JP2017020962A - 瞬時位相シフト干渉計 - Google Patents
瞬時位相シフト干渉計 Download PDFInfo
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- JP2017020962A JP2017020962A JP2015140397A JP2015140397A JP2017020962A JP 2017020962 A JP2017020962 A JP 2017020962A JP 2015140397 A JP2015140397 A JP 2015140397A JP 2015140397 A JP2015140397 A JP 2015140397A JP 2017020962 A JP2017020962 A JP 2017020962A
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- Prior art keywords
- optical path
- measurement
- phase shift
- interference fringe
- interferometer
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- 230000010363 phase shift Effects 0.000 title claims abstract description 44
- 230000003287 optical effect Effects 0.000 claims abstract description 81
- 238000005259 measurement Methods 0.000 claims abstract description 69
- 238000004364 calculation method Methods 0.000 claims abstract description 11
- 230000003111 delayed effect Effects 0.000 claims abstract description 4
- 230000004907 flux Effects 0.000 claims description 8
- 238000012360 testing method Methods 0.000 claims description 5
- 230000005540 biological transmission Effects 0.000 claims description 2
- 238000003384 imaging method Methods 0.000 description 21
- 238000000034 method Methods 0.000 description 8
- 230000010287 polarization Effects 0.000 description 7
- 238000010586 diagram Methods 0.000 description 6
- 238000006073 displacement reaction Methods 0.000 description 6
- 238000007796 conventional method Methods 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 241000282326 Felis catus Species 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000013519 translation Methods 0.000 description 1
Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
- G01B9/0201—Interferometers characterised by controlling or generating intrinsic radiation properties using temporal phase variation
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
- G01B11/2441—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures using interferometry
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02015—Interferometers characterised by the beam path configuration
- G01B9/02027—Two or more interferometric channels or interferometers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
- G01B2290/70—Using polarization in the interferometer
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Instruments For Measurement Of Length By Optical Means (AREA)
- Length Measuring Devices By Optical Means (AREA)
Abstract
Description
200…遅延光路
201、202、211…偏光ビームスプリッタ(PBS)
203…直角プリズム
204…微小変位移動機構
212、214、700…λ/4板
213、215…平面ミラー
300…ビーム拡大光学系
400…参照面
401…鏡筒
500…測定対象物(測定面)
501…固定部材
600…結像レンズ
800…撮像系
809…三分割プリズム
810、811、812…偏光板
813、814、815、820…カメラ
830…マイクロポラライザ(偏光板)
900…干渉計本体
Claims (3)
- 測定の基準となる参照光束と測定対象物からの反射または透過によって得られる測定光束からなる被検光束を複数の光束又は領域に分割し、前記参照光束と前記測定光束の位相差を相対的にシフトさせた後に干渉縞を発生させて、位相シフトした複数の干渉縞画像を同時に撮像し、前記測定対象物の形状を測定する瞬時位相シフト干渉計において、
前記参照光束と前記測定光束の光路長差よりも可干渉距離が短い光源を用い、
前記光源からの光束を二つに分割して、光路長可変の遅延光路を用いて一方の光束は遅延させて光路長差を付与して他方の光束と同一光軸上に重ね合わせた後に、前記参照光束と前記測定光束を発生させ、
調整時に前記遅延光路の光路長を変化させて、位相シフトした複数の干渉縞画像をそれぞれ取り込み、各干渉縞画像のそれぞれで得られる干渉縞のバイアス、振幅、位相シフト量の少なくともいずれかを算出しておき、
測定時は、前記干渉縞のバイアス算出結果、振幅算出結果、位相シフト量算出結果の少なくともいずれかに基づいて前記測定対象物の形状を測定することを特徴とする瞬時位相シフト干渉計。 - 前記調整時に、前記遅延光路の光路長を変化させて、位相シフトした複数の干渉縞画像をそれぞれ取り込む際、前記測定対象物は干渉計本体に対して固定して配置することを特徴とする、請求項1に記載の瞬時位相シフト干渉計。
- 前記複数の領域が、マイクロポラライザによって区分された、単位セル内の微小領域であることを特徴とする、請求項1又は2に記載の瞬時位相シフト干渉計。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015140397A JP6553967B2 (ja) | 2015-07-14 | 2015-07-14 | 瞬時位相シフト干渉計 |
US15/190,912 US10088291B2 (en) | 2015-07-14 | 2016-06-23 | Instantaneous phase-shift interferometer |
EP16001456.9A EP3118571B1 (en) | 2015-07-14 | 2016-06-29 | Instantaneous phase-shift interferometer and measurement method |
CN201610552319.4A CN106352789B (zh) | 2015-07-14 | 2016-07-13 | 瞬时相位偏移干涉仪 |
Applications Claiming Priority (1)
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JP2015140397A JP6553967B2 (ja) | 2015-07-14 | 2015-07-14 | 瞬時位相シフト干渉計 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2017020962A true JP2017020962A (ja) | 2017-01-26 |
JP6553967B2 JP6553967B2 (ja) | 2019-07-31 |
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JP2015140397A Active JP6553967B2 (ja) | 2015-07-14 | 2015-07-14 | 瞬時位相シフト干渉計 |
Country Status (4)
Country | Link |
---|---|
US (1) | US10088291B2 (ja) |
EP (1) | EP3118571B1 (ja) |
JP (1) | JP6553967B2 (ja) |
CN (1) | CN106352789B (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11536562B2 (en) | 2019-10-08 | 2022-12-27 | Mitutoyo Corp. | Analysis apparatus, analysis method, and interference measurement system |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6910238B2 (ja) * | 2017-08-04 | 2021-07-28 | 株式会社ミツトヨ | 光学システム、光学装置及びプログラム |
EP3864370A1 (en) * | 2018-10-12 | 2021-08-18 | Electric Power Research Institute, Inc. | Method for measuring surface characteristics in optically distorting media |
CN110319939A (zh) * | 2019-06-28 | 2019-10-11 | 南京理工大学 | 偏振移相结合pzt移相的短相干光源系统及实验方法 |
WO2021168611A1 (en) | 2020-02-24 | 2021-09-02 | Yangtze Memory Technologies Co., Ltd. | Systems and methods for semiconductor chip surface topography metrology |
CN111406198B (zh) | 2020-02-24 | 2021-02-19 | 长江存储科技有限责任公司 | 用于半导体芯片表面形貌计量的系统和方法 |
CN111356896B (zh) | 2020-02-24 | 2021-01-12 | 长江存储科技有限责任公司 | 用于半导体芯片表面形貌计量的系统和方法 |
WO2021168610A1 (en) | 2020-02-24 | 2021-09-02 | Yangtze Memory Technologies Co., Ltd. | Systems having light source with extended spectrum for semiconductor chip surface topography metrology |
Citations (6)
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US4872755A (en) * | 1987-03-07 | 1989-10-10 | Carl-Zeiss-Stiftung | Interferometer for measuring optical phase differences |
JP2002013907A (ja) * | 2000-06-30 | 2002-01-18 | Mitsutoyo Corp | 位相シフト干渉縞同時撮像装置における平面形状計測方法 |
JP2008032690A (ja) * | 2006-06-30 | 2008-02-14 | Mitsutoyo Corp | 斜入射干渉計 |
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US8345258B2 (en) * | 2006-09-07 | 2013-01-01 | 4 D Technology Corporation | Synchronous frequency-shift mechanism in fizeau interferometer |
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EP2813801B1 (en) | 2013-06-10 | 2018-10-31 | Mitutoyo Corporation | Interferometer system and method to generate an interference signal of a surface of a sample |
JP6508764B2 (ja) | 2014-11-10 | 2019-05-08 | 株式会社ミツトヨ | 白色光干渉計光学ヘッドを用いた非接触表面形状測定方法及び装置 |
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2015
- 2015-07-14 JP JP2015140397A patent/JP6553967B2/ja active Active
-
2016
- 2016-06-23 US US15/190,912 patent/US10088291B2/en active Active
- 2016-06-29 EP EP16001456.9A patent/EP3118571B1/en active Active
- 2016-07-13 CN CN201610552319.4A patent/CN106352789B/zh active Active
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JP2002013907A (ja) * | 2000-06-30 | 2002-01-18 | Mitsutoyo Corp | 位相シフト干渉縞同時撮像装置における平面形状計測方法 |
JP2008032690A (ja) * | 2006-06-30 | 2008-02-14 | Mitsutoyo Corp | 斜入射干渉計 |
JP2011257190A (ja) * | 2010-06-07 | 2011-12-22 | Fujifilm Corp | 実時間測定分岐型干渉計 |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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US11536562B2 (en) | 2019-10-08 | 2022-12-27 | Mitutoyo Corp. | Analysis apparatus, analysis method, and interference measurement system |
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Publication number | Publication date |
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US10088291B2 (en) | 2018-10-02 |
CN106352789A (zh) | 2017-01-25 |
US20170016711A1 (en) | 2017-01-19 |
EP3118571A1 (en) | 2017-01-18 |
JP6553967B2 (ja) | 2019-07-31 |
CN106352789B (zh) | 2019-12-24 |
EP3118571B1 (en) | 2019-05-22 |
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