JP2017020000A5 - - Google Patents

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Publication number
JP2017020000A5
JP2017020000A5 JP2016111352A JP2016111352A JP2017020000A5 JP 2017020000 A5 JP2017020000 A5 JP 2017020000A5 JP 2016111352 A JP2016111352 A JP 2016111352A JP 2016111352 A JP2016111352 A JP 2016111352A JP 2017020000 A5 JP2017020000 A5 JP 2017020000A5
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JP
Japan
Prior art keywords
monomers
polymer
formula
dimers
polymerized units
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2016111352A
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English (en)
Japanese (ja)
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JP2017020000A (ja
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Publication date
Priority claimed from US14/739,402 external-priority patent/US9442377B1/en
Application filed filed Critical
Publication of JP2017020000A publication Critical patent/JP2017020000A/ja
Publication of JP2017020000A5 publication Critical patent/JP2017020000A5/ja
Pending legal-status Critical Current

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JP2016111352A 2015-06-15 2016-06-02 湿式剥離性シリコン含有反射防止剤 Pending JP2017020000A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US14/739,402 2015-06-15
US14/739,402 US9442377B1 (en) 2015-06-15 2015-06-15 Wet-strippable silicon-containing antireflectant

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2018128294A Division JP6643411B2 (ja) 2015-06-15 2018-07-05 湿式剥離性シリコン含有反射防止剤

Publications (2)

Publication Number Publication Date
JP2017020000A JP2017020000A (ja) 2017-01-26
JP2017020000A5 true JP2017020000A5 (enExample) 2017-10-19

Family

ID=56881349

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2016111352A Pending JP2017020000A (ja) 2015-06-15 2016-06-02 湿式剥離性シリコン含有反射防止剤
JP2018128294A Expired - Fee Related JP6643411B2 (ja) 2015-06-15 2018-07-05 湿式剥離性シリコン含有反射防止剤

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2018128294A Expired - Fee Related JP6643411B2 (ja) 2015-06-15 2018-07-05 湿式剥離性シリコン含有反射防止剤

Country Status (5)

Country Link
US (2) US9442377B1 (enExample)
JP (2) JP2017020000A (enExample)
KR (1) KR101849638B1 (enExample)
CN (1) CN106243357B (enExample)
TW (1) TWI600724B (enExample)

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JP5830044B2 (ja) 2013-02-15 2015-12-09 信越化学工業株式会社 レジスト下層膜形成用組成物及びパターン形成方法
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