JP2017027829A5 - - Google Patents

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Publication number
JP2017027829A5
JP2017027829A5 JP2015146549A JP2015146549A JP2017027829A5 JP 2017027829 A5 JP2017027829 A5 JP 2017027829A5 JP 2015146549 A JP2015146549 A JP 2015146549A JP 2015146549 A JP2015146549 A JP 2015146549A JP 2017027829 A5 JP2017027829 A5 JP 2017027829A5
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JP
Japan
Prior art keywords
charged particle
particle beam
image
condition
processing unit
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Application number
JP2015146549A
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English (en)
Japanese (ja)
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JP6470654B2 (ja
JP2017027829A (ja
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Priority to JP2015146549A priority Critical patent/JP6470654B2/ja
Priority claimed from JP2015146549A external-priority patent/JP6470654B2/ja
Priority to US15/217,460 priority patent/US10037866B2/en
Publication of JP2017027829A publication Critical patent/JP2017027829A/ja
Publication of JP2017027829A5 publication Critical patent/JP2017027829A5/ja
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Publication of JP6470654B2 publication Critical patent/JP6470654B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2015146549A 2015-07-24 2015-07-24 荷電粒子線装置 Expired - Fee Related JP6470654B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2015146549A JP6470654B2 (ja) 2015-07-24 2015-07-24 荷電粒子線装置
US15/217,460 US10037866B2 (en) 2015-07-24 2016-07-22 Charged particle beam apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2015146549A JP6470654B2 (ja) 2015-07-24 2015-07-24 荷電粒子線装置

Publications (3)

Publication Number Publication Date
JP2017027829A JP2017027829A (ja) 2017-02-02
JP2017027829A5 true JP2017027829A5 (enExample) 2018-02-01
JP6470654B2 JP6470654B2 (ja) 2019-02-13

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ID=57837778

Family Applications (1)

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JP2015146549A Expired - Fee Related JP6470654B2 (ja) 2015-07-24 2015-07-24 荷電粒子線装置

Country Status (2)

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US (1) US10037866B2 (enExample)
JP (1) JP6470654B2 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101815850B1 (ko) * 2016-03-23 2018-01-30 한국표준과학연구원 모노크로미터 및 이를 구비한 하전입자선 장치
KR101773861B1 (ko) * 2016-05-20 2017-09-01 한국표준과학연구원 모노크로미터를 구비한 전자선장치
JP2020181629A (ja) 2017-07-27 2020-11-05 株式会社日立ハイテク 電子線観察装置、電子線観察システム及び電子線観察装置の制御方法
JP6858722B2 (ja) * 2018-03-14 2021-04-14 株式会社日立製作所 電子ビーム装置及び試料検査方法
JP2019169362A (ja) * 2018-03-23 2019-10-03 株式会社日立製作所 電子ビーム装置
US11791130B2 (en) 2019-01-23 2023-10-17 Hitachi High-Tech Corporation Electron beam observation device, electron beam observation system, and image correcting method and method for calculating correction factor for image correction in electron beam observation device
KR20230007965A (ko) * 2021-07-06 2023-01-13 에프이아이 컴파니 현미경 검사를 위한 자동 샘플 정렬

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4412137A1 (de) * 1993-12-28 1995-10-26 Alexander Dr Zarubin Mikroskop, welches mit geladenen Teilchen arbeitet
JP3424512B2 (ja) * 1997-07-18 2003-07-07 株式会社日立製作所 粒子ビーム検査装置および検査方法並びに粒子ビーム応用装置
JP3987276B2 (ja) * 2000-10-12 2007-10-03 株式会社日立製作所 試料像形成方法
JP2004063988A (ja) 2002-07-31 2004-02-26 Canon Inc 照明光学系、当該照明光学系を有する露光装置及びデバイス製造方法
JP4351108B2 (ja) 2004-04-07 2009-10-28 日本電子株式会社 Ｓｅｍの収差自動補正方法及び収差自動補正装置
US7915597B2 (en) * 2008-03-18 2011-03-29 Axcelis Technologies, Inc. Extraction electrode system for high current ion implanter
JP5302595B2 (ja) * 2008-08-06 2013-10-02 株式会社日立ハイテクノロジーズ 傾斜観察方法および観察装置
JP6396638B2 (ja) 2013-03-29 2018-09-26 マクセル株式会社 位相フィルタ、撮像光学系、及び撮像システム

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