Chemical compound C[SiH]1CCCC1 SBWCARQXLPGQNH-UHFFFAOYSA-N 0.000 claims 1
- IVSPVXKJEGPQJP-UHFFFAOYSA-N 2-silylethylsilane Chemical compound [SiH3]CC[SiH3] IVSPVXKJEGPQJP-UHFFFAOYSA-N 0.000 claims 1
- PRKHVWLTKHOQCJ-UHFFFAOYSA-N C(C)N(C1CCCC1)[SiH2][SiH3] Chemical compound C(C)N(C1CCCC1)[SiH2][SiH3] PRKHVWLTKHOQCJ-UHFFFAOYSA-N 0.000 claims 1
- HGKWCIAZHDFDJN-UHFFFAOYSA-N C1(CCCC1)N(C(C)C)[SiH3] Chemical compound C1(CCCC1)N(C(C)C)[SiH3] HGKWCIAZHDFDJN-UHFFFAOYSA-N 0.000 claims 1
- KTRLOZVAGCGQMN-UHFFFAOYSA-N CC(C)N([SiH3])C1CCCCC1 Chemical compound CC(C)N([SiH3])C1CCCCC1 KTRLOZVAGCGQMN-UHFFFAOYSA-N 0.000 claims 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 1
- NBVCUZXQYLDNFW-UHFFFAOYSA-N N,N-di(propan-2-yl)-1,3-disiletan-1-amine Chemical compound C(C)(C)N(C(C)C)[SiH]1C[SiH2]C1 NBVCUZXQYLDNFW-UHFFFAOYSA-N 0.000 claims 1
- FIWLQVUXWKYFDB-UHFFFAOYSA-N N,N-di(propan-2-yl)silolan-1-amine Chemical compound C(C)(C)N(C(C)C)[SiH]1CCCC1 FIWLQVUXWKYFDB-UHFFFAOYSA-N 0.000 claims 1
- QPJXCJGTBYLYKH-UHFFFAOYSA-N N-(disilanyl)-N-propan-2-ylbutan-2-amine Chemical compound C(C)(CC)N(C(C)C)[SiH2][SiH3] QPJXCJGTBYLYKH-UHFFFAOYSA-N 0.000 claims 1
- BNIKMUKLTXHLSD-UHFFFAOYSA-N N-(disilanyl)-N-propan-2-ylcyclohexanamine Chemical compound CC(C)N([SiH2][SiH3])C1CCCCC1 BNIKMUKLTXHLSD-UHFFFAOYSA-N 0.000 claims 1
- YINSAFBGXKWFHX-UHFFFAOYSA-N N-(disilanyl)-N-propan-2-ylcyclopentanamine Chemical compound C1(CCCC1)N(C(C)C)[SiH2][SiH3] YINSAFBGXKWFHX-UHFFFAOYSA-N 0.000 claims 1
- GNZBDLMUHMACNZ-UHFFFAOYSA-N N-(disilanyl)-N-propan-2-ylpropan-2-amine Chemical compound CC(C)N([SiH2][SiH3])C(C)C GNZBDLMUHMACNZ-UHFFFAOYSA-N 0.000 claims 1
- ANSYKGYLJJTCPH-UHFFFAOYSA-N N-butan-2-yl-N-(disilanyl)butan-2-amine Chemical compound CCC(C)N([SiH2][SiH3])C(C)CC ANSYKGYLJJTCPH-UHFFFAOYSA-N 0.000 claims 1
- IFEIERILPBNIEU-UHFFFAOYSA-N N-butan-2-yl-N-(disilanyl)cyclopentanamine Chemical compound C(C)(CC)N(C1CCCC1)[SiH2][SiH3] IFEIERILPBNIEU-UHFFFAOYSA-N 0.000 claims 1
- SFLARCZJKUXPCE-UHFFFAOYSA-N N-butan-2-yl-N-silylbutan-2-amine Chemical compound CCC(C)N([SiH3])C(C)CC SFLARCZJKUXPCE-UHFFFAOYSA-N 0.000 claims 1
- FZKDGFOWWRZLMM-UHFFFAOYSA-N N-ethyl-N-phenylsilylethanamine Chemical compound CCN(CC)[SiH2]c1ccccc1 FZKDGFOWWRZLMM-UHFFFAOYSA-N 0.000 claims 1
- XLQBVGUBXYNRRJ-UHFFFAOYSA-N N-ethyl-N-silylcyclohexanamine Chemical compound CCN([SiH3])C1CCCCC1 XLQBVGUBXYNRRJ-UHFFFAOYSA-N 0.000 claims 1
- OQLNRLSREPYVEN-UHFFFAOYSA-N N-methyl-N-silylcyclohexanamine Chemical compound CN([SiH3])C1CCCCC1 OQLNRLSREPYVEN-UHFFFAOYSA-N 0.000 claims 1
- LNWZBVQRKZMDCI-UHFFFAOYSA-N N-methyl-N-silylcyclopentanamine Chemical compound CN(C1CCCC1)[SiH3] LNWZBVQRKZMDCI-UHFFFAOYSA-N 0.000 claims 1
- FFXMRUCLGCBMAR-UHFFFAOYSA-N N-propan-2-yl-N-(1-silylethylsilyl)propan-2-amine Chemical compound CC([SiH3])[SiH2]N(C(C)C)C(C)C FFXMRUCLGCBMAR-UHFFFAOYSA-N 0.000 claims 1
- KAXQKXRGDGLZNM-UHFFFAOYSA-N N-propan-2-yl-N-(2-silylethylsilyl)propan-2-amine Chemical compound CC(C)N([SiH2]CC[SiH3])C(C)C KAXQKXRGDGLZNM-UHFFFAOYSA-N 0.000 claims 1
- NEDNVOFYWKZLDM-UHFFFAOYSA-N N-propan-2-yl-N-(silylmethyl)butan-2-amine Chemical compound C(C)(CC)N(C(C)C)C[SiH3] NEDNVOFYWKZLDM-UHFFFAOYSA-N 0.000 claims 1
- JSECHSBXELQIQB-UHFFFAOYSA-N N-propan-2-yl-N-(silylmethyl)cyclohexanamine Chemical compound C1(CCCCC1)N(C(C)C)C[SiH3] JSECHSBXELQIQB-UHFFFAOYSA-N 0.000 claims 1
- IAQJQGCKDFCPCS-UHFFFAOYSA-N N-propan-2-yl-N-(silylmethyl)propan-2-amine Chemical compound C(C)(C)N(C(C)C)C[SiH3] IAQJQGCKDFCPCS-UHFFFAOYSA-N 0.000 claims 1
- YVECFKLXGMLZLK-UHFFFAOYSA-N N-propan-2-yl-N-(silylmethylsilyl)propan-2-amine Chemical compound CC(C)N([SiH2]C[SiH3])C(C)C YVECFKLXGMLZLK-UHFFFAOYSA-N 0.000 claims 1
- NITKIRHZVIOUQR-UHFFFAOYSA-N N-propan-2-yl-N-silylbutan-2-amine Chemical compound C(C)(CC)N(C(C)C)[SiH3] NITKIRHZVIOUQR-UHFFFAOYSA-N 0.000 claims 1
- BIVNKSDKIFWKFA-UHFFFAOYSA-N N-propan-2-yl-N-silylpropan-2-amine Chemical compound CC(C)N([SiH3])C(C)C BIVNKSDKIFWKFA-UHFFFAOYSA-N 0.000 claims 1
- GRBZAIDSFBMSFV-UHFFFAOYSA-N [SiH3][SiH2]N(C)C1CCCCC1 Chemical compound [SiH3][SiH2]N(C)C1CCCCC1 GRBZAIDSFBMSFV-UHFFFAOYSA-N 0.000 claims 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 claims 1
- 150000001342 alkaline earth metals Chemical class 0.000 claims 1
- 125000003118 aryl group Chemical group 0.000 claims 1
- IPCJGHRRIQJAOP-UHFFFAOYSA-N bis(4-methylphenyl)silane Chemical compound C1=CC(C)=CC=C1[SiH2]C1=CC=C(C)C=C1 IPCJGHRRIQJAOP-UHFFFAOYSA-N 0.000 claims 1
- UCXUKTLCVSGCNR-UHFFFAOYSA-N diethylsilane Chemical compound CC[SiH2]CC UCXUKTLCVSGCNR-UHFFFAOYSA-N 0.000 claims 1
- VDCSGNNYCFPWFK-UHFFFAOYSA-N diphenylsilane Chemical compound C=1C=CC=CC=1[SiH2]C1=CC=CC=C1 VDCSGNNYCFPWFK-UHFFFAOYSA-N 0.000 claims 1
- PZPGRFITIJYNEJ-UHFFFAOYSA-N disilane Chemical compound [SiH3][SiH3] PZPGRFITIJYNEJ-UHFFFAOYSA-N 0.000 claims 1
- KCWYOFZQRFCIIE-UHFFFAOYSA-N ethylsilane Chemical compound CC[SiH3] KCWYOFZQRFCIIE-UHFFFAOYSA-N 0.000 claims 1
- UIUXUFNYAYAMOE-UHFFFAOYSA-N methylsilane Chemical compound [SiH3]C UIUXUFNYAYAMOE-UHFFFAOYSA-N 0.000 claims 1
- 229910000077 silane Inorganic materials 0.000 claims 1
- QZYLHXTXFGOILC-UHFFFAOYSA-N siletane Chemical compound C1C[SiH2]C1 QZYLHXTXFGOILC-UHFFFAOYSA-N 0.000 claims 1
- DWRSCILTXDLQBG-UHFFFAOYSA-N silolane Chemical compound C1CC[SiH2]C1 DWRSCILTXDLQBG-UHFFFAOYSA-N 0.000 claims 1
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201461946164P | 2014-02-28 | 2014-02-28 | |
| US61/946,164 | 2014-02-28 | ||
| US14/625,158 US9233990B2 (en) | 2014-02-28 | 2015-02-18 | Organoaminosilanes and methods for making same |
| US14/625,158 | 2015-02-18 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015038477A Division JP6046758B2 (ja) | 2014-02-28 | 2015-02-27 | 有機アミノシランおよびその製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2017066147A JP2017066147A (ja) | 2017-04-06 |
| JP2017066147A5 true JP2017066147A5 (enExample) | 2017-12-28 |
Family
ID=52596806
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015038477A Active JP6046758B2 (ja) | 2014-02-28 | 2015-02-27 | 有機アミノシランおよびその製造方法 |
| JP2016217206A Pending JP2017066147A (ja) | 2014-02-28 | 2016-11-07 | 有機アミノシランおよびその製造方法 |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015038477A Active JP6046758B2 (ja) | 2014-02-28 | 2015-02-27 | 有機アミノシランおよびその製造方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (3) | US9233990B2 (enExample) |
| EP (2) | EP3395822B1 (enExample) |
| JP (2) | JP6046758B2 (enExample) |
| KR (2) | KR101873565B1 (enExample) |
| CN (1) | CN104876957B (enExample) |
| TW (1) | TWI540138B (enExample) |
Families Citing this family (29)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10453675B2 (en) * | 2013-09-20 | 2019-10-22 | Versum Materials Us, Llc | Organoaminosilane precursors and methods for depositing films comprising same |
| US9920077B2 (en) | 2013-09-27 | 2018-03-20 | L'Air Liquide, SociétéAnonyme pour l'Etude et l'Exploitation des Procédés Georges Claude | Amine substituted trisilylamine and tridisilylamine compounds and synthesis methods thereof |
| US9233990B2 (en) * | 2014-02-28 | 2016-01-12 | Air Products And Chemicals, Inc. | Organoaminosilanes and methods for making same |
| WO2016049154A1 (en) | 2014-09-23 | 2016-03-31 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Carbosilane substituted amine precursors for deposition of si-containing films and methods thereof |
| US10354860B2 (en) * | 2015-01-29 | 2019-07-16 | Versum Materials Us, Llc | Method and precursors for manufacturing 3D devices |
| TWI716333B (zh) | 2015-03-30 | 2021-01-11 | 法商液態空氣喬治斯克勞帝方法研究開發股份有限公司 | 碳矽烷與氨、胺類及脒類之觸媒去氫耦合 |
| US9777025B2 (en) | 2015-03-30 | 2017-10-03 | L'Air Liquide, Société pour l'Etude et l'Exploitation des Procédés Georges Claude | Si-containing film forming precursors and methods of using the same |
| CN118007094A (zh) * | 2015-06-16 | 2024-05-10 | 弗萨姆材料美国有限责任公司 | 卤硅烷化合物和组合物以及用于使用其沉积含硅膜的方法 |
| KR102752515B1 (ko) * | 2015-12-18 | 2025-01-10 | 나타 세미컨덕터 머티리얼스 컴퍼니, 리미티드 | 오가노아미노실란의 제조 방법 및 오가노아미노실란으로부터 실릴아민을 제조하는 방법 |
| US10053775B2 (en) | 2015-12-30 | 2018-08-21 | L'air Liquide, Societé Anonyme Pour L'etude Et L'exploitation Des Procédés Georges Claude | Methods of using amino(bromo)silane precursors for ALD/CVD silicon-containing film applications |
| US9701695B1 (en) * | 2015-12-30 | 2017-07-11 | American Air Liquide, Inc. | Synthesis methods for amino(halo)silanes |
| TWI724141B (zh) | 2016-03-23 | 2021-04-11 | 法商液態空氣喬治斯克勞帝方法硏究開發股份有限公司 | 形成含矽膜之組成物及其製法與用途 |
| US10464953B2 (en) * | 2016-10-14 | 2019-11-05 | Versum Materials Us, Llc | Carbon bridged aminosilane compounds for high growth rate silicon-containing films |
| US11735413B2 (en) * | 2016-11-01 | 2023-08-22 | Versum Materials Us, Llc | Precursors and flowable CVD methods for making low-k films to fill surface features |
| US10647734B2 (en) * | 2016-12-27 | 2020-05-12 | Dow Corning Corporation | Catalysis of dehydrocoupling reactions between amines and silanes |
| TWI784022B (zh) * | 2017-07-31 | 2022-11-21 | 中國大陸商南大光電半導體材料有限公司 | 1,1,1-參(二甲胺基)二矽烷及其製備方法 |
| WO2019055393A1 (en) * | 2017-09-14 | 2019-03-21 | Versum Material Us, Llc | COMPOSITIONS AND METHODS FOR DEPOSITION OF FILMS CONTAINING SILICON |
| JP6788650B2 (ja) * | 2017-12-08 | 2020-11-25 | ダウ シリコーンズ コーポレーション | ヒドロカルビルオキシジシラン |
| CN108084219B (zh) * | 2017-12-26 | 2020-09-15 | 浙江博瑞电子科技有限公司 | 一种二（二乙基氨基）硅烷合成方法 |
| WO2019226207A1 (en) * | 2018-05-23 | 2019-11-28 | Dow Silicones Corporation | Method of making an organoaminosilane |
| WO2020163359A1 (en) * | 2019-02-05 | 2020-08-13 | Versum Materials Us, Llc | Deposition of carbon doped silicon oxide |
| US11649560B2 (en) | 2019-06-20 | 2023-05-16 | Applied Materials, Inc. | Method for forming silicon-phosphorous materials |
| US11466037B2 (en) * | 2019-10-31 | 2022-10-11 | Nata Semiconductor Materials Co., Ltd. | Catalysis of dehydrocoupling reactions between amines and silanes |
| WO2021201910A1 (en) * | 2020-04-02 | 2021-10-07 | Versum Materials Us, Llc | Organoamino-functionalized cyclic oligosiloxanes for deposition of silicon-containing films |
| TWI797640B (zh) | 2020-06-18 | 2023-04-01 | 法商液態空氣喬治斯克勞帝方法研究開發股份有限公司 | 基於矽之自組裝單層組成物及使用該組成物之表面製備 |
| CN112210769B (zh) * | 2020-09-29 | 2023-04-25 | 合肥安德科铭半导体科技有限公司 | 一种低温高生长速率氧化硅薄膜的原子层沉积方法 |
| CN115260223B (zh) * | 2022-09-26 | 2022-12-23 | 江苏南大光电材料股份有限公司 | 无氯催化剂于制备二异丙胺硅烷中的用途 |
| KR102858392B1 (ko) | 2023-07-18 | 2025-09-11 | 주식회사 한솔케미칼 | 2종의 실리콘 전구체 화합물을 이용하여 박막을 형성하는 방법 |
| KR20250085041A (ko) | 2023-12-04 | 2025-06-12 | (주)원익머트리얼즈 | 디알킬아미노디실란의 제조방법 |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5736424Y2 (enExample) | 1973-01-17 | 1982-08-11 | ||
| JPS519738B2 (enExample) * | 1973-03-07 | 1976-03-30 | ||
| JPS49110673A (enExample) | 1973-03-07 | 1974-10-22 | ||
| US4965367A (en) * | 1989-10-16 | 1990-10-23 | Dow Corning Corporation | Process for preparation of silacyclobutanes |
| FR2739283B1 (fr) | 1995-09-29 | 1997-11-07 | Oreal | Composition topique contenant un polymere a greffons silicones et un polymere amphiphile a chaine grasse |
| US6072085A (en) | 1997-09-30 | 2000-06-06 | Massachusetts Institute Of Technology | Imine hydrosilylation, uses and reagents related thereto |
| FR2833944A1 (fr) * | 2001-12-20 | 2003-06-27 | Rhodia Chimie Sa | Procede de preparation d'amines par reduction d'imines |
| AU2003286709B8 (en) | 2002-10-28 | 2009-11-19 | Insight Equity A.P.X., Lp | Oxygen-containing heterocyclic fused naphthopyrans |
| US7875556B2 (en) | 2005-05-16 | 2011-01-25 | Air Products And Chemicals, Inc. | Precursors for CVD silicon carbo-nitride and silicon nitride films |
| US8530361B2 (en) | 2006-05-23 | 2013-09-10 | Air Products And Chemicals, Inc. | Process for producing silicon and oxide films from organoaminosilane precursors |
| KR101040325B1 (ko) | 2009-08-25 | 2011-06-10 | (주)디엔에프 | 알킬아미노실란의 제조방법 |
| US20120277457A1 (en) | 2010-10-12 | 2012-11-01 | Air Products And Chemicals, Inc. | Aminosilanes and methods for making same |
| US10453675B2 (en) | 2013-09-20 | 2019-10-22 | Versum Materials Us, Llc | Organoaminosilane precursors and methods for depositing films comprising same |
| US9233990B2 (en) * | 2014-02-28 | 2016-01-12 | Air Products And Chemicals, Inc. | Organoaminosilanes and methods for making same |
-
2015
- 2015-02-18 US US14/625,158 patent/US9233990B2/en active Active
- 2015-02-24 TW TW104105880A patent/TWI540138B/zh active
- 2015-02-27 JP JP2015038477A patent/JP6046758B2/ja active Active
- 2015-02-27 EP EP18177680.8A patent/EP3395822B1/en active Active
- 2015-02-27 EP EP15157000.9A patent/EP2913334B1/en active Active
- 2015-02-27 KR KR1020150027946A patent/KR101873565B1/ko active Active
- 2015-02-28 CN CN201510091650.6A patent/CN104876957B/zh active Active
- 2015-12-02 US US14/956,748 patent/US9758534B2/en active Active
-
2016
- 2016-11-07 JP JP2016217206A patent/JP2017066147A/ja active Pending
-
2017
- 2017-03-30 US US15/474,789 patent/US10294250B2/en active Active
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2018
- 2018-06-26 KR KR1020180073562A patent/KR102201058B1/ko active Active
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