JP2016535240A - 中性子コンバータの製造方法 - Google Patents
中性子コンバータの製造方法 Download PDFInfo
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- JP2016535240A JP2016535240A JP2015563140A JP2015563140A JP2016535240A JP 2016535240 A JP2016535240 A JP 2016535240A JP 2015563140 A JP2015563140 A JP 2015563140A JP 2015563140 A JP2015563140 A JP 2015563140A JP 2016535240 A JP2016535240 A JP 2016535240A
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- boron carbide
- grinding
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- boron
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0635—Carbides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/028—Physical treatment to alter the texture of the substrate surface, e.g. grinding, polishing
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
- C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01T—MEASUREMENT OF NUCLEAR OR X-RADIATION
- G01T3/00—Measuring neutron radiation
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- Chemical & Material Sciences (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Molecular Biology (AREA)
- Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Physics & Mathematics (AREA)
- High Energy & Nuclear Physics (AREA)
- Measurement Of Radiation (AREA)
- Physical Vapour Deposition (AREA)
- Coating By Spraying Or Casting (AREA)
- Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
Abstract
Description
− アルミニウム又はアルミニウム合金のような中性子透過材料の薄いシート(基材)にフィルムが可能な限り良好に接着する
− 熱中性子及び冷中性子に対して基材が高い透過性を有する
− 放射線負荷に関して、並びに機械的応力及び熱的応力の下で、システムが良好な安定性を有する
[1]
スパッタリングを用いて炭化ホウ素で金属シートをコーティングする方法であって、前記金属シートが第1の工程で微細研削により研磨され、第2の工程でスパッタリングによりコーティングされる、方法。
[2]
前記微細研削が研削紙を用いて行われる、項目1に記載の方法。
[3]
粒度が1000〜2500の範囲の研削紙を用いる、項目2に記載の方法。
[4]
前記微細研削がさらに研削液を用いて行われる、項目2又は3のいずれかに記載の方法。
[5]
前記研削液がアセトン、アルコール及び水からなる群より選択される、項目4に記載の方法。
[6]
エタノールがアルコールとして使用される、項目5に記載の方法。
[7]
前記金属シートがアルミニウム又はアルミニウム合金からなる、項目1〜6のいずれか一項に記載の方法。
[8]
前記金属シートがアルミニウム又はチタンアルミニウム合金からなる、項目1〜7のいずれか一項に記載の方法。
[9]
10 Bが濃縮されたB 4 Cがコーティング用の炭化ホウ素として使用される、項目1〜8のいずれか一項に記載の方法。
[10]
前記炭化ホウ素が95%の 10 Bを含む、項目8に記載の方法。
[11]
項目1〜9のいずれか一項に記載の方法により製造された、炭化ホウ素でコーティグされたシート。
[12]
炭化ホウ素でコーティングされた、項目1〜10のいずれか一項に記載の方法により製造された金属シートの中性子コンバータとしての使用。
Claims (12)
- スパッタリングを用いて炭化ホウ素で金属シートをコーティングする方法であって、前記金属シートが第1の工程で微細研削により研磨され、第2の工程でスパッタリングによりコーティングされる、方法。
- 前記微細研削が研削紙を用いて行われる、請求項1に記載の方法。
- 粒度が1000〜2500の範囲の研削紙を用いる、請求項2に記載の方法。
- 前記微細研削がさらに研削液を用いて行われる、請求項2又は3のいずれかに記載の方法。
- 前記研削液がアセトン、アルコール及び水からなる群より選択される、請求項4に記載の方法。
- エタノールがアルコールとして使用される、請求項5に記載の方法。
- 前記金属シートがアルミニウム又はアルミニウム合金からなる、請求項1〜6のいずれか一項に記載の方法。
- 前記金属シートがアルミニウム又はチタンアルミニウム合金からなる、請求項1〜7のいずれか一項に記載の方法。
- 10Bが濃縮されたB4Cがコーティング用の炭化ホウ素として使用される、請求項1〜8のいずれか一項に記載の方法。
- 前記炭化ホウ素が95%の10Bを含む、請求項8に記載の方法。
- 請求項1〜9のいずれか一項に記載の方法により製造された、炭化ホウ素でコーティグされたシート。
- 炭化ホウ素でコーティングされた、請求項1〜10のいずれか一項に記載の方法により製造された金属シートの中性子コンバータとしての使用。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP14176907.5 | 2014-07-14 | ||
EP14176907.5A EP2975154A1 (de) | 2014-07-14 | 2014-07-14 | Verfahren zur Herstellung von Neutronen Konvertern |
PCT/EP2015/064751 WO2016008713A1 (de) | 2014-07-14 | 2015-06-29 | Verfahren zur herstellung von neutronenkonvertern |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2016535240A true JP2016535240A (ja) | 2016-11-10 |
JP6339597B2 JP6339597B2 (ja) | 2018-06-06 |
Family
ID=51167799
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2015563140A Active JP6339597B2 (ja) | 2014-07-14 | 2015-06-29 | 中性子コンバータの製造方法 |
Country Status (11)
Country | Link |
---|---|
US (1) | US20170260619A1 (ja) |
EP (2) | EP2975154A1 (ja) |
JP (1) | JP6339597B2 (ja) |
CN (1) | CN107250421A (ja) |
AU (1) | AU2015291339B2 (ja) |
CA (1) | CA2949470C (ja) |
DK (1) | DK2997174T3 (ja) |
ES (1) | ES2599977T3 (ja) |
HU (1) | HUE031311T2 (ja) |
RU (1) | RU2695697C2 (ja) |
WO (1) | WO2016008713A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2022124155A1 (ja) * | 2020-12-11 | 2022-06-16 | 国立大学法人広島大学 | 中性子検出素子 |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110467865B (zh) * | 2018-05-09 | 2021-12-28 | 同方威视技术股份有限公司 | 一种涂硼方法 |
CN109852927A (zh) * | 2019-03-11 | 2019-06-07 | 同济大学 | 一种用于涂硼中子探测器富硼涂层的薄膜结构 |
CN111479377A (zh) * | 2020-04-22 | 2020-07-31 | 吉林大学 | 一种d-d中子管靶膜保护层 |
CN112462412B (zh) * | 2020-10-28 | 2023-01-03 | 郑州工程技术学院 | 一种GaN中子探测器用的10B4C中子转换层制备方法 |
CN112859142B (zh) * | 2021-01-25 | 2023-01-24 | 核工业西南物理研究院 | 一种管壁中子灵敏层制备方法及正比计数管 |
CN114481030A (zh) * | 2022-01-26 | 2022-05-13 | 苏州闻道电子科技有限公司 | 一种固体中子转换层及其制备方法和应用 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05274663A (ja) * | 1991-10-08 | 1993-10-22 | Tosoh Corp | 磁気ディスクの製造方法 |
JP2002105665A (ja) * | 2000-09-28 | 2002-04-10 | Japan Science & Technology Corp | イオンビームを用いた硬質薄膜作製法 |
US6771730B1 (en) * | 1998-11-25 | 2004-08-03 | Board Of Regents Of University Of Nebraska | Boron-carbide solid state neutron detector and method of using the same |
US20050208218A1 (en) * | 1999-08-21 | 2005-09-22 | Ibadex Llc. | Method for depositing boron-rich coatings |
JP2007100133A (ja) * | 2005-09-30 | 2007-04-19 | Dowa Holdings Co Ltd | 硬質皮膜被覆部材およびその製造方法 |
WO2013002697A1 (en) * | 2011-06-30 | 2013-01-03 | European Spallation Source Ess Ab | A method for producing a neutron detector component comprising a boron carbide layer for use in a neutron detecting device |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4599827A (en) * | 1985-06-24 | 1986-07-15 | The United States Of America As Represented By The Secretary Of The Army | Metallographic preparation of particulate filled aluminum metal matrix composite material |
US4959113C1 (en) * | 1989-07-31 | 2001-03-13 | Rodel Inc | Method and composition for polishing metal surfaces |
RU2141005C1 (ru) * | 1997-03-28 | 1999-11-10 | Баранов Александр Михайлович | Способ уменьшения шероховатости поверхности и устройство для его осуществления |
RU2160938C1 (ru) * | 1999-03-15 | 2000-12-20 | Государственный научный центр РФ Институт теоретической и экспериментальной физики | Генератор ультрахолодных нейтронов |
JP2001240850A (ja) * | 2000-02-29 | 2001-09-04 | Sanyo Chem Ind Ltd | 研磨用砥粒分散剤および研磨用スラリー |
US6517249B1 (en) * | 2000-06-06 | 2003-02-11 | The Timken Company | Bearing with amorphous boron carbide coating |
RU2194087C2 (ru) * | 2000-07-05 | 2002-12-10 | Дочернее государственное предприятие "Институт ядерной физики" Национального ядерного центра Республики Казахстан | Способ получения бериллиевой и бериллийсодержащей фольги и устройство для его осуществления |
RU2377610C1 (ru) * | 2007-11-30 | 2009-12-27 | Шлюмберже Текнолоджи Б.В. | Способ гамма-каротажа скважины (варианты) |
JP5585081B2 (ja) * | 2008-05-16 | 2014-09-10 | 東レ株式会社 | 研磨パッド |
RU2409703C1 (ru) * | 2009-08-03 | 2011-01-20 | Государственное образовательное учреждение Высшего профессионального образования "Томский государственный университет" | Способ нанесения покрытий в вакууме на изделия из электропроводных материалов и диэлектриков |
CN102749641B (zh) * | 2011-04-18 | 2015-11-25 | 同方威视技术股份有限公司 | 涂硼中子探测器及其制造方法 |
CN102890027B (zh) * | 2012-09-29 | 2014-12-03 | 攀钢集团攀枝花钢铁研究院有限公司 | 一种含Ti的无间隙原子钢冷轧薄板金相组织显示方法 |
CN103336296A (zh) * | 2013-05-31 | 2013-10-02 | 上海大学 | 一种中子探测器 |
-
2014
- 2014-07-14 EP EP14176907.5A patent/EP2975154A1/de not_active Withdrawn
-
2015
- 2015-06-29 RU RU2016148869A patent/RU2695697C2/ru active
- 2015-06-29 US US14/900,253 patent/US20170260619A1/en not_active Abandoned
- 2015-06-29 CN CN201580031423.2A patent/CN107250421A/zh active Pending
- 2015-06-29 JP JP2015563140A patent/JP6339597B2/ja active Active
- 2015-06-29 AU AU2015291339A patent/AU2015291339B2/en active Active
- 2015-06-29 HU HUE15731384A patent/HUE031311T2/en unknown
- 2015-06-29 WO PCT/EP2015/064751 patent/WO2016008713A1/de active Application Filing
- 2015-06-29 ES ES15731384.2T patent/ES2599977T3/es active Active
- 2015-06-29 EP EP15731384.2A patent/EP2997174B1/de active Active
- 2015-06-29 DK DK15731384.2T patent/DK2997174T3/en active
- 2015-06-29 CA CA2949470A patent/CA2949470C/en active Active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05274663A (ja) * | 1991-10-08 | 1993-10-22 | Tosoh Corp | 磁気ディスクの製造方法 |
US6771730B1 (en) * | 1998-11-25 | 2004-08-03 | Board Of Regents Of University Of Nebraska | Boron-carbide solid state neutron detector and method of using the same |
US20050208218A1 (en) * | 1999-08-21 | 2005-09-22 | Ibadex Llc. | Method for depositing boron-rich coatings |
JP2002105665A (ja) * | 2000-09-28 | 2002-04-10 | Japan Science & Technology Corp | イオンビームを用いた硬質薄膜作製法 |
JP2007100133A (ja) * | 2005-09-30 | 2007-04-19 | Dowa Holdings Co Ltd | 硬質皮膜被覆部材およびその製造方法 |
WO2013002697A1 (en) * | 2011-06-30 | 2013-01-03 | European Spallation Source Ess Ab | A method for producing a neutron detector component comprising a boron carbide layer for use in a neutron detecting device |
Non-Patent Citations (1)
Title |
---|
JPN6016028942; HOGLUND C. et.al.: 'B4C thin films for neutron detection' Journal of Applied Physics vol. 111, 201210, 104908, AIP * |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2022124155A1 (ja) * | 2020-12-11 | 2022-06-16 | 国立大学法人広島大学 | 中性子検出素子 |
Also Published As
Publication number | Publication date |
---|---|
EP2997174B1 (de) | 2016-09-21 |
HUE031311T2 (en) | 2017-07-28 |
ES2599977T3 (es) | 2017-02-06 |
JP6339597B2 (ja) | 2018-06-06 |
CA2949470C (en) | 2018-05-01 |
RU2016148869A (ru) | 2018-08-14 |
CN107250421A (zh) | 2017-10-13 |
RU2016148869A3 (ja) | 2019-02-07 |
AU2015291339B2 (en) | 2018-08-16 |
EP2997174A1 (de) | 2016-03-23 |
US20170260619A1 (en) | 2017-09-14 |
EP2975154A1 (de) | 2016-01-20 |
DK2997174T3 (en) | 2016-11-28 |
WO2016008713A1 (de) | 2016-01-21 |
RU2695697C2 (ru) | 2019-07-25 |
AU2015291339A1 (en) | 2016-11-17 |
CA2949470A1 (en) | 2016-01-21 |
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