JP2017045867A - Manufacturing method of component built-in wiring board, component built-in wiring board, and electronic component fixing tape - Google Patents

Manufacturing method of component built-in wiring board, component built-in wiring board, and electronic component fixing tape Download PDF

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JP2017045867A
JP2017045867A JP2015167362A JP2015167362A JP2017045867A JP 2017045867 A JP2017045867 A JP 2017045867A JP 2015167362 A JP2015167362 A JP 2015167362A JP 2015167362 A JP2015167362 A JP 2015167362A JP 2017045867 A JP2017045867 A JP 2017045867A
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thermosetting resin
resin film
electronic component
core
main surface
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JP6542616B2 (en
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聡 服部
Satoshi Hattori
聡 服部
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Furukawa Electric Co Ltd
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Abstract

PROBLEM TO BE SOLVED: To provide a manufacturing method of a component built-in wiring board capable of simplifying a manufacture process, and the component built-in wiring board.SOLUTION: The manufacturing method includes: a taping step for sticking a surface of a thermosetting resin film 3 of an electronic component fixing tape 4 to a side of a core rear face of a core substrate 100 including a housing hole part 1 that is opened both on a core principal surface X1 and on a core rear face X2; a temporary electronic component fixing step for housing an electronic component 5 in the housing hole part and temporarily fixing a rear face of the electronic component to the thermosetting resin film; a filling and supplying step for filling a gap between an inner wall surface of the housing hole part and the electronic component with a thermosetting resin filler 6 and supplying the filler at such a degree that the core principal surface can be covered; a flattening and pressing step for performing heating, pressing and flattening at such a temperature that the thermosetting resin film and the resin filler are not hardened; and a hardening step for heating and hardening the thermosetting resin film and the resin filler.SELECTED DRAWING: Figure 1

Description

本発明は、内部にコンデンサなどの電子部品が収容されている部品内蔵配線基板の製造方法、部品内蔵配線基板および電子部品固定用テープに関するものである。   The present invention relates to a method of manufacturing a wiring board with a built-in component in which an electronic component such as a capacitor is accommodated, a wiring board with a built-in component, and an electronic component fixing tape.

コンピュータのマイクロプロセッサ等として使用される半導体集積回路素子(ICチップ)は、近年ますます高速化、高機能化しており、これに付随して端子数が増え、端子間ピッチも狭くなる傾向にある。一般的にICチップの底面には多数の端子が密集してアレイ状に配置されており、このような端子群はマザーボード側の端子群に対してフリップチップの形態で接続される。但し、ICチップ側の端子群とマザーボード側の端子群とでは端子間ピッチに大きな差があることから、ICチップをマザーボード上に直接的に接続することは困難である。そのため、通常はICチップをICチップ搭載用配線基板上に搭載してなるパッケージを作製し、そのパッケージをマザーボード上に搭載するという手法が採用される。この種のパッケージを構成するICチップ搭載用配線基板においては、ICチップのスイッチングノイズの低減や電源電圧の安定化を図るために、コンデンサ(「キャパシタ」とも言う)を設けることが提案されている。その一例として、高分子材料製のコア基板内にコンデンサを埋め込むとともに、そのコア基板の表面及び裏面にビルドアップ層を形成した配線基板が従来提案されている(例えば特許文献1,2参照)。   In recent years, semiconductor integrated circuit elements (IC chips) used as computer microprocessors and the like have become increasingly faster and more functional, with an accompanying increase in the number of terminals and a tendency to narrow the pitch between terminals. . In general, a large number of terminals are densely arranged on the bottom surface of an IC chip, and such a terminal group is connected to a terminal group on the motherboard side in the form of a flip chip. However, it is difficult to connect the IC chip directly on the mother board because there is a large difference in the pitch between the terminals of the terminal group on the IC chip side and the terminal group on the mother board side. For this reason, a method is generally employed in which a package is prepared by mounting an IC chip on an IC chip mounting wiring board, and the package is mounted on a motherboard. In a wiring board for mounting an IC chip constituting this type of package, it has been proposed to provide a capacitor (also referred to as a “capacitor”) in order to reduce switching noise of the IC chip and stabilize the power supply voltage. . As an example, a wiring board in which capacitors are embedded in a core substrate made of a polymer material and a buildup layer is formed on the front surface and the back surface of the core substrate has been conventionally proposed (for example, see Patent Documents 1 and 2).

上記従来の部品内蔵配線基板の製造方法の一例を以下に説明する。まず、図5(A)に示すように、コア主面X1及びコア裏面X2の両方にて開口する収容穴部51を複数有する樹脂材料製のコア基板500を準備する。そして、図5(B)に示すように、コア裏面X2側に粘着テープ53を貼り付けるテーピング工程を行い、収容穴部51のコア裏面X2側の開口をあらかじめシールする。次に、図5(C)に示すように、複数の収容穴部51内にそれぞれコンデンサ等の電子部品54を収容する収容工程を行い、各電子部品54の裏面を粘着テープ53の粘着面に貼り付けて仮固定する。次に、フィルム状の樹脂充填材55をラミネートして、図5(D)に示すように、収容穴部51の内壁面と電子部品54の側面との隙間に樹脂充填材55を充填する充填工程を行う。そして、板厚方向にプレスする第1平坦化プレス工程を行う。これにより、コア主面X1上に残っている樹脂充填材55を平坦化する。その後、図6(A)に示すように、粘着テープ53を剥離する剥離工程を行う。そして、図6(B)に示すように、コア裏面X2側に対して、熱硬化性樹脂フィルム56を積層し、板厚方向にプレスする第2平坦化プレス工程を行う。これにより、熱硬化性樹脂フィルム56を構成する樹脂の一部をコア裏面X2側に配置された配線間等の隙間に押し込むとともに、コア裏面X2に残っている熱硬化性樹脂フィルム56の樹脂を平坦化する。そして、図6(C)に示すように、熱硬化性樹脂フィルム56および樹脂充填材55を硬化収縮させる硬化工程を行う。これにより、収容穴部51に充填された充填樹脂とコア基板500両面を覆う絶縁層が一体化された状態で形成される。その後、図6(D)に示すように、上層配線層57やフィルドビア58等の外層パターンの形成を行う(例えば、特許文献3参照)。   An example of a method for manufacturing the conventional component built-in wiring board will be described below. First, as shown in FIG. 5 (A), a core substrate 500 made of a resin material having a plurality of accommodation holes 51 that are open on both the core main surface X1 and the core back surface X2 is prepared. Then, as shown in FIG. 5 (B), a taping step of attaching the adhesive tape 53 to the core back surface X2 side is performed, and the opening of the accommodation hole 51 on the core back surface X2 side is sealed in advance. Next, as shown in FIG. 5 (C), a housing step of housing electronic components 54 such as capacitors in each of the plurality of housing holes 51 is performed, and the back surface of each electronic component 54 is used as the adhesive surface of the adhesive tape 53. Paste and fix temporarily. Next, a film-like resin filler 55 is laminated, and as shown in FIG. 5D, the resin filler 55 is filled into the gap between the inner wall surface of the accommodation hole 51 and the side surface of the electronic component 54. Perform the process. And the 1st planarization press process pressed in a plate | board thickness direction is performed. Thereby, the resin filler 55 remaining on the core main surface X1 is flattened. Thereafter, as shown in FIG. 6A, a peeling process for peeling the adhesive tape 53 is performed. Then, as shown in FIG. 6B, a second flattening press step is performed in which a thermosetting resin film 56 is laminated on the core back surface X2 side and pressed in the plate thickness direction. As a result, part of the resin constituting the thermosetting resin film 56 is pushed into a gap such as between the wirings arranged on the core back surface X2 side, and the resin of the thermosetting resin film 56 remaining on the core back surface X2 is removed. Flatten. Then, as shown in FIG. 6C, a curing step is performed in which the thermosetting resin film 56 and the resin filler 55 are cured and contracted. Thereby, the filling resin filled in the accommodation hole 51 and the insulating layer covering both surfaces of the core substrate 500 are formed in an integrated state. Thereafter, as shown in FIG. 6D, outer layer patterns such as the upper wiring layer 57 and the filled via 58 are formed (see, for example, Patent Document 3).

また、上述のフィルム状の樹脂充填材に換えて液状の樹脂充填材を使用することも行われている。また、樹脂充填材の硬化を第1の平坦化プレス工程の後に行うこともある。   In addition, a liquid resin filler is used instead of the film-like resin filler described above. Further, the resin filler may be cured after the first flattening press step.

特開2002−217544号公報JP 2002-217544 A 特開2002−237683号公報JP 2002-237683 A 特開2014−96446号公報JP 2014-96446 A

しかしながら、上述のような従来の部品内蔵配線基板の製造方法では、第1平坦化プレス工程の後、粘着テープを剥離する剥離工程を行い、その後さらに第2平坦化プレス工程を行う必要があった。また、貼合した粘着テープを剥離し、その後、さらに絶縁層を形成するための熱硬化性樹脂フィルムを貼合する必要があった。このため、製造工程が煩雑になるという問題があった。   However, in the conventional method for manufacturing a wiring board with a built-in component as described above, it is necessary to perform a peeling process for peeling the adhesive tape after the first flattening press process, and then perform a second flattening press process. . Moreover, it was necessary to peel the bonded adhesive tape and then bond a thermosetting resin film for further forming an insulating layer. For this reason, there existed a problem that a manufacturing process became complicated.

そこで、本発明は、製造工程を簡略化することができる部品内蔵配線基板の製造方法を提供することを課題とする。   Then, this invention makes it a subject to provide the manufacturing method of the component built-in wiring board which can simplify a manufacturing process.

以上の課題を解決するため、本発明に係る部品内蔵配線基板の製造方法は、コア主面およびコア裏面の両方にて開口する収容穴部を一つまたは複数有するコア基板の前記コア裏面側に、粘着テープと未硬化で粘着性を有する熱硬化性樹脂フィルムとを有する電子部品固定用テープの前記熱硬化性樹脂フィルム面を貼り付けるテーピング工程と、前記収容穴部内に電子部品を収容し、前記電子部品の裏面を前記熱硬化性樹脂フィルムに貼り付けて仮固定する電子部品仮固定工程と、熱硬化性の樹脂充填材を、前記収容穴部の内壁面と前記電子部品との隙間に充填するとともに、前記コア主面を覆うことができる程度に供給する充填供給工程と、前記熱硬化性樹脂フィルムおよび前記樹脂充填材が硬化することのない温度で加熱するとともに加圧することにより、前記熱硬化性樹脂フィルムの粘着テープ側の面および前記樹脂充填材の表面をそれぞれ平坦化する平坦化プレス工程と、前記粘着テープを剥離する剥離工程と、前記熱硬化性樹脂フィルムおよび前記樹脂充填材を加熱硬化する硬化工程と
を含むことを特徴とする。
In order to solve the above problems, a method of manufacturing a component-embedded wiring board according to the present invention is provided on the core back surface side of a core substrate having one or a plurality of receiving holes that are open on both the core main surface and the core back surface. A taping step of affixing the thermosetting resin film surface of an electronic component fixing tape having an adhesive tape and an uncured thermosetting resin film having an adhesive property, and accommodating the electronic component in the accommodation hole, An electronic component temporary fixing step in which the back surface of the electronic component is attached to the thermosetting resin film and temporarily fixed, and a thermosetting resin filler is provided in the gap between the inner wall surface of the housing hole and the electronic component. A filling and supplying step for filling and supplying the core main surface to the extent that it can be covered, and heating and pressurizing at a temperature at which the thermosetting resin film and the resin filler are not cured A flattening press step for flattening the surface of the thermosetting resin film on the pressure-sensitive adhesive tape side and the surface of the resin filler, a peeling step for peeling the pressure-sensitive adhesive tape, and the thermosetting resin film. And a curing step of heat curing the resin filler.

また、以上の課題を解決するため、本発明に係る部品内蔵配線基板の製造方法は、コア主面およびコア裏面の両方にて開口する収容穴部を一つまたは複数有するコア基板の前記コア裏面側に、剥離フィルムと未硬化で粘着性を有する熱硬化性樹脂フィルムとを有する電子部品固定用テープの前記熱硬化性樹脂フィルム面を貼り付けるテーピング工程と、前記収容穴部内に電子部品を収容し、前記電子部品の裏面を前記熱硬化性樹脂フィルムに貼り付けて仮固定する電子部品仮固定工程と、熱硬化性の樹脂充填材を、前記収容穴部の内壁面と前記電子部品との隙間に充填するとともに、前記コア主面を覆うことができる程度に供給する充填供給工程と、前記熱硬化性樹脂フィルムおよび前記樹脂充填材が硬化することのない温度で加熱するとともに加圧することにより、前記熱硬化性樹脂フィルムの剥離フィルム側の面および前記樹脂充填材の表面をそれぞれ平坦化する平坦化プレス工程と、前記剥離フィルムを剥離する剥離工程と、前記熱硬化性樹脂フィルムおよび前記樹脂充填材を加熱硬化する硬化工程とを含むことを特徴とする。   Moreover, in order to solve the above-mentioned subject, the manufacturing method of the component built-in wiring board which concerns on this invention is the said core back surface of the core board which has one or more accommodation hole parts opened in both a core main surface and a core back surface A taping step of attaching the thermosetting resin film surface of an electronic component fixing tape having a release film and an uncured and adhesive thermosetting resin film on the side, and housing the electronic component in the housing hole The electronic component temporary fixing step of temporarily attaching the back surface of the electronic component to the thermosetting resin film and fixing the thermosetting resin filler between the inner wall surface of the housing hole and the electronic component A filling and supplying step for filling the gap and supplying the core main surface so as to cover the core, and heating at a temperature at which the thermosetting resin film and the resin filler are not cured. By applying pressure to the surface of the release film side of the thermosetting resin film and the surface of the resin filler, respectively, a release process for peeling the release film, and the thermosetting And a curing step of heating and curing the resin film and the resin filler.

上記部品内蔵配線基板の製造方において、前記樹脂充填材が未硬化のフィルム状であり、前記充填供給工程は、前記樹脂充填材を前記コア主面に積層した後、前記樹脂充填材が硬化することのない温度で加熱するとともに加圧することにより行うことが好ましい。   In the method of manufacturing the component built-in wiring board, the resin filler is in an uncured film shape, and the filling and supplying step is performed by laminating the resin filler on the core main surface, and then the resin filler is cured. It is preferable to carry out by heating and pressurizing at a temperature that does not occur.

また、上記部品内蔵配線基板の製造方法において、前記樹脂充填材が液状であってもよい。   In the method for manufacturing the component built-in wiring board, the resin filler may be in a liquid state.

また、本発明に係る部品内蔵配線基板の製造方法は、コア主面およびコア裏面の両方にて開口する収容穴部を一つまたは複数有するコア基板の前記コア裏面側に、粘着テープと未硬化で粘着性を有する熱硬化性樹脂フィルムとを有する電子部品固定用テープの前記熱硬化性樹脂フィルム面を貼り付けるテーピング工程と、前記収容穴部内に電子部品を収容し、前記電子部品の裏面を前記熱硬化性樹脂フィルムに貼り付けて仮固定する電子部品仮固定工程と、熱硬化性の樹脂充填材を前記収容穴部の内壁面と前記電子部品との隙間に充填する充填工程と、前記コア主面側に未硬化のコア主面側用熱硬化性樹脂フィルムを供給する供給工程と、前記熱硬化性樹脂フィルム、前記樹脂充填材および前記コア主面側用熱硬化性樹脂フィルムが硬化することのない温度で加熱するとともに加圧することにより、前記熱硬化性樹脂フィルムの粘着テープ側の面および前記樹コア主面側用熱硬化性樹脂フィルムの表面をそれぞれ平坦化する平坦化プレス工程と、前記粘着テープを剥離する剥離工程と、前記熱硬化性樹脂フィルム、前記樹脂充填材およびコア主面側用熱硬化性樹脂フィルムを加熱硬化する硬化工程とを含むことを特徴とする。   Further, the method of manufacturing a component-embedded wiring board according to the present invention includes an adhesive tape and an uncured tape on the core back surface side of the core substrate having one or a plurality of receiving holes that are opened on both the core main surface and the core back surface. A taping step of attaching the thermosetting resin film surface of the electronic component fixing tape having an adhesive thermosetting resin film, and housing the electronic component in the housing hole, An electronic component temporary fixing step for temporarily fixing the adhesive to the thermosetting resin film; a filling step for filling the gap between the inner wall surface of the housing hole and the electronic component with a thermosetting resin filler; Supply step of supplying an uncured thermosetting resin film for core main surface side to the core main surface side, and the thermosetting resin film, the resin filler, and the thermosetting resin film for core main surface side are cured Do A flattening press step for flattening the surface of the thermosetting resin film and the surface of the thermosetting resin film for the main surface of the tree core by heating and pressurizing at a temperature without And a peeling step of peeling off the adhesive tape, and a curing step of heat-curing the thermosetting resin film, the resin filler and the thermosetting resin film for the core main surface side.

また、本発明に係る部品内蔵配線基板の製造方法は、コア主面およびコア裏面の両方にて開口する収容穴部を一つまたは複数有するコア基板の前記コア裏面側に、剥離フィルムと未硬化で粘着性を有する熱硬化性樹脂フィルムとを有する電子部品固定用テープの前記熱硬化性樹脂フィルム面を貼り付けるテーピング工程と、前記収容穴部内に電子部品を収容し、前記電子部品の裏面を前記熱硬化性樹脂フィルムに貼り付けて仮固定する電子部品仮固定工程と、熱硬化性の樹脂充填材を前記収容穴部の内壁面と前記電子部品との隙間に充填する充填工程と、前記コア主面側に未硬化のコア主面側用熱硬化性樹脂フィルムを供給する供給工程と、前記熱硬化性樹脂フィルム、前記樹脂充填材および前記コア主面側用熱硬化性樹脂フィルムが硬化することのない温度で加熱するとともに加圧することにより、前記熱硬化性樹脂フィルムの前記剥離フィルム側の面および前記コア主面側用熱硬化性樹脂フィルムの表面をそれぞれ平坦化する平坦化プレス工程と、前記剥離フィルムを剥離する剥離工程と、前記熱硬化性樹脂フィルム、前記樹脂充填材および前記コア主面側用熱硬化性樹脂フィルムを加熱硬化する硬化工程とを含むことを特徴とする。   Further, the method for manufacturing a component built-in wiring board according to the present invention includes a release film and an uncured film on the core back surface side of the core substrate having one or a plurality of receiving holes that are open on both the core main surface and the core back surface. A taping step of attaching the thermosetting resin film surface of the electronic component fixing tape having an adhesive thermosetting resin film, and housing the electronic component in the housing hole, An electronic component temporary fixing step for temporarily fixing the adhesive to the thermosetting resin film; a filling step for filling the gap between the inner wall surface of the housing hole and the electronic component with a thermosetting resin filler; Supply step of supplying an uncured thermosetting resin film for core main surface side to the core main surface side, and the thermosetting resin film, the resin filler, and the thermosetting resin film for core main surface side are cured You A flattening press step of flattening the surface of the release film side of the thermosetting resin film and the surface of the thermosetting resin film for the core main surface side by heating and pressurizing at a temperature that does not occur The peeling process which peels the said peeling film, The hardening process which heat-hardens the said thermosetting resin film, the said resin filler, and the said thermosetting resin film for core main surface sides is characterized by the above-mentioned.

また、上記部品内蔵配線基板の製造方法において、前記熱硬化性樹脂フィルムの軟化温度が、前記樹脂充填材の軟化温度よりも高いことが好ましい。   Moreover, in the said manufacturing method of the component built-in wiring board, it is preferable that the softening temperature of the said thermosetting resin film is higher than the softening temperature of the said resin filler.

また、上記部品内蔵配線基板の製造方法において、前記粘着テープが、刺激により硬化する刺激硬化型の粘着剤層を有することが好ましい。   In the method for manufacturing a wiring board with a built-in component, it is preferable that the pressure-sensitive adhesive tape has a stimulus-curable pressure-sensitive adhesive layer that is cured by stimulation.

本発明に係る部品内蔵配線基板は、上述のいずれかの部品内蔵配線基板の製造方法により製造されたことを特徴とする   The component built-in wiring board according to the present invention is manufactured by any one of the above-described component built-in wiring boards.

また、本発明に係る電子部品固定用テープは、粘着テープと未硬化で粘着性を有する熱硬化性樹脂フィルムとを有し、コア主面およびコア裏面の両方にて開口する収容穴部を一つまたは複数有するコア基板の前記コア裏面側に前記熱硬化性樹脂フィルム面を貼り付けるテーピング工程と、前記収容穴部内に電子部品を収容し、前記電子部品の裏面を前記熱硬化性樹脂フィルムに貼り付けて仮固定する電子部品仮固定工程と、熱硬化性の樹脂充填材を、前記収容穴部の内壁面と前記電子部品との隙間に充填するとともに、前記コア主面を覆うことができる程度に供給する充填供給工程と、前記熱硬化性樹脂フィルムおよび前記樹脂充填材が硬化することのない温度で加熱するとともに加圧することにより、前記熱硬化性樹脂フィルムの粘着テープ側の面および前記樹脂充填材の表面をそれぞれ平坦化する平坦化プレス工程と、前記粘着テープを剥離する剥離工程と、前記熱硬化性樹脂フィルムおよび前記樹脂充填材を加熱硬化する硬化工程とを含む部品内蔵配線基板の製造方法に用いることを特徴とする。   The electronic component fixing tape according to the present invention includes an adhesive tape and a thermosetting resin film that is uncured and has adhesiveness, and has a single accommodation hole that opens on both the core main surface and the core back surface. A taping step of attaching the thermosetting resin film surface to the core back surface side of the core substrate having one or a plurality, and housing the electronic component in the housing hole, and the back surface of the electronic component to the thermosetting resin film The electronic component temporary fixing step of pasting and temporarily fixing, and filling the gap between the inner wall surface of the housing hole and the electronic component with a thermosetting resin filler, and covering the core main surface The pressure-sensitive adhesive tape of the thermosetting resin film is heated and pressurized at a temperature at which the thermosetting resin film and the resin filler are not cured. A flattening press step for flattening the surface on the side and the surface of the resin filler, a peeling step for peeling the adhesive tape, and a curing step for heat curing the thermosetting resin film and the resin filler. It is used for the manufacturing method of the component built-in wiring board containing.

また、本発明に係る電子部品固定用テープは、剥離フィルムと未硬化で粘着性を有する熱硬化性樹脂フィルムとを有し、コア主面およびコア裏面の両方にて開口する収容穴部を一つまたは複数有するコア基板の前記コア裏面側に前記熱硬化性樹脂フィルム面を貼り付けるテーピング工程と、前記収容穴部内に電子部品を収容し、前記電子部品の裏面を前記熱硬化性樹脂フィルムに貼り付けて仮固定する電子部品仮固定工程と、熱硬化性の樹脂充填材を、前記収容穴部の内壁面と前記電子部品との隙間に充填するとともに、前記コア主面を覆うことができる程度に供給する充填供給工程と、前記熱硬化性樹脂フィルムおよび前記樹脂充填材が硬化することのない温度で加熱するとともに加圧することにより、前記熱硬化性樹脂フィルムの剥離フィルム側の面および前記樹脂充填材の表面をそれぞれ平坦化する平坦化プレス工程と、前記剥離フィルムを剥離する剥離工程と、前記熱硬化性樹脂フィルムおよび前記樹脂充填材を加熱硬化する硬化工程とを含む部品内蔵配線基板の製造方法に用いることを特徴とする。   In addition, the electronic component fixing tape according to the present invention has a release film and an uncured and thermosetting resin film having adhesiveness, and has a single accommodation hole that opens on both the core main surface and the core back surface. A taping step of attaching the thermosetting resin film surface to the core back surface side of the core substrate having one or a plurality, and housing the electronic component in the housing hole, and the back surface of the electronic component to the thermosetting resin film The electronic component temporary fixing step of pasting and temporarily fixing, and filling the gap between the inner wall surface of the housing hole and the electronic component with a thermosetting resin filler, and covering the core main surface The filling and supplying step of supplying to the extent, and heating and pressurizing at a temperature at which the thermosetting resin film and the resin filler are not cured, thereby releasing the thermosetting resin film. A flattening press step for flattening the surface of the lum side and the surface of the resin filler; a peeling step for peeling the release film; and a curing step for heat curing the thermosetting resin film and the resin filler. It is used for the manufacturing method of the component built-in wiring board containing this.

本発明によれば、部品内蔵配線基板の製造工程を簡略化することができる。   According to the present invention, the manufacturing process of the component built-in wiring board can be simplified.

本発明の実施形態に係る部品内蔵配線基板の製造方法を説明するための断面図である。It is sectional drawing for demonstrating the manufacturing method of the component built-in wiring board which concerns on embodiment of this invention. 本発明の実施形態に係る部品内蔵配線基板の製造方法を説明するための断面図である。It is sectional drawing for demonstrating the manufacturing method of the component built-in wiring board which concerns on embodiment of this invention. 本発明の他の実施形態に係る部品内蔵配線基板の製造方法を説明するための断面図である。It is sectional drawing for demonstrating the manufacturing method of the component built-in wiring board which concerns on other embodiment of this invention. 本発明の他の実施形態に係る部品内蔵配線基板の製造方法を説明するための断面図である。It is sectional drawing for demonstrating the manufacturing method of the component built-in wiring board which concerns on other embodiment of this invention. 従来の部品内蔵配線基板の製造方法を説明するための断面図である。It is sectional drawing for demonstrating the manufacturing method of the conventional component built-in wiring board. 従来の部品内蔵配線基板の製造方法を説明するための断面図である。It is sectional drawing for demonstrating the manufacturing method of the conventional component built-in wiring board.

以下に、本発明の実施の形態について詳細に説明する。   Hereinafter, embodiments of the present invention will be described in detail.

図1および図2は、本発明の実施形態に係る部品内蔵配線基板の製造方法を説明するための断面図である。本実施形態の部品内蔵配線基板の製造方法は、コア主面X1およびコア裏面X2の両方にて開口する収容穴部1を一つまたは複数有するコア基板100を準備する準備工程と、コア基板100の裏面側に粘着テープ2と未硬化で粘着性を有する熱硬化性樹脂フィルム3とを有する電子部品固定用テープ4の熱硬化性樹脂フィルム3側の面を貼り付けるテーピング工程と、電子部品5の裏面を熱硬化性樹脂フィルム3に貼り付けて仮固定する電子部品仮固定工程と、熱硬化性の樹脂充填材6を収容穴部1の内壁面と電子部品5との隙間に充填するとともにコア主面X1を覆うことができる程度に供給する充填供給工程と、熱硬化性樹脂フィルム3の粘着テープ2側の面および樹脂充填材6の表面をそれぞれ平坦化する平坦化プレス工程と、粘着テープ2を剥離する剥離工程と、熱硬化性樹脂フィルム3および樹脂充填材6を加熱硬化する硬化工程と、外層を形成する外層形成工程を有する。以下、各工程について、詳細に説明する。   1 and 2 are cross-sectional views for explaining a method of manufacturing a component built-in wiring board according to an embodiment of the present invention. The manufacturing method of the component built-in wiring board according to the present embodiment includes a preparation step of preparing a core substrate 100 having one or a plurality of receiving hole portions 1 opened on both the core main surface X1 and the core back surface X2, and the core substrate 100. A taping step of attaching the thermosetting resin film 3 side surface of the electronic component fixing tape 4 having the adhesive tape 2 and the uncured and thermosetting resin film 3 having adhesiveness to the back surface side of the electronic component 5; The electronic component temporary fixing step of pasting the back surface of the resin to the thermosetting resin film 3 and temporarily fixing, and filling the gap between the inner wall surface of the accommodation hole 1 and the electronic component 5 with the thermosetting resin filler 6 A filling and supplying step for supplying the core main surface X1 to such an extent that the core main surface X1 can be covered; a flattening press step for flattening the surface of the thermosetting resin film 3 on the pressure-sensitive adhesive tape 2 side and the surface of the resin filler 6; It has a peeling step of peeling the-loop 2, a curing step of heating and curing the thermosetting resin film 3 and the resin filler 6, the outer layer forming step of forming an outer layer. Hereinafter, each step will be described in detail.

(準備工程)
まず、図1(A)に示すように、本発明の実施形態に係る部品内蔵配線基板の製造方法において使用するコア基板100を準備する。このコア基板100は、コア主面X1およびコア裏面X2の両方にて開口する収容穴部1を一つまたは複数有している。収容穴部1は、電子部品5を収容するものである。このようなコア基板100は、基材の所定領域に上面視長方形状等の所定形状の貫通孔を形成することにより得ることができる。収容穴部1は、収容穴部1の輪郭となる箇所にレーザ光を照射するレーザ加工により形成することができる。
(Preparation process)
First, as shown in FIG. 1A, a core substrate 100 to be used in a method for manufacturing a component built-in wiring board according to an embodiment of the present invention is prepared. The core substrate 100 has one or a plurality of accommodation holes 1 that are open on both the core main surface X1 and the core back surface X2. The accommodation hole 1 accommodates the electronic component 5. Such a core substrate 100 can be obtained by forming a through hole having a predetermined shape such as a rectangular shape in a top view in a predetermined region of the base material. The accommodation hole 1 can be formed by laser processing that irradiates a portion that becomes the outline of the accommodation hole 1 with laser light.

また、このコア基板100の基材の両面には、配線パターン7がそれぞれ設けられている。コア基板100は、表面の配線パターン7に限らず内部にも内部配線パターン(図示しない)が形成されている積層基板であってもよい。ただし、収容穴部1が形成されることとなる領域の範囲内には、配線パターン7も内部配線パターンも存在しない。また、コア基板100の基材の所定箇所には、充填スルーホール8が形成されている。充填スルーホール8は、配線パターン7間の導通を取るものである。   In addition, wiring patterns 7 are provided on both surfaces of the base material of the core substrate 100, respectively. The core substrate 100 is not limited to the wiring pattern 7 on the surface, and may be a laminated substrate in which an internal wiring pattern (not shown) is formed inside. However, neither the wiring pattern 7 nor the internal wiring pattern exists within the region where the accommodation hole 1 is to be formed. In addition, a filling through hole 8 is formed at a predetermined position of the base material of the core substrate 100. The filled through hole 8 is for establishing electrical connection between the wiring patterns 7.

このようなコア基板100を準備した後、コア基板100の表面に形成された配線パターン7の粗面化処理を行ってもよい。これにより、この後形成される絶縁層と配線パターン7との密着性を向上させることができる。具体的には、コア基板100を硫酸−過酸化水素系のソフトエッチング剤に浸漬する。ソフトエッチング剤としては銅用表面粗化剤等として市販されているものを用い、処理条件としては通常使用されている条件で行えばよい。   After such a core substrate 100 is prepared, the wiring pattern 7 formed on the surface of the core substrate 100 may be roughened. Thereby, the adhesiveness of the insulating layer and wiring pattern 7 formed after this can be improved. Specifically, the core substrate 100 is immersed in a sulfuric acid-hydrogen peroxide soft etchant. What is necessary is just to carry out on the conditions normally used as processing conditions, using what is marketed as a surface roughening agent for copper etc. as a soft etching agent.

(テーピング工程)
続いて、図1(B)に示すように、コア基板100のコア裏面X2側に、粘着テープ2と未硬化で粘着性を有する熱硬化性樹脂フィルム3とを有する電子部品固定用テープ4を、熱硬化性樹脂フィルム3面がコア裏面X2側となるように、ラミネートする。これにより、収容穴部1の開口面が一方の面において電子部品固定用テープ4により塞がれた状態となる。つまり、電子部品固定用テープ4が収容穴部1の底面をなしており、その熱硬化性樹脂フィルム3が収容穴部1内に露出している。ラミネートは、常温で行うことが好ましいが、加熱しながら行ってもよい。
(Taping process)
Subsequently, as shown in FIG. 1 (B), an electronic component fixing tape 4 having an adhesive tape 2 and an uncured thermosetting resin film 3 having adhesiveness on the core back surface X2 side of the core substrate 100 is provided. Lamination is performed so that the surface of the thermosetting resin film 3 is on the core back surface X2 side. Thereby, the opening surface of the accommodation hole part 1 will be in the state obstruct | occluded by the electronic component fixing tape 4 in one surface. That is, the electronic component fixing tape 4 forms the bottom surface of the accommodation hole 1, and the thermosetting resin film 3 is exposed in the accommodation hole 1. Lamination is preferably performed at room temperature, but may be performed while heating.

電子部品固定用テープ4の熱硬化性樹脂フィルム3は、未硬化の状態で電子部品5を仮固定し、その後、硬化した状態で充填樹脂12とともに電子部品5を固定するとともに、コア基板100のコア裏面X2側に上層層間絶縁層14を形成するものである。   The thermosetting resin film 3 of the electronic component fixing tape 4 temporarily fixes the electronic component 5 in an uncured state, and then fixes the electronic component 5 together with the filling resin 12 in a cured state. The upper interlayer insulating layer 14 is formed on the core back surface X2 side.

熱硬化性樹脂フィルム3は、常温で粘着性を有し、加熱硬化後に絶縁層として適するものであれば、特に限定されるものではない。例えば、エポキシ樹脂その他の熱硬化性樹脂をフィルム状にしたものであって、未硬化のものを用いることができる。特に、Bステージと称される半硬化状態のものが好ましい。   The thermosetting resin film 3 is not particularly limited as long as it has adhesiveness at room temperature and is suitable as an insulating layer after heat curing. For example, an epoxy resin or other thermosetting resin formed into a film and uncured can be used. Particularly preferred is a semi-cured state called B stage.

電子部品固定用テープ4の粘着テープ2は、タック性を有する熱硬化性樹脂フィルム3をカバーしたり支持したりするためのものである。粘着テープ2としては、基材フィルム9上に粘着剤層10が設けられた粘着テープ2を用いることができる。   The adhesive tape 2 of the electronic component fixing tape 4 is for covering or supporting the thermosetting resin film 3 having tackiness. As the adhesive tape 2, the adhesive tape 2 in which the adhesive layer 10 is provided on the base film 9 can be used.

基材フィルム9は、例えば、ポリエチレンテレフタレートフィルム等のポリエステル系フィルム、ポリテトラフルオロエチレンフィルム、ポリエチレンフィルム、ポリプロピレンフィルム、ポリメチルペンテンフィルム、ポリビニルアセテートフィルム等のポリオレフィン系フィルム、ポリ塩化ビニルフィルム、ポリイミドフィルムなどのプラスチックフィルム等であり、多層構造を有していても構わない。   The base film 9 is, for example, a polyester film such as a polyethylene terephthalate film, a polytetrafluoroethylene film, a polyethylene film, a polypropylene film, a polymethylpentene film, a polyolefin film such as a polyvinyl acetate film, a polyvinyl chloride film, or a polyimide film. And may have a multilayer structure.

粘着剤層10は、刺激により硬化して粘着力が低下する刺激硬化型の粘着剤からなることが好ましい。このような刺激硬化型粘着剤としては特に限定されず、例えば、ゴム系感圧接着剤、アクリル系感圧接着剤、スチレン・共役ジエンブロック共重合体系感圧接着剤、シリコーン系感圧接着剤等をベース樹脂として、多官能オリゴマー又は多官能モノマーからなる架橋成分と紫外線重合開始剤とを配合した光硬化型粘着剤、架橋成分と熱重合開始剤とを配合した熱硬化型粘着剤等が挙げられる。   The pressure-sensitive adhesive layer 10 is preferably made of a stimulus-curing pressure-sensitive adhesive that is cured by stimulation and has reduced adhesive strength. Such a stimulus curable pressure-sensitive adhesive is not particularly limited. For example, a rubber-based pressure-sensitive adhesive, an acrylic-based pressure-sensitive adhesive, a styrene / conjugated diene block copolymer-based pressure-sensitive adhesive, and a silicone-based pressure-sensitive adhesive. Etc. as a base resin, a photo-curing pressure-sensitive adhesive in which a crosslinking component composed of a polyfunctional oligomer or a polyfunctional monomer and an ultraviolet polymerization initiator are blended, a thermosetting pressure-sensitive adhesive in which a crosslinking component and a thermal polymerization initiator are blended, etc. Can be mentioned.

なお、本実施形態においては、粘着テープ2と未硬化で粘着性を有する熱硬化性樹脂フィルム3とを有する電子部品固定用テープ4を使用するようにしたが、粘着テープ2に替えて剥離フィルムと熱硬化性樹脂フィルム3とを有する電子部品固定用テープを使用することもできる。剥離フィルムの構成材料としては、ポリエチレン、ポリプロピレン、ポリエチレンテレフタレート、結晶性フッ素樹脂、非晶質フッ素樹脂、シリコーン樹脂等の合成樹脂フィルムがあげられ、これらを単独で又は2種以上組み合わせて使用してもよい。
剥離フィルムの表面には熱硬化性樹脂フィルム3からの剥離性を高めるため、必要に応じてシリコーン処理、長鎖アルキル処理、フッ素処理等の剥離処理が施されていてもよい。
In this embodiment, the electronic component fixing tape 4 having the adhesive tape 2 and the uncured thermosetting resin film 3 having adhesiveness is used, but the release film is used instead of the adhesive tape 2. It is also possible to use an electronic component fixing tape having a thermosetting resin film 3. Examples of the constituent material for the release film include synthetic resin films such as polyethylene, polypropylene, polyethylene terephthalate, crystalline fluororesin, amorphous fluororesin, and silicone resin. These can be used alone or in combination of two or more. Also good.
The surface of the release film may be subjected to release treatment such as silicone treatment, long-chain alkyl treatment, and fluorine treatment as necessary in order to enhance the peelability from the thermosetting resin film 3.

(電子部品仮固定工程)
その後、図1(C)に示すように、電子部品5を収容穴部1内に収納して、電子部品5の裏面を熱硬化性樹脂フィルム3に貼り付けて仮固定する。これにより、樹脂の充填圧力で電子部品5の位置ずれや傾きが生じないようにすることができる。
(Electronic parts temporary fixing process)
Thereafter, as shown in FIG. 1C, the electronic component 5 is accommodated in the accommodating hole 1, and the back surface of the electronic component 5 is attached to the thermosetting resin film 3 and temporarily fixed. Accordingly, it is possible to prevent the electronic component 5 from being displaced or tilted by the resin filling pressure.

電子部品5は、本実施形態においては積層セラミックコンデンサ(multi−layer ceramic capacitor)である。以下、MLCC5という。MLCC5は、全体として長方形の平板状をなしている。MLCC5は、その長手方向の両端に、表面が電極11で覆われている領域を有している。電極11は、MLCC5の内部導体に繋がる通電電極である。   In this embodiment, the electronic component 5 is a multi-layer ceramic capacitor. Hereinafter referred to as MLCC5. The MLCC 5 has a rectangular flat plate shape as a whole. The MLCC 5 has regions whose surfaces are covered with the electrodes 11 at both ends in the longitudinal direction. The electrode 11 is a conducting electrode connected to the inner conductor of the MLCC 5.

本実施形態においては、電子部品5として、MLCC5を例示したが、半導体チップ、抵抗素子、インダクタ素子などの接続端子を備えた各種の電子部品を使用することができる。また、コア基板100の1つの収容穴部1に複数の電子部品5を配置してもよい。   In this embodiment, although MLCC5 was illustrated as the electronic component 5, various electronic components provided with connection terminals, such as a semiconductor chip, a resistive element, and an inductor element, can be used. In addition, a plurality of electronic components 5 may be arranged in one accommodation hole 1 of the core substrate 100.

(充填供給工程)
次に、図1(D)に示すように、コア基板100の主面に、未硬化のフィルム状の樹脂充填材6をラミネートする。フィルム状の樹脂充填材6としては、エポキシ樹脂その他の熱硬化性樹脂であって、未硬化のものを用いることができる。特に、Bステージと称される半硬化状態のものが好ましい。また、ガラスクロス(心材)入りではないものが好ましい。本実施形態においては、上述の電子部品固定用テープ4の熱硬化性樹脂フィルム3の軟化温度の方が、樹脂充填材6の軟化温度よりも高い。なお、このラミネートは、減圧雰囲気下で行うことが望ましい。
(Filling supply process)
Next, as shown in FIG. 1D, an uncured film-like resin filler 6 is laminated on the main surface of the core substrate 100. As the film-like resin filler 6, an epoxy resin or other thermosetting resin that is uncured can be used. Particularly preferred is a semi-cured state called B stage. Moreover, what does not contain glass cloth (heart material) is preferable. In the present embodiment, the softening temperature of the thermosetting resin film 3 of the electronic component fixing tape 4 is higher than the softening temperature of the resin filler 6. In addition, it is desirable to perform this lamination in a reduced pressure atmosphere.

このラミネートは、公知のラミネータ(積層装置)を用いて、コア基板100等を板厚方向にプレスすることにより行われる。これにより、樹脂充填材6を軟化、流動化させ、図2(A)に示すように、その一部を収容穴部1における内壁面とMLCC5との間の隙間に押し込む。こうして、当該隙間を充填樹脂12により充填する。つまり充填樹脂12は、もともとはフィルム状の樹脂充填材6を構成する樹脂の一部である。フィルム状の樹脂充填材6のうち当該隙間に押し込まれずにコア基板100の主面やMLCC5の表面上に残っている部分が主面側の上層層間絶縁層13となる。よって充填樹脂12は、上層層間絶縁層13に対して界面なく繋がっている。   This lamination is performed by pressing the core substrate 100 and the like in the plate thickness direction using a known laminator (lamination device). Thereby, the resin filler 6 is softened and fluidized, and a part of the resin filler 6 is pushed into the gap between the inner wall surface of the accommodation hole 1 and the MLCC 5 as shown in FIG. Thus, the gap is filled with the filling resin 12. That is, the filling resin 12 is part of the resin that originally forms the film-like resin filler 6. Of the film-like resin filler 6, the portion remaining on the main surface of the core substrate 100 and the surface of the MLCC 5 without being pushed into the gap becomes the upper interlayer insulating layer 13 on the main surface side. Therefore, the filling resin 12 is connected to the upper interlayer insulating layer 13 without an interface.

このラミネートは、樹脂充填材6は軟化するが、熱硬化性樹脂フィルム3は軟化しない温度であって、樹脂充填材6および熱硬化性樹脂フィルム3が硬化してしまうことのない程度の圧力や温度で行う。したがって、このラミネートの際には、熱硬化性樹脂フィルム3は軟化しないため、MLCC5の底面側が安定し、充填樹脂12が充填される際に、より確実にMLCC5の傾きや位置ずれを防止することができる。なお、「樹脂充填材6および熱硬化性樹脂フィルム3が硬化してしまうことのない程度の圧力や温度」とは、樹脂充填材6および熱硬化性樹脂フィルム3が完全に硬化しない圧力や温度であればよく、開始剤の一部が反応して一部硬化が起こる圧力や温度を含む。したがって、樹脂充填材6や熱硬化性樹脂フィルム3に低温(本ラミネート時の加熱温度)で硬化を生じさせる開始剤を意図的に少量添加することにより、樹脂充填材6や熱硬化性樹脂フィルム3を一部硬化させてもよく、この場合、MLCC5をより確実に固定することができる。   This laminate has a temperature at which the resin filler 6 is softened but the thermosetting resin film 3 is not softened, and the resin filler 6 and the thermosetting resin film 3 are not cured. Do at temperature. Therefore, since the thermosetting resin film 3 is not softened during the lamination, the bottom surface side of the MLCC 5 is stabilized, and when the filling resin 12 is filled, the tilt and misalignment of the MLCC 5 can be more reliably prevented. Can do. The “pressure and temperature at which the resin filler 6 and the thermosetting resin film 3 are not cured” means the pressure and temperature at which the resin filler 6 and the thermosetting resin film 3 are not completely cured. The pressure and temperature at which a part of the initiator reacts to cause a partial curing are included. Therefore, the resin filler 6 and the thermosetting resin film are intentionally added to the resin filler 6 and the thermosetting resin film 3 by a small amount of an initiator that causes curing at a low temperature (heating temperature at the time of the main lamination). 3 may be partially cured, and in this case, the MLCC 5 can be more reliably fixed.

(平坦化プレス工程)
上述のラミネータによるプレスを行った後、公知の平坦化プレス機を用いて、樹脂充填材6および熱硬化性樹脂フィルム3が軟化する温度であって、樹脂充填材6および熱硬化性樹脂フィルム3が硬化してしまうことのない程度の圧力や温度でプレスを行う。これにより、熱硬化性樹脂フィルム3を軟化、流動化させ、コア裏面X2の配線パターン7等の凹凸面に追従させる。熱硬化性樹脂フィルム3は、裏面側の上層層間絶縁層14となる。この平坦化プレスにより、主面側の上層層間絶縁層13と裏面側の上層層間絶縁層14の表面が平坦化される。すなわち、図2(B)に示すように、樹脂充填材6および熱硬化性樹脂フィルム3は、充填樹脂12および上層層間絶縁層13,14を一体的に形成した状態で、表面(熱硬化性樹脂フィルム3にあっては、粘着テープ2側の面)が平坦化される。なお、この平坦化プレスの際、MLCC5はほぼ、同じ姿勢で同じ位置にある。平坦化プレス時に行われる板厚方向のプレスの圧力は、MLCC5の両面にかかるからである。
(Flattening press process)
After the above laminator is pressed, the resin filler 6 and the thermosetting resin film 3 are softened using a known flattening press, and the resin filler 6 and the thermosetting resin film 3 are softened. Is pressed at a pressure and temperature that does not cure. Thereby, the thermosetting resin film 3 is softened and fluidized to follow the uneven surface such as the wiring pattern 7 on the core back surface X2. The thermosetting resin film 3 becomes the upper interlayer insulating layer 14 on the back side. By this flattening press, the surfaces of the upper interlayer insulating layer 13 on the main surface side and the upper interlayer insulating layer 14 on the back surface side are flattened. That is, as shown in FIG. 2B, the resin filler 6 and the thermosetting resin film 3 have a surface (thermosetting property) in a state where the filling resin 12 and the upper interlayer insulating layers 13 and 14 are integrally formed. In the resin film 3, the surface on the pressure-sensitive adhesive tape 2 side is flattened. In this flattening press, the MLCC 5 is substantially in the same position and in the same position. This is because the pressing pressure in the thickness direction performed during the flattening press is applied to both sides of the MLCC 5.

なお、本実施形態においては、上述の電子部品固定用テープ4の熱硬化性樹脂フィルム3の軟化温度の方が、樹脂充填材6の軟化温度よりも高いものを用いたが、同程度の軟化温度のものを用いてもよい。この場合、充填供給工程において、熱硬化性樹脂フィルム3も軟化、流動化し、その一部が収容穴部1における底面とMLCC5の電極11間との間等の隙間に押し込まれる。このとき、MLCC5はほぼ、同じ姿勢で同じ位置にある。ラミネート時に行われる板厚方向のプレスの圧力は、MLCC5の両面にかかるからである。   In the present embodiment, the softening temperature of the thermosetting resin film 3 of the above-described electronic component fixing tape 4 is higher than the softening temperature of the resin filler 6. You may use the thing of temperature. In this case, in the filling and supplying step, the thermosetting resin film 3 is also softened and fluidized, and a part thereof is pushed into a gap such as between the bottom surface of the accommodation hole 1 and the electrode 11 of the MLCC 5. At this time, the MLCC 5 is substantially in the same position with the same posture. This is because the pressure of the press in the thickness direction performed at the time of lamination is applied to both surfaces of the MLCC 5.

(剥離工程)
次に、粘着テープ2を剥離する。粘着テープ2の粘着力自体はそれほど強いものではないので、コア基板100から容易に粘着テープ2を剥ぎ取ることができる。刺激硬化型粘着層を用いた場合は、適切な紫外線照射等の刺激の付与を行った後に、粘着テープ2を剥ぎ取る。このとき、熱硬化性樹脂フィルム3やMLCC5等は、粘着テープ2とともに離脱するのではなく、コア基板100に残る。詳細には、上層層間絶縁層13および充填樹脂12の構成樹脂は、未硬化であるが、常温では流動性をもたないため、MLCC5は、上層層間絶縁層13および充填樹脂12、熱硬化性樹脂フィルム3によりしっかりと保持される。
(Peeling process)
Next, the adhesive tape 2 is peeled off. Since the adhesive force itself of the adhesive tape 2 is not so strong, the adhesive tape 2 can be easily peeled off from the core substrate 100. When the stimulus curable pressure-sensitive adhesive layer is used, the pressure-sensitive adhesive tape 2 is peeled off after applying an appropriate stimulus such as ultraviolet irradiation. At this time, the thermosetting resin film 3 and the MLCC 5 are not separated from the adhesive tape 2 but remain on the core substrate 100. Specifically, the constituent resin of the upper interlayer insulating layer 13 and the filling resin 12 is uncured, but has no fluidity at room temperature. Therefore, the MLCC 5 has the upper interlayer insulating layer 13 and the filling resin 12, thermosetting It is firmly held by the resin film 3.

(硬化工程)
次に、硬化処理を行う。すなわち、上記の平坦化プレスが済んだコア基板100を、平坦化プレスにおけるプレスの際の温度よりも高温で加熱して、熱硬化性樹脂を硬化させる。これにより、未硬化のまま隙間なく接している樹脂充填材6と熱硬化性樹脂フィルム3とが、同時に硬化する。このため、上層層間絶縁層13,14および充填樹脂12は、界面なく連続して絶縁樹脂部をなす。またこの硬化処理により、図2(C)に示した状態でMLCC5の姿勢が固定される。
(Curing process)
Next, a curing process is performed. That is, the core substrate 100 that has been subjected to the above-described planarization press is heated at a temperature higher than the temperature at the time of pressing in the planarization press to cure the thermosetting resin. As a result, the resin filler 6 and the thermosetting resin film 3 that are in contact with each other without being cured are cured simultaneously. For this reason, the upper interlayer insulating layers 13 and 14 and the filling resin 12 continuously form an insulating resin portion without an interface. In addition, this curing process fixes the posture of the MLCC 5 in the state shown in FIG.

(外層形成工程)
その後、図2(D)に示すように、外層配線パターン15等を形成する。図2(D)の例では、外層配線パターン15は、上層層間絶縁層13,14の上に形成されている。外層配線パターン15の所々には、内層配線パターンとの導通をとるビアホール(図示しない)や、MLCC5の電極11との導通をとるビアホール16が形成されている。
(Outer layer forming process)
Thereafter, as shown in FIG. 2D, an outer layer wiring pattern 15 and the like are formed. In the example of FIG. 2D, the outer layer wiring pattern 15 is formed on the upper interlayer insulating layers 13 and 14. Via holes (not shown) that are electrically connected to the inner layer wiring pattern and via holes 16 that are electrically connected to the electrode 11 of the MLCC 5 are formed in the outer layer wiring pattern 15.

その後、最終工程で保護絶縁層17やバンプ18を形成する。そして、電気テストにより部品の性能や各部の絶縁性をチェックすれば電子部品内蔵配線板が完成する。   Thereafter, the protective insulating layer 17 and the bumps 18 are formed in the final process. The electronic component built-in wiring board is completed by checking the performance of the parts and the insulation of each part by an electrical test.

なお、本実施形態においては、樹脂充填材6は、未硬化のフィルム状のものを用いたが、液状のものを用いるようにしてもよい。この場合、公知のディスペンサーを用いて、樹脂充填材6を、収容穴部1の内壁面と電子部品5との隙間に充填するとともに、コア主面X1を覆うことができる程度に供給する。   In the present embodiment, the resin filler 6 is an uncured film, but a liquid filler may be used. In this case, using a known dispenser, the resin filler 6 is supplied to such an extent that the gap between the inner wall surface of the accommodation hole 1 and the electronic component 5 can be filled and the core main surface X1 can be covered.

次に、本発明の他の実施の形態について説明する。なお、上述の実施形態における符号と同じ符号を付したものは、上述の実施形態と同様の構成を有する。   Next, another embodiment of the present invention will be described. In addition, what attached | subjected the code | symbol same as the code | symbol in the above-mentioned embodiment has the structure similar to the above-mentioned embodiment.

図3および図4は、本実施形態に係る部品内蔵配線基板の製造方法を説明するための断面図である。本実施形態の部品内蔵配線基板の製造方法は、コア主面X1およびコア裏面X2の両方にて開口する収容穴部1を一つまたは複数有するコア基板100を準備する準備工程と、コア基板100の裏面側に粘着テープ2と未硬化で粘着性を有する熱硬化性樹脂フィルム3とを有する電子部品固定用テープ4の熱硬化性樹脂フィルム3面を貼り付けるテーピング工程と、電子部品5の裏面を熱硬化性樹脂フィルム3に貼り付けて仮固定する電子部品仮固定工程と、熱硬化性の樹脂充填材19を収容穴部1の内壁面と電子部品5との隙間に充填する充填工程と、コア主面X1側に未硬化のコア主面側用熱硬化性樹脂フィルム20を供給する供給工程と、硬化性樹脂フィルムの粘着テープ2側の面およびコア主面側用熱硬化性樹脂フィルム20の表面をそれぞれ平坦化する平坦化プレス工程と、粘着テープ2を剥離する剥離工程と、熱硬化性樹脂フィルム3、樹脂充填材19およびコア主面側用熱硬化性樹脂フィルム20を加熱硬化する硬化工程と、外層を形成する外層形成工程を有する。以下、各工程について説明する。   3 and 4 are cross-sectional views for explaining the method of manufacturing the component built-in wiring board according to the present embodiment. The manufacturing method of the component built-in wiring board according to the present embodiment includes a preparation step of preparing a core substrate 100 having one or a plurality of receiving hole portions 1 opened on both the core main surface X1 and the core back surface X2, and the core substrate 100. A taping step of attaching the thermosetting resin film 3 surface of the electronic component fixing tape 4 having the adhesive tape 2 and the uncured thermosetting resin film 3 having adhesiveness to the back surface side of the electronic component 5, and the back surface of the electronic component 5 An electronic component temporary fixing step in which the thermosetting resin film 19 is temporarily attached to the thermosetting resin film 3, and a filling step in which the thermosetting resin filler 19 is filled in the gap between the inner wall surface of the housing hole 1 and the electronic component 5; The supply process of supplying the uncured core main surface side thermosetting resin film 20 to the core main surface X1 side, the adhesive tape 2 side surface of the curable resin film, and the core main surface side thermosetting resin film 20 surfaces A flattening press step for flattening, a peeling step for peeling off the adhesive tape 2, a curing step for heating and curing the thermosetting resin film 3, the resin filler 19, and the thermosetting resin film 20 for the core main surface side, and And an outer layer forming step of forming the outer layer. Hereinafter, each step will be described.

(準備工程)
まず、図3(A)に示すように、本発明の実施形態に係る部品内蔵配線基板の製造方法において使用するコア基板100を準備する。コア基板100は、コア主面X1およびコア裏面X2の両方にて開口する収容穴部1を一つまたは複数有している。このコア基板100は、上述の実施形態に係る部品内蔵配線基板の製造方法で使用するコア基板100と同様のものを使用することができる。
(Preparation process)
First, as shown in FIG. 3A, a core substrate 100 used in the method for manufacturing a component built-in wiring board according to the embodiment of the present invention is prepared. The core substrate 100 has one or a plurality of accommodation holes 1 that are open on both the core main surface X1 and the core back surface X2. The core substrate 100 can be the same as the core substrate 100 used in the method for manufacturing a component built-in wiring substrate according to the above-described embodiment.

(テーピング工程)
続いて、図3(B)に示すように、コア基板100のコア裏面X2側に、粘着テープ2と未硬化で粘着性を有する熱硬化性樹脂フィルム3とを有する電子部品固定用テープ4を、熱硬化性樹脂フィルム3面がコア裏面X2側となるように、ラミネートする。これにより、収容穴部1の開口面が一方の面において電子部品固定用テープ4により塞がれた状態となる。つまり、電子部品固定用テープ4が収容穴部1の底面をなしており、その熱硬化性樹脂フィルム3が収容穴部1内に露出している。この電子部品固定用テープ4は、上述の実施形態に係る部品内蔵配線基板の製造方法で使用する電子部品固定用テープ4と同様のものを使用することができる。
(Taping process)
Subsequently, as shown in FIG. 3B, the electronic component fixing tape 4 having the adhesive tape 2 and the uncured thermosetting resin film 3 having adhesiveness on the core back surface X2 side of the core substrate 100 is provided. Lamination is performed so that the surface of the thermosetting resin film 3 is on the core back surface X2 side. Thereby, the opening surface of the accommodation hole part 1 will be in the state obstruct | occluded by the electronic component fixing tape 4 in one surface. That is, the electronic component fixing tape 4 forms the bottom surface of the accommodation hole 1, and the thermosetting resin film 3 is exposed in the accommodation hole 1. The electronic component fixing tape 4 can be the same as the electronic component fixing tape 4 used in the method of manufacturing the component built-in wiring board according to the above-described embodiment.

(電子部品仮固定工程)
その後、図3(C)に示すように、電子部品5を収容穴部1内に収納して、電子部品5の裏面を熱硬化性樹脂フィルム3に貼り付けて仮固定する。電子部品5は、上述の実施形態における電子部品5と同様のものである。
(Electronic parts temporary fixing process)
Thereafter, as shown in FIG. 3C, the electronic component 5 is accommodated in the accommodation hole 1, and the back surface of the electronic component 5 is attached to the thermosetting resin film 3 and temporarily fixed. The electronic component 5 is the same as the electronic component 5 in the above-described embodiment.

(充填工程)
次に、図3(D)に示すように、液状の樹脂充填材19を、収容穴部1における側壁面とMLCC5との間の隙間に充填する。充填は公知のディスペンサーにより行うことができる。本実施形態においては、収容穴部1内が樹脂充填材19により充填されていればよく、コア主面X1を覆う程に樹脂充填材19を供給する必要はない。
(Filling process)
Next, as shown in FIG. 3D, the liquid resin filler 19 is filled in the gap between the side wall surface of the accommodation hole 1 and the MLCC 5. Filling can be performed by a known dispenser. In the present embodiment, it is sufficient that the inside of the accommodation hole 1 is filled with the resin filler 19, and it is not necessary to supply the resin filler 19 to the extent that the core main surface X1 is covered.

(供給工程)
次に、図4(A)に示すように、コア主面X1側に未硬化のコア主面側用熱硬化性樹脂フィルム20をラミネートする。このコア主面側用熱硬化性樹脂フィルム20は、コア主面X1に上層層間絶縁層23を形成するためのものである。コア主面側用熱硬化性樹脂フィルム20は、加熱硬化後に絶縁層として適するものであれば、特に限定されるものではない。例えば、エポキシ樹脂その他の熱硬化性樹脂をフィルム状にしたものであって、未硬化のものを用いることができる。特に、Bステージと称される半硬化状態のものが好ましい。
(Supply process)
Next, as shown in FIG. 4A, an uncured thermosetting resin film 20 for core main surface side is laminated on the core main surface X1 side. The core main surface side thermosetting resin film 20 is for forming the upper interlayer insulating layer 23 on the core main surface X1. The core main surface side thermosetting resin film 20 is not particularly limited as long as it is suitable as an insulating layer after heat curing. For example, an epoxy resin or other thermosetting resin formed into a film and uncured can be used. Particularly preferred is a semi-cured state called B stage.

(平坦化プレス工程)
その後、公知の平坦化プレス機を用いて、樹脂充填材19、熱硬化性樹脂フィルム3およびコア主面側用熱硬化性樹脂フィルム20が軟化する温度であって、熱硬化性樹脂フィルム3およびコア主面側用熱硬化性樹脂フィルム20が硬化してしまうことのない程度の圧力や温度でプレスを行う。これにより、コア主面側用熱硬化性樹脂フィルム20を軟化、流動化させ、コア主面X1の配線パターン7等の凹凸面に追従させ、熱硬化性樹脂フィルム3を軟化、流動化させ、コア裏面X2の配線パターン7等の凹凸面に追従させる。コア主面側用熱硬化性樹脂フィルム20は、主面側の上層層間絶縁層23となり、熱硬化性樹脂フィルム3は、裏面側の上層層間絶縁層24となる。この平坦化プレスにより、主面側の上層層間絶縁層23と裏面側の上層層間絶縁層24の表面が平坦化される。すなわち、図4(B)に示すように、熱硬化性樹脂フィルム3およびコア主面側用熱硬化性樹脂フィルム20は、充填樹脂12と一体的になった状態で、表面(熱硬化性樹脂フィルム3にあっては、粘着テープ2側の面)が平坦化される。
(Flattening press process)
Thereafter, using a known flattening press, the resin filler 19, the thermosetting resin film 3 and the core main surface side thermosetting resin film 20 are softened at a temperature, and the thermosetting resin film 3 and The core main surface side thermosetting resin film 20 is pressed at a pressure or temperature that does not cure. Thereby, the thermosetting resin film 20 for core main surface side is softened and fluidized, followed by uneven surfaces such as the wiring pattern 7 of the core main surface X1, and the thermosetting resin film 3 is softened and fluidized. It is made to follow uneven surfaces, such as the wiring pattern 7 of the core back surface X2. The thermosetting resin film 20 for the core main surface side becomes the upper interlayer insulating layer 23 on the main surface side, and the thermosetting resin film 3 becomes the upper interlayer insulating layer 24 on the back surface side. By this flattening press, the surfaces of the upper interlayer insulating layer 23 on the main surface side and the upper interlayer insulating layer 24 on the back surface side are flattened. That is, as shown in FIG. 4 (B), the thermosetting resin film 3 and the core main surface side thermosetting resin film 20 are integrated with the filling resin 12 in the surface (thermosetting resin). In the film 3, the adhesive tape 2 side surface) is flattened.

(剥離工程)
次に、粘着テープ2を剥離する。粘着テープ2の粘着力自体はそれほど強いものではないので、コア基板100から容易に粘着テープ2を剥ぎ取ることができる。刺激硬化型粘着層を用いた場合は、適切な紫外線照射等の刺激の付与を行った後に、粘着テープ2を剥ぎ取る。
(Peeling process)
Next, the adhesive tape 2 is peeled off. Since the adhesive force itself of the adhesive tape 2 is not so strong, the adhesive tape 2 can be easily peeled off from the core substrate 100. When the stimulus curable pressure-sensitive adhesive layer is used, the pressure-sensitive adhesive tape 2 is peeled off after applying an appropriate stimulus such as ultraviolet irradiation.

(硬化工程)
次に、硬化処理を行う。すなわち、上記の平坦化プレスが済んだコア基板100を、平坦化プレスにおけるプレスの際の温度よりも高温で加熱して、熱硬化性樹脂を硬化させる。これにより、未硬化のまま隙間なく接している樹脂充填材19、熱硬化性樹脂フィルム3およびコア主面側用熱硬化性樹脂フィルム20が、同時に硬化する。このため、上層層間絶縁層23および充填樹脂22は、界面なく連続して絶縁樹脂部をなす。またこの硬化処理により、図4(C)に示した状態でMLCC5の姿勢が固定される。
(Curing process)
Next, a curing process is performed. That is, the core substrate 100 that has been subjected to the above-described planarization press is heated at a temperature higher than the temperature at the time of pressing in the planarization press to cure the thermosetting resin. Thereby, the resin filler 19, the thermosetting resin film 3 and the core main surface side thermosetting resin film 20 that are in contact with each other without being cured are cured at the same time. Therefore, the upper interlayer insulating layer 23 and the filling resin 22 continuously form an insulating resin portion without an interface. Further, this curing process fixes the posture of the MLCC 5 in the state shown in FIG.

(外層形成工程等)
その後、図4(D)に示すように、上述の実施形態と同様にして、外層配線パターン15、ビアホール(図示しない)、保護絶縁層17、バンプ18等を形成する。
(Outer layer formation process, etc.)
Thereafter, as shown in FIG. 4D, the outer layer wiring pattern 15, the via hole (not shown), the protective insulating layer 17, the bump 18 and the like are formed in the same manner as the above-described embodiment.

上述のように、本発明の部品内蔵配線基板の製造方法によれば、コア主面X1側の上層層間絶縁層13,23とコア裏面X2側の上層層間絶縁層14,24の平坦化プレスを同時に行うことができるため、製造工程を簡略化することができる。また、粘着テープ2を剥離した後に、コア裏面X2側の上層層間絶縁層を形成するための熱硬化性樹脂フィルムを貼合する必要がないため、製造工程を簡略化することができる。   As described above, according to the method for manufacturing a component built-in wiring board of the present invention, the flattening press of the upper interlayer insulating layers 13 and 23 on the core main surface X1 side and the upper interlayer insulating layers 14 and 24 on the core back surface X2 side is performed. Since it can be performed simultaneously, the manufacturing process can be simplified. Moreover, since it is not necessary to bond the thermosetting resin film for forming the upper interlayer insulation layer of the core back surface X2 side after peeling off the adhesive tape 2, a manufacturing process can be simplified.

100:コア基板
1:収容穴部
2:粘着テープ
3:熱硬化性樹脂フィルム
4:電子部品固定用テープ
5:電子部品(MLCC)
6,19:樹脂充填材
9:基材フィルム
10:粘着剤層
20:コア主面側用熱硬化性樹脂フィルム
13,14,23,24:上層層間絶縁層
100: Core substrate 1: Housing hole part 2: Adhesive tape 3: Thermosetting resin film 4: Electronic component fixing tape 5: Electronic component (MLCC)
6, 19: Resin filler 9: Base film 10: Adhesive layer 20: Thermosetting resin film for core main surface side 13, 14, 23, 24: Upper interlayer insulating layer

Claims (11)

コア主面およびコア裏面の両方にて開口する収容穴部を一つまたは複数有するコア基板の前記コア裏面側に、粘着テープと未硬化で粘着性を有する熱硬化性樹脂フィルムとを有する電子部品固定用テープの前記熱硬化性樹脂フィルム面を貼り付けるテーピング工程と、
前記収容穴部内に電子部品を収容し、前記電子部品の裏面を前記熱硬化性樹脂フィルムに貼り付けて仮固定する電子部品仮固定工程と、
熱硬化性の樹脂充填材を、前記収容穴部の内壁面と前記電子部品との隙間に充填するとともに、前記コア主面を覆うことができる程度に供給する充填供給工程と、
前記熱硬化性樹脂フィルムおよび前記樹脂充填材が硬化することのない温度で加熱するとともに加圧することにより、前記熱硬化性樹脂フィルムの粘着テープ側の面および前記樹脂充填材の表面をそれぞれ平坦化する平坦化プレス工程と、
前記粘着テープを剥離する剥離工程と、
前記熱硬化性樹脂フィルムおよび前記樹脂充填材を加熱硬化する硬化工程と
を含むことを特徴とする部品内蔵配線基板の製造方法。
An electronic component having an adhesive tape and an uncured thermosetting resin film on the core back surface side of the core substrate having one or a plurality of receiving hole portions opened on both the core main surface and the core back surface A taping step of applying the thermosetting resin film surface of the fixing tape;
An electronic component temporary fixing step of storing an electronic component in the storage hole, and temporarily fixing the electronic component by attaching the back surface of the electronic component to the thermosetting resin film;
Filling and supplying a thermosetting resin filler into the gap between the inner wall surface of the accommodation hole and the electronic component and supplying the core main surface to the extent that the core main surface can be covered;
By heating and pressurizing at a temperature at which the thermosetting resin film and the resin filler are not cured, the surface of the thermosetting resin film on the adhesive tape side and the surface of the resin filler are each flattened. Flattening press process to
A peeling step for peeling the adhesive tape;
The manufacturing method of the component built-in wiring board characterized by including the hardening process which heat-hardens the said thermosetting resin film and the said resin filler.
コア主面およびコア裏面の両方にて開口する収容穴部を一つまたは複数有するコア基板の前記コア裏面側に、剥離フィルムと未硬化で粘着性を有する熱硬化性樹脂フィルムとを有する電子部品固定用テープの前記熱硬化性樹脂フィルム面を貼り付けるテーピング工程と、
前記収容穴部内に電子部品を収容し、前記電子部品の裏面を前記熱硬化性樹脂フィルムに貼り付けて仮固定する電子部品仮固定工程と、
熱硬化性の樹脂充填材を、前記収容穴部の内壁面と前記電子部品との隙間に充填するとともに、前記コア主面を覆うことができる程度に供給する充填供給工程と、
前記熱硬化性樹脂フィルムおよび前記樹脂充填材が硬化することのない温度で加熱するとともに加圧することにより、前記熱硬化性樹脂フィルムの剥離フィルム側の面および前記樹脂充填材の表面をそれぞれ平坦化する平坦化プレス工程と、
前記剥離フィルムを剥離する剥離工程と、
前記熱硬化性樹脂フィルムおよび前記樹脂充填材を加熱硬化する硬化工程と
を含むことを特徴とする部品内蔵配線基板の製造方法。
An electronic component having a release film and an uncured and thermosetting resin film on the core back surface side of the core substrate having one or a plurality of receiving holes that are open on both the core main surface and the core back surface A taping step of applying the thermosetting resin film surface of the fixing tape;
An electronic component temporary fixing step of storing an electronic component in the storage hole, and temporarily fixing the electronic component by attaching the back surface of the electronic component to the thermosetting resin film;
Filling and supplying a thermosetting resin filler into the gap between the inner wall surface of the accommodation hole and the electronic component and supplying the core main surface to the extent that the core main surface can be covered;
The surface of the release film side of the thermosetting resin film and the surface of the resin filler are each flattened by heating and pressing at a temperature at which the thermosetting resin film and the resin filler are not cured. Flattening press process to
A peeling step for peeling the release film;
The manufacturing method of the component built-in wiring board characterized by including the hardening process which heat-hardens the said thermosetting resin film and the said resin filler.
前記樹脂充填材が未硬化のフィルム状であり、
前記充填供給工程は、前記樹脂充填材を前記コア主面に積層した後、前記樹脂充填材が硬化することのない温度で加熱するとともに加圧することにより行うことを特徴とする請求項1または請求項2に記載の部品内蔵配線基板の製造方法。
The resin filler is an uncured film,
2. The filling and supplying step is performed by laminating the resin filler on the core main surface and then heating and pressurizing the resin filler at a temperature at which the resin filler does not harden. Item 3. A method of manufacturing a component built-in wiring board according to Item 2.
前記樹脂充填材が液状であることを特徴とする請求項1または請求項2に記載の部品内蔵配線基板の製造方法。   The method for manufacturing a component built-in wiring board according to claim 1, wherein the resin filler is liquid. コア主面およびコア裏面の両方にて開口する収容穴部を一つまたは複数有するコア基板の前記コア裏面側に、粘着テープと未硬化で粘着性を有する熱硬化性樹脂フィルムとを有する電子部品固定用テープの前記熱硬化性樹脂フィルム面を貼り付けるテーピング工程と、
前記収容穴部内に電子部品を収容し、前記電子部品の裏面を前記熱硬化性樹脂フィルムに貼り付けて仮固定する電子部品仮固定工程と、
熱硬化性の樹脂充填材を前記収容穴部の内壁面と前記電子部品との隙間に充填する充填工程と、
前記コア主面側に未硬化のコア主面側用熱硬化性樹脂フィルムを供給する供給工程と、
前記熱硬化性樹脂フィルム、前記樹脂充填材および前記コア主面側用熱硬化性樹脂フィルムが硬化することのない温度で加熱するとともに加圧することにより、前記熱硬化性樹脂フィルムの粘着テープ側の面および前記コア主面側用熱硬化性樹脂フィルムの表面をそれぞれ平坦化する平坦化プレス工程と、
前記粘着テープを剥離する剥離工程と、
前記熱硬化性樹脂フィルム、前記樹脂充填材および前記コア主面側用熱硬化性樹脂フィルムを加熱硬化する硬化工程と
を含むことを特徴とする部品内蔵配線基板の製造方法。
An electronic component having an adhesive tape and an uncured thermosetting resin film on the core back surface side of the core substrate having one or a plurality of receiving hole portions opened on both the core main surface and the core back surface A taping step of applying the thermosetting resin film surface of the fixing tape;
An electronic component temporary fixing step of storing an electronic component in the storage hole, and temporarily fixing the electronic component by attaching the back surface of the electronic component to the thermosetting resin film;
A filling step of filling the gap between the inner wall surface of the housing hole and the electronic component with a thermosetting resin filler;
A supply step of supplying an uncured thermosetting resin film for the core main surface side to the core main surface side;
By heating and pressing at a temperature at which the thermosetting resin film, the resin filler and the thermosetting resin film for core main surface side are not cured, the pressure-sensitive adhesive tape side of the thermosetting resin film is A flattening press step of flattening the surface and the surface of the thermosetting resin film for the core main surface side,
A peeling step for peeling the adhesive tape;
A method of manufacturing a wiring board with a built-in component, comprising: a curing step of heat curing the thermosetting resin film, the resin filler, and the core main surface side thermosetting resin film.
コア主面およびコア裏面の両方にて開口する収容穴部を一つまたは複数有するコア基板の前記コア裏面側に、剥離フィルムと未硬化で粘着性を有する熱硬化性樹脂フィルムとを有する電子部品固定用テープの前記熱硬化性樹脂フィルム面を貼り付けるテーピング工程と、
前記収容穴部内に電子部品を収容し、前記電子部品の裏面を前記熱硬化性樹脂フィルムに貼り付けて仮固定する電子部品仮固定工程と、
熱硬化性の樹脂充填材を前記収容穴部の内壁面と前記電子部品との隙間に充填する充填工程と、
前記コア主面側に未硬化のコア主面側用熱硬化性樹脂フィルムを供給する供給工程と、
前記熱硬化性樹脂フィルム、前記樹脂充填材および前記コア主面側用熱硬化性樹脂フィルムが硬化することのない温度で加熱するとともに加圧することにより、前記熱硬化性樹脂フィルムの前記剥離フィルム側の面および前記コア主面側用熱硬化性樹脂フィルムの表面をそれぞれ平坦化する平坦化プレス工程と、
前記剥離フィルムを剥離する剥離工程と、
前記熱硬化性樹脂フィルム、前記樹脂充填材および前記コア主面側用熱硬化性樹脂フィルムを加熱硬化する硬化工程と
を含むことを特徴とする部品内蔵配線基板の製造方法。
An electronic component having a release film and an uncured and thermosetting resin film on the core back surface side of the core substrate having one or a plurality of receiving holes that are open on both the core main surface and the core back surface A taping step of applying the thermosetting resin film surface of the fixing tape;
An electronic component temporary fixing step of storing an electronic component in the storage hole, and temporarily fixing the electronic component by attaching the back surface of the electronic component to the thermosetting resin film;
A filling step of filling the gap between the inner wall surface of the housing hole and the electronic component with a thermosetting resin filler;
A supply step of supplying an uncured thermosetting resin film for the core main surface side to the core main surface side;
The release film side of the thermosetting resin film is heated and pressed at a temperature at which the thermosetting resin film, the resin filler, and the thermosetting resin film for the core main surface side are not cured. And a flattening press step for flattening the surface of the core main surface side thermosetting resin film,
A peeling step for peeling the release film;
A method of manufacturing a wiring board with a built-in component, comprising: a curing step of heat curing the thermosetting resin film, the resin filler, and the core main surface side thermosetting resin film.
前記熱硬化性樹脂フィルムの軟化温度が、前記樹脂充填材の軟化温度よりも高いことを特徴とする請求項1から請求項6のいずれか一項に記載の部品内蔵配線基板の製造方法。   The method for manufacturing a wiring board with a built-in component according to any one of claims 1 to 6, wherein a softening temperature of the thermosetting resin film is higher than a softening temperature of the resin filler. 前記粘着テープが、刺激により硬化する刺激硬化型の粘着剤層を有することを特徴とする請求項1から請求項7のいずれか一項に記載の部品内蔵配線基板の製造方法。   The method for manufacturing a wiring board with a built-in component according to claim 1, wherein the pressure-sensitive adhesive tape has a stimulus-curing pressure-sensitive adhesive layer that is cured by stimulation. 請求項1から請求項8のいずれか一項に記載の部品内蔵配線基板の製造方法により製造されたことを特徴とする部品内蔵配線基板。   A component built-in wiring board manufactured by the method for manufacturing a component built-in wiring substrate according to any one of claims 1 to 8. 粘着テープと未硬化で粘着性を有する熱硬化性樹脂フィルムとを有し、
コア主面およびコア裏面の両方にて開口する収容穴部を一つまたは複数有するコア基板の前記コア裏面側に前記熱硬化性樹脂フィルム面を貼り付けるテーピング工程と、
前記収容穴部内に電子部品を収容し、前記電子部品の裏面を前記熱硬化性樹脂フィルムに貼り付けて仮固定する電子部品仮固定工程と、
熱硬化性の樹脂充填材を、前記収容穴部の内壁面と前記電子部品との隙間に充填するとともに、前記コア主面を覆うことができる程度に供給する充填供給工程と、
前記熱硬化性樹脂フィルムおよび前記樹脂充填材が硬化することのない温度で加熱するとともに加圧することにより、前記熱硬化性樹脂フィルムの粘着テープ側の面および前記樹脂充填材の表面をそれぞれ平坦化する平坦化プレス工程と、
前記粘着テープを剥離する剥離工程と、
前記熱硬化性樹脂フィルムおよび前記樹脂充填材を加熱硬化する硬化工程と
を含む部品内蔵配線基板の製造方法に用いることを特徴とする電子部品固定用テープ。
It has an adhesive tape and a thermosetting resin film that is uncured and has adhesiveness,
A taping step of affixing the thermosetting resin film surface to the core back surface side of the core substrate having one or a plurality of accommodation holes that are open on both the core main surface and the core back surface;
An electronic component temporary fixing step of storing an electronic component in the storage hole, and temporarily fixing the electronic component by attaching the back surface of the electronic component to the thermosetting resin film;
Filling and supplying a thermosetting resin filler into the gap between the inner wall surface of the accommodation hole and the electronic component and supplying the core main surface to the extent that the core main surface can be covered;
By heating and pressurizing at a temperature at which the thermosetting resin film and the resin filler are not cured, the surface of the thermosetting resin film on the adhesive tape side and the surface of the resin filler are each flattened. Flattening press process to
A peeling step for peeling the adhesive tape;
An electronic component fixing tape characterized by being used in a method for manufacturing a component built-in wiring board including a curing step in which the thermosetting resin film and the resin filler are heated and cured.
剥離フィルムと未硬化で粘着性を有する熱硬化性樹脂フィルムとを有し、
コア主面およびコア裏面の両方にて開口する収容穴部を一つまたは複数有するコア基板の前記コア裏面側に前記熱硬化性樹脂フィルム面を貼り付けるテーピング工程と、
前記収容穴部内に電子部品を収容し、前記電子部品の裏面を前記熱硬化性樹脂フィルムに貼り付けて仮固定する電子部品仮固定工程と、
熱硬化性の樹脂充填材を、前記収容穴部の内壁面と前記電子部品との隙間に充填するとともに、前記コア主面を覆うことができる程度に供給する充填供給工程と、
前記熱硬化性樹脂フィルムおよび前記樹脂充填材が硬化することのない温度で加熱するとともに加圧することにより、前記熱硬化性樹脂フィルムの剥離フィルム側の面および前記樹脂充填材の表面をそれぞれ平坦化する平坦化プレス工程と、
前記剥離フィルムを剥離する剥離工程と、
前記熱硬化性樹脂フィルムおよび前記樹脂充填材を加熱硬化する硬化工程と
を含む部品内蔵配線基板の製造方法に用いることを特徴とする電子部品固定用テープ。
It has a release film and a thermosetting resin film that is uncured and sticky,
A taping step of affixing the thermosetting resin film surface to the core back surface side of the core substrate having one or a plurality of accommodation holes that are open on both the core main surface and the core back surface;
An electronic component temporary fixing step of storing an electronic component in the storage hole, and temporarily fixing the electronic component by attaching the back surface of the electronic component to the thermosetting resin film;
Filling and supplying a thermosetting resin filler into the gap between the inner wall surface of the accommodation hole and the electronic component and supplying the core main surface to the extent that the core main surface can be covered;
The surface of the release film side of the thermosetting resin film and the surface of the resin filler are each flattened by heating and pressing at a temperature at which the thermosetting resin film and the resin filler are not cured. Flattening press process to
A peeling step for peeling the release film;
An electronic component fixing tape characterized by being used in a method for manufacturing a component built-in wiring board including a curing step in which the thermosetting resin film and the resin filler are heated and cured.
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