JP2017009603A5 - - Google Patents

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Publication number
JP2017009603A5
JP2017009603A5 JP2016117624A JP2016117624A JP2017009603A5 JP 2017009603 A5 JP2017009603 A5 JP 2017009603A5 JP 2016117624 A JP2016117624 A JP 2016117624A JP 2016117624 A JP2016117624 A JP 2016117624A JP 2017009603 A5 JP2017009603 A5 JP 2017009603A5
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JP
Japan
Prior art keywords
detector
prediction
radiation
pixel
image
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JP2016117624A
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English (en)
Japanese (ja)
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JP2017009603A (ja
JP6416825B2 (ja
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Priority claimed from EP15172752.6A external-priority patent/EP3106862B1/en
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Publication of JP2017009603A5 publication Critical patent/JP2017009603A5/ja
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Publication of JP6416825B2 publication Critical patent/JP6416825B2/ja
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JP2016117624A 2015-06-18 2016-06-14 タイコグラフィックイメージングの方法 Active JP6416825B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP15172752.6 2015-06-18
EP15172752.6A EP3106862B1 (en) 2015-06-18 2015-06-18 Method of ptychographic imaging

Publications (3)

Publication Number Publication Date
JP2017009603A JP2017009603A (ja) 2017-01-12
JP2017009603A5 true JP2017009603A5 (enExample) 2018-07-05
JP6416825B2 JP6416825B2 (ja) 2018-10-31

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JP2016117624A Active JP6416825B2 (ja) 2015-06-18 2016-06-14 タイコグラフィックイメージングの方法

Country Status (4)

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US (1) US9959639B2 (enExample)
EP (1) EP3106862B1 (enExample)
JP (1) JP6416825B2 (enExample)
CN (1) CN106257323B (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107796837B (zh) * 2017-10-09 2019-10-29 南京大学 一种成像装置、成像方法及成像系统
US10755892B2 (en) * 2018-05-23 2020-08-25 Kla-Tencor Corporation Reflection-mode electron-beam inspection using ptychographic imaging
AU2019403134A1 (en) * 2018-12-18 2021-06-17 Pathware Inc. Computational microscopy based-system and method for automated imaging and analysis of pathology specimens
CN110411983B (zh) * 2019-07-26 2022-05-27 南方科技大学 一种高分辨率衍射成像方法及装置
US11264200B1 (en) * 2020-09-23 2022-03-01 Fei Company Lamella alignment based on a reconstructed volume
US12501177B2 (en) 2021-12-02 2025-12-16 Duke University Method and system of polarization microscopy imaging
US20250110066A1 (en) * 2022-02-03 2025-04-03 Tohoku University Method for calculating elastic modulus and device for calculating elastic modulus
US12352946B1 (en) * 2022-12-15 2025-07-08 United States Of America As Represented By The Administrator Of Nasa Fourier ptychographic microscope systems and methods

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB0409572D0 (en) 2004-04-29 2004-06-02 Univ Sheffield High resolution imaging
US8138485B2 (en) 2007-06-25 2012-03-20 Asml Netherlands B.V. Radiation detector, method of manufacturing a radiation detector, and lithographic apparatus comprising a radiation detector
JP5764380B2 (ja) 2010-04-29 2015-08-19 エフ イー アイ カンパニＦｅｉ Ｃｏｍｐａｎｙ Ｓｅｍ画像化法
GB201016088D0 (en) * 2010-09-24 2010-11-10 Phase Focus Ltd Improvements in imaging
GB201020516D0 (en) * 2010-12-03 2011-01-19 Univ Sheffield Improvements in providing image data
GB201107053D0 (en) * 2011-04-27 2011-06-08 Univ Sheffield Improvements in providing image data
GB201112119D0 (en) * 2011-07-14 2011-08-31 Univ Sheffield Method and apparatus for position determination
US8704176B2 (en) 2011-08-10 2014-04-22 Fei Company Charged particle microscope providing depth-resolved imagery
EP2690648B1 (en) 2012-07-26 2014-10-15 Fei Company Method of preparing and imaging a lamella in a particle-optical apparatus
GB201215558D0 (en) * 2012-08-31 2012-10-17 Phase Focus Ltd Improvements in phase retrieval
EP2915180B1 (en) * 2012-10-30 2018-12-05 California Institute of Technology Fourier ptychographic imaging systems, devices, and methods
US9864184B2 (en) * 2012-10-30 2018-01-09 California Institute Of Technology Embedded pupil function recovery for fourier ptychographic imaging devices
EP2879156A1 (en) 2013-12-02 2015-06-03 Fei Company Charged-particle microscopy with enhanced electron detection
EP2887381B1 (en) 2013-12-18 2016-09-21 Fei Company Method of investigating the wavefront of a charged-particle beam
EP2911180A1 (en) 2014-02-24 2015-08-26 FEI Company Method of examining a sample in a charged-particle microscope

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