JP2016539806A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2016539806A5 JP2016539806A5 JP2016521305A JP2016521305A JP2016539806A5 JP 2016539806 A5 JP2016539806 A5 JP 2016539806A5 JP 2016521305 A JP2016521305 A JP 2016521305A JP 2016521305 A JP2016521305 A JP 2016521305A JP 2016539806 A5 JP2016539806 A5 JP 2016539806A5
- Authority
- JP
- Japan
- Prior art keywords
- laser beam
- substrate
- light guiding
- guiding element
- incident direction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims 52
- 230000010287 polarization Effects 0.000 claims 9
- 230000005684 electric field Effects 0.000 claims 2
- 239000000463 material Substances 0.000 claims 2
- 239000007787 solid Substances 0.000 claims 2
- 230000003287 optical effect Effects 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB1317773.8A GB2519088B (en) | 2013-10-08 | 2013-10-08 | Laser scanning system for laser release |
| GB1317773.8 | 2013-10-08 | ||
| PCT/GB2014/051423 WO2015052475A1 (en) | 2013-10-08 | 2014-05-09 | Laser scanning system for laser release |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016539806A JP2016539806A (ja) | 2016-12-22 |
| JP2016539806A5 true JP2016539806A5 (enExample) | 2017-05-18 |
| JP6388931B2 JP6388931B2 (ja) | 2018-09-12 |
Family
ID=49630355
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016521305A Expired - Fee Related JP6388931B2 (ja) | 2013-10-08 | 2014-05-09 | レーザー取り外し用レーザー走査システム |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US9804384B2 (enExample) |
| EP (1) | EP3055097B1 (enExample) |
| JP (1) | JP6388931B2 (enExample) |
| KR (1) | KR20160067168A (enExample) |
| CN (1) | CN105636739B (enExample) |
| GB (1) | GB2519088B (enExample) |
| TW (1) | TWI614077B (enExample) |
| WO (1) | WO2015052475A1 (enExample) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2016014648A2 (en) * | 2014-07-22 | 2016-01-28 | Brewer Science Inc. | Polyimides as laser release materials for 3-d ic applications |
| CN106654814A (zh) * | 2017-03-09 | 2017-05-10 | 中国科学院合肥物质科学研究院 | 可用于晶化和剥离的两用准分子激光系统 |
| KR102550390B1 (ko) * | 2017-09-12 | 2023-07-03 | 에베 그룹 에. 탈너 게엠베하 | 일시적으로 접합된 기판 스택을 분리하는 방법 및 장치 |
| KR102148013B1 (ko) * | 2018-07-24 | 2020-08-25 | (주) 큐알에스 | 레이어 분리장치 |
| KR102748542B1 (ko) * | 2019-10-29 | 2025-01-03 | 청두 비스타 옵토일렉트로닉스 씨오., 엘티디. | 발광 다이오드 칩 및 발광 다이오드 칩 이송 장치 |
| CN116348223A (zh) * | 2020-10-02 | 2023-06-27 | Slm方案集团股份公司 | 操作辐照系统的方法、辐照系统和具有偏振控制的用于生产三维工件的设备 |
| CN115609138A (zh) * | 2021-07-13 | 2023-01-17 | 广东聚华印刷显示技术有限公司 | 激光剥离方法、激光设备以及激光剥离系统 |
| DE102023205564A1 (de) * | 2023-06-14 | 2024-12-19 | Carl Zeiss Smt Gmbh | Verfahren zur Erzeugung einer Temperierhohlstruktur in einem Substrat mit Hilfe eines Bearbeitungslichtstrahls |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4694139A (en) * | 1984-12-03 | 1987-09-15 | Messer Griesheim Gmbh | Guidance device for a laser beam for three-dimensional machining of workpieces |
| US5436867A (en) * | 1993-03-08 | 1995-07-25 | Northrop Grumman Corporation | Holographic random access memory |
| JPH08132267A (ja) * | 1994-11-02 | 1996-05-28 | Toshiba Corp | レ−ザ光走査装置 |
| US6294407B1 (en) * | 1998-05-06 | 2001-09-25 | Virtual Integration, Inc. | Microelectronic packages including thin film decal and dielectric adhesive layer having conductive vias therein, and methods of fabricating the same |
| US6875951B2 (en) * | 2000-08-29 | 2005-04-05 | Mitsubishi Denki Kabushiki Kaisha | Laser machining device |
| JP5057619B2 (ja) * | 2001-08-01 | 2012-10-24 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
| TWI221102B (en) * | 2002-08-30 | 2004-09-21 | Sumitomo Heavy Industries | Laser material processing method and processing device |
| JP4335613B2 (ja) * | 2003-08-28 | 2009-09-30 | Tdk株式会社 | ホログラフィック記録方法及び装置 |
| US7923306B2 (en) * | 2004-06-18 | 2011-04-12 | Electro Scientific Industries, Inc. | Semiconductor structure processing using multiple laser beam spots |
| TWI253065B (en) * | 2004-06-30 | 2006-04-11 | Lite On It Corp | Angle multiplexing holographic storage device |
| TWI375498B (en) | 2007-11-21 | 2012-10-21 | Ind Tech Res Inst | High perfromance laser-assisted transferring system and transfer component |
| US8027074B2 (en) * | 2007-12-07 | 2011-09-27 | Konica Minolta Opto, Inc. | Scan optical system, light scan device, and image formation device |
| JP4386137B2 (ja) * | 2008-02-29 | 2009-12-16 | トヨタ自動車株式会社 | レーザ加工装置及びレーザ加工方法 |
| JP2010025713A (ja) * | 2008-07-18 | 2010-02-04 | Hitachi High-Technologies Corp | 欠陥検査方法及び欠陥検査装置 |
| CN101879657B (zh) | 2009-05-08 | 2016-06-29 | 东莞市中镓半导体科技有限公司 | 固体激光剥离设备和剥离方法 |
| US8871609B2 (en) * | 2009-06-30 | 2014-10-28 | Taiwan Semiconductor Manufacturing Company, Ltd. | Thin wafer handling structure and method |
| DE102009057566A1 (de) | 2009-12-09 | 2011-06-16 | Osram Opto Semiconductors Gmbh | Vorrichtung für ein Laserabhebeverfahren und Laserabhebeverfahren |
| JP5856824B2 (ja) * | 2011-11-28 | 2016-02-10 | オリンパス株式会社 | 光走査装置および走査型顕微鏡装置 |
| CN103235489B (zh) * | 2013-05-15 | 2015-01-07 | 中国科学院光电技术研究所 | 可变周期多光束干涉光刻的方法 |
-
2013
- 2013-10-08 GB GB1317773.8A patent/GB2519088B/en not_active Expired - Fee Related
-
2014
- 2014-05-09 WO PCT/GB2014/051423 patent/WO2015052475A1/en not_active Ceased
- 2014-05-09 EP EP14723865.3A patent/EP3055097B1/en active Active
- 2014-05-09 JP JP2016521305A patent/JP6388931B2/ja not_active Expired - Fee Related
- 2014-05-09 CN CN201480055829.XA patent/CN105636739B/zh not_active Expired - Fee Related
- 2014-05-09 KR KR1020167011861A patent/KR20160067168A/ko not_active Abandoned
- 2014-05-09 US US15/027,527 patent/US9804384B2/en not_active Expired - Fee Related
- 2014-05-27 TW TW103118490A patent/TWI614077B/zh not_active IP Right Cessation
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2016539806A5 (enExample) | ||
| JP6388931B2 (ja) | レーザー取り外し用レーザー走査システム | |
| US9233435B2 (en) | Apparatus and method for the interference patterning of planar samples | |
| JP2015174100A5 (enExample) | ||
| CN106945272B (zh) | 用于三维打印的方法和装置 | |
| JP6219904B2 (ja) | 半導体ウェハを個片化するためのレーザファイバアレイ | |
| CN105710530B (zh) | 脉冲宽度控制器 | |
| JP2018013487A5 (enExample) | ||
| CN102779786A (zh) | 光器件晶片的分割方法 | |
| KR101582632B1 (ko) | 프레넬 영역 소자를 이용한 기판 절단 방법 | |
| US10994474B2 (en) | Method for printing a three-dimensional light guiding structure by curing droplets of a printing material by light irradiation | |
| JP2011502788A5 (enExample) | ||
| US8422134B2 (en) | Dual pulsed light generation apparatus and method for dual pulsed lights generation thereof | |
| US12050305B2 (en) | Laser processing apparatus | |
| KR102618163B1 (ko) | 레이저 가공 장치 | |
| JP2012236204A (ja) | レンズおよびそのレンズを搭載したレーザ加工装置 | |
| KR20140015895A (ko) | 필름 부착 기판용 레이저 절단 장치 및 방법 | |
| TWI715548B (zh) | 硬脆材料的雷射切割方法及雷射切割機與雷射切割機的光學系統 | |
| KR20230112742A (ko) | 이중 파장 어닐링 방법 및 장치 | |
| US20140263222A1 (en) | Laser machining device for machining netted dots | |
| KR20160140212A (ko) | 레이저 가공장치 및 레이저 가공방법 | |
| JP2016099533A (ja) | 光学機能素子の製造装置およびこれを使用した光学機能素子の製造方法 | |
| US9720244B1 (en) | Intensity distribution management system and method in pixel imaging | |
| JP2018072448A (ja) | スペックル解消光学系 | |
| US20140254022A1 (en) | Apparatus for speckle reduction, pulse stretching, and beam homogenization |