JP2016536421A - 導電性パターン形成用組成物、これを用いた導電性パターン形成方法と、導電性パターンを有する樹脂構造体 - Google Patents
導電性パターン形成用組成物、これを用いた導電性パターン形成方法と、導電性パターンを有する樹脂構造体 Download PDFInfo
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- 229920005989 resin Polymers 0.000 title claims abstract description 131
- 239000011347 resin Substances 0.000 title claims abstract description 131
- 239000000203 mixture Substances 0.000 title claims abstract description 65
- 238000000034 method Methods 0.000 title claims abstract description 57
- 239000002184 metal Substances 0.000 claims abstract description 138
- 229910052751 metal Inorganic materials 0.000 claims abstract description 138
- 150000002736 metal compounds Chemical class 0.000 claims abstract description 58
- 239000002245 particle Substances 0.000 claims abstract description 58
- 239000004431 polycarbonate resin Substances 0.000 claims abstract description 45
- 229920005668 polycarbonate resin Polymers 0.000 claims abstract description 45
- 239000011817 metal compound particle Substances 0.000 claims abstract description 37
- 239000000853 adhesive Substances 0.000 claims abstract description 31
- 230000001070 adhesive effect Effects 0.000 claims abstract description 31
- 229910052596 spinel Inorganic materials 0.000 claims abstract description 17
- 239000011029 spinel Substances 0.000 claims abstract description 17
- 150000002500 ions Chemical class 0.000 claims abstract description 15
- 239000000126 substance Substances 0.000 claims description 34
- 239000000758 substrate Substances 0.000 claims description 31
- 239000004417 polycarbonate Substances 0.000 claims description 22
- 229920000515 polycarbonate Polymers 0.000 claims description 21
- 239000000654 additive Substances 0.000 claims description 20
- 150000002739 metals Chemical class 0.000 claims description 17
- 238000007747 plating Methods 0.000 claims description 15
- 230000000996 additive effect Effects 0.000 claims description 14
- 238000007772 electroless plating Methods 0.000 claims description 14
- 229910052748 manganese Inorganic materials 0.000 claims description 10
- 230000007261 regionalization Effects 0.000 claims description 10
- 229910052804 chromium Inorganic materials 0.000 claims description 8
- 239000000463 material Substances 0.000 claims description 8
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical group N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 6
- 229910052742 iron Inorganic materials 0.000 claims description 6
- 229910052750 molybdenum Inorganic materials 0.000 claims description 6
- 238000010561 standard procedure Methods 0.000 claims description 6
- 229910052721 tungsten Inorganic materials 0.000 claims description 6
- 229910052802 copper Inorganic materials 0.000 claims description 5
- 239000011256 inorganic filler Substances 0.000 claims description 4
- 229910003475 inorganic filler Inorganic materials 0.000 claims description 4
- 230000001678 irradiating effect Effects 0.000 claims description 4
- 239000004925 Acrylic resin Substances 0.000 claims description 3
- 229920001283 Polyalkylene terephthalate Polymers 0.000 claims description 3
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical group [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 3
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 claims description 3
- 125000001931 aliphatic group Chemical group 0.000 claims description 3
- 125000003118 aryl group Chemical group 0.000 claims description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical group [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 3
- 239000003795 chemical substances by application Substances 0.000 claims description 3
- 239000003063 flame retardant Substances 0.000 claims description 3
- 229910052737 gold Inorganic materials 0.000 claims description 3
- 229920000578 graft copolymer Polymers 0.000 claims description 3
- 229910052759 nickel Inorganic materials 0.000 claims description 3
- 229910052757 nitrogen Inorganic materials 0.000 claims description 3
- 229910052760 oxygen Inorganic materials 0.000 claims description 3
- 239000001301 oxygen Substances 0.000 claims description 3
- 229910052763 palladium Inorganic materials 0.000 claims description 3
- 229910052697 platinum Inorganic materials 0.000 claims description 3
- 230000002787 reinforcement Effects 0.000 claims description 3
- 229910052709 silver Inorganic materials 0.000 claims description 3
- 229910052717 sulfur Chemical group 0.000 claims description 3
- 239000011593 sulfur Chemical group 0.000 claims description 3
- 229910052718 tin Inorganic materials 0.000 claims description 3
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 3
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 claims description 2
- 239000002952 polymeric resin Substances 0.000 abstract description 22
- 229920003002 synthetic resin Polymers 0.000 abstract description 22
- 230000006866 deterioration Effects 0.000 abstract description 4
- 239000000047 product Substances 0.000 description 43
- 230000008569 process Effects 0.000 description 14
- 229910021645 metal ion Inorganic materials 0.000 description 10
- 239000000243 solution Substances 0.000 description 10
- 230000015572 biosynthetic process Effects 0.000 description 8
- 239000002585 base Substances 0.000 description 7
- 239000010949 copper Substances 0.000 description 6
- 239000011164 primary particle Substances 0.000 description 6
- 238000006722 reduction reaction Methods 0.000 description 6
- 239000003638 chemical reducing agent Substances 0.000 description 5
- 230000007423 decrease Effects 0.000 description 5
- 230000000704 physical effect Effects 0.000 description 5
- 230000009467 reduction Effects 0.000 description 5
- 239000012744 reinforcing agent Substances 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 4
- 238000011156 evaluation Methods 0.000 description 4
- 238000012986 modification Methods 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 230000004913 activation Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 230000001747 exhibiting effect Effects 0.000 description 3
- 238000000465 moulding Methods 0.000 description 3
- 238000007086 side reaction Methods 0.000 description 3
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 2
- 239000012963 UV stabilizer Substances 0.000 description 2
- 150000001768 cations Chemical group 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 230000018109 developmental process Effects 0.000 description 2
- HUQOFZLCQISTTJ-UHFFFAOYSA-N diethylaminoboron Chemical compound CCN([B])CC HUQOFZLCQISTTJ-UHFFFAOYSA-N 0.000 description 2
- YPTUAQWMBNZZRN-UHFFFAOYSA-N dimethylaminoboron Chemical compound [B]N(C)C YPTUAQWMBNZZRN-UHFFFAOYSA-N 0.000 description 2
- 230000002349 favourable effect Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000003801 milling Methods 0.000 description 2
- 239000000049 pigment Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 229910016507 CuCo Inorganic materials 0.000 description 1
- 229910019041 PtMn Inorganic materials 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000003929 acidic solution Substances 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 238000000498 ball milling Methods 0.000 description 1
- 239000003637 basic solution Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 229910000365 copper sulfate Inorganic materials 0.000 description 1
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 238000010191 image analysis Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 239000010954 inorganic particle Substances 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- 229910052755 nonmetal Inorganic materials 0.000 description 1
- 238000000399 optical microscopy Methods 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 239000008188 pellet Substances 0.000 description 1
- ACVYVLVWPXVTIT-UHFFFAOYSA-M phosphinate Chemical compound [O-][PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-M 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 239000012994 photoredox catalyst Substances 0.000 description 1
- LJCNRYVRMXRIQR-OLXYHTOASA-L potassium sodium L-tartrate Chemical compound [Na+].[K+].[O-]C(=O)[C@H](O)[C@@H](O)C([O-])=O LJCNRYVRMXRIQR-OLXYHTOASA-L 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 239000006100 radiation absorber Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
- 239000011163 secondary particle Substances 0.000 description 1
- 235000011006 sodium potassium tartrate Nutrition 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 239000013589 supplement Substances 0.000 description 1
- 239000003017 thermal stabilizer Substances 0.000 description 1
Classifications
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/0296—Conductive pattern lay-out details not covered by sub groups H05K1/02 - H05K1/0295
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1603—Process or apparatus coating on selected surface areas
- C23C18/1607—Process or apparatus coating on selected surface areas by direct patterning
- C23C18/1608—Process or apparatus coating on selected surface areas by direct patterning from pretreatment step, i.e. selective pre-treatment
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- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/24—Electrically-conducting paints
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- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1603—Process or apparatus coating on selected surface areas
- C23C18/1607—Process or apparatus coating on selected surface areas by direct patterning
- C23C18/1612—Process or apparatus coating on selected surface areas by direct patterning through irradiation means
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- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1635—Composition of the substrate
- C23C18/1639—Substrates other than metallic, e.g. inorganic or organic or non-conductive
- C23C18/1641—Organic substrates, e.g. resin, plastic
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/2006—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30
- C23C18/2026—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30 by radiant energy
- C23C18/204—Radiation, e.g. UV, laser
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- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/0353—Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement
- H05K1/0373—Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement containing additives, e.g. fillers
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- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
- H05K3/181—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
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- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/38—Coating with copper
- C23C18/40—Coating with copper using reducing agents
- C23C18/405—Formaldehyde
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Abstract
Description
[化学式1]
AB2X4
[化学式2]
B(AB)X4
[化学式3]
[A(1−a)M(a)][B(2−b)M(b)]X4
化学式1、化学式2、および化学式3において、A、Bは、それぞれ独立に、第1および第2金属を表し、これらのうちのいずれか1つは、Cu、Ag、Pd、Au、Pt、Ni、およびSnからなる群より選択された1種以上の金属であり、残りの1つは、Cr、Fe、Mo、Mn、Co、およびWからなる群より選択された1種以上の金属であり、
Mは、Cr、Fe、Mo、Mn、Co、およびWからなる群より選択された1種以上の金属で、前記AまたはBと異なる金属であり、
aは、0より大きくて1より小さい実数であり、bは、0より大きくて2より小さい実数であり、
Xは、酸素、窒素、または硫黄である。
ポリカーボネート樹脂;およびABS樹脂、芳香族または脂肪族(メタ)アクリレート樹脂、ゴム変性ビニル系グラフト共重合樹脂、およびポリアルキレンテレフタレート樹脂からなる群より選択された1種以上;をさらに含む樹脂が挙げられる。
このような粒子の主成分である非導電性金属化合物の一例の立体構造は、図1に模式的に示されている。
[化学式1]
AB2X4
[化学式2]
B(AB)X4
[化学式3]
[A(1−a)M(a)][B(2−b)M(b)]X4
化学式1、化学式2、および化学式3において、A、Bは、それぞれ独立に、第1および第2金属を表し、これらのうちのいずれか1つは、Cu、Ag、Pd、Au、Pt、Ni、およびSnからなる群より選択された1種以上の金属であり、残りの1つは、Cr、Fe、Mo、Mn、Co、およびWからなる群より選択された1種以上の金属であり、
Mは、Cr、Fe、Mo、Mn、Co、およびWからなる群より選択された1種以上の金属で、前記AまたはBと異なる金属であり、
aは、0より大きくて1より小さい実数であり、bは、0より大きくて2より小さい実数であり、
Xは、酸素、窒素、または硫黄である。
原料粉末としてCuOおよびCr2O3(製造会社:Sigma Aldrich)をそれぞれ1:1のモル比率で混合し、600℃で3時間熱処理して、CuCr2O4の構造を有する非導電性金属化合物を合成した。合成されたCuCr2O4は、ボールミリングによる破砕工程を通してその粒度を調節した。使用したCuCr2O4一次粒子(primary particle)の平均粒径は4.0μmであった。
実施例1において、LDS添加剤の非導電性金属化合物粒子(CuCr2O4)の平均粒径が2.5μmのものを使用したことを除いては、実施例1と同様の方法で導電性パターン形成用組成物を製造し、これから導電性パターンを有する樹脂構造体を製造した。
実施例1において、LDS添加剤の非導電性金属化合物(CuCr2O4)の一次粒子の平均粒径が1.0μmのものを使用したことを除いては、実施例1と同様の方法で導電性パターン形成用組成物を製造し、これから導電性パターンを有する樹脂構造体を製造した。
実施例3において、LDS添加剤の非導電性金属化合物(CuCr2O4)の含有量を3重量%で添加したことを除いては、実施例3と同様の方法で導電性パターン形成用組成物を製造し、これから導電性パターンを有する樹脂構造体を製造した。
実施例1において、LDS添加剤の非導電性金属化合物(CuCr2O4)の一次粒子の平均粒径が0.2μmのものを使用したことを除いては、実施例1と同様の方法で導電性パターン形成用組成物を製造し、これから導電性パターンを有する樹脂構造体を製造した。
実施例5において、LDS添加剤の非導電性金属化合物(CuCr2O4)の含有量を3重量%で添加したことを除いては、実施例5と同様の方法で導電性パターン形成用組成物を製造し、これから導電性パターンを有する樹脂構造体を製造した。
LDS添加剤として、非導電性金属化合物粒子を[Cu,Mn][Cr,Mn]2O4(製造会社:Tomatec、JP)を5重量%で添加したことを除いては、実施例1と同様の方法で導電性パターン形成用組成物を製造し、これから導電性パターンを有する樹脂構造体を製造した。使用された非導電性金属化合物の一次粒子の平均粒径は約0.5μm、一次粒子が固まっている二次粒子の平均粒径は約2μmであった。
実施例1〜7で形成した導電性パターンに対して、ISO2409の標準方法によって、所定のテープを用いる剥離程度評価ISO2409のclass基準class0〜1等級を満足させることができる、レーザの最小照射容量を測定した。
2.class1等級:導電性パターンの剥離面積が評価対象の導電性パターン面積の0%超過5%以下;
使用レーザ条件:Nd−YAG pulsed fiber laser(波長:1064nm、パルス頻度:40kHz)
実施例1〜7の樹脂構造体の衝撃強度をASTM D256の標準方法で測定し、これを非導電性金属化合物粒子を添加しない高分子樹脂基材(ポリカーボネート樹脂、PC)自体と比較した。
Claims (14)
- ポリカーボネート系樹脂;および
第1金属および第2金属を含み、スピネル構造を有する非導電性金属化合物粒子であって、0.1〜6μmの粒径を有する粒子を含み、
電磁波照射によって、前記非導電性金属化合物粒子から前記第1または第2金属やそのイオンを含む金属核が形成される、電磁波照射による導電性パターン形成用組成物。 - 前記非導電性金属化合物粒子が、下記化学式1、化学式2、または化学式3で表される非導電性金属化合物を1種以上含む、請求項1に記載の電磁波照射による導電性パターン形成用組成物:
[化学式1]
AB2X4
[化学式2]
B(AB)X4
[化学式3]
[A(1−a)M(a)][B(2−b)M(b)]X4
化学式1、化学式2、および化学式3において、A、Bが、それぞれ独立に、第1および第2金属を表し、これらのうちのいずれか1つが、Cu、Ag、Pd、Au、Pt、Ni、およびSnからなる群より選択された1種以上の金属であり、残りの1つが、Cr、Fe、Mo、Mn、Co、およびWからなる群より選択された1種以上の金属であり、
Mが、Cr、Fe、Mo、Mn、Co、およびWからなる群より選択された1種以上の金属で、前記AまたはBと異なる金属であり、
aが、0より大きくて1より小さい実数であり、bは、0より大きくて2より小さい実数であり、
Xが、酸素、窒素、または硫黄である。 - 前記ポリカーボネート系樹脂が、ポリカーボネート樹脂を単独で含むか、または
ポリカーボネート樹脂;およびABS樹脂、芳香族または脂肪族(メタ)アクリレート樹脂、ゴム変性ビニル系グラフト共重合樹脂、およびポリアルキレンテレフタレート樹脂からなる群より選択された1種以上;をさらに含む、請求項1に記載の電磁波照射による導電性パターン形成用組成物。 - 前記非導電性金属化合物粒子が、全体組成物に対して、0.1〜7重量%含まれる、請求項1に記載の電磁波照射による導電性パターン形成用組成物。
- 無機充填剤、色添加剤、難燃剤、衝撃補強剤、および機能性補強剤からなる群より選択された1種以上の添加剤をさらに含む、請求項1に記載の電磁波照射による導電性パターン形成用組成物。
- 請求項1〜5のいずれか1項に記載の導電性パターン形成用組成物を樹脂製品に成形し、又は他の製品に塗布して樹脂層を形成する段階と、
前記樹脂製品または樹脂層の所定領域に電磁波を照射して、前記非導電性金属化合物粒子から第1または第2金属やそのイオンを含む金属核を発生させる段階と、
前記金属核を発生させた領域を化学的に還元またはメッキさせて、導電性金属層を形成する段階と、を含む、電磁波の直接照射による導電性パターン形成方法。 - 前記金属核を発生させる段階において、レーザ電磁波が照射される、請求項6に記載の電磁波の直接照射による導電性パターン形成方法。
- 前記レーザ電磁波が、248nm、308nm、355nm、532nm、755nm、1064nm、1550nm、または2940nmの波長を有する、請求項7に記載の電磁波の直接照射による導電性パターン形成方法。
- 前記金属核を発生させる段階を行うと、前記非導電性金属化合物粒子の一部が前記樹脂製品または樹脂層の所定領域の表面に露出するにつれ、これから金属核が発生し、より高い接着性を有するように活性化した接着活性表面を形成する、請求項6に記載の電磁波の直接照射による導電性パターン形成方法。
- 前記導電性金属層が、無電解メッキによって、前記接着活性表面上に形成される、請求項9に記載の電磁波の直接照射による導電性パターン形成方法。
- ポリカーボネート系樹脂基材;
第1金属および第2金属を含み、スピネル構造を有する非導電性金属化合物の粒子であって、0.1〜6μmの粒径を有し、前記ポリカーボネート系樹脂基材に分散している粒子;
所定領域のポリカーボネート系樹脂基材の表面に露出した、第1または第2金属やそのイオンを含む金属核を含む接着活性表面;および
前記接着活性表面上に形成された導電性金属層を含む、導電性パターンを有する樹脂構造体。 - 前記接着活性表面および導電性金属層が形成された所定領域が、前記ポリカーボネート系樹脂基材に電磁波が照射された領域に対応する、請求項11に記載の導電性パターンを有する樹脂構造体。
- 前記導電性金属層が、ISO2409の標準方法によって試験をした時、前記導電性金属層の剥離面積がテスト対象の金属層面積の0%(class0等級)または0%超過〜5%以下(class1等級)の接着力で前記ポリカーボネート系樹脂基材上に形成されている、請求項11に記載の樹脂構造体。
- ASTM D256方法で測定した衝撃強度が4.0J/cm以上である、請求項11に記載の樹脂構造体。
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