JP6470654B2 - 荷電粒子線装置 - Google Patents

荷電粒子線装置 Download PDF

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Publication number
JP6470654B2
JP6470654B2 JP2015146549A JP2015146549A JP6470654B2 JP 6470654 B2 JP6470654 B2 JP 6470654B2 JP 2015146549 A JP2015146549 A JP 2015146549A JP 2015146549 A JP2015146549 A JP 2015146549A JP 6470654 B2 JP6470654 B2 JP 6470654B2
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JP
Japan
Prior art keywords
charged particle
image
particle beam
condition
modified illumination
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2015146549A
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English (en)
Japanese (ja)
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JP2017027829A5 (enExample
JP2017027829A (ja
Inventor
百代 圓山
百代 圓山
福田　宗行
宗行 福田
秀之 数見
秀之 数見
浜田　宏一
宏一 浜田
谷本　明佳
明佳 谷本
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Hitachi High Tech Corp
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Hitachi High Technologies Corp
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Priority to JP2015146549A priority Critical patent/JP6470654B2/ja
Priority to US15/217,460 priority patent/US10037866B2/en
Publication of JP2017027829A publication Critical patent/JP2017027829A/ja
Publication of JP2017027829A5 publication Critical patent/JP2017027829A5/ja
Application granted granted Critical
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261—Details
    • H01J37/265—Controlling the tube; circuit arrangements adapted to a particular application not otherwise provided, e.g. bright-field-dark-field illumination
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/21—Means for adjusting the focus
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical, image processing or photographic arrangements associated with the tube
    • H01J37/222—Image processing arrangements associated with the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical, image processing or photographic arrangements associated with the tube
    • H01J37/226—Optical arrangements for illuminating the object; optical arrangements for collecting light from the object
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/049—Focusing means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/10—Lenses
    • H01J2237/103—Lenses characterised by lens type
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/153—Correcting image defects, e.g. stigmators
    • H01J2237/1534—Aberrations
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/22—Treatment of data
    • H01J2237/221—Image processing
    • H01J2237/223—Fourier techniques
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/245—Detection characterised by the variable being measured
    • H01J2237/24507—Intensity, dose or other characteristics of particle beams or electromagnetic radiation
    • H01J2237/24514—Beam diagnostics including control of the parameter or property diagnosed
    • H01J2237/24542—Beam profile
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/245—Detection characterised by the variable being measured
    • H01J2237/24592—Inspection and quality control of devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2801—Details

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Electron Sources, Ion Sources (AREA)
JP2015146549A 2015-07-24 2015-07-24 荷電粒子線装置 Expired - Fee Related JP6470654B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2015146549A JP6470654B2 (ja) 2015-07-24 2015-07-24 荷電粒子線装置
US15/217,460 US10037866B2 (en) 2015-07-24 2016-07-22 Charged particle beam apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2015146549A JP6470654B2 (ja) 2015-07-24 2015-07-24 荷電粒子線装置

Publications (3)

Publication Number Publication Date
JP2017027829A JP2017027829A (ja) 2017-02-02
JP2017027829A5 JP2017027829A5 (enExample) 2018-02-01
JP6470654B2 true JP6470654B2 (ja) 2019-02-13

Family

ID=57837778

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015146549A Expired - Fee Related JP6470654B2 (ja) 2015-07-24 2015-07-24 荷電粒子線装置

Country Status (2)

Country Link
US (1) US10037866B2 (enExample)
JP (1) JP6470654B2 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101815850B1 (ko) * 2016-03-23 2018-01-30 한국표준과학연구원 모노크로미터 및 이를 구비한 하전입자선 장치
KR101773861B1 (ko) * 2016-05-20 2017-09-01 한국표준과학연구원 모노크로미터를 구비한 전자선장치
JP2020181629A (ja) 2017-07-27 2020-11-05 株式会社日立ハイテク 電子線観察装置、電子線観察システム及び電子線観察装置の制御方法
JP6858722B2 (ja) * 2018-03-14 2021-04-14 株式会社日立製作所 電子ビーム装置及び試料検査方法
JP2019169362A (ja) * 2018-03-23 2019-10-03 株式会社日立製作所 電子ビーム装置
US11791130B2 (en) 2019-01-23 2023-10-17 Hitachi High-Tech Corporation Electron beam observation device, electron beam observation system, and image correcting method and method for calculating correction factor for image correction in electron beam observation device
KR20230007965A (ko) * 2021-07-06 2023-01-13 에프이아이 컴파니 현미경 검사를 위한 자동 샘플 정렬

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4412137A1 (de) * 1993-12-28 1995-10-26 Alexander Dr Zarubin Mikroskop, welches mit geladenen Teilchen arbeitet
JP3424512B2 (ja) * 1997-07-18 2003-07-07 株式会社日立製作所 粒子ビーム検査装置および検査方法並びに粒子ビーム応用装置
JP3987276B2 (ja) * 2000-10-12 2007-10-03 株式会社日立製作所 試料像形成方法
JP2004063988A (ja) 2002-07-31 2004-02-26 Canon Inc 照明光学系、当該照明光学系を有する露光装置及びデバイス製造方法
JP4351108B2 (ja) 2004-04-07 2009-10-28 日本電子株式会社 Ｓｅｍの収差自動補正方法及び収差自動補正装置
US7915597B2 (en) * 2008-03-18 2011-03-29 Axcelis Technologies, Inc. Extraction electrode system for high current ion implanter
JP5302595B2 (ja) * 2008-08-06 2013-10-02 株式会社日立ハイテクノロジーズ 傾斜観察方法および観察装置
JP6396638B2 (ja) 2013-03-29 2018-09-26 マクセル株式会社 位相フィルタ、撮像光学系、及び撮像システム

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US10037866B2 (en) 2018-07-31
US20170025251A1 (en) 2017-01-26
JP2017027829A (ja) 2017-02-02

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